JPS6221003Y2 - - Google Patents

Info

Publication number
JPS6221003Y2
JPS6221003Y2 JP1982100519U JP10051982U JPS6221003Y2 JP S6221003 Y2 JPS6221003 Y2 JP S6221003Y2 JP 1982100519 U JP1982100519 U JP 1982100519U JP 10051982 U JP10051982 U JP 10051982U JP S6221003 Y2 JPS6221003 Y2 JP S6221003Y2
Authority
JP
Japan
Prior art keywords
rotor
casing
exhaust port
distance
air
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1982100519U
Other languages
English (en)
Japanese (ja)
Other versions
JPS594633U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1982100519U priority Critical patent/JPS594633U/ja
Priority to US06/423,153 priority patent/US4489501A/en
Publication of JPS594633U publication Critical patent/JPS594633U/ja
Application granted granted Critical
Publication of JPS6221003Y2 publication Critical patent/JPS6221003Y2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B5/00—Drying solid materials or objects by processes not involving the application of heat
    • F26B5/08—Drying solid materials or objects by processes not involving the application of heat by centrifugal treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP1982100519U 1982-07-01 1982-07-01 シリコンウエハ等の水切乾燥装置 Granted JPS594633U (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1982100519U JPS594633U (ja) 1982-07-01 1982-07-01 シリコンウエハ等の水切乾燥装置
US06/423,153 US4489501A (en) 1982-07-01 1982-09-24 Spin drier for silicon wafers and the like

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1982100519U JPS594633U (ja) 1982-07-01 1982-07-01 シリコンウエハ等の水切乾燥装置

Publications (2)

Publication Number Publication Date
JPS594633U JPS594633U (ja) 1984-01-12
JPS6221003Y2 true JPS6221003Y2 (enEXAMPLES) 1987-05-28

Family

ID=14276198

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1982100519U Granted JPS594633U (ja) 1982-07-01 1982-07-01 シリコンウエハ等の水切乾燥装置

Country Status (2)

Country Link
US (1) US4489501A (enEXAMPLES)
JP (1) JPS594633U (enEXAMPLES)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4989345A (en) * 1989-12-18 1991-02-05 Gill Jr Gerald L Centrifugal spin dryer for semiconductor wafer
KR950007111Y1 (ko) * 1992-08-31 1995-08-28 김주용 반도체 웨이퍼 건조장치
GB9704075D0 (en) * 1997-02-27 1997-04-16 Sansom Anthony M Sports footwear
US6193458B1 (en) 1999-04-29 2001-02-27 Jeffrey D. Marsh System for and method of binding and trimming a perfect bound book
WO2007084952A2 (en) 2006-01-18 2007-07-26 Akrion Technologies, Inc. Systems and methods for drying a rotating substrate
US11840715B2 (en) 2020-06-30 2023-12-12 Microsoft Technology Licensing, Llc Microelectrode array with a switchable hydrophilic surface
CN115523735B (zh) * 2022-09-16 2024-09-03 中国矿业大学 一种基于离心脱水原理的煤料脱水装置和脱水系统

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2591669A (en) * 1949-07-30 1952-04-08 Eastern Lab Inc Hair drier
US3152875A (en) * 1962-06-15 1964-10-13 Jr William L Davis Football drier
US3246404A (en) * 1963-03-13 1966-04-19 Ametek Inc Centrifugal dryer
US3566582A (en) * 1969-04-04 1971-03-02 Entoleter Mass contact between media of different densities
JPS6017985B2 (ja) * 1976-05-08 1985-05-08 日本電気株式会社 薄片乾燥機

Also Published As

Publication number Publication date
US4489501A (en) 1984-12-25
JPS594633U (ja) 1984-01-12

Similar Documents

Publication Publication Date Title
JPS6221003Y2 (enEXAMPLES)
US2314986A (en) Centrifugal separator
JPS6017985B2 (ja) 薄片乾燥機
KR950012659B1 (ko) 반도체 재료의 물기를 빼는 건조장치
US3151188A (en) Porous blanket humidifier
JPS6244526Y2 (enEXAMPLES)
JPS645882Y2 (enEXAMPLES)
JPS63265430A (ja) 半導体材料の水切乾燥装置
JPH0322909Y2 (enEXAMPLES)
US4525938A (en) Spin drier for semiconductor material
JPS6233316Y2 (enEXAMPLES)
JPH0388331A (ja) スピンドライヤのフィルターボックス
JPH0514508Y2 (enEXAMPLES)
JP5325067B2 (ja) 洗濯機用排水トラップ装置、排水トラップ装置用のトラップカバー、および洗濯乾燥機
JPH0310668Y2 (enEXAMPLES)
JPS6253942B2 (enEXAMPLES)
JP2991581B2 (ja) 遠心乾燥機
CN217005155U (zh) 一种芯片烘干装置
JPH0745958Y2 (ja) 半導体材料の水切乾燥装置
US4489502A (en) Spin drier for silicon wafers and the like
JPS5818927A (ja) 水切乾燥装置
JPH06224173A (ja) 回転式基板処理装置
JP4358410B2 (ja) スピン処理装置
US2591290A (en) Washing machine
JPS5952186A (ja) 遠心脱水機