JPS60191417A - Manufacture of thin film magnetic head - Google Patents

Manufacture of thin film magnetic head

Info

Publication number
JPS60191417A
JPS60191417A JP4773384A JP4773384A JPS60191417A JP S60191417 A JPS60191417 A JP S60191417A JP 4773384 A JP4773384 A JP 4773384A JP 4773384 A JP4773384 A JP 4773384A JP S60191417 A JPS60191417 A JP S60191417A
Authority
JP
Japan
Prior art keywords
polishing
markings
parallelism
magnetic head
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4773384A
Other languages
Japanese (ja)
Inventor
Kohei Izawa
井沢 康平
Yuji Yamaguchi
雄司 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Original Assignee
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Semiconductor Manufacturing Co Ltd, Kansai Nippon Electric Co Ltd filed Critical Renesas Semiconductor Manufacturing Co Ltd
Priority to JP4773384A priority Critical patent/JPS60191417A/en
Publication of JPS60191417A publication Critical patent/JPS60191417A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/313Disposition of layers
    • G11B5/3133Disposition of layers including layers not usually being a part of the electromagnetic transducer structure and providing additional features, e.g. for improving heat radiation, reduction of power dissipation, adaptations for measurement or indication of gap depth or other properties of the structure
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • G11B5/3166Testing or indicating in relation thereto, e.g. before the fabrication is completed

Abstract

PURPOSE:To improve the quantity of polishing and the precision of parallelism by setting the size and shape of marking and intervals of steps by detecting numbers of markings provided in polishing margins of a substrate digitally and then polishing the substrate. CONSTITUTION:Numbers of markings 8 are embedded stepwise in polishing margins 7 at both side end parts of the substrate 1 at specific step intervals P. When the polishing margins 7 are polished, markings 8 exposed in polished surfaces 9 are counted respectively to decide whether the polishing reaches a target polishing line 10 or not and whether specific parallelism is obtained or not. Namely, the numbers of markings of both end parts attains to a set quantity at the same time, it is decided that the desired quantity of polishing and parallelism are obtained, and corrective polishing operation is performed. Consequently, a multitrack thin-film magnetic head which has the target polishing line 10 having specific parallelism, i.e. contact sliding surface is manufactured.

Description

【発明の詳細な説明】 技術分計 この発明は、DAT等σ〕記録・再生に使用される薄膜
磁気ヘッド全製造する場合U〕、記録媒体との接触槽動
向形成に関する技術である。
DETAILED DESCRIPTION OF THE INVENTION Technical Summary The present invention relates to the formation of a contact tank trend with a recording medium in the case of manufacturing all thin film magnetic heads used for recording and reproducing (σ) such as DATs (U).

従来技術 最近、磁気テープ等の磁気記録媒体U〕篩記録密度化に
伴い、」二記磁気記録媒体に情報全記録、再生、消去す
る手段として薄膜磁気ヘッドが使用されている。この薄
膜磁気ヘッドは水平及び垂直磁気記録の両方式に利用で
き、その使用範囲はデジタルオーディオ機器等広範囲に
亘っている。
BACKGROUND OF THE INVENTION Recently, with the increasing recording density of magnetic recording media such as magnetic tapes, thin film magnetic heads have been used as means for recording, reproducing, and erasing all information on magnetic recording media. This thin film magnetic head can be used for both horizontal and perpendicular magnetic recording, and is used in a wide range of applications including digital audio equipment.

」二記薄膜磁気ヘッドの一般例を第1図乃至第3図yc
示し説明する。図に於いて、(1)は非磁性体のフェラ
イトやセラミック等の硬質材料からなる平板状の基板、
(2)は旨透磁率を有するFe−Ni合蛍からなるコア
パターン、(3)は略環状に形成された導電性のコイル
パターン、(4)は−に記コアパターン(2)とコイル
パターン・(3)と全絶縁させるための810゜等の非
磁性材料からなる絶縁層である。この薄膜磁気ヘッドは
以下のようVCして製造される。即ち上記基板(1)上
にスパッタリング法やフォトエツチング法により薄膜状
のコアパターン(円全略リング状に形成し、該コアパタ
ーン(2)に鎖交するようにコイルパターン(3)?同
様にスパッタリング法等により被層形成する。そして磁
気ギャップスペーサ及ヒコアパターンとコイルパターン
(3)間の絶縁・保護拐全兼ねて前記絶縁層(4)全形
成することにより、磁気ギャップgが設定される。上記
工程全終了すると、磁気テープとの]4触摺動而に形成
するため、ガラス等の保腹用の基板(図示省略)を4Q
O°C程度の低融点ガラスボンティングによって絶縁層
(4)」二に接合する。
Figures 1 to 3 show general examples of the thin-film magnetic head described in Section 2.
Show and explain. In the figure, (1) is a flat substrate made of a hard material such as non-magnetic ferrite or ceramic;
(2) is a core pattern made of Fe-Ni composite material with high magnetic permeability, (3) is a conductive coil pattern formed in a substantially ring shape, and (4) is the core pattern (2) and coil pattern shown in -.・This is an insulating layer made of a non-magnetic material such as 810° for complete insulation from (3). This thin film magnetic head is manufactured by VC as follows. That is, a thin film-like core pattern (circular, approximately ring-shaped) is formed on the substrate (1) by sputtering or photoetching, and a coil pattern (3) is formed so as to interlink with the core pattern (2). A layer is formed by a sputtering method or the like.Then, the magnetic gap g is set by completely forming the insulating layer (4) which also serves as insulation and protection between the magnetic gap spacer, the Hicore pattern and the coil pattern (3). When all the above steps are completed, a 4Q substrate (not shown) made of glass or the like is used to form a 4-touch contact with the magnetic tape.
It is bonded to the insulating layer (4) by low melting point glass bonding at about 0°C.

ところで例えば、PCM録音用等に使用される薄膜磁気
ヘッドは第51スに示すように1枚の基板(1)に多数
個の単位磁気ヘッドを並設したマルチトラック構成とな
っており、各トラックヘッド(51(5)・・・の磁気
テープとの接触槽動向全形成するため、」−記基板(1
)?研厚力■工しなければならない。
By the way, for example, a thin film magnetic head used for PCM recording has a multi-track configuration in which a large number of unit magnetic heads are arranged in parallel on one substrate (1), as shown in No. 51. In order to completely form the contact tank movement with the magnetic tape of the head (51 (5)...), the substrate (1
)? We must work hard to improve our skills.

これは上記接触摺動向が略完螢な平面でなく、該接触摺
動向と磁気テープとの間にスペーシングロスカゞあると
記録・再生ロスが発生したり、ノイズの原因ともなり、
」二記接触摺動而に略光金な平面にするためである。ま
た第4図に示すようにこの接触摺動面(m+は磁気テー
プ(6)の摺動による摩耗が= 3− 激シいため、コアパターン(2)が露出するまで(r)
[摩加工して接触槽動向全形成するとその摩耗によって
うアバターン(2)が破損してギヤツブ崩れがうむ生す
るので、これを防Iヒするため1−記コアバターン(2
)と接触摺動向(m1間にギヤツブg’に設け、その位
置まで研摩加工することVCより上記接触摺動向(m+
全形成する万か好ましい。これにより上記ギャップg1
肺分は硬質の材料で形成されているので摩耗によるギヤ
ツブ崩れが少ないためである。
This is because the above-mentioned contact sliding movement is not a nearly perfect plane, and if there is a spacing loss between the contact sliding movement and the magnetic tape, recording/reproduction loss may occur, or it may cause noise.
''This is to make the contact sliding surface almost flat. In addition, as shown in Figure 4, this contact sliding surface (m+ is the wear due to the sliding of the magnetic tape (6) = 3-), so that until the core pattern (2) is exposed (r)
[If the contact tank trend is completely formed by abrasion, the wear will damage the core batter (2) and cause the gear to collapse.
) and the contact sliding movement (m1) should be provided on the gear g' between
Full formation is preferable. As a result, the gap g1
This is because the lung portion is made of a hard material, so gears are less likely to collapse due to wear.

ところが第5図図示U〕如〈従来、基板(1)全研摩加
工して磁気テープとの接触摺動面全形成するに際しては
、作栗首か顕微鏡等全利用して、その1」視によりコア
パターン(2)が露出するの全確認するまで研摩代(7
)全研摩加トしていた。こσ)方法によると接触摺動向
(m)にコアパターン(2)が露出するため、前述σ〕
ようにギヤツブ崩れが発生し易いという欠点があった。
However, as shown in FIG. Polishing amount (7) until the core pattern (2) is completely exposed.
) It had been fully polished. According to this σ) method, the core pattern (2) is exposed to the contact sliding movement (m), so the above-mentioned σ]
The disadvantage was that the gears were prone to collapse.

1だ研摩加工中に)−記研摩代(7)の残りや研摩の平
行+W ′に確認することか困姉であるため、仮にギャ
ップg′全設けて接触摺動向(m+全形成しようとして
も研摩の平行IM、即ち−に記接触 4− 摺動面(m+とコアパターン(2)との平行度がイ准詔
できないため、その研摩精度が低く、延いてIri薄膜
磁気ヘッドの特性も劣化するという欠点があった。
1) During the polishing process) - It is difficult to check the remainder of the polishing allowance (7) and the parallelism +W' of polishing, so even if you try to create the entire gap g' and the contact sliding movement (m + complete formation) Parallel IM of polishing, i.e., the contact noted in - 4- Since the parallelism between the sliding surface (m+ and the core pattern (2) cannot be guaranteed), the polishing accuracy is low, and the characteristics of the Iri thin film magnetic head are also deteriorated. There was a drawback to that.

発明のl」的 この発明は、上記従来技術における欠点全解消するため
に提唱されたものであり、記録媒体との接触摺動m 7
’a=形成するため、研摩加工時に1その研摩面の平行
度や残り代金容易に測定できる薄膜磁気ヘッドの製膜方
法r得ること全重量としている。
This invention has been proposed to eliminate all the drawbacks of the above-mentioned prior art, and is aimed at eliminating the contact sliding motion with the recording medium.
'a=The total weight of a thin film magnetic head that can be easily measured for the parallelism of the polished surface and the remaining amount during the polishing process.

発明の構成 この発明は、磁気ヘッドの記録媒体との接触摺動[fl
lを形成するため、磁気ヘッドの基板に設けられた研馴
代全研摩仕上げするに際して、予め研摩代に、階段状に
多数のマーキング全埋設しておき、研摩面に表われるマ
ーキング数が、所定筒数に達するまで研摩することによ
り、摺動面全形成すること全特徴としている。したがっ
て、この発明は、いわばディジタル的に研摩量全検出す
る摺動面設定技術と換言することができる。
Structure of the Invention The present invention is directed to contact sliding of a magnetic head with a recording medium [fl
When polishing the entire polishing area provided on the substrate of the magnetic head in order to form a magnetic head, a large number of markings are buried in the polishing area in advance in a step-like manner, so that the number of markings appearing on the polished surface is a predetermined number. The main feature is that the entire sliding surface is formed by polishing until the number of cylinders is reached. Therefore, the present invention can be described as a sliding surface setting technique that digitally detects the entire amount of polishing.

発明の実施例 第6図〜第8図は、この発明に係る薄膜磁気ヘッド製造
方法の一実施例全説明するだめの要部正面図又は平面1
米である。まずこの発明が、従来の製造方法と相違する
点は、基板(1)の両側端部の研摩代(7)において、
階段状に多数のマーキング(8)。
Embodiment of the Invention FIGS. 6 to 8 are front views or plane views of essential parts of an embodiment of the method for manufacturing a thin film magnetic head according to the present invention.
It's rice. First, this invention differs from conventional manufacturing methods in terms of the polishing allowances (7) at both ends of the substrate (1).
Many markings (8) in a stair-like manner.

(8)、・・・・・・全、所定の段差間隔Pにて夫々埋
設したことである。これらのマーキング(8) 、 (
811・・・・・は、例えば角形でありA見等の金属音
、スパッタリンク法トフォトエッチング法により形成す
る。マーキング(81、(8) 、・・・・・・の段差
設定の仕方は、研摩するに従って移動する研摩面移動方
向に沿わせ、またそれらの大きさは、段差間隔Pと供に
、研摩量検出分解能に関係するが、種々の設定が可能で
ある0そして、マーキング(”+ 、(’J +・・・
・・は、コアパターン(2)の形成と同時にFθ−Nj
合合金全一て形成することかできる。尚、マーキング(
81、(81、・・・・・・・・・は、ここでは−列に
形成しているか、勿論複数列であってもさしつかえない
(8), . . . are buried at a predetermined step interval P, respectively. These markings (8), (
811... are, for example, rectangular, and are formed by metal etching, sputter link method, or photo-etching method. The steps of the markings (81, (8), etc.) are set along the moving direction of the polishing surface that moves as it is polished, and their sizes are determined according to the amount of polishing along with the step interval P. Although related to detection resolution, various settings are possible.0 and markings ("+, ('J+...
... is Fθ-Nj at the same time as the core pattern (2) is formed.
All alloys can be formed. In addition, marking (
Here, 81, (81, . . . ) are formed in a - column, or of course, they may be formed in multiple columns.

したかつて、研摩代(7)全研摩加工する際には、 6
− 第8図に4くされているようにその研摩面(9)の両端
部に露出するマーキング(al 1 (131、・ の
加数を夫夫計数測定することにより、研摩目標ライン(
19に到達したか否か、及び所定の平行度が得られてい
るかを判定することができる。つまり、両端部の筒数が
揃って設定数量に一致すれば、所望の研摩量、平行度か
得られ、筒数か設定数量よりも少ければ、研摩不足、両
ηM R1(の面数が不一致ならば、平行度か得られて
いないと判>νし、イじ正研摩作業全行うのである。よ
って適正な保蝕ギャップ(112を有し、且つFli定
σ)平行度全保持した研摩目標ライン(1(9すなわち
、接触括1動面′kJし成したマルチトラック薄膜磁気
ヘッドが製膜できる。
In the past, the polishing allowance (7) was 6 when performing the complete polishing process.
- As shown in Fig. 8, the polishing target line (
It is possible to determine whether the parallelism has reached 19 and whether a predetermined degree of parallelism has been obtained. In other words, if the number of cylinders at both ends matches the set quantity, the desired amount of polishing and parallelism can be obtained, and if the number of cylinders is less than the set quantity, there is insufficient polishing, and the number of surfaces of both ηM R1 ( If there is a discrepancy, it is determined that parallelism has not been obtained >ν, and the entire polishing operation is performed in the same manner.Therefore, polishing with an appropriate maintenance gap (112 and Fli constant σ) that maintains full parallelism is performed. A multi-track thin film magnetic head with a target line (1 (9), that is, one contact bracket and one moving surface 'kJ') can be formed.

尚、=に記実雄側は、誘導型(集積槽)ヘッドの場合で
あるが、この’tt明は、勿論その他のMRヘッド、或
いは、70ソピーデイスク用ヘツドやコンピュータのメ
モリ用ヘッドに個用しても同様な結果が得られる。
The male side shown in = is for an induction type (accumulating tank) head, but this 'tt light can of course be used individually for other MR heads, 70 Sopie disk heads, and computer memory heads. Similar results can be obtained.

発明の作用効果 この発明は、基板の研摩代に設けた多数のマー 7− キング全ディジタル検出して研鯖するので、マーキング
の寸法形状、段差間隔設定により、研摩量及び平行度の
精1i 7,1−同−1−させることができる。しかも
、この発印」によれv1゛、研摩力1.I T二u存に
、マーキング計数限度′に設定すると、研摩過剰となる
危険力’7 < 、AMllヘッドパターン保設ギャッ
プか適正となり、磁気記録媒体の摺動による摩耗でヘッ
ド全破損することもなくなる。
Effects of the Invention This invention performs polishing by detecting a large number of markings provided in the polishing allowance of the substrate completely digitally. Therefore, the precision of the polishing amount and parallelism can be adjusted by setting the size and shape of the markings and the step interval. , 1-same-1- can be made. Moreover, according to this stamp, the polishing force is 1. However, if the marking count limit is set to the marking count limit, there is a risk of excessive polishing. It disappears.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は一般的な薄膜磁気ヘッドの一部を示す部分概略
断面図、第2図は第1図の平面図、第3図は第1図の斜
視図、第4図は磁気テープとの接触摺動面全示す断面説
明図、第5図は従来の製造方法の一例をボす概略断面図
、第61区〜第8図は、この発明の一実施例7示す薄膜
磁気ヘッドの要部平面図又は平面図である。 (1)・・・基板、(7〕・・・研摩代、(81、(8
1、・・・・・・ ・・・マーキング、(9)・・・研
摩面、(1q・・・接触摺動面。 9(10)
Fig. 1 is a partial schematic sectional view showing a part of a general thin-film magnetic head, Fig. 2 is a plan view of Fig. 1, Fig. 3 is a perspective view of Fig. 1, and Fig. 4 is a diagram showing the structure of a magnetic tape. FIG. 5 is a schematic cross-sectional view showing an example of a conventional manufacturing method. Section 61 to FIG. 8 are main parts of a thin-film magnetic head showing Embodiment 7 of the present invention. FIG. (1)... Substrate, (7)... Polishing allowance, (81, (8
1,... Marking, (9)... Polished surface, (1q... Contact sliding surface. 9 (10)

Claims (1)

【特許請求の範囲】[Claims] 磁気ヘッドの磁気記録媒体とσ〕接接触側動向全形成る
ため、]−記磁気ヘッドσ)基板に設けられた研摩代全
研摩仕上げするに際して、予め1−記研摩代に、階段状
に多数σ〕ママ−ング全埋設しておき、研摩面に表われ
る1−記マーキング数か、用定箇数に達するまで研鯖す
ることにより、」二a[l!摺摺動音賂或することを特
徴とする薄膜磁気ヘッドの!II!!遣方法。
In order to fully form the contact side of the magnetic head with the magnetic recording medium, the polishing distance provided on the magnetic head σ) substrate is polished in advance. σ] By burying all the markings and grinding until the number of markings appearing on the polished surface or the number of marks to be used is reached, ``2a[l! A thin film magnetic head characterized by a sliding sound! II! ! How to send.
JP4773384A 1984-03-12 1984-03-12 Manufacture of thin film magnetic head Pending JPS60191417A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4773384A JPS60191417A (en) 1984-03-12 1984-03-12 Manufacture of thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4773384A JPS60191417A (en) 1984-03-12 1984-03-12 Manufacture of thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS60191417A true JPS60191417A (en) 1985-09-28

Family

ID=12783537

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4773384A Pending JPS60191417A (en) 1984-03-12 1984-03-12 Manufacture of thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS60191417A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5629832A (en) * 1979-08-10 1981-03-25 Nec Corp Manufacture for thin film magnetic head
JPS5911516A (en) * 1982-07-09 1984-01-21 Fujitsu Ltd Magnetic head

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5629832A (en) * 1979-08-10 1981-03-25 Nec Corp Manufacture for thin film magnetic head
JPS5911516A (en) * 1982-07-09 1984-01-21 Fujitsu Ltd Magnetic head

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