JPH0462413B2 - - Google Patents
Info
- Publication number
- JPH0462413B2 JPH0462413B2 JP61099799A JP9979986A JPH0462413B2 JP H0462413 B2 JPH0462413 B2 JP H0462413B2 JP 61099799 A JP61099799 A JP 61099799A JP 9979986 A JP9979986 A JP 9979986A JP H0462413 B2 JPH0462413 B2 JP H0462413B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- magnetic
- recording medium
- surface roughness
- magnetic recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010410 layer Substances 0.000 claims description 87
- 230000003746 surface roughness Effects 0.000 claims description 56
- 239000011241 protective layer Substances 0.000 claims description 25
- 239000000919 ceramic Substances 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 4
- 239000000696 magnetic material Substances 0.000 claims 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 14
- 239000010408 film Substances 0.000 description 11
- 229910052759 nickel Inorganic materials 0.000 description 8
- 239000011651 chromium Substances 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 7
- 230000003068 static effect Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910002441 CoNi Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、磁気記録装置に用いられる磁気記録
媒体に関し、特に、磁気記録媒体の始動時におい
て、その始動を円滑にするようにした磁気記録媒
体に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a magnetic recording medium used in a magnetic recording device, and in particular, to a magnetic recording medium for smooth startup of the magnetic recording medium. Regarding the medium.
磁気記録媒体としては、第４図に示すものがあ
る。この円板状の磁気記録媒体１は、主として磁
気ヘツドにより種々の情報が書きこまれたり、読
みとられるリードライトゾーン１ａと、このリー
ドライトゾーン１ａの直径方向内側に、主として
情報の書きこみ又は読みとり終了後に磁気ヘツド
が配置されるランデイングゾーン１ｂとに区画さ
れている。なお、磁気記録媒体１の中心には、磁
気記録媒体１を回転させるための回転軸を挿入す
る、断面円状の貫通孔１ｃが形成されている。そ
して、従来、この磁気記録媒体１の構造としては
特開昭61−3322号公報に記録されているように、
第５図に示すものがあつた。すなわち、Al基板
２及びニツケル下地メツキ層３からなる非磁性支
持体４（以下「支持体」という）。と、コバルト
磁性メツキ層５（膜厚は0.2μ以下である。）とか
らなるものである。このニツケル下地メツキ層３
は、その全面をランデイングゾーン１ｂに必要な
大きな面粗度とし、次にリードライトゾーン１ａ
の部分に限つて、ランデイングゾーン１ｂよりも
小さな面粗度になるように研磨して仕上げる。こ
のような表面を有するニツケル下地メツキ層３上
のコバルト磁性メツキ層５の表面も、ニツケル下
地メツキ層３の表面と同様にランデイングゾーン
１ｂの方がリードライトゾーン１ａよりも面粗度
は大きい。
As a magnetic recording medium, there is one shown in FIG. This disk-shaped magnetic recording medium 1 has a read/write zone 1a where various information is mainly written or read by a magnetic head, and a diametrically inner side of this read/write zone 1a where information is mainly written or read. A landing zone 1b is divided into a landing zone 1b where a magnetic head is placed after reading is completed. Note that a through hole 1c having a circular cross section is formed in the center of the magnetic recording medium 1, into which a rotating shaft for rotating the magnetic recording medium 1 is inserted. Conventionally, the structure of this magnetic recording medium 1 is as recorded in Japanese Patent Application Laid-Open No. 61-3322.
The one shown in Figure 5 was found. That is, a nonmagnetic support 4 (hereinafter referred to as "support") consisting of an Al substrate 2 and a nickel underplating layer 3. and a cobalt magnetic plating layer 5 (film thickness is 0.2 μm or less). This nickel base plating layer 3
The entire surface has a large surface roughness required for the landing zone 1b, and then the read/write zone 1a
Only this part is polished and finished so that the surface roughness is smaller than that of the landing zone 1b. The surface of the cobalt magnetic plating layer 5 on the nickel base plating layer 3 having such a surface also has a surface roughness greater in the landing zone 1b than in the read/write zone 1a, similar to the surface of the nickel base plating layer 3.
前述したランデイングゾーン１ｂをリードライ
ンゾーン１ａよりも面粗度を大きくしているの
は、磁気ヘツドがランデイングゾーン１ｂに配置
しているとき、磁気ヘツドがランデイングゾーン
に吸着する現象、すなわち磁気記録媒体を回転不
能にさせたり、回転しずらくさせたりする現象を
防止するためである。 The reason why the surface roughness of the landing zone 1b described above is larger than that of the lead line zone 1a is due to the phenomenon that the magnetic head is attracted to the landing zone when the magnetic head is placed in the landing zone 1b, that is, the magnetic recording medium. This is to prevent phenomena that would make it impossible to rotate or make it difficult to rotate.
しかしながら、従来の構造の磁気記録媒体で
は、支持体を構成するニツケル下地メツキ層の表
面を、リードライトゾーン及びランデイングゾー
ンのそれぞれに必要な異なる面粗度を有するもの
としているが、その表面をリードライトゾーンと
ランデイングゾーンに区画し、リードライトゾー
ンを高密度記録に適した面粗度に研磨仕上げする
ことは非常に困難であつた。すなわち、従来の磁
気記録媒体は高密度記録のためのものとしては問
題があつた。
However, in magnetic recording media with a conventional structure, the surface of the nickel underplating layer constituting the support has different surface roughness required for each of the read/write zone and the landing zone. It was extremely difficult to divide the read/write zone into a write zone and a landing zone and polish the read/write zone to a surface roughness suitable for high-density recording. That is, conventional magnetic recording media have had problems when used for high-density recording.
本発明は、前述した問題点を解決するためにな
されたもので、その特徴は、支持体と保護層との
間に磁性層を介在している磁気記録媒体におい
て、前記磁気記録媒体にランデイングゾーンを設
け、前記ランデイングゾーンの前記支持体と前記
磁性層との間に、前記磁性層側に向つて、前記ラ
ンデイングゾーンの保護層表面に凹凸を形成する
ための凹凸形成層と下地層とを設け、かつ前記凹
凸形成層の面粗度が、前記支持体の主表面の面粗
度よりも大きい磁気記録媒体である。
The present invention has been made to solve the above-mentioned problems, and is characterized by a magnetic recording medium in which a magnetic layer is interposed between a support and a protective layer. and an unevenness forming layer and a base layer for forming unevenness on the surface of the protective layer of the landing zone are provided between the support body and the magnetic layer of the landing zone toward the magnetic layer side. , and the surface roughness of the unevenness forming layer is greater than the surface roughness of the main surface of the support.
本発明の望ましい態様は、支持体の主表面に凹
凸形成層を被着し、前記凹凸形成層上に、下地層
磁性層及び保護層を順次積層したこと、ランデイ
ンゾーンのみに凹凸形成層を設けたこと、支持体
の主表面の面粗度が、Rmax.において150Å以下
であること、または支持体がガラス又はセラミツ
クからなることである。 A desirable embodiment of the present invention is that an unevenness-forming layer is applied to the main surface of the support, and an underlayer magnetic layer and a protective layer are sequentially laminated on the unevenness-forming layer, and that the unevenness-forming layer is applied only to the landine zone. The main surface of the support has a surface roughness of 150 Å or less in Rmax., or the support is made of glass or ceramic.
本発明の第１実施例を第１図に基づき、第２実
施例を第２図に基づきそれぞれ以下に詳述する。
A first embodiment of the present invention will be described in detail below based on FIG. 1, and a second embodiment will be explained in detail below based on FIG. 2.
実施例 １
本例の磁気記録媒体１０を第１図に基づき説明
する。なお、同図は部分拡大模式断面図である。
さらに、本例の磁気記録媒体１０は、第４図に示
すような形状及びリードライトゾーン１０ａとラ
ンデイングゾーン１０ｂとを有しているものであ
る。Example 1 A magnetic recording medium 10 of this example will be explained based on FIG. Note that this figure is a partially enlarged schematic cross-sectional view.
Further, the magnetic recording medium 10 of this example has a shape as shown in FIG. 4, and has a read/write zone 10a and a landing zone 10b.
第１図に示す磁気記録媒体１０は、ソーダライ
ムガラスからなる支持体１１（直径：130mm、厚
さ：1.9mm、中心の貫通孔の直径：40mm）と、支
持体１１の主表面のランデイングゾーン１０ｂに
被着した、アルミニウム（Al）薄膜からなる凹
凸形成層１２（膜厚：300Å）と、磁気特性を向
上させる機能を有する、クロム（Cr）からなる
地下層１３（膜厚：2000Å）と、コバルト（Co）
とニツケル（Ni）とからなる磁性層１４（それ
ぞれの含有率は、75wt％及び25wt％であり、膜
厚は700Åである。）と、炭素(C)薄膜からなる保護
層１５（膜厚：500Å）とからなるものである。
そして、支持体１１の主表面の面粗度はRmax.
において40Å（以下、面粗度はRmax.で示す。）、
凹凸形成層１２の面粗度は120Å、保護層１５の
ランデイングゾーン１０ｂ及びリードライトゾー
ン１０ａの面粗度はそれぞれ140Å及び50Åであ
る。なお、第１図において支持体１１の表面粗さ
のノコギリ形状は、保護層１５等を設ける側の主
表面のみに示し、対向する主表面のノコギリ形状
は省略した（後述する第２図も同様）。また各層
１２，１３，１４，１５及び支持体１１のノコギ
リ形状は模式的に示している（後述する第２図も
同様）。 The magnetic recording medium 10 shown in FIG. 1 includes a support 11 (diameter: 130 mm, thickness: 1.9 mm, center through hole diameter: 40 mm) made of soda lime glass, and a landing zone on the main surface of the support 11. An unevenness forming layer 12 (thickness: 300 Å) made of a thin aluminum (Al) film and an underground layer 13 (thickness: 2000 Å) made of chromium (Cr) and having a function of improving magnetic properties are deposited on the surface of the layer 10b. , cobalt (Co)
and nickel (Ni) (the respective contents are 75 wt% and 25 wt%, and the film thickness is 700 Å), and the protective layer 15 (film thickness: 500Å).
The surface roughness of the main surface of the support 11 is Rmax.
40Å (hereinafter, surface roughness is indicated by Rmax.),
The surface roughness of the unevenness forming layer 12 is 120 Å, and the surface roughness of the landing zone 10b and read/write zone 10a of the protective layer 15 is 140 Å and 50 Å, respectively. In addition, in FIG. 1, the sawtooth shape of the surface roughness of the support 11 is shown only on the main surface on the side where the protective layer 15 etc. are provided, and the sawtooth shape on the opposing main surface is omitted (the same is true in FIG. 2 described later). ). Further, the sawtooth shapes of the layers 12, 13, 14, 15 and the support 11 are schematically shown (the same applies to FIG. 2, which will be described later).
次に、本例の磁気記録媒体１０の製造方法を述
べる。先ず、支持体１１の主表面に、リードライ
トゾーン１０ａのみを覆うマスクを介して、Al
をスパツタターゲツトとしスパツタリング法によ
り凹凸形成層１２を成膜した。なお、この成膜に
おいて、支持体１１の温度を150℃としているこ
とから、粒界の発達したAl薄膜となり、ランデ
イングゾーン１０ｂの保護層１５に所望の凹凸、
すなわち面粗度を形成することがきる。次に、前
述した凹凸形成層１２及び支持体１１のリードラ
イトゾーン１０ａに対する主表面に上、Crから
なるターゲツトを用いてスパツタリング法により
下地層１３を成膜した。次に、この下地層１３上
に、磁性層１４を、CoとNiとからなるターゲツ
トを用いてスパツタリング法により成膜し、さら
にこの磁性層１４上に、保護層１５をＣからなる
ターゲツトを用いてスパツタリング法により成膜
した。なお、保護層１５において、リードライン
１０ａとランデイングゾーン１０ｂとは約300Å
の段差を生じているが、これは磁気ヘツドの飛行
高さの1/10程度であることから、磁気ヘツドの移
動には何ら支障のない段差である。 Next, a method for manufacturing the magnetic recording medium 10 of this example will be described. First, Al is applied to the main surface of the support 11 through a mask that covers only the read/write zone 10a.
The unevenness forming layer 12 was formed by a sputtering method using as a sputtering target. In addition, in this film formation, since the temperature of the support 11 is set to 150° C., the resulting Al thin film has developed grain boundaries, and the protective layer 15 in the landing zone 10b has the desired unevenness.
In other words, surface roughness can be formed. Next, a base layer 13 was formed on the above-mentioned unevenness forming layer 12 and the main surface of the support 11 with respect to the read/write zone 10a by sputtering using a target made of Cr. Next, a magnetic layer 14 is formed on this underlayer 13 by sputtering using a target made of Co and Ni, and a protective layer 15 is further formed on this magnetic layer 14 using a target made of C. A film was formed using a sputtering method. Note that in the protective layer 15, the distance between the lead line 10a and the landing zone 10b is approximately 300 Å.
However, since this is about 1/10 of the flight height of the magnetic head, it does not pose any problem for the movement of the magnetic head.
本例の磁気記録媒体１０は、凹凸形成層１２の
面粗度よりも支持体１１の主表面の面粗度を小さ
くしていることから、ランデイングゾーン１０ｂ
の保護層１５の面粗度は、凹凸形成層１２の面粗
度の影響を受け、所望する面粗度となる。また、
凹凸形成層１２は、成膜法（本例では、スパツタ
リング法である。）により形成していることから、
支持体１１の主表面のリードライトゾーン１０ａ
の面粗度を大きくすることがなく、良好に維持す
ることができ、その結果、高密度の記録ができ
る。 In the magnetic recording medium 10 of this example, since the surface roughness of the main surface of the support body 11 is made smaller than the surface roughness of the unevenness forming layer 12, the landing zone 10b
The surface roughness of the protective layer 15 is influenced by the surface roughness of the unevenness forming layer 12 and becomes a desired surface roughness. Also,
Since the unevenness forming layer 12 is formed by a film forming method (in this example, a sputtering method),
Read/write zone 10a on the main surface of support 11
It is possible to maintain good surface roughness without increasing it, and as a result, high-density recording is possible.
さらに、本例の磁気記録媒体１０の性能を評価
するために、以下のような磁気ヘツドと磁気記録
媒体１０との静止摩擦係数の測定及び耐久性試験
を行つた。 Furthermore, in order to evaluate the performance of the magnetic recording medium 10 of this example, the following measurements of the coefficient of static friction between the magnetic head and the magnetic recording medium 10 and the durability test were conducted.
磁気ヘツドに15グラムの荷重を加えたとき、ラ
ンデイングゾーン１０ｂのコンタクトスタート／
ストツプ試験（磁気ヘツドを磁気記録媒体の表面
に当接し、静止させた状態で、磁気記録媒体の回
転開始・回転停止を行う試験であり、以下「CSS
試験」という。）を行つた。この試験の初期の静
止摩擦係数が0.15であり、15000回CSS試験後の
静止摩擦係数も0.5であり、磁気ヘツドにより、
磁気記録媒体１０の回転が不能となつたり、回転
しずらくなる現象は生ぜず、さらに磁気ヘツド及
び磁気記録媒体１０の損傷も生じなかつた。一
方、比較のために、リードライトゾーン１０ａ
（保護層１５のリードライトゾーン１０ａの面粗
度は50Åである。）において、同様のCSS試験を
行つたところ、初期の静止摩擦係数は0.2であつ
たが、15000回試験後においては2.5以上となり、
磁気記録媒体１０が回転しずらくなり、磁気記録
媒体１０を回転するために、回転源に必要以上の
起動トルクを負荷しなくてはならず、正常な回転
を維持することができなくなつた。 When a load of 15 grams is applied to the magnetic head, the contact start of landing zone 10b/
Stop test (This is a test in which the magnetic recording medium starts and stops rotating while the magnetic head is in contact with the surface of the magnetic recording medium and kept stationary. Hereinafter referred to as "CSS")
It's called "examination." ) was carried out. The initial coefficient of static friction in this test was 0.15, and the coefficient of static friction after 15,000 CSS tests was also 0.5.
No phenomenon occurred in which the magnetic recording medium 10 became unable to rotate or became difficult to rotate, and furthermore, no damage occurred to the magnetic head or the magnetic recording medium 10. On the other hand, for comparison, read/write zone 10a
(The surface roughness of the read/write zone 10a of the protective layer 15 is 50 Å.) When a similar CSS test was conducted, the initial static friction coefficient was 0.2, but after 15,000 tests, it was over 2.5. Then,
The magnetic recording medium 10 becomes difficult to rotate, and in order to rotate the magnetic recording medium 10, more starting torque than necessary must be applied to the rotation source, making it impossible to maintain normal rotation. .
実施例 ２
本例の磁気記録媒体２０を第２図に基づき説明
する。なお、同図は部分拡大模式断面図であり、
本例の磁気記録媒体２０も前記実施例と同様の形
状であり、かつリードライトゾーン２０ａとラン
デイングゾーン２０ｂを有しているものである。Example 2 A magnetic recording medium 20 of this example will be explained based on FIG. 2. The figure is a partially enlarged schematic cross-sectional view.
The magnetic recording medium 20 of this example also has the same shape as that of the previous example, and has a read/write zone 20a and a landing zone 20b.
本例の磁気記録媒体２０は、前記実施例と同様
の支持体２１と、支持体２１の主表面のランデイ
ングゾーン２０ｂのみならず、リードライトゾー
ン２０ａにも被着した、Alからなる凹凸形成層
２２（膜厚：200Å）と、前記実施例と同様の、
下地層２３、磁性層２４及び保護層２５とからな
る。そして、支持体２１の主表面の面粗度、凹凸
形成層２２の面粗度及び保護層２５の面粗度はそ
れぞれ、40Å、80Å及び100Åである。すなわち、
保護層２５のリードライトゾーン２０ａ及びラン
デイングゾーン２０ｂの面粗度はそれぞれ100Å
である。 The magnetic recording medium 20 of this example includes a support 21 similar to that of the above example, and an unevenness forming layer made of Al that is adhered not only to the landing zone 20b on the main surface of the support 21 but also to the read/write zone 20a. 22 (film thickness: 200 Å) and the same as in the above example,
It consists of a base layer 23, a magnetic layer 24, and a protective layer 25. The surface roughness of the main surface of the support 21, the surface roughness of the unevenness forming layer 22, and the surface roughness of the protective layer 25 are 40 Å, 80 Å, and 100 Å, respectively. That is,
The surface roughness of the read/write zone 20a and the landing zone 20b of the protective layer 25 is each 100 Å.
It is.
次に、この磁気記録媒体２０の製造方法を述べ
る。先ず、支持体２１のリードラインゾーン２０
ａとランデイングゾーン２０ｂの主表面に、Al
ターゲツトを用いてスパツタリング法により凹凸
形成層２２を成膜した。なお、この成膜において
は、面粗度を前述した80Åとするために、支持体
２１の温度を200℃とした。次に、凹凸形成層２
２上に、前記実施例と同様の方法で、下地層２
３、磁性層２４及び保護層２５を成膜する。 Next, a method for manufacturing this magnetic recording medium 20 will be described. First, the lead line zone 20 of the support 21
a and the main surfaces of the landing zone 20b, Al
The unevenness forming layer 22 was formed by sputtering using a target. In addition, in this film formation, the temperature of the support 21 was set to 200° C. in order to obtain the above-mentioned surface roughness of 80 Å. Next, the unevenness forming layer 2
2, a base layer 2 is applied in the same manner as in the above example.
3. Form a magnetic layer 24 and a protective layer 25.
本例によれば、凹凸形成層２２の面粗度が支持
体２１の面粗度よりも大きいことから、ランデイ
ングゾーン２０ｂの保護層２５の面粗度は、凹凸
形成層２２の面粗度の影響を受け、所望する面粗
度となる。なお、本例においても、前記実施例と
同様に、凹凸形成層２２を成膜法により形成して
いることから、支持体２１の主表面の面粗度を維
持することができる。また、本例では、磁性層２
３のリードライトゾーン２０ａの面粗度は、凹凸
形成層２２の面粗度の影響を受けるが、その値が
100Åであることから、リードライトゾーン２０
ａの高密度記録性を維持でき、一方保護層２５の
面粗度は100Åであることから、後記するように、
ランデイングゾーン２０ｂにおいても磁気ヘツド
との吸着、すなわち前記記録媒体２０の回転時に
おいて不都合は生じない。 According to this example, since the surface roughness of the unevenness forming layer 22 is larger than the surface roughness of the support 21, the surface roughness of the protective layer 25 of the landing zone 20b is equal to the surface roughness of the unevenness forming layer 22. The desired surface roughness is obtained. In addition, in this example as well, since the unevenness forming layer 22 is formed by the film forming method, the surface roughness of the main surface of the support body 21 can be maintained. In addition, in this example, the magnetic layer 2
The surface roughness of the read/write zone 20a in No. 3 is influenced by the surface roughness of the unevenness forming layer 22, but the value is
Since it is 100Å, the read/write zone 20
Since the high-density recording property of a can be maintained, and the surface roughness of the protective layer 25 is 100 Å, as will be described later,
Even in the landing zone 20b, no problem occurs when the recording medium 20 is attracted to the magnetic head, that is, when the recording medium 20 is rotated.
また、ランデイングゾーン２０ｂにおいて、前
記実施例の同様の試験を行つた結果、試験初期の
静止摩擦係数が0.15であり、15000回CSS試験後
の静止摩擦係数は0.7となり、前記実施例のとき
と比較して15000回試験後の静止摩擦係数は大き
くなるが、磁気記録媒体２０の回転が不能となつ
たり、回転しずらくなる現象は生じなかつた。さ
らに磁気記録媒体２０及び磁気ヘツドの損傷も生
じなかつた。 In addition, in the landing zone 20b, as a result of conducting a test similar to that of the above example, the coefficient of static friction at the initial stage of the test was 0.15, and the coefficient of static friction after 15,000 CSS tests was 0.7, compared with that of the above example. Although the coefficient of static friction increased after 15,000 tests, no phenomenon occurred in which the magnetic recording medium 20 became unable to rotate or became difficult to rotate. Furthermore, no damage occurred to the magnetic recording medium 20 or the magnetic head.
なお、本例において、ランデイングゾーン２０
ｂ及びリードライトゾーン２０ａの両者に対して
有効な凹凸形成層２２面粗度は60Å〜150Åであ
り、この面粗度の範囲のとき、ランデイングゾー
ン２０ｂにおいては、磁気ヘツド吸着を防止で
き、一方リードライトゾーン２０ａを高密化に十
分に対応できる。 In addition, in this example, the landing zone 20
The surface roughness of the unevenness forming layer 22 that is effective for both the read/write zone 20b and the read/write zone 20a is 60 Å to 150 Å, and when the surface roughness is within this range, magnetic head adsorption can be prevented in the landing zone 20b. The read/write zone 20a can be sufficiently adapted to higher density.
本発明は前記実施例に限らず、下記のものであ
つてもよい。先ず、支持体の材料はソーダライム
ガラス、アルミシリケートガラス、石英ガラス等
のガラスに限らず、Al合金又はセラミツクであ
つてもよい、望ましくは、Al合金と比較して所
望する面粗度に加工することが容易で、かつ高密
度記録性に悪影響を与えるピツトや突起が、主表
面に少ないガラスやセラミツクがよい。また、支
持体の面粗度は150Å以下が望ましい。すなわち
３支持体の面粗度は下地層及び磁性層の各面粗度
に影響を与えることから、支持体の面粗度が150
Åを超えると、磁性層の面粗度も150Åを超えて
しまい、磁気ヘツド飛行の高さを低くして高密度
記録を行うとき、ミツシング（記録する信号が確
実に記録されないこと）等の記録不良が発生する
ことがある。すなわち記録の高密度化が損われと
きがある。また、前記実施例において、Alから
なる凹凸形成層を成膜するときの支持体の温度は
150℃又は200℃であつが、これに限らず、他の温
度、すなわちランデイングゾーンの保護層の面粗
度が、磁気ヘツドに対する吸着防止効果を生ずる
ような面粗度となるようにする、凹凸形成層の面
粗度となる温度であればよい。望ましくは、Al
の粒界の発達が著しい、すなわち面粗度が大きく
なる100℃以上であり、又実用上300℃以下であ
る。なお、支持体の温度と、このAlからなる凹
凸形成層（膜厚：300Å）の面粗度との関係を第
３図に示す。凹凸形成層はAl薄膜からなるもの
であつたが、他の薄膜であつてもよく、望ましく
は粒界が発達する結晶性の薄膜、例えば、Sn、
In、Pb、Zn、Sbなどの金属、これらのうち一つ
を含んだ合金又はこれらの酸化物、窒化物からな
る薄膜若しくはZrO2、MgF2又はZns等の誘電体
膜がよい。また、この凹凸形成層の膜厚は、100
Å以上で1000Å以下が望ましい。すなわち、100
Å未満では、所望する面粗度、すなわちランデイ
ングゾーンの磁気ヘツドの吸着防止効果が顕著な
60Å以上の面粗度を有する凹凸形成層が製作しず
らくなり、一方膜厚が1000Åを超えると、凹凸形
成層がその材質によつては、耐湿性が低下し、高
温多湿の条件での使用に適さないことがある。次
に、下地層は、Mo、Ti、Ta等の非磁性材料で
あつてもよい。また、磁性層は、CoNi合金から
なるものに限らず、Coを主成分としてNi、Fe、
Pt、Ｐ、Cr、Ｗ、Mo等のうち少なくとも一種類
以上の元素を含む合金やFe2O3からなる、所定の
磁気特性が得られるものであればよい。また保護
層は、複合層、例えば、Cr層とＣ層とを当接し
て積層したもの、Cr層とSiO2層とを当接して積
層したもの、Cr層とＣ層とSiO2層とからなりこ
れらを適宜当接して積層したもの、又は前記複合
層の材料を混合した混合層であつてもよく、さら
にSiO2層や有機重合体からなるものであつても
よい。磁性層及び保護層の膜厚もそれぞれ、必要
に応じて適宜決定すればよい。また、ランデイン
グゾーンは径方向外側又は中程に設けてもよい。
さらに、凹凸形成層、磁性層及び保護層の成膜法
は、それぞれスパツタリング法に限らず、真空蒸
着法やイオンプレーテイング法であつてもよい。 The present invention is not limited to the above-described embodiments, but may include the following embodiments. First, the material of the support is not limited to glass such as soda lime glass, aluminum silicate glass, quartz glass, etc., but may also be Al alloy or ceramic, preferably processed to a desired surface roughness compared to Al alloy. Glass or ceramic is preferred because it is easy to record and has few pits or protrusions on the main surface that adversely affect high-density recording. Further, the surface roughness of the support is preferably 150 Å or less. In other words, the surface roughness of the support 3 affects the surface roughness of the underlayer and the magnetic layer, so if the surface roughness of the support is 150
If the magnetic layer exceeds 150 Å, the surface roughness of the magnetic layer will also exceed 150 Å, which may cause problems such as missing (signals not being recorded reliably) when performing high-density recording by lowering the height of the magnetic head flight. Defects may occur. In other words, high-density recording may sometimes be impaired. In addition, in the above examples, the temperature of the support when forming the unevenness forming layer made of Al was
At other temperatures, including but not limited to 150°C or 200°C, the surface roughness of the protective layer in the landing zone is such that it has a surface roughness that prevents adsorption to the magnetic head. Any temperature that provides the surface roughness of the forming layer may be used. Preferably, Al
The temperature is 100°C or higher at which the development of grain boundaries is remarkable, that is, the surface roughness increases, and the temperature is 300°C or lower for practical purposes. Note that FIG. 3 shows the relationship between the temperature of the support and the surface roughness of the unevenness forming layer (thickness: 300 Å) made of Al. Although the unevenness forming layer is made of an Al thin film, it may be made of other thin films, preferably a crystalline thin film with developed grain boundaries, such as Sn,
A thin film made of a metal such as In, Pb, Zn, or Sb, an alloy containing one of these, or an oxide or nitride of these, or a dielectric film such as ZrO 2 , MgF 2 or Zns is preferable. In addition, the thickness of this unevenness forming layer is 100
It is desirable to have a thickness of Å or more and 1000 Å or less. i.e. 100
If the surface roughness is less than Å, the desired surface roughness, that is, the effect of preventing magnetic head adsorption in the landing zone is remarkable.
It becomes difficult to produce an unevenness-forming layer with a surface roughness of 60 Å or more. On the other hand, if the thickness exceeds 1000 Å, the moisture resistance of the unevenness-forming layer may decrease depending on the material, making it difficult to fabricate under high temperature and humid conditions. May not be suitable for use. Next, the underlayer may be made of a nonmagnetic material such as Mo, Ti, Ta, or the like. In addition, the magnetic layer is not limited to one made of CoNi alloy, but can also include Co as the main component, Ni, Fe,
It may be made of an alloy containing at least one element among Pt, P, Cr, W, Mo, etc., or Fe 2 O 3 , as long as it can obtain predetermined magnetic properties. The protective layer may be a composite layer, such as a laminate of a Cr layer and a C layer in contact with each other, a laminate of a Cr layer and two SiO layers in contact with each other, or a Cr layer, a C layer, and two SiO layers. Alternatively, it may be a layered layer in which these layers are appropriately abutted, or a mixed layer in which the materials of the composite layer are mixed, or a layer made of two SiO 2 layers or an organic polymer. The thicknesses of the magnetic layer and the protective layer may also be determined as appropriate. Further, the landing zone may be provided on the outside or in the middle in the radial direction.
Further, the method for forming the unevenness forming layer, the magnetic layer, and the protective layer is not limited to the sputtering method, but may be a vacuum evaporation method or an ion plating method.
本発明の磁気記録媒体によれば、磁気記録媒体
の円滑な始動を行うことができ、さらに高密度記
録が可能となつた。
According to the magnetic recording medium of the present invention, the magnetic recording medium can be started smoothly and high-density recording can be performed.
第１図は本発明の磁気記録媒体の一実施例を示
す部分拡大模式断面図、第２図は本発明の他の実
施例を示す部分拡大模式断面図である。第３図は
支持体の温度と、Alからなる凹凸形成層の面粗
度との関係を示す特性図である。第４図は一般の
磁気記録媒体を示す概略平面図、第５図は従来の
磁気記録媒体の部分断面図である。
１０，２０……磁気記録媒体、１０ａ，２０ａ
……リードライトゾーン、１０ｂ，２０ｂ……ラ
ンデイングゾーン、１１，２１……支持体、１
２，２２……凹凸形成層、１３，２３……下地
層、１４，２４……磁性層、１５，２５……保護
層。
FIG. 1 is a partially enlarged schematic cross-sectional view showing one embodiment of the magnetic recording medium of the present invention, and FIG. 2 is a partially enlarged schematic cross-sectional view showing another embodiment of the present invention. FIG. 3 is a characteristic diagram showing the relationship between the temperature of the support and the surface roughness of the unevenness forming layer made of Al. FIG. 4 is a schematic plan view showing a general magnetic recording medium, and FIG. 5 is a partial cross-sectional view of the conventional magnetic recording medium. 10, 20...magnetic recording medium, 10a, 20a
...Read/write zone, 10b, 20b...Landing zone, 11, 21...Support, 1
2, 22...Irregularity forming layer, 13, 23... Underlayer, 14, 24... Magnetic layer, 15, 25... Protective layer.
Claims (1)
している磁気記録媒体において、前記磁気記録媒
体にランデイングゾーンを設け、前記ランデイン
グゾーンの前記非磁性支持体と前記磁性層との間
に、前記磁性層側に向つて、前記ランデイングゾ
ーンの保護層表面に凹凸を形成するための凹凸形
成層と下地層とを設け、かつ前記凹凸形成層の面
粗度が、前記非磁性支持体の主表面の面粗度より
も大きいことを特徴とする磁気記録媒体。 ２ 非磁性支持体の主表面に凹凸形成層を被着
し、前記凹凸形成層上に下地層、磁性層及び保護
層を順次積層したことを特徴とする特許請求の範
囲第１項記載の磁気記録媒体。 ３ ランデイングゾーンのみに凹凸形成層を設け
たことを特徴とする特許請求の範囲第１項又は第
２項記載の磁気記録媒体。 ４ 非磁性支持体の主表面の面粗度が、Rmax.
において150Å以下であることを特徴とする特許
請求の範囲第１項、第２項又は第３項記載の磁気
記録媒体。 ５ 非磁性支持体がガラス又はセラミツクからな
ることを特徴とする特許請求の範囲第１項、第２
項、第３項又は第４項記載の磁気記録媒体。[Scope of Claims] 1. In a magnetic recording medium in which a magnetic layer is interposed between a non-magnetic support and a protective layer, a landing zone is provided in the magnetic recording medium, and the non-magnetic support in the landing zone and An unevenness forming layer and a base layer for forming unevenness on the surface of the protective layer of the landing zone are provided between the magnetic layer and the unevenness forming layer toward the magnetic layer side, and the unevenness forming layer has a surface roughness. , a magnetic recording medium characterized in that the surface roughness is greater than that of the main surface of the nonmagnetic support. 2. The magnetic material according to claim 1, characterized in that an unevenness-forming layer is adhered to the main surface of a non-magnetic support, and a base layer, a magnetic layer, and a protective layer are sequentially laminated on the unevenness-forming layer. recoding media. 3. The magnetic recording medium according to claim 1 or 2, characterized in that the unevenness forming layer is provided only in the landing zone. 4 The surface roughness of the main surface of the nonmagnetic support is Rmax.
3. The magnetic recording medium according to claim 1, 2 or 3, wherein the magnetic recording medium has a thickness of 150 Å or less. 5 Claims 1 and 2, characterized in that the non-magnetic support is made of glass or ceramic.
The magnetic recording medium according to item 3, item 4, or item 4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9979986A JPS62256215A (en) | 1986-04-28 | 1986-04-28 | Magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9979986A JPS62256215A (en) | 1986-04-28 | 1986-04-28 | Magnetic recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62256215A JPS62256215A (en) | 1987-11-07 |
| JPH0462413B2 true JPH0462413B2 (en) | 1992-10-06 |
Family
ID=14256943
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9979986A Granted JPS62256215A (en) | 1986-04-28 | 1986-04-28 | Magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62256215A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63316314A (en) * | 1987-06-18 | 1988-12-23 | Asahi Glass Co Ltd | Glass substrate for magnetic disk |
| JP2547651B2 (en) * | 1989-05-22 | 1996-10-23 | 日本板硝子株式会社 | Magnetic recording media |
| ES2074538T3 (en) * | 1989-05-22 | 1995-09-16 | Nippon Sheet Glass Co Ltd | SUBSTRATE USED FOR A MAGNETIC DISC AND MAGNETIC GABRATION MEDIA USING THE SUBSTRATE. |
| US6156404A (en) * | 1996-10-18 | 2000-12-05 | Komag, Inc. | Method of making high performance, low noise isotropic magnetic media including a chromium underlayer |
| US5871621A (en) * | 1994-09-27 | 1999-02-16 | Komag, Incorporated | Method of fabricating a textured magnetic storage disk |
| US5718811A (en) * | 1996-02-28 | 1998-02-17 | Seagate Technology, Inc. | Sputter textured magnetic recording medium |
| US6383404B1 (en) | 1998-08-19 | 2002-05-07 | Hoya Corporation | Glass substrate for magnetic recording medium, magnetic recording medium, and method of manufacturing the same |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60117415A (en) * | 1983-11-29 | 1985-06-24 | Matsushita Electric Ind Co Ltd | Thin film type magnetic recording medium |
| JPS613322A (en) * | 1984-06-14 | 1986-01-09 | Mitsubishi Electric Corp | Magnetic disc device |
| JPS6180525A (en) * | 1984-09-26 | 1986-04-24 | Matsushita Electric Ind Co Ltd | Magnetic recording medium |
-
1986
- 1986-04-28 JP JP9979986A patent/JPS62256215A/en active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60117415A (en) * | 1983-11-29 | 1985-06-24 | Matsushita Electric Ind Co Ltd | Thin film type magnetic recording medium |
| JPS613322A (en) * | 1984-06-14 | 1986-01-09 | Mitsubishi Electric Corp | Magnetic disc device |
| JPS6180525A (en) * | 1984-09-26 | 1986-04-24 | Matsushita Electric Ind Co Ltd | Magnetic recording medium |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62256215A (en) | 1987-11-07 |
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