JPS6227446B2 - - Google Patents
Info
- Publication number
- JPS6227446B2 JPS6227446B2 JP10194679A JP10194679A JPS6227446B2 JP S6227446 B2 JPS6227446 B2 JP S6227446B2 JP 10194679 A JP10194679 A JP 10194679A JP 10194679 A JP10194679 A JP 10194679A JP S6227446 B2 JPS6227446 B2 JP S6227446B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic head
- thin film
- pole height
- film magnetic
- comb
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 claims description 31
- 238000005498 polishing Methods 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 8
- 239000010408 film Substances 0.000 claims description 3
- 244000126211 Hericium coralloides Species 0.000 claims description 2
- 238000005259 measurement Methods 0.000 description 6
- 239000004020 conductor Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 210000001520 comb Anatomy 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
- G11B5/3166—Testing or indicating in relation thereto, e.g. before the fabrication is completed
Description
【発明の詳細な説明】
本発明は薄膜磁気ヘツドの製造方法に関し、特
にポールハイトを正確に作製する方法に係る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a thin film magnetic head, and more particularly to a method for accurately manufacturing a pole height.
薄膜磁気ヘツドは一括して多くの磁気ヘツド素
子を作成することができることを特徴としてお
り、従来ガラス、シリコンあるいはフエライト基
板の上に作成している。基板上に形成された磁気
ヘツド素子はそのままでは磁気ヘツドとしての完
全な機能を発揮せず、切断して断面より物理的方
法たとえば研摩でポールハイトを正確に出して完
全なものになる。ポールハイトとは第１図におい
て基板１の上に作成された磁性薄膜２，３と導体
４とで構成される薄膜磁気ヘツド素子５の磁性薄
膜２，３の端面６と導体４の端面７との間の距離
１を指している。 Thin film magnetic heads are characterized by the ability to fabricate many magnetic head elements at once, and are conventionally fabricated on glass, silicon or ferrite substrates. The magnetic head element formed on the substrate does not function perfectly as a magnetic head as it is, so it can be made perfect by cutting the cross section and using a physical method such as polishing to accurately obtain the pole height. Pole height refers to the end face 6 of the magnetic thin films 2 and 3 and the end face 7 of the conductor 4 of the thin film magnetic head element 5 which is composed of the magnetic thin films 2 and 3 and the conductor 4 formed on the substrate 1 in FIG. It indicates the distance 1 between.
従来、このポールハイトを正確に出すために薄
膜磁気ヘツド素子を切断研摩する前にある基準面
を設けておき、前もつて研摩量を決め寸法を常に
測りながら予定のポールハイトを得る方法があつ
た。又、最近では第２図に示す如く薄膜磁気ヘツ
ド素子８の近傍にポールハイトを間接的に知るた
めのモニタ９を設けておき、研摩工事をしながら
研摩面側より長さＬを測定することにより予定の
ポールハイトを得る方法があつた。第２図におい
て１０は研摩工事前の薄膜磁気ヘツド、１１は研
摩工事が完了し予定のポールハイトｌを得た状態
の薄膜磁気ヘツドを示している。 Conventionally, in order to obtain this pole height accurately, a reference plane was prepared before cutting and polishing the thin film magnetic head element, and the amount of polishing was determined in advance and the dimensions were constantly measured to obtain the planned pole height. Ta. Recently, as shown in FIG. 2, a monitor 9 is installed near the thin film magnetic head element 8 to indirectly know the pole height, and the length L is measured from the polished surface side while polishing work is being carried out. Now there is a way to obtain the expected pole height. In FIG. 2, numeral 10 shows the thin film magnetic head before polishing work, and numeral 11 shows the thin film magnetic head after the polishing work has been completed and the expected pole height l has been obtained.
例示した従来の方法はいずれも研摩途中での寸
法の正確な測定を必要とするが、ポールハイトの
必要精度が±10μｍ程度であれば低倍率の工具顕
微鏡で測定が可能であり、それほど困難な作業で
はなかつた。しかしながら最近の磁気記録装置は
著しく記録密度が向上して、磁気ヘツドに要求さ
れる性能もかこくなものがあり、±１μｍないし
±２μｍのポールハイトの精度を必要とする場合
もめずらしくない。このような高精度な寸法を確
実に出すには従来の方法では高倍率で正確な寸法
測定用の顕微鏡を必要とする。さらに大量生産す
る場合に、そのような顕微鏡を研摩の工事現場で
使用して又一個一個寸法を測定することは作業効
率、歩留りの点から考えても適切な方法とは言え
ない。又結果としての薄膜磁気ヘツドのポールハ
イトも寸法の測定精度に左右され一定の品質のも
のを得ることは困難である。 All of the conventional methods illustrated require accurate measurement of dimensions during polishing, but if the required accuracy of pole height is around ±10 μm, measurement can be done with a low-magnification tool microscope; It wasn't work. However, the recording density of recent magnetic recording devices has significantly improved, and the performance required of the magnetic head is also high, and it is not uncommon for pole height accuracy of ±1 μm to ±2 μm to be required. In order to reliably obtain such highly accurate dimensions, conventional methods require a microscope for accurate dimension measurements with high magnification. Furthermore, in the case of mass production, using such a microscope at a polishing construction site to measure the dimensions of each item one by one is not an appropriate method in terms of work efficiency and yield. Furthermore, the pole height of the resulting thin film magnetic head is also affected by the measurement accuracy of the dimensions, and it is difficult to obtain one of constant quality.
本発明の目的は上記の欠点を解消し、生産がす
ぐれており且つ精度の良好なポールハイトを有す
る薄膜磁気ヘツドを製造する方法を提供すること
にある。 SUMMARY OF THE INVENTION An object of the present invention is to overcome the above-mentioned drawbacks and to provide a method for manufacturing a thin film magnetic head having a pole height with excellent production efficiency and good accuracy.
本発明は基板上の一部にくしの歯状で且つくし
の歯の長さがそれぞれ異なる形状の膜を形成して
おき、その後薄膜磁気ヘツド素子を基板ごと研摩
してポールハイトを予定の寸法に仕上げる際、研
摩面側よりくしの歯状の薄膜の断面を観測し、研
摩面側に露出しているくしの歯の数を計数するこ
とによりポールハイトの正確な寸法を知ろうとす
るものである。従来例である第２図のモニタ９と
本質的に異なる点はモニタ９では研摩面より寸法
を正確に測定する必要があるのに対し本発明のく
しの歯状のモニタによれば研摩面に露出している
くしの数により言いかえればデイジタル的にポー
ルハイトの制御が可能である。 In the present invention, a comb-shaped film with different lengths of the comb teeth is formed on a part of the substrate, and then the thin film magnetic head element is polished together with the substrate to adjust the pole height to the planned size. When finishing, the cross section of the comb tooth-shaped thin film is observed from the polished surface side, and the number of comb teeth exposed on the polished surface side is counted to determine the exact dimensions of the pole height. be. The essentially different point from the conventional monitor 9 shown in FIG. In other words, the pole height can be digitally controlled by the number of exposed combs.
次に本発明の実施例について図面を参照して説
明する。第３図、第４図及び第５図は本発明の実
施例の製造方法を示す図である。第３図において
薄膜磁気ヘツド素子８は基板１２の上に蒸着ある
いはスパツタなどの一般的に知られている薄膜形
成技術及び写真蝕刻技術により形成される。この
製造工程の中で薄膜磁気ヘツド素子８を作るプロ
セスと同時にあるいは別にくしの歯状で且つくし
の歯の長さがそれぞれ異なるポールハイトモニタ
１３を薄膜磁気ヘツド素子８と同一の基板１２の
上に形成する。ポールハイトモニタ１３の材質は
特にこれでなければと言うものは何が薄膜磁気ヘ
ツド素子８を構成する導体あるいは磁性膜と同一
の材質の方が薄膜磁気ヘツド素子８を作製するの
と同時にポールハイトモニタ１３を作れる点で便
利である。くしの歯の長さＣは研摩工事で得よう
とする予定のポールハイト寸法の前後の長さがあ
ればよい。一例としては第３図で仮想線１４まで
研摩した時に予定のポールハイトになるとすると
くしの歯の長さＣは20μ程度であれば充分であ
る。くしの歯の長さの変化は所要のポールハイト
の測定精度により異なりたとえば２μｍの精度が
必要であるならばくしの歯は２μずつ変化させた
ものを並べる必要がある。したがつて、くしの歯
が10本あれば２μ精度で約20μ幅内のポールハイ
トの寸法を知ることができる。このようにして作
製されたチツプ１５は第４図に示す如くスライダ
ー１６と接着剤あるいはガラス１７により接合さ
れ矢印Ａ側より研摩されて薄膜磁気ヘツド１８、
第５図は研摩の途中で第４図の矢印Ａ側より薄膜
磁気ヘツド素子を見た時の研摩面の状態を示して
いる。ここでポールハイトモニタ１３はその断面
を見ることができ先に説明した原理でもわかるよ
うに、研摩面に露出しているくしの歯の数を計数
することによりあとどれだけ研摩すれば予定のポ
ールハイトになるかをデイジタル的に知ることが
できる。この場合測定の精度はくしの歯の段数に
よつて決まり、使用する顕微鏡によるものではな
い。ところがくしの歯状のポールハイトモニタ１
３の形状寸法は写真蝕刻法により決められるもの
であり、周知の如く写真蝕刻法は最近ドライエツ
チング法の実用性などもあり極めて精度が良くな
つている。このため本発明の実施例に適用するに
最適である。 Next, embodiments of the present invention will be described with reference to the drawings. FIG. 3, FIG. 4, and FIG. 5 are diagrams showing a manufacturing method of an embodiment of the present invention. In FIG. 3, a thin film magnetic head element 8 is formed on a substrate 12 by generally known thin film forming techniques such as vapor deposition or sputtering, and photolithographic techniques. During this manufacturing process, simultaneously or separately from the process of making the thin film magnetic head element 8, pole height monitors 13 having a comb tooth shape and having different lengths of the comb teeth are placed on the same substrate 12 as the thin film magnetic head element 8. to form. The material of the pole height monitor 13 must be selected from these materials.It is better to use the same material as the conductor or magnetic film that constitutes the thin film magnetic head element 8 to make the pole height monitor 13 at the same time as the thin film magnetic head element 8 is manufactured. It is convenient in that a monitor 13 can be created. The length C of the comb teeth should be the length before and after the pole height dimension to be obtained by the polishing work. As an example, if the expected pole height is achieved when polished to the imaginary line 14 in FIG. 3, it is sufficient that the length C of the comb teeth is about 20 μm. The change in the length of the comb teeth varies depending on the required pole height measurement accuracy. For example, if an accuracy of 2 μm is required, the comb teeth must be arranged in such a way that they vary in 2 μm increments. Therefore, if the comb has 10 teeth, the pole height dimension within a width of about 20μ can be determined with 2μ accuracy. The thus manufactured chip 15 is bonded to a slider 16 with adhesive or glass 17 as shown in FIG. 4, and is polished from the arrow A side to form a thin film magnetic head 18.
FIG. 5 shows the state of the polished surface when the thin film magnetic head element is viewed from the arrow A side in FIG. 4 during polishing. Here, the pole height monitor 13 can see the cross section of the comb, and as can be seen from the principle explained earlier, by counting the number of teeth of the comb exposed on the polished surface, it is possible to determine how much more the planned pole needs to be polished. You can digitally know whether the height will be high. In this case, the accuracy of the measurement is determined by the number of teeth on the comb and not by the microscope used. However, the comb-shaped pole height monitor 1
The shape and dimensions of 3 are determined by photo-etching, and as is well known, photo-etching has recently become extremely accurate due to the practicality of dry etching. Therefore, it is most suitable for application to the embodiments of the present invention.
本発明は以上説明したようにデイジタル的にポ
ールハイトをモニタできるくしの歯状の薄膜を薄
膜磁気ヘツド素子が形成されている基板上に作製
しておき、研摩の際に研摩面に露出しているくし
の歯を計数することにより容易に正確な予定のポ
ールハイトを得ることができる。 As explained above, in the present invention, a comb-shaped thin film capable of digitally monitoring the pole height is prepared on a substrate on which a thin film magnetic head element is formed, and is exposed on the polished surface during polishing. By counting the teeth of the comb, an accurate expected pole height can be easily obtained.
第１図は一般的な薄膜磁気ヘツド素子を示す
図、第２図は従来のポールハイトの寸法を知る方
法を示す図、第３図に本発明の実施例によるチツ
プを示す図、第４図は本発明の実施例による薄膜
磁気ヘツドの外観図、第５図は本発明の実施例に
よる薄膜磁気ヘツドの研摩面よりポールハイトモ
ニタを見た図である。
１……基板、ｌ……ポールハイト、８……薄膜
磁気ヘツド素子、９……従来のモニタ、１３……
ポールハイトモニタ、Ｃ……くしの歯の長さ、１
５……チツプ、１６……スライダー、１７……ガ
ラス。
Fig. 1 shows a general thin film magnetic head element, Fig. 2 shows a conventional method of determining the pole height dimension, Fig. 3 shows a chip according to an embodiment of the present invention, and Fig. 4 5 is an external view of a thin film magnetic head according to an embodiment of the present invention, and FIG. 5 is a view of a pole height monitor viewed from the polished surface of the thin film magnetic head according to an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Substrate, l... Pole height, 8... Thin film magnetic head element, 9... Conventional monitor, 13...
Pole height monitor, C...Length of comb teeth, 1
5...chip, 16...slider, 17...glass.
Claims (1)
の一部に、くしの歯状で且つ各くしの歯の長さが
それぞれ異なる形状の膜を作成しておき、その後
薄膜磁気ヘツド素子を基板ごと研摩してポールハ
イトを予定の値に正確に作製する際、研摩面側よ
り前記くしの歯状の薄膜断面を観測し、研摩面側
に露出せるくしの歯の数に応じて研摩量を制御し
予定のポールハイトを得ることを特徴とする薄膜
磁気ヘツドの製造方法。1. On a part of the substrate on which the thin-film magnetic head element is formed, a comb-shaped film is created in which the length of each comb tooth is different, and then the thin-film magnetic head element is attached to the substrate. When polishing to accurately produce the pole height to the planned value, observe the comb tooth-shaped thin film cross section from the polished surface side, and control the amount of polishing according to the number of comb teeth exposed on the polished surface side. A method for manufacturing a thin film magnetic head characterized by obtaining a predetermined pole height.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10194679A JPS5629832A (en) | 1979-08-10 | 1979-08-10 | Manufacture for thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10194679A JPS5629832A (en) | 1979-08-10 | 1979-08-10 | Manufacture for thin film magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5629832A JPS5629832A (en) | 1981-03-25 |
| JPS6227446B2 true JPS6227446B2 (en) | 1987-06-15 |
Family
ID=14314055
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10194679A Granted JPS5629832A (en) | 1979-08-10 | 1979-08-10 | Manufacture for thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5629832A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0414993Y2 (en) * | 1987-10-23 | 1992-04-03 |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57162115A (en) * | 1981-03-30 | 1982-10-05 | Nec Corp | Thin-film magnetic head element |
| JPS59223919A (en) * | 1983-06-03 | 1984-12-15 | Sanyo Electric Co Ltd | Production for thin film magnetic head |
| JPH0664714B2 (en) * | 1983-11-25 | 1994-08-22 | 株式会社東芝 | Thin film magnetic head |
| JPS60135813U (en) * | 1984-02-17 | 1985-09-09 | 株式会社ケンウッド | thin film magnetic head |
| JPS60191417A (en) * | 1984-03-12 | 1985-09-28 | Nec Kansai Ltd | Manufacture of thin film magnetic head |
| JPH0658730B2 (en) * | 1985-03-26 | 1994-08-03 | 日本ビクター株式会社 | Element for thin film magnetic head and method for manufacturing thin film magnetic head |
| US7336442B2 (en) * | 2005-08-22 | 2008-02-26 | Headway Technologies, Inc. | Magnetic head and method of manufacturing same, and magnetic head substructure |
-
1979
- 1979-08-10 JP JP10194679A patent/JPS5629832A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0414993Y2 (en) * | 1987-10-23 | 1992-04-03 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5629832A (en) | 1981-03-25 |
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