JPS62247529A - アライメント方法 - Google Patents

アライメント方法

Info

Publication number
JPS62247529A
JPS62247529A JP61293159A JP29315986A JPS62247529A JP S62247529 A JPS62247529 A JP S62247529A JP 61293159 A JP61293159 A JP 61293159A JP 29315986 A JP29315986 A JP 29315986A JP S62247529 A JPS62247529 A JP S62247529A
Authority
JP
Japan
Prior art keywords
wafer
alignment
data
pattern
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61293159A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0463534B2 (enExample
Inventor
Masao Kosugi
小杉　雅夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP61293159A priority Critical patent/JPS62247529A/ja
Publication of JPS62247529A publication Critical patent/JPS62247529A/ja
Publication of JPH0463534B2 publication Critical patent/JPH0463534B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61293159A 1986-12-09 1986-12-09 アライメント方法 Granted JPS62247529A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61293159A JPS62247529A (ja) 1986-12-09 1986-12-09 アライメント方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61293159A JPS62247529A (ja) 1986-12-09 1986-12-09 アライメント方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP57135498A Division JPS5927525A (ja) 1982-08-03 1982-08-03 アライメント方法

Publications (2)

Publication Number Publication Date
JPS62247529A true JPS62247529A (ja) 1987-10-28
JPH0463534B2 JPH0463534B2 (enExample) 1992-10-12

Family

ID=17791182

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61293159A Granted JPS62247529A (ja) 1986-12-09 1986-12-09 アライメント方法

Country Status (1)

Country Link
JP (1) JPS62247529A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0684753A (ja) * 1992-09-04 1994-03-25 Nikon Corp 露光方法
JP2011018840A (ja) * 2009-07-10 2011-01-27 Nikon Corp パターン形成装置、パターン形成方法、デバイス製造装置、及びデバイス製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51111076A (en) * 1975-03-26 1976-10-01 Hitachi Ltd Exposure device
JPS5541739A (en) * 1978-09-20 1980-03-24 Hitachi Ltd Micro-projection type mask alignment device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51111076A (en) * 1975-03-26 1976-10-01 Hitachi Ltd Exposure device
JPS5541739A (en) * 1978-09-20 1980-03-24 Hitachi Ltd Micro-projection type mask alignment device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0684753A (ja) * 1992-09-04 1994-03-25 Nikon Corp 露光方法
JP2011018840A (ja) * 2009-07-10 2011-01-27 Nikon Corp パターン形成装置、パターン形成方法、デバイス製造装置、及びデバイス製造方法

Also Published As

Publication number Publication date
JPH0463534B2 (enExample) 1992-10-12

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