JPS6223980A - マグネトロンスパツタリング用タ−ゲツト - Google Patents

マグネトロンスパツタリング用タ−ゲツト

Info

Publication number
JPS6223980A
JPS6223980A JP16316285A JP16316285A JPS6223980A JP S6223980 A JPS6223980 A JP S6223980A JP 16316285 A JP16316285 A JP 16316285A JP 16316285 A JP16316285 A JP 16316285A JP S6223980 A JPS6223980 A JP S6223980A
Authority
JP
Japan
Prior art keywords
target
magnet
target body
magnetron sputtering
annular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16316285A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0154431B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Katsuya Okumura
勝弥 奥村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP16316285A priority Critical patent/JPS6223980A/ja
Publication of JPS6223980A publication Critical patent/JPS6223980A/ja
Publication of JPH0154431B2 publication Critical patent/JPH0154431B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP16316285A 1985-07-24 1985-07-24 マグネトロンスパツタリング用タ−ゲツト Granted JPS6223980A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16316285A JPS6223980A (ja) 1985-07-24 1985-07-24 マグネトロンスパツタリング用タ−ゲツト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16316285A JPS6223980A (ja) 1985-07-24 1985-07-24 マグネトロンスパツタリング用タ−ゲツト

Publications (2)

Publication Number Publication Date
JPS6223980A true JPS6223980A (ja) 1987-01-31
JPH0154431B2 JPH0154431B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-11-17

Family

ID=15768408

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16316285A Granted JPS6223980A (ja) 1985-07-24 1985-07-24 マグネトロンスパツタリング用タ−ゲツト

Country Status (1)

Country Link
JP (1) JPS6223980A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Also Published As

Publication number Publication date
JPH0154431B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-11-17

Similar Documents

Publication Publication Date Title
US4441974A (en) Magnetron sputtering apparatus
JP3655334B2 (ja) マグネトロンスパッタリング装置
US5026470A (en) Sputtering apparatus
CN112011771B (zh) 偏置磁场控制方法、磁性薄膜沉积方法、腔室及设备
US5085755A (en) Sputtering apparatus for forming thin films
JPH0362789B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR850008362A (ko) 스퍼터코팅 장치 및 방법
JPH0241585B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPS6223980A (ja) マグネトロンスパツタリング用タ−ゲツト
JPH03170668A (ja) 平板マグネトロンスパッタリング装置
JPH03183123A (ja) スパッタリング装置
JPH04187766A (ja) マグネトロン・スパッタリング装置用磁気回路装置
JP4489868B2 (ja) カソード電極装置及びスパッタリング装置
GB2209769A (en) Sputter coating
JPH01283372A (ja) マグネトロンスパッタリング装置
JPS63277758A (ja) マグネトロンスパッタリング装置
JP4056132B2 (ja) マグネトロンスパッタ方法及び装置
JPH0734244A (ja) マグネトロン型スパッタカソード
JPH01108375A (ja) マグネトロンスパッタ装置
JPH0313575A (ja) 対向ターゲツトスパツタ装置
JPS63227772A (ja) マグネトロンスパツタ用タ−ゲツト
JPH0445267A (ja) スパッタリング装置
JPS61158121A (ja) 磁性膜の形成装置
JPH05163568A (ja) マグネトロンスパッタ装置
JPS5917896Y2 (ja) 高速スパツタ用タ−ゲツト電極

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term