JPS622308B2 - - Google Patents

Info

Publication number
JPS622308B2
JPS622308B2 JP54138683A JP13868379A JPS622308B2 JP S622308 B2 JPS622308 B2 JP S622308B2 JP 54138683 A JP54138683 A JP 54138683A JP 13868379 A JP13868379 A JP 13868379A JP S622308 B2 JPS622308 B2 JP S622308B2
Authority
JP
Japan
Prior art keywords
mold
original plate
protective film
photomask
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54138683A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5664342A (en
Inventor
Chikara Hayashi
Kimitachi Yana
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP13868379A priority Critical patent/JPS5664342A/ja
Publication of JPS5664342A publication Critical patent/JPS5664342A/ja
Publication of JPS622308B2 publication Critical patent/JPS622308B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP13868379A 1979-10-29 1979-10-29 Photomask original plate having protective film on reverse side Granted JPS5664342A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13868379A JPS5664342A (en) 1979-10-29 1979-10-29 Photomask original plate having protective film on reverse side

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13868379A JPS5664342A (en) 1979-10-29 1979-10-29 Photomask original plate having protective film on reverse side

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP61197286A Division JPS6258250A (ja) 1986-08-25 1986-08-25 保護膜を裏面に有するフオトマスク原板

Publications (2)

Publication Number Publication Date
JPS5664342A JPS5664342A (en) 1981-06-01
JPS622308B2 true JPS622308B2 (cg-RX-API-DMAC7.html) 1987-01-19

Family

ID=15227658

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13868379A Granted JPS5664342A (en) 1979-10-29 1979-10-29 Photomask original plate having protective film on reverse side

Country Status (1)

Country Link
JP (1) JPS5664342A (cg-RX-API-DMAC7.html)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5138460B2 (cg-RX-API-DMAC7.html) * 1972-06-12 1976-10-21
JPS5023595A (cg-RX-API-DMAC7.html) * 1973-06-29 1975-03-13
JPS5322426B2 (cg-RX-API-DMAC7.html) * 1975-02-15 1978-07-08
JPS51139267A (en) * 1975-05-28 1976-12-01 Hitachi Ltd Photo-mask

Also Published As

Publication number Publication date
JPS5664342A (en) 1981-06-01

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