JPS62216223A - 半導体処理装置 - Google Patents

半導体処理装置

Info

Publication number
JPS62216223A
JPS62216223A JP62041752A JP4175287A JPS62216223A JP S62216223 A JPS62216223 A JP S62216223A JP 62041752 A JP62041752 A JP 62041752A JP 4175287 A JP4175287 A JP 4175287A JP S62216223 A JPS62216223 A JP S62216223A
Authority
JP
Japan
Prior art keywords
space
substrate
reaction
chamber
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62041752A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0447455B2 (enExample
Inventor
Shunpei Yamazaki
舜平 山崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP62041752A priority Critical patent/JPS62216223A/ja
Publication of JPS62216223A publication Critical patent/JPS62216223A/ja
Publication of JPH0447455B2 publication Critical patent/JPH0447455B2/ja
Granted legal-status Critical Current

Links

JP62041752A 1987-02-24 1987-02-24 半導体処理装置 Granted JPS62216223A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62041752A JPS62216223A (ja) 1987-02-24 1987-02-24 半導体処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62041752A JPS62216223A (ja) 1987-02-24 1987-02-24 半導体処理装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP57167281A Division JPS5956726A (ja) 1982-09-20 1982-09-25 プラズマｃｖｄ装置

Publications (2)

Publication Number Publication Date
JPS62216223A true JPS62216223A (ja) 1987-09-22
JPH0447455B2 JPH0447455B2 (enExample) 1992-08-04

Family

ID=12617151

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62041752A Granted JPS62216223A (ja) 1987-02-24 1987-02-24 半導体処理装置

Country Status (1)

Country Link
JP (1) JPS62216223A (enExample)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5143718U (enExample) * 1974-09-27 1976-03-31
JPS5344487A (en) * 1976-08-25 1978-04-21 Wacker Chemitronic Process for preparing large surfaced silicon plate not supported on substrate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5143718U (enExample) * 1974-09-27 1976-03-31
JPS5344487A (en) * 1976-08-25 1978-04-21 Wacker Chemitronic Process for preparing large surfaced silicon plate not supported on substrate

Also Published As

Publication number Publication date
JPH0447455B2 (enExample) 1992-08-04

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