JPS62256215A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPS62256215A JPS62256215A JP9979986A JP9979986A JPS62256215A JP S62256215 A JPS62256215 A JP S62256215A JP 9979986 A JP9979986 A JP 9979986A JP 9979986 A JP9979986 A JP 9979986A JP S62256215 A JPS62256215 A JP S62256215A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- surface roughness
- magnetic
- recording medium
- magnetic recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010410 layer Substances 0.000 claims abstract description 65
- 230000003746 surface roughness Effects 0.000 claims abstract description 58
- 239000011241 protective layer Substances 0.000 claims abstract description 27
- 239000000919 ceramic Substances 0.000 claims abstract description 5
- 239000011521 glass Substances 0.000 claims abstract description 5
- 239000002344 surface layer Substances 0.000 abstract 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 14
- 239000010408 film Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 8
- 239000011651 chromium Substances 0.000 description 7
- 229910052759 nickel Inorganic materials 0.000 description 7
- 238000007747 plating Methods 0.000 description 7
- 230000003068 static effect Effects 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 6
- 239000000956 alloy Substances 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910002441 CoNi Inorganic materials 0.000 description 1
- 241000219112 Cucumis Species 0.000 description 1
- 235000015510 Cucumis melo subsp melo Nutrition 0.000 description 1
- FJJCIZWZNKZHII-UHFFFAOYSA-N [4,6-bis(cyanoamino)-1,3,5-triazin-2-yl]cyanamide Chemical compound N#CNC1=NC(NC#N)=NC(NC#N)=N1 FJJCIZWZNKZHII-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- -1 etc. Inorganic materials 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、磁気記録装置に用いられる磁気記録媒体に関
し、特に、磁気記録媒体の始動時において、その始動を
円滑にするJ:うにした磁気記録媒体に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a magnetic recording medium used in a magnetic recording device, and in particular, to a magnetic recording medium used in a magnetic recording device, the present invention relates to a magnetic recording medium used in a magnetic recording device, and in particular, to a magnetic recording medium that facilitates the start-up of the magnetic recording medium. Regarding recording media.
磁気記録媒体としては、第4図に示すものがある。この
円板状の磁気記録媒体1は、主として磁気ヘッドにより
種々の情報が書きこまれたり、読みとられるリードライ
トゾーン1aど、このリードライトゾーン1aの直径方
向内側に、主どして情報の書きこみ又は読みとり終了後
に磁気ヘッドが配置されるランディングゾーン1bとに
区画されている。なお、磁気記録媒体1の中心には、磁
気記録媒体1を回転させるための回転軸を挿入づる、断
面円状の貫通孔1Cが形成されている、1そして、従来
、この磁気記録媒体1の構造どじζは特開昭61−33
22号公報に記載されているように、第5図に示すもの
があった。ずなわら、へ1基板2及びニッケル下地メッ
キ層3からなる非磁性支持体4(以下「支持体」という
。)と、二1バルト磁性メッキ層5(膜厚は0.2μ以
下である。)とからなるものである。このニッケル下地
メッキ層3は、その全面をランディングゾーン1bに必
要な大ぎな面粗度どし、次にリードライトゾーン1aの
部分に限って、ランディングゾーン1[)よりも小さな
面粗度になるように研摩して仕1ニげる。As a magnetic recording medium, there is one shown in FIG. This disc-shaped magnetic recording medium 1 mainly stores information in a read/write zone 1a on the inside of the read/write zone 1a in the diametrical direction, where various information is written and read by a magnetic head. It is divided into a landing zone 1b where a magnetic head is placed after writing or reading is completed. A through hole 1C having a circular cross section is formed in the center of the magnetic recording medium 1, into which a rotation shaft for rotating the magnetic recording medium 1 is inserted. The structural difference ζ is disclosed in Japanese Patent Application Laid-Open No. 61-33
As described in Publication No. 22, there was one shown in FIG. Furthermore, a non-magnetic support 4 (hereinafter referred to as "support") consisting of a first substrate 2 and a nickel base plating layer 3, and a second Balt magnetic plating layer 5 (having a thickness of 0.2 .mu.m or less) are included. ). The entire surface of this nickel base plating layer 3 has the large surface roughness required for the landing zone 1b, and then only the read/write zone 1a has a surface roughness smaller than that of the landing zone 1 [). Polish it as shown to give it a finish.
このような表面を右回るニッケル下地メツ1一層3上の
コバルト磁性メッキ層5の表面も、ニッケル下地メッキ
層3の表面と同様にランディングゾーン1bの方がリー
ドライトゾーン1aよりも面粗度は大ぎい。The surface of the cobalt magnetic plating layer 5 on the nickel base plating layer 1 and layer 3 rotating clockwise around such a surface has a surface roughness that is higher in the landing zone 1b than in the read/write zone 1a, similar to the surface of the nickel base plating layer 3. It's big.
前述したランディングゾーン1bをリードライトゾーン
1aよりも面粗度を大ぎくしているのは、磁気ヘッドが
ランディングゾーン1bに配置しているとき、磁気ヘッ
ドがシンディングゾーンに吸容する現象、すなわち磁気
記録媒体を回転不能にさせたり、回転しずらくさせたり
覆る現象を防止するためである。The reason why the surface roughness of the landing zone 1b described above is greater than that of the read/write zone 1a is due to the phenomenon that when the magnetic head is placed in the landing zone 1b, the magnetic head is absorbed into the sinking zone. This is to prevent the magnetic recording medium from becoming unrotatable, difficult to rotate, or covered.
しかしながら、従来の構造の磁気記録媒体では、支持体
を構成力るニッケル下地メッキ層の表面を、リードライ
トゾーン及びランディングゾーンのそれぞれに必要な異
なる面粗度を有するものとしているが、その表面をリー
ドライトゾーンとランディングゾーンに区画し、リード
ライトゾーンを高密度記録に適したiα1粗度に研摩仕
上げすることは非常に困難であった。すなわち、従来の
磁気記録媒体は高密度記録のためのものとしては問題が
あった、。However, in magnetic recording media with a conventional structure, the surface of the nickel base plating layer constituting the support has different surface roughness required for each of the read/write zone and the landing zone. It was extremely difficult to divide the read/write zone into a read/write zone and a landing zone and polish the read/write zone to an iα1 roughness suitable for high-density recording. In other words, conventional magnetic recording media have had problems when used for high-density recording.
本発明は、前述した問題点を解決するためになされたも
ので、その特徴は、支持体と保護層との間に磁性層を介
在している磁気記録媒体において、前記磁気記録媒体に
ランディングゾーンを設け、前記ランディングゾーンの
前記支持体と前記磁性層との間に、前記磁性層側に向っ
て、前記ランディングゾーンの保護層表向に凹凸を形成
するための凹凸形成側と下地層とを設け、かつ前記凹凸
形成側の面11度が、前記支持体の主表面の面粗度より
も大きい磁気記録媒体である。The present invention has been made to solve the above-mentioned problems, and is characterized by a magnetic recording medium in which a magnetic layer is interposed between a support and a protective layer. between the support body and the magnetic layer of the landing zone, an unevenness forming side and an underlayer for forming unevenness on the surface of the protective layer of the landing zone toward the magnetic layer side. The magnetic recording medium is provided with a surface roughness of 11 degrees on the side where the unevenness is formed, which is larger than the surface roughness of the main surface of the support.
本発明の望ましい態様は、支持体の主表面に凹凸形成側
を被着し、前記凹凸形成側上に下地層、磁性層及び保護
層を順次積層したこと、ランディングゾーンのみに凹凸
形成側を設けたこと、支持体の主表面の面粗度が、Rm
ax、において150Å以下であること、または支持体
がガラス又はセラミックからなることである。A desirable embodiment of the present invention is that the unevenness forming side is attached to the main surface of the support, and the underlayer, the magnetic layer, and the protective layer are sequentially laminated on the unevenness forming side, and the unevenness forming side is provided only in the landing zone. That is, the surface roughness of the main surface of the support is Rm
ax, is 150 Å or less, or the support is made of glass or ceramic.
本発明の第1実施例を第1図に基づき、第2実施例を第
2図に基づきそれぞれ以下に詳述する。A first embodiment of the present invention will be described in detail below based on FIG. 1, and a second embodiment will be explained in detail below based on FIG. 2.
〔実施例1〕
本例の磁気記録媒体10を第1図に基づき説明づる。な
お、同図は部分拡大模式断面図である。さらに、本例の
磁気記録媒体10は、第4図に示すような形状及びリー
ドライトゾーン10aとランディングゾーン10bとを
有しているものである。[Example 1] A magnetic recording medium 10 of this example will be explained based on FIG. 1. Note that this figure is a partially enlarged schematic cross-sectional view. Furthermore, the magnetic recording medium 10 of this example has a shape as shown in FIG. 4, and has a read/write zone 10a and a landing zone 10b.
第1図に示す磁気記録媒体10は、ソーダライムガラス
からなる支持体11(直径: 13011+m、厚さ
=7.9+++m、中心の貫通孔の直径: 40mm)
と、支持体11の主表面のランディングゾーン10bに
被着した、アルミニウム(All)薄膜からなる凹凸形
成側12(膜厚:300人)と、磁気特性を向上さけ−
る機能を有する、クロム(Cr)からなる下地層13(
膜厚:2000人)と、コバルト(Co)とニッケル(
Ni)とからなる磁性層14(それぞれの含有率は、7
5wt%及び25wt%であり、膜厚は100人である
。)と、炭素(C)薄膜からなる保護層15(膜厚:5
00人)とからなるものである。そして、支持体11の
主表面の面粗度はRmax、において40人(以下、面
粗度はRmax、で示す。)、凹凸形成側12の面粗度
は120人、保護層15のランディングゾーン10b及
びリードライトゾーン10aの面粗度はそれぞれ140
人及び50人である。なお、第1図において支持体11
の表面粗さのノー】ギリ形状は、保護層15等を設ける
側の主表面のみに示し、対向する主表面のノコギリ形状
は省略した(後述する第2図も同様)。The magnetic recording medium 10 shown in FIG. 1 has a support 11 made of soda lime glass (diameter: 13011+m, thickness=7.9+++m, diameter of the central through hole: 40mm).
and a concavo-convex forming side 12 (thickness: 300 layers) made of an aluminum (All) thin film adhered to the landing zone 10b on the main surface of the support 11, in order to improve magnetic properties.
Underlayer 13 (made of chromium (Cr)), which has the function of
Film thickness: 2000), cobalt (Co) and nickel (
The magnetic layer 14 consists of Ni) (the content of each is 7
5wt% and 25wt%, and the film thickness is 100 people. ) and a protective layer 15 made of a carbon (C) thin film (thickness: 5
00 people). The surface roughness of the main surface of the support 11 is Rmax, which is 40 people (hereinafter, the surface roughness is referred to as Rmax), and the surface roughness of the unevenness forming side 12 is 120 people, and the landing zone of the protective layer 15 is The surface roughness of the read/write zone 10b and the read/write zone 10a is 140, respectively.
and 50 people. In addition, in FIG. 1, the support body 11
The sawtooth shape of the surface roughness is shown only on the main surface on the side where the protective layer 15 etc. are provided, and the sawtooth shape on the opposing main surface is omitted (the same applies to FIG. 2, which will be described later).
また各層12.13.14.15及び支持体11のノコ
ギリ形状は模式的に示()ている(後述づる第2図も同
様)。Further, the sawtooth shapes of each layer 12, 13, 14, 15 and the support 11 are schematically shown in parentheses (the same applies to FIG. 2, which will be described later).
次に、本例の磁気記録媒体10の製造方法を述べる。先
ず、支持体11の主表面に、リードライ1〜ゾーン10
aのみを覆うマスクを介して、Allをスパッタターゲ
ットと【ノスパッタリング法ににり凹凸形成側12を成
膜した。なお、この成膜において、支持体11の温度を
150℃としていることから、粒界の発達したAjJt
tlBIとなり、ランディングゾーン10bの保護層1
5に所望の凹凸、ずなわノ5面粗度を形成することがで
きる。次に、前述した凹凸形成側12及び支持体11の
リードライトゾーン10aに対する主表面上に、Crか
らなるターゲットを用いてスパッタリング法により下地
層13を成膜した。Next, a method for manufacturing the magnetic recording medium 10 of this example will be described. First, re-drying zones 1 to 10 are applied to the main surface of the support 11.
A film was formed on the unevenness forming side 12 by using a sputtering target and a no-sputtering method using a mask that covered only the portion a. In addition, in this film formation, since the temperature of the support 11 was set to 150°C, AjJt with developed grain boundaries
tlBI, the protective layer 1 of the landing zone 10b
5 can be formed with desired unevenness and roughness of the 5-sided surface. Next, a base layer 13 was formed on the above-described unevenness forming side 12 and the main surface of the support 11 with respect to the read/write zone 10a by sputtering using a target made of Cr.
次に、この不地層13上に、磁性層14を、CoとNi
とからなるターゲットによりスパッタリング法で成膜し
、さらにこの磁性層14上に、保護層15をCからなる
ターゲットを用いてスパッタリング法により成膜した。Next, on this ground layer 13, a magnetic layer 14 is formed of Co and Ni.
A protective layer 15 was formed on the magnetic layer 14 by a sputtering method using a target made of carbon.
なお、保護層15において、リードライトゾーン10a
とランディングゾーン10bとは約300人の段差を生
じているが、これは磁気ヘッドの飛行高さの1710程
度であることから、磁気ヘッドの移動には何ら支障のな
い段差である。Note that in the protective layer 15, the read/write zone 10a
There is a difference in level between the landing zone 10b and the landing zone 10b of about 300 people, but since this is about 1710 degrees higher than the flight height of the magnetic head, the difference in level does not pose any problem for the movement of the magnetic head.
本例の磁気記録媒体10は、凹凸形成側12の面粗度よ
りも支持体11の主表面の面粗度を小ざくしでいること
から、ランディングゾーン10bの保護層j5の面粗度
は、凹凸形成側12の面粗度の影胃を受け、所望する面
粗度となる。また、凹凸形成側12は、成膜法(本例で
は、スパッタリング法である。In the magnetic recording medium 10 of this example, the surface roughness of the main surface of the support 11 is smaller than that of the unevenness forming side 12, so the surface roughness of the protective layer j5 of the landing zone 10b is , the desired surface roughness is obtained by taking into account the influence of the surface roughness of the unevenness forming side 12. Further, the unevenness forming side 12 is formed by a film forming method (in this example, a sputtering method).
)により形成していることから、支持体11の主表面の
リードライトゾーン10aの面粗度を大きくすることが
なく、良好に維持することができ、その結果、高密瓜の
記録ができる。), the surface roughness of the read/write zone 10a on the main surface of the support 11 can be maintained well without increasing it, and as a result, high-density melon can be recorded.
さらに、本例の磁気記録媒体10の性能を評価り゛るた
めに2以下のような磁気ヘッドと磁気記録媒体10との
静止摩擦係数の測定及び耐久性試験を行った。Furthermore, in order to evaluate the performance of the magnetic recording medium 10 of this example, the coefficient of static friction between the magnetic head 2 or less and the magnetic recording medium 10 was measured and a durability test was conducted.
磁気ヘッドに15グラムの荷重を加えたとぎ、ランディ
ングゾーン10bのコンタクトスターl−/ストップ試
験(磁気ヘッドを磁気記録媒体の表面に当接し、静止さ
せた状態で、磁気記録媒体の回転開始・回転停止を行う
試験であり、以下「css試験」という。)を行った。After applying a load of 15 grams to the magnetic head, a contact star l-/stop test of the landing zone 10b (starting and rotating the magnetic recording medium with the magnetic head in contact with the surface of the magnetic recording medium and stationary) (hereinafter referred to as "CSS test") was conducted.
この試験の初期の静止摩擦係数が0.15であり、15
000回C3S試験後の静止摩擦係数も0.5であり、
磁気ヘッドにより、磁気記録媒体10の回転が不能とな
ったり、回転しずらくなる現象は生ぜず、さらに磁気ヘ
ッド及び磁気記録媒体10の損傷も生じなかった。一方
、比較のために、リードライ1〜ゾーン10a(保護層
15のリードライトゾーン10aの面粗度は50人であ
る。The initial coefficient of static friction in this test was 0.15;
The static friction coefficient after 000 times C3S test is also 0.5,
The magnetic head did not cause the magnetic recording medium 10 to become unable to rotate or became difficult to rotate, and neither the magnetic head nor the magnetic recording medium 10 was damaged. On the other hand, for comparison, the surface roughness of the read/write zone 10a of the protective layer 15 is 50.
)において、同様のC8S試験を行ったところ、初期の
静止摩擦係数は0.2であったが、15000回試験後
においては2.5以上となり、磁気記録媒体10−が回
転しずらくなり、磁気記録媒体10を回転するために、
回転源に必要以上の起動トルクを負荷しなくてはならず
、正常な回転を維持づることかできなくなった。), when a similar C8S test was conducted, the initial coefficient of static friction was 0.2, but after 15,000 tests it became 2.5 or more, making it difficult for the magnetic recording medium 10- to rotate. In order to rotate the magnetic recording medium 10,
It was necessary to load the rotation source with more starting torque than necessary, making it impossible to maintain normal rotation.
〔実施例2〕
本例の磁気記録媒体20を第2図に基づぎ説明する。な
お、同図は部分拡大模式断面図であり、本例の磁気記録
媒体20も前記実施例と同様の形状であり、かつリード
ライトゾーン20aとランディングゾーン20bを有し
ているものである。[Example 2] A magnetic recording medium 20 of this example will be explained based on FIG. 2. The figure is a partially enlarged schematic cross-sectional view, and the magnetic recording medium 20 of this example has the same shape as that of the previous example, and has a read/write zone 20a and a landing zone 20b.
本例の磁気記録媒体20は、前記実施例と同様の支持体
21と、支持体21の主表面のランディングゾーン20
bのみならず、リードライトゾーン20aにも被着した
、^Lからなる凹凸形成側22(膜厚:200人)と、
前記実施例と同様の、下地層23、磁性層24及び保護
層25とからなる。そして、支持体21の主表面の面粗
度、凹凸形成側22の面粗度及び保護層25の面粗度は
それぞれ、40人、80人及び100人である。すなわ
ち、保護層25のリードライトゾーン20a及びランデ
ィングゾーン20bの面粗度はそれぞれ100人である
。The magnetic recording medium 20 of this example includes a support 21 similar to that of the above example, and a landing zone 20 on the main surface of the support 21.
The unevenness forming side 22 (film thickness: 200 layers) consisting of ^L is adhered not only to the read/write zone 20a, but also to the read/write zone 20a.
It consists of an underlayer 23, a magnetic layer 24, and a protective layer 25, similar to the previous embodiment. The surface roughness of the main surface of the support body 21, the surface roughness of the unevenness forming side 22, and the surface roughness of the protective layer 25 are 40, 80, and 100, respectively. That is, the surface roughness of the read/write zone 20a and the landing zone 20b of the protective layer 25 is 100, respectively.
次に、この磁気記録媒体20の製造方法を)ホベる。Next, a method for manufacturing this magnetic recording medium 20 will be described.
先ず、支持体21のリードライトゾーン20aとランデ
ィングゾーン20bの主表面に、へlターゲットを用い
てスパッタリング法により凹凸形成側22を成膜した。First, the unevenness forming side 22 was formed on the main surfaces of the read/write zone 20a and the landing zone 20b of the support 21 by sputtering using a heli target.
なお、この成膜においては、面粗度を前述した80人と
するために、支持体21の温度を200℃とした。次に
、凹凸形成側22上に、前記実施例と同様の方法で、下
地層23、磁性層24及び保護層25を成膜する。In this film formation, the temperature of the support 21 was set to 200° C. in order to achieve the surface roughness of 80 as described above. Next, a base layer 23, a magnetic layer 24, and a protective layer 25 are formed on the unevenness forming side 22 by the same method as in the above embodiment.
本例によれば、凹凸形成側22の面粗度が支持体21の
面粗度よりも大ぎいことから、ランディングゾーン20
bの保護層25の面粗度は、凹凸形成側22の面粗度の
影響を受け、所望する面粗度となる。According to this example, since the surface roughness of the unevenness forming side 22 is greater than the surface roughness of the support body 21, the landing zone 20
The surface roughness of the protective layer 25 b is influenced by the surface roughness of the unevenness forming side 22, and has a desired surface roughness.
なお、本例においても、前記実施例と同様に、凹凸形成
側22を成膜法により形成していることから、支持体2
1の主表面の面粗度を軸持することができる。また、本
例では、磁性層24のリードライトゾーン20aの面粗
度は、凹凸形成側22の面粗度の影響を受【ノるが、そ
の値が100人であることから、リードライトゾーン2
0aの高密度記録性も軸持でき、一方保護層25の面粗
度は100人であることから、後記するJ:うに、ラン
ディングゾーン20bにおいても磁気ヘッドとの吸着、
′?1′なわ15!l気記録媒体20の回転時において
不都合は生じない。In addition, in this example as well, since the unevenness forming side 22 is formed by the film forming method as in the above example, the support body 2
The surface roughness of the main surface of No. 1 can be maintained. Further, in this example, the surface roughness of the read/write zone 20a of the magnetic layer 24 is influenced by the surface roughness of the unevenness forming side 22, but since the value is 100, the read/write zone 20a is 2
Since the surface roughness of the protective layer 25 is 100, it is possible to maintain the high density recording property of 0a, and the surface roughness of the protective layer 25 is 100.
′? 1' rope 15! No inconvenience occurs when the recording medium 20 is rotated.
また、ランディングゾーン20bにおいて、前記実施例
と同様の試験を行った結果、試験初期の静止摩擦係数が
0.15であり、15000回CSS試験後の静止摩擦
係数は0.7となり、前記実施例のときと比較して15
000回試験後の静止摩擦係数は大きくなるが、磁気記
録媒体20の回転が不能となったり、回転しずらくなる
現象は生じなかった。さらに磁気記録媒体20及び磁気
ヘッドの10傷も牛しなかった。Further, in the landing zone 20b, as a result of conducting a test similar to the above example, the static friction coefficient at the initial stage of the test was 0.15, and the static friction coefficient after 15000 times CSS test was 0.7, and the above example 15 compared to when
Although the coefficient of static friction increased after 000 tests, no phenomenon occurred in which the magnetic recording medium 20 became unable to rotate or became difficult to rotate. Furthermore, no damage was caused to the magnetic recording medium 20 or the magnetic head.
なお、本例において、ランディングゾーン20b及びリ
ードライトゾーン20aの両者に対して有効な凹凸形成
側22の面粗度は60人〜150人であり、この面粗度
の範囲のとき、ランディングゾーン20bにおいては、
磁気ヘッドの吸着を防止でさ、一方リードライトゾーン
20aの高密度化に十分に 12一
対応できる。In this example, the surface roughness of the unevenness forming side 22 that is effective for both the landing zone 20b and the read/write zone 20a is from 60 to 150. In,
This prevents the magnetic head from being attracted, and at the same time, it can sufficiently accommodate the increase in density of the read/write zone 20a.
本発明は前記実施例に限らず、下記のものであってもよ
い。先ず、支持体の材料はソーダライムガラス、アルミ
ノシリケートガラス、石英ガラス等のガラスに限らず、
AIL合金又はセラミックであってもよい。望ましくは
、A1合金と比較して所望する面粗度に加工することが
容易で、かつ高密度記録性に悪影響を与えるピットや突
起が、主表面に非常に少ないガラスやセラミックがよい
。The present invention is not limited to the above-described embodiments, but may include the following embodiments. First, the material of the support is not limited to glass such as soda lime glass, aluminosilicate glass, quartz glass, etc.
It may be an AIL alloy or a ceramic. Preferably, glass or ceramic is used, which is easier to process to a desired surface roughness than A1 alloy, and whose main surface has very few pits or protrusions that adversely affect high-density recording performance.
また、支持体の面粗度は150Å以下が望ましい。Further, the surface roughness of the support is preferably 150 Å or less.
すなわち、支持体の面粗度は下地層及び磁性層の各面粗
度に影響を与えることから、支持体の面粗度が150人
を超えると、磁性層の面粗度も150人を超えてしまい
、磁気ヘッドの飛行の高さを低くして高密度記録を行う
とき、ミッシング(記録する信号が確実に記録されない
こと)等の記録不良が発生することがある。すなわち記
録の高密度化が損われるときがある。また、前記実施例
において、Alからなる凹凸形成側を成膜するときの支
持体の温度は150℃又は200℃であったが、これに
限らず、他の温度、すなわちランディングゾーンの保護
層の面粗度が、磁気ヘッドに対する吸着防止効果を生ず
るような面粗度となるようにする、凹凸形成側の面粗度
となる温度であればよい。望ましくは、Al2.の粒界
の発達が著しい、すなわち面粗度が大きくなる100℃
以上であり、又実用上300℃以下である。なお、支持
体の温度と、この^Lからなる凹凸形成側(膜厚:30
0人)の面粗度との関係を第3図に示す。凹凸形成側は
へn薄膜からなるものであったが、他のWJ股であって
もよく、望ましくは粒界が発達する結晶性の薄膜、例え
ば、Sn、 In、 Pb、 Zn、 Sbなどの金屑
、これらのうち一つを含んだ合金又はこれらの酸化物、
窒化物からなる簿膜若しくはzr 02 、No F2
又はZnS等の誘電体膜がよい。また、この凹凸形成側
の膜厚は、100人以Lr1000Å以下が望ましい。In other words, the surface roughness of the support affects the surface roughness of the underlayer and the magnetic layer, so if the surface roughness of the support exceeds 150, the surface roughness of the magnetic layer also exceeds 150. Therefore, when performing high-density recording by lowering the flying height of the magnetic head, recording defects such as missing (signals to be recorded are not reliably recorded) may occur. In other words, high density recording may sometimes be impaired. Further, in the above examples, the temperature of the support when forming the unevenness forming side made of Al was 150°C or 200°C, but the temperature is not limited to this, and other temperatures, that is, the temperature of the protective layer of the landing zone, may be used. The temperature may be such that the surface roughness is such that the surface roughness on the unevenness forming side is such that the magnetic head is prevented from being attracted to the magnetic head. Preferably, Al2. At 100°C, the grain boundaries develop significantly, that is, the surface roughness increases.
above, and practically 300°C or below. Note that the temperature of the support and the unevenness forming side (film thickness: 30
Figure 3 shows the relationship with the surface roughness of 0 persons). Although the unevenness forming side is made of a thin film of Hen, it may be made of other WJ layers, and preferably a crystalline thin film in which grain boundaries develop, such as Sn, In, Pb, Zn, Sb, etc. Gold scraps, alloys containing one of these or their oxides,
A film made of nitride or ZR 02, No F2
Alternatively, a dielectric film such as ZnS is preferable. Further, the film thickness on the side where the unevenness is formed is desirably 100 Å or more and Lr 1000 Å or less.
すなわち、100人未満では、所望する面粗度、すなわ
ちランディングゾーンの磁気ヘッドの吸着防止効果が顕
著な60Å以上の面粗度を有する凹凸形成側が製作しず
らくなり、一方膜厚が1000人を超えると、凹凸形成
側がその材質によっては、耐湿性が低下し、高温多湿の
条f1での使用に適さないことがある。次に、下地層は
、Ho、 Ti、 Ta等の非磁性材料であってもよい
。J、た、磁性層は、CoN i合金からなるものに限
らず、Coを主成分としてNi。In other words, if the thickness is less than 100, it will be difficult to manufacture the surface roughness forming side with the desired surface roughness, that is, a surface roughness of 60 Å or more, which has a remarkable effect of preventing the magnetic head from attracting the landing zone. If it exceeds the range, depending on the material of the uneven surface, the moisture resistance may decrease, making it unsuitable for use in the hot and humid strip f1. Next, the underlayer may be made of a nonmagnetic material such as Ho, Ti, Ta, or the like. J, the magnetic layer is not limited to one made of CoNi alloy, but may be made of Co as a main component and Ni as a main component.
Fe、 Pt、 P、 Cr、 W、 No等のうち少
なくとも一種類以上の元素を含む合金やFe2 03か
らなる、所定の磁気特性が得られるものであればよい。It may be made of an alloy containing at least one element selected from Fe, Pt, P, Cr, W, No, etc., or Fe2O3, as long as it can obtain predetermined magnetic properties.
また保護層は、複合層、例えば、Cr層と0層とを当接
して積層したもの、Cr層とSi 021i¥7とを当
接しで積層したもの、Cr層と0層とSi 02層どが
らなりこれらを適宜当接して積層したもの、又は前記複
合層の材料を混合した混合層であっ−Cもよく、さらに
Si 02層や有機重合体からなるものであっCもよい
。磁性層及び保護層の膜厚もそれぞれ、必要に応じて適
宜決定ずればよい。また、シンディングゾーンは径方向
外側又は中程に段1ノでもよい。The protective layer may be a composite layer, such as a laminate of a Cr layer and a 0 layer in contact with each other, a laminate of a Cr layer and a Si 021i layer in contact with each other, a Cr layer, a 0 layer, and a Si 02 layer, etc. The layer may be a layer formed by stacking these materials in proper contact with each other, or a mixed layer obtained by mixing the materials of the composite layer, or a layer made of a SiO2 layer or an organic polymer. The thicknesses of the magnetic layer and the protective layer may also be appropriately determined as necessary. Also, the sinding zone may be radially outward or in the middle step 1.
さらに、凹凸形成側、磁性層及び保護層の成膜法は、そ
れぞれスパッタリング法に限らず、真空蒸着法やイオン
ブレーティング法であってもよい。Furthermore, the method for forming the unevenness forming side, the magnetic layer, and the protective layer is not limited to the sputtering method, but may be a vacuum evaporation method or an ion blating method.
本発明の磁気記録媒体によれば、磁気記録媒体の円滑な
始動を行うことができ、さらに高密度記録が可能となっ
た。According to the magnetic recording medium of the present invention, the magnetic recording medium can be started smoothly and high-density recording can be performed.
第1図は本発明の磁気記録媒体の一実施例を示す部分拡
大模式断面図、第2図は本発明の他の実施例を示す部分
拡大模式断面図である。m3図は支持体の温度と、An
からなる凹凸形成側の面精度との関係を示す特性図であ
る。第4図は一般の磁気記録媒体を示す概略平面図、第
5図は従来の磁気記録媒体の部分断面図である。
10、20・・・磁気記録媒体、1(la、20a・・
・リードライトゾーン、10b、20b・・・ランディ
ングゾーン、11.21・・・支持体、12.22・・
・凹凸形成側、13.23・・・下地層、14.24・
・・磁性層、15.25・・・保護層FIG. 1 is a partially enlarged schematic cross-sectional view showing one embodiment of the magnetic recording medium of the present invention, and FIG. 2 is a partially enlarged schematic cross-sectional view showing another embodiment of the present invention. The m3 diagram shows the temperature of the support and the An
FIG. 3 is a characteristic diagram showing the relationship between surface precision on the side where concavities and convexities are formed. FIG. 4 is a schematic plan view showing a general magnetic recording medium, and FIG. 5 is a partial cross-sectional view of the conventional magnetic recording medium. 10, 20...magnetic recording medium, 1(la, 20a...
・Read/write zone, 10b, 20b...Landing zone, 11.21...Support, 12.22...
・Irregularity forming side, 13.23... Base layer, 14.24・
...Magnetic layer, 15.25...Protective layer
Claims (5)
いる磁気記録媒体において、前記磁気記録媒体にランデ
イングゾーンを設け、前記ランデイングゾーンの前記非
磁性支持体と前記磁性層との間に、前記磁性層側に向つ
て、前記ランデイングゾーンの保護層表面に凹凸を形成
するための凹凸形成層と下地層とを設け、かつ前記凹凸
形成層の面粗度が、前記非磁性支持体の主表面の面粗度
よりも大きいことを特徴とする磁気記録媒体。(1) In a magnetic recording medium in which a magnetic layer is interposed between a non-magnetic support and a protective layer, a landing zone is provided in the magnetic recording medium, and the non-magnetic support and the magnetic layer in the landing zone an underlayer and an unevenness forming layer for forming unevenness on the surface of the protective layer of the landing zone are provided between the magnetic layers, and the surface roughness of the unevenness forming layer is equal to that of the non-magnetic layer. A magnetic recording medium characterized in that the surface roughness is greater than that of the main surface of a support.
記凹凸形成層上に下地層、磁性層及び保護層を順次積層
したことを特徴とする特許請求の範囲第(1)項記載の
磁気記録媒体。(2) Claim (1) characterized in that the unevenness forming side is adhered to the main surface of the non-magnetic support, and a base layer, a magnetic layer and a protective layer are sequentially laminated on the unevenness forming layer. Magnetic recording medium described in Section 1.
とを特徴とする特許請求の範囲第(1)項又は第(2)
項記載の磁気記録媒体。(3) Claim (1) or (2) characterized in that the unevenness forming layer is provided only in the landing zone.
Magnetic recording medium described in Section 1.
おいて150Å以下であることを特徴とする特許請求の
範囲第(1)項、第(2)項又は第(3)項記載の磁気
記録媒体。(4) The surface roughness of the main surface of the nonmagnetic support is Rmax. A magnetic recording medium according to claim (1), (2) or (3), wherein the magnetic recording medium has a thickness of 150 Å or less.
とを特徴とする特許請求の範囲第(1)項、第(2)項
、第(3)項又は第(4)項記載の磁気記録媒体。(5) A magnetic recording medium according to claim (1), (2), (3), or (4), wherein the nonmagnetic support is made of glass or ceramic. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9979986A JPS62256215A (en) | 1986-04-28 | 1986-04-28 | Magnetic recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9979986A JPS62256215A (en) | 1986-04-28 | 1986-04-28 | Magnetic recording medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62256215A true JPS62256215A (en) | 1987-11-07 |
JPH0462413B2 JPH0462413B2 (en) | 1992-10-06 |
Family
ID=14256943
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9979986A Granted JPS62256215A (en) | 1986-04-28 | 1986-04-28 | Magnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62256215A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63316314A (en) * | 1987-06-18 | 1988-12-23 | Asahi Glass Co Ltd | Glass substrate for magnetic disk |
EP0399747A2 (en) * | 1989-05-22 | 1990-11-28 | Nippon Sheet Glass Co., Ltd. | Substrate used for magnetic disk and magnetic recording medium using the substrate |
JPH0373419A (en) * | 1989-05-22 | 1991-03-28 | Nippon Sheet Glass Co Ltd | Magnetic disk substrate and magnetic recording medium using it |
WO1997032055A1 (en) * | 1996-02-28 | 1997-09-04 | Seagate Technology, Inc. | Sputter textured magnetic recording medium |
US5871621A (en) * | 1994-09-27 | 1999-02-16 | Komag, Incorporated | Method of fabricating a textured magnetic storage disk |
US6156404A (en) * | 1996-10-18 | 2000-12-05 | Komag, Inc. | Method of making high performance, low noise isotropic magnetic media including a chromium underlayer |
US6383404B1 (en) * | 1998-08-19 | 2002-05-07 | Hoya Corporation | Glass substrate for magnetic recording medium, magnetic recording medium, and method of manufacturing the same |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60117415A (en) * | 1983-11-29 | 1985-06-24 | Matsushita Electric Ind Co Ltd | Thin film type magnetic recording medium |
JPS613322A (en) * | 1984-06-14 | 1986-01-09 | Mitsubishi Electric Corp | Magnetic disc device |
JPS6180525A (en) * | 1984-09-26 | 1986-04-24 | Matsushita Electric Ind Co Ltd | Magnetic recording medium |
-
1986
- 1986-04-28 JP JP9979986A patent/JPS62256215A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60117415A (en) * | 1983-11-29 | 1985-06-24 | Matsushita Electric Ind Co Ltd | Thin film type magnetic recording medium |
JPS613322A (en) * | 1984-06-14 | 1986-01-09 | Mitsubishi Electric Corp | Magnetic disc device |
JPS6180525A (en) * | 1984-09-26 | 1986-04-24 | Matsushita Electric Ind Co Ltd | Magnetic recording medium |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63316314A (en) * | 1987-06-18 | 1988-12-23 | Asahi Glass Co Ltd | Glass substrate for magnetic disk |
EP0399747A2 (en) * | 1989-05-22 | 1990-11-28 | Nippon Sheet Glass Co., Ltd. | Substrate used for magnetic disk and magnetic recording medium using the substrate |
JPH0373419A (en) * | 1989-05-22 | 1991-03-28 | Nippon Sheet Glass Co Ltd | Magnetic disk substrate and magnetic recording medium using it |
US5427867A (en) * | 1989-05-22 | 1995-06-27 | Nippon Sheet Glass Co., Ltd. | Substrate used for magnetic disk and magnetic recording medium using the substrate |
US5871621A (en) * | 1994-09-27 | 1999-02-16 | Komag, Incorporated | Method of fabricating a textured magnetic storage disk |
WO1997032055A1 (en) * | 1996-02-28 | 1997-09-04 | Seagate Technology, Inc. | Sputter textured magnetic recording medium |
GB2326169A (en) * | 1996-02-28 | 1998-12-16 | Seagate Technology | Sputter textured magnetic recording medium |
GB2326169B (en) * | 1996-02-28 | 1999-09-22 | Seagate Technology | Sputter textured magnetic recording medium |
US5985410A (en) * | 1996-02-28 | 1999-11-16 | Seagate Technology, Inc. | Sputter textured magnetic recording medium |
US6156404A (en) * | 1996-10-18 | 2000-12-05 | Komag, Inc. | Method of making high performance, low noise isotropic magnetic media including a chromium underlayer |
US6383404B1 (en) * | 1998-08-19 | 2002-05-07 | Hoya Corporation | Glass substrate for magnetic recording medium, magnetic recording medium, and method of manufacturing the same |
US6548139B2 (en) | 1998-08-19 | 2003-04-15 | Hoya Corporation | Glass substrate for magnetic recording medium, magnetic recording medium, and method of manufacturing the same |
Also Published As
Publication number | Publication date |
---|---|
JPH0462413B2 (en) | 1992-10-06 |
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Legal Events
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