JPS6219539Y2 - - Google Patents
Info
- Publication number
- JPS6219539Y2 JPS6219539Y2 JP11088083U JP11088083U JPS6219539Y2 JP S6219539 Y2 JPS6219539 Y2 JP S6219539Y2 JP 11088083 U JP11088083 U JP 11088083U JP 11088083 U JP11088083 U JP 11088083U JP S6219539 Y2 JPS6219539 Y2 JP S6219539Y2
- Authority
- JP
- Japan
- Prior art keywords
- plate
- flat plate
- folds
- plates
- inscribed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000853 adhesive Substances 0.000 claims description 2
- 230000001070 adhesive effect Effects 0.000 claims description 2
- 239000003292 glue Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
Landscapes
- Cartons (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11088083U JPS6018914U (ja) | 1983-07-15 | 1983-07-15 | 折り込み紙箱 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11088083U JPS6018914U (ja) | 1983-07-15 | 1983-07-15 | 折り込み紙箱 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6018914U JPS6018914U (ja) | 1985-02-08 |
JPS6219539Y2 true JPS6219539Y2 (nl) | 1987-05-19 |
Family
ID=30257690
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11088083U Granted JPS6018914U (ja) | 1983-07-15 | 1983-07-15 | 折り込み紙箱 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6018914U (nl) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8962101B2 (en) | 2007-08-31 | 2015-02-24 | Novellus Systems, Inc. | Methods and apparatus for plasma-based deposition |
US9023731B2 (en) | 2012-05-18 | 2015-05-05 | Novellus Systems, Inc. | Carbon deposition-etch-ash gap fill process |
US9240320B1 (en) | 2008-06-27 | 2016-01-19 | Novellus Systems, Inc. | Methods of depositing smooth and conformal ashable hard mask films |
US9304396B2 (en) | 2013-02-25 | 2016-04-05 | Lam Research Corporation | PECVD films for EUV lithography |
US9320387B2 (en) | 2013-09-30 | 2016-04-26 | Lam Research Corporation | Sulfur doped carbon hard masks |
US9362133B2 (en) | 2012-12-14 | 2016-06-07 | Lam Research Corporation | Method for forming a mask by etching conformal film on patterned ashable hardmask |
US9589799B2 (en) | 2013-09-30 | 2017-03-07 | Lam Research Corporation | High selectivity and low stress carbon hardmask by pulsed low frequency RF power |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE202005014737U1 (de) * | 2005-09-19 | 2007-02-08 | Seda S.P.A., Arzano | Behälter und Zuschnitt zu dessen Herstellung |
JP5618782B2 (ja) * | 2010-11-25 | 2014-11-05 | 株式会社ロッテ | 紙製容器 |
JP2014151951A (ja) * | 2013-02-12 | 2014-08-25 | Toppan Printing Co Ltd | 紙製二重箱 |
-
1983
- 1983-07-15 JP JP11088083U patent/JPS6018914U/ja active Granted
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8962101B2 (en) | 2007-08-31 | 2015-02-24 | Novellus Systems, Inc. | Methods and apparatus for plasma-based deposition |
US9240320B1 (en) | 2008-06-27 | 2016-01-19 | Novellus Systems, Inc. | Methods of depositing smooth and conformal ashable hard mask films |
US9023731B2 (en) | 2012-05-18 | 2015-05-05 | Novellus Systems, Inc. | Carbon deposition-etch-ash gap fill process |
US9362133B2 (en) | 2012-12-14 | 2016-06-07 | Lam Research Corporation | Method for forming a mask by etching conformal film on patterned ashable hardmask |
US9304396B2 (en) | 2013-02-25 | 2016-04-05 | Lam Research Corporation | PECVD films for EUV lithography |
US9320387B2 (en) | 2013-09-30 | 2016-04-26 | Lam Research Corporation | Sulfur doped carbon hard masks |
US9589799B2 (en) | 2013-09-30 | 2017-03-07 | Lam Research Corporation | High selectivity and low stress carbon hardmask by pulsed low frequency RF power |
Also Published As
Publication number | Publication date |
---|---|
JPS6018914U (ja) | 1985-02-08 |
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