JPS62201414A - レ−ザ描画装置 - Google Patents

レ−ザ描画装置

Info

Publication number
JPS62201414A
JPS62201414A JP61043759A JP4375986A JPS62201414A JP S62201414 A JPS62201414 A JP S62201414A JP 61043759 A JP61043759 A JP 61043759A JP 4375986 A JP4375986 A JP 4375986A JP S62201414 A JPS62201414 A JP S62201414A
Authority
JP
Japan
Prior art keywords
sample stage
sample
laser
polygon mirror
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61043759A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0561613B2 (enExample
Inventor
Shoji Tanaka
田中　勝爾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Machine Co Ltd
Original Assignee
Toshiba Machine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Machine Co Ltd filed Critical Toshiba Machine Co Ltd
Priority to JP61043759A priority Critical patent/JPS62201414A/ja
Publication of JPS62201414A publication Critical patent/JPS62201414A/ja
Publication of JPH0561613B2 publication Critical patent/JPH0561613B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Facsimile Scanning Arrangements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP61043759A 1986-02-28 1986-02-28 レ−ザ描画装置 Granted JPS62201414A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61043759A JPS62201414A (ja) 1986-02-28 1986-02-28 レ−ザ描画装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61043759A JPS62201414A (ja) 1986-02-28 1986-02-28 レ−ザ描画装置

Publications (2)

Publication Number Publication Date
JPS62201414A true JPS62201414A (ja) 1987-09-05
JPH0561613B2 JPH0561613B2 (enExample) 1993-09-06

Family

ID=12672688

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61043759A Granted JPS62201414A (ja) 1986-02-28 1986-02-28 レ−ザ描画装置

Country Status (1)

Country Link
JP (1) JPS62201414A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02173609A (ja) * 1988-12-26 1990-07-05 Nec Corp レーザ描画装置
JP2003515255A (ja) * 1999-11-17 2003-04-22 マイクロニック レーザー システムズ アクチボラゲット マイクロリソグラフィ描画におけるビーム位置決め
JP2009122597A (ja) * 2007-11-19 2009-06-04 Hitachi Via Mechanics Ltd レーザ直接描画装置
JP2009128499A (ja) * 2007-11-21 2009-06-11 Hitachi Via Mechanics Ltd レーザ直接描画方法およびレーザ直接描画装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02173609A (ja) * 1988-12-26 1990-07-05 Nec Corp レーザ描画装置
JP2003515255A (ja) * 1999-11-17 2003-04-22 マイクロニック レーザー システムズ アクチボラゲット マイクロリソグラフィ描画におけるビーム位置決め
JP2011124586A (ja) * 1999-11-17 2011-06-23 Micronic Laser Systems Ab マイクロリソグラフィ描画におけるビーム位置決め
JP2009122597A (ja) * 2007-11-19 2009-06-04 Hitachi Via Mechanics Ltd レーザ直接描画装置
JP2009128499A (ja) * 2007-11-21 2009-06-11 Hitachi Via Mechanics Ltd レーザ直接描画方法およびレーザ直接描画装置

Also Published As

Publication number Publication date
JPH0561613B2 (enExample) 1993-09-06

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