JPS6219264B2 - - Google Patents
Info
- Publication number
- JPS6219264B2 JPS6219264B2 JP56113109A JP11310981A JPS6219264B2 JP S6219264 B2 JPS6219264 B2 JP S6219264B2 JP 56113109 A JP56113109 A JP 56113109A JP 11310981 A JP11310981 A JP 11310981A JP S6219264 B2 JPS6219264 B2 JP S6219264B2
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- tip
- soldering iron
- chip
- plating layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 40
- 229910000679 solder Inorganic materials 0.000 claims description 26
- 238000005476 soldering Methods 0.000 claims description 25
- 238000007747 plating Methods 0.000 claims description 21
- 229910052742 iron Inorganic materials 0.000 claims description 19
- 229910001128 Sn alloy Inorganic materials 0.000 claims description 17
- 230000003628 erosive effect Effects 0.000 claims description 10
- 229910045601 alloy Inorganic materials 0.000 claims description 9
- 239000000956 alloy Substances 0.000 claims description 9
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 8
- 229910052759 nickel Inorganic materials 0.000 claims description 8
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 239000012535 impurity Substances 0.000 claims description 6
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 description 10
- 230000000694 effects Effects 0.000 description 7
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 238000009713 electroplating Methods 0.000 description 3
- 229910008994 Sn—Ni—Co Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000004881 precipitation hardening Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910020810 Sn-Co Inorganic materials 0.000 description 1
- 229910020938 Sn-Ni Inorganic materials 0.000 description 1
- 229910008336 SnCo Inorganic materials 0.000 description 1
- 229910006414 SnNi Inorganic materials 0.000 description 1
- 229910018757 Sn—Co Inorganic materials 0.000 description 1
- 229910008937 Sn—Ni Inorganic materials 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K3/00—Tools, devices, or special appurtenances for soldering, e.g. brazing, or unsoldering, not specially adapted for particular methods
- B23K3/02—Soldering irons; Bits
- B23K3/025—Bits or tips
Description
この発明は、高強度および高熱伝導性を有し、
かつはんだぬれ性および耐溶融はんだ侵食性にも
すぐれたはんだごてチツプに関するものである。
一般に、はんだ付け用はんだごてチツプには、
その使用目的から高強度および高熱伝導性が要求
されることから、通常、約1.2重量%以下のCrを
含有した析出硬化型Cu合金が使用され、かつそ
の表面にはんだぬれ性および耐溶融はんだ侵食性
を付与する目的でFeめつきが施されている。確
かに、このCr含有の析出硬化型Cu合金は、比較
的高強度をもつものの十分満足する高強度をもつ
ものでないため、はんだごてチツプ先端部を極細
加工、例えば直径1.5mmφ以下に加工することが
不可能であり、また耐溶融はんだ侵食性にも劣る
ものであるため、チツプ先端部に施されるFeメ
ツキは0.25〜0.5mm厚、あるいはこれ以上にも及
ぶ厚めつきが必要である。このようにチツプ先端
部に厚めつきを施す必要があるため、どうしても
生産性が悪く、かつコスト高となるのが現状であ
る。
一方、今日の電子工業分野においては、電気製
品の小型化および高実装化が進んでおり、これに
したがつて電気回路は増々精密になる傾向があ
り、この結果電気製品を構成している各部品を能
率的かつ確実にはんだ付けするためには、これに
使用されるはんだごてチツプも小型のもの、すな
わち極細形状のものが要求されるようになつてい
る。
そこで、本発明者等は、上述のような観点か
ら、極細加工が可能な高強度を有し、かつ耐溶融
はんだ侵食性にもすぐれたはんだごてチツプをコ
スト安く開発すべく研究を行なつた結果、Cr:
2%超17.0%,Zr:0.03〜1.2%含有し、さらに必
要に応じてP:0.005〜0.25%を含有し、残りが
Cuと不可避不純物からなる組成(以上重量%,
以下%の表示は重量%を意味する)を有するCu
合金は、これをはんだごてチツプの製造に用いた
場合、その先端部を極細形状に加工できる高強度
と、はんだごてチツプに要求される高熱伝導性
(高導電性)を有し、しかも前記組成のCu合金製
はんだごてチツプの少なくとも先端部表面に、主
要合金成分として、少なくともNiおよびCoのう
ちの1種以上を、望ましくは10〜50%含有する
Sn合金の1層以上のSn合金めつき層を形成する
と、この結果のはんだごてチツプはすぐれた耐溶
融はんだ侵食性およびはんだぬれ性をもつように
なり、さらに必要に応じて前記Sn合金めつき層
を、Fe,Ni,Co,Cr,およびこれらの成分を主
成分とする合金のうちの1種以上からなる1層以
上の中間めつき層を介して形成してやると、前記
Sn合金めつき層の密着強度が一段と増大するよ
うになると共に、前記Sn合金めつき層のチツプ
本体への拡散が抑制されるようになることから、
一段と使用寿命の延命化がはかれるという知見を
得たのである。
この発明は上記知見にもとづいてなされたもの
であつて、以下にチツプの成分組成範囲を上記の
通りに限定した理由を説明する。
(a) Cr
Cr成分には、強度を向上させ、かつ耐酸化性
および耐溶融はんだ侵食性を改善する作用がある
が、その含有量が2%以下では前記作用に所望の
効果が得られず、一方17%を越えて含有させる
と、熱伝導性(導電性)が低下するようになるこ
とから、その含有量を2%超〜17%と定めた。
(b) Zr
Zr成分には、高温延性,高温クリープ強さ,お
よび高温強度を付与する作用があるが、その含有
量が0.03%未満では前記の各特性に所望の向上効
果が得られず、一方1.2%を越えて含有させても
より一層の向上効果が現われず、逆に塑性加工性
が劣化するようになることから、その含有量を
0.03〜1.2%と定めた。
(c) P
P成分には、造塊時の鋳塊偏析を抑制し、初晶
として晶出するCrを均一微細に分散させ、もつ
て強度および伸びを一段と改善する作用があるの
で、これらの特性が要求される場合に必要に応じ
て含有されるが、その含有量が0.005%未満では
前記作用に所望の向上効果が得られず、一方0.25
%を越えて含有させても前記作用により一層の改
善効果が現われず、逆に導電性(熱伝導性)の低
下をきたすようになることから、その含有量を
0.005〜0.25%と定めた。
なお、この発明のチツプにおいて、不可避不純
物として、0.1%以下のC,それぞれ0.5%以下の
Fe,Ni,Co,Cd,およびSnを含有しても、上記
の特性が何ら損なわれるものではない。
また、この発明のチツプにおいて、Al,Mg,
Ti,Si,Be,B,Ag,In,Hf,およびミツシユ
メタルのうちの1種または2種以上をそれぞれ
0.5%以下の範囲で含有させると、耐熱性およ
び/または耐溶融はんだ侵食性が一段と向上する
ようになるものであり、さらに脱酸剤としてCa
およびLiのうちの1種または2種をそれぞれ0.2
%以下の範囲で含有させることによつて鋳塊の清
浄化をはかり、特性の改善をはかることも可能で
ある。
さらに、この発明のはんだごてチツプの製造に
際して、Sn合金めつき層は、Sn―Ni系,Sn―Co
系,Sn―Ni―Co系,のSn合金,さらにこれの合
金にCu,W,およびMoのうちの1種以上を含有
させたSn合金を、化学蒸着法や物理蒸着法など
の乾式めつき法、さらに溶融めつき法、無電解め
つき法、および電気めつき法などの湿式めつき法
(コスト面からは電気めつき法が最も望ましい)
を用いて、5〜50μmの層厚で形成するのが好ま
しい。このSn合金めつき層がすぐれた耐溶融は
んだ侵食性を示すのは、Sn合金めつき層中に形
成されたSnNiあるいはSnCoの金属間化合物の存
在によるものと考えられる。
また、中間めつき層も同様に乾式あるいは湿式
めつき法によつて形成することができ、この場合
層厚は1〜10μmとするのが望ましい。
さらに、チツプ先端部以外のチツプ本体表面部
全体をCrめつき層で被覆して、伝熱部であるか
かる部分の表面酸化を防止すると共に、はんだぬ
れを防止してチツプ先端部からのはんだの持上り
現象を抑制するようにするとよい。
つぎに、この発明のはんだごてチツプを実施例
により具体的に説明する。
実施例
それぞれ第1表に示される成分組成をもつた
Cu合金製丸棒(寸法:直径10mmφ×長さ70mm)
を調整し、この丸棒を、先端部の長さ3mmの直
径:0.8mmφ×本体の直径:7mmφ×全体長さ:
55mmの寸法に切削加工し、引続いて、これに同じ
く第1表に示される成分組成および層厚をもつた
Sn合金めつき層および中間めつき層を通常の電
気めつき法を用いて、チツプ先端部の長さ:2mm
に亘つて形成することによつて本発明チツプ1〜
20をそれぞれ製造した。
ついで、この結果得られた本発明チツプ1〜20
This invention has high strength and high thermal conductivity,
The present invention relates to a soldering iron chip that also has excellent solder wettability and molten solder erosion resistance. In general, soldering iron tips for soldering include
Because its intended use requires high strength and high thermal conductivity, precipitation-hardening Cu alloys containing approximately 1.2% by weight or less of Cr are usually used, and their surfaces have excellent solderability and resistance to molten solder corrosion. Fe plating is applied for the purpose of giving sex. It is true that this Cr-containing precipitation-hardening Cu alloy has relatively high strength, but it does not have a sufficiently high strength, so the tip of the soldering iron tip must be processed into a very fine shape, for example, to a diameter of 1.5 mm or less. It is impossible to do this, and the molten solder corrosion resistance is also poor, so the Fe plating applied to the tip end of the chip must be 0.25 to 0.5 mm thick, or even thicker. Since it is necessary to thicken the tip end of the chip in this way, the current situation is that productivity is inevitably low and costs are high. On the other hand, in today's electronics industry, electrical products are becoming smaller and more highly packaged, and as a result, electrical circuits tend to become more and more precise. In order to efficiently and reliably solder components, the soldering iron chips used therein are also required to be small, that is, to have an extremely thin shape. Therefore, from the above-mentioned viewpoint, the present inventors conducted research in order to develop a soldering iron chip with high strength capable of ultra-fine processing and excellent resistance to molten solder erosion at a low cost. As a result, Cr:
Contains more than 2% 17.0%, Zr: 0.03 to 1.2%, further contains P: 0.005 to 0.25% as necessary, and the rest
Composition consisting of Cu and unavoidable impurities (more than % by weight,
(The following % indication means weight %)
When the alloy is used to manufacture soldering iron chips, it has high strength that allows the tip to be processed into an ultra-fine shape, and high thermal conductivity (high electrical conductivity) required for soldering iron chips. At least the tip surface of the Cu alloy soldering iron chip having the above composition contains at least one of Ni and Co as a main alloy component, preferably 10 to 50%.
By forming one or more Sn alloy plated layers of Sn alloy, the resulting soldering iron chip has excellent molten solder erosion resistance and solderability, and if necessary, When the plating layer is formed through one or more intermediate plating layers made of one or more of Fe, Ni, Co, Cr, and alloys containing these components as main components, the above-mentioned
The adhesion strength of the Sn alloy plating layer is further increased, and the diffusion of the Sn alloy plating layer into the chip body is suppressed.
This led to the discovery that the service life could be further extended. This invention has been made based on the above knowledge, and the reason why the range of the component composition of the chip is limited as described above will be explained below. (a) Cr The Cr component has the effect of increasing strength and improving oxidation resistance and molten solder erosion resistance, but if its content is less than 2%, the desired effect cannot be obtained. On the other hand, if the content exceeds 17%, the thermal conductivity (electroconductivity) decreases, so the content was set at more than 2% to 17%. (b) Zr The Zr component has the effect of imparting high-temperature ductility, high-temperature creep strength, and high-temperature strength, but if its content is less than 0.03%, the desired effect of improving each of the above properties cannot be obtained. On the other hand, if the content exceeds 1.2%, no further improvement effect will be obtained, and on the contrary, the plastic workability will deteriorate, so the content should be
It was set at 0.03-1.2%. (c) P The P component has the effect of suppressing ingot segregation during ingot making, uniformly and finely dispersing Cr that crystallizes as primary crystals, and further improving strength and elongation. It is included as necessary when properties are required, but if the content is less than 0.005%, the desired effect of improving the above function cannot be obtained; on the other hand, 0.25%
Even if it is contained in excess of
It was set at 0.005-0.25%. In addition, in the chip of this invention, unavoidable impurities include C of 0.1% or less and C of 0.5% or less.
Even if Fe, Ni, Co, Cd, and Sn are contained, the above characteristics are not impaired in any way. In addition, in the chip of this invention, Al, Mg,
Each contains one or more of Ti, Si, Be, B, Ag, In, Hf, and Mitsushi metal.
When Ca is contained in a range of 0.5% or less, heat resistance and/or molten solder corrosion resistance are further improved, and Ca is added as a deoxidizing agent.
and 0.2 each of one or two of Li.
It is also possible to clean the ingot and improve its properties by including it in a range of % or less. Furthermore, when manufacturing the soldering iron chip of the present invention, the Sn alloy plating layer is Sn-Ni based, Sn-Co
Dry plating method such as chemical vapor deposition method or physical vapor deposition method is applied to Sn alloys such as Sn-Ni-Co-based, Sn-Ni-Co-based, and Sn alloys containing one or more of Cu, W, and Mo. wet plating methods such as melt plating method, electroless plating method, and electroplating method (electroplating method is the most desirable from a cost standpoint)
The layer thickness is preferably 5 to 50 μm. The reason why this Sn alloy plated layer exhibits excellent molten solder erosion resistance is thought to be due to the presence of an intermetallic compound of SnNi or SnCo formed in the Sn alloy plated layer. Further, the intermediate plating layer can be similarly formed by a dry or wet plating method, and in this case, the layer thickness is preferably 1 to 10 μm. Furthermore, the entire surface of the chip body other than the chip tip is coated with a Cr plating layer to prevent surface oxidation of the heat transfer area, as well as to prevent solder wetting and remove solder from the chip tip. It is preferable to suppress the lifting phenomenon. Next, the soldering iron chip of the present invention will be specifically explained using examples. Examples Each of the ingredients had the composition shown in Table 1.
Cu alloy round bar (dimensions: diameter 10mmφ x length 70mm)
Adjust this round bar, the length of the tip is 3mm, the diameter is 0.8mmφ x the diameter of the main body is 7mmφ x the overall length is:
This was then cut to a size of 55 mm, and a layer having the composition and layer thickness also shown in Table 1 was used.
The Sn alloy plating layer and the intermediate plating layer are plated using a normal electroplating method, and the length of the tip of the chip is 2 mm.
By forming chips 1 to 1 of the present invention,
20 were produced each. Next, chips 1 to 20 of the present invention obtained as a result
【表】
について、大気中、温度:400℃に24時間加熱
後、チツプ先端部を、浴温:230℃の溶融はんだ
(Sn:60%,Pb:40%の組成を有する)中に1秒
間浸漬の条件で、はんだぬれ性を観察したとこ
ろ、いずれのチツプもきわめて良好なはんだぬれ
性を示すものであつた。
また、本発明チツプ1〜20について、チツプ先
端部保持温度:400℃,押付荷重:150g,1サイ
クル:3秒の条件ではんだ付け連続耐久テストを
行なつたところ、いずれのチツプも50000回の試
験後においても外観に異状は見られず、すぐれた
耐溶融はんだ侵食性を示すと共に、良好なはんだ
ぬれ性も保持しており、引続いての長期に亘る使
用が可能であることを示した。
なお、第1表には、上記本発明チツプ1〜20の
チツプ本体の500℃での引張特性,280℃での100
時間クリープラプチヤー寿命,および導電率を合
せて示したが、これらの結果からも本発明チツプ
が高強度および高導電率、すなわち高熱伝導性を
有することが明らかである。
上述のように、この発明のはんだこてチツプ
は、高強度を有するので、チツプ先端部を、実用
に十分耐える状態で極細形状に加工することがで
きるため、精密はんだ付けへの適用が可能とな
り、また、はんだごてチツプに要求される耐溶融
はんだ侵食性およびはんだぬれ性にもすぐれ、か
つ高熱伝導性を有するので、長期に亘つてすぐれ
たはんだ付け性能を発揮するなど工業上有用な特
性を有するのである。[Table] After heating in the air at a temperature of 400℃ for 24 hours, the tip of the chip was placed in molten solder (with a composition of Sn: 60% and Pb: 40%) at a bath temperature of 230℃ for 1 second. When the solder wettability of the chips was observed under immersion conditions, all chips showed extremely good solder wettability. In addition, when chips 1 to 20 of the present invention were subjected to a continuous soldering durability test under the conditions of chip tip holding temperature: 400°C, pressing load: 150 g, and 1 cycle: 3 seconds, all chips were tested 50,000 times. No abnormalities were observed in the appearance even after the test, showing excellent resistance to molten solder corrosion and good solder wettability, indicating that it can be used for a long period of time. . Furthermore, Table 1 shows the tensile properties of the chip bodies of chips 1 to 20 of the present invention at 500°C and 100°C at 280°C.
The time creep rapture life and electrical conductivity are also shown, and it is clear from these results that the chip of the present invention has high strength and high electrical conductivity, that is, high thermal conductivity. As mentioned above, the soldering iron tip of the present invention has high strength, so the tip end of the tip can be processed into an extremely thin shape that is sufficiently durable for practical use, making it possible to apply it to precision soldering. In addition, it has excellent molten solder erosion resistance and solder wettability required for soldering iron chips, and has high thermal conductivity, so it has industrially useful properties such as exhibiting excellent soldering performance over a long period of time. It has.
Claims (1)
有し、残りがCuと不可避不純物からなる組成
(以上重量%)を有するCu合金製はんだてチツプ
の少なくとも先端部表面を、主要合金成分とし
て、少なくともNiおよびCoのうちの1種以上を
含有するSn合金の1層以上のSn合金めつき層で
被覆してなるはんだぬれ性および耐溶融はんだ侵
食性にすぐれた高強度高熱伝導性はんだごてチツ
プ。 2 Cr:2%超〜17.0%、Zr:0.03〜1.2%を含
有し、さらにP:0.005〜0.25%を含有し、残り
がCuと不可避不純物からなる組成(以上重量
%)を有するCu合金製はんだてチツプの少なく
とも先端部表面を、主要合金成分として、少なく
ともNiおよびCoのうちの1種以上を含有するSn
合金の1層以上のSn合金めつき層で被覆してな
るはんだぬれ性および耐溶融はんだ侵食性にすぐ
れた高強度高熱伝導性はんだごてチツプ。 3 Cr:2%超〜17.0%,Zr:0.03〜1.2%を含
有し、残りがCuと不可避不純物からなる組成
(以上重量%)を有するCu合金製はんだごてチツ
プの少なくとも先端部表面を、Fe,Ni,Co,
Cr,およびこれらの成分を主成分とする合金の
うちの1種以上からなる1層以上の中間めつき層
を介して、主要合金成分として、少なくともNi
およびCoのうちの1種以上を含有するSn合金の
1層以上のSn合金めつき層で被覆してなるはん
だぬれ性および耐溶融はんだ侵食性にすぐれた高
強度高熱伝導性はんだごてチツプ。 4 Cr:2%超〜17.0%,Zr:0.03〜1.2%を含
有し、さらにP:0.005〜0.25%を含有し、残り
がCuと不可避不純物からなる組成(以上重量
%)を有するCu合金製はんだごてチツプの少な
くとも先端部を、Fe,Ni,Co,Cr,およびこれ
らの成分を主成分とする合金のうちの1種以上か
らなる1層以上の中間めつき層を介して、主要合
金成分として、少なくともNiおよびCoのうちの
1種以上を含有するSn合金の1層以上のSn合金
めつき層で被覆してなるはんだぬれ性および耐溶
融はんだ侵食性にすぐれた高強度高熱伝導性はん
だごてチツプ。[Claims] 1. At least a Cu alloy soldering chip having a composition (weight %) containing 1 Cr: more than 2% to 17.0%, Zr: 0.03 to 1.2%, and the remainder consisting of Cu and unavoidable impurities. The surface of the tip is coated with one or more Sn alloy plating layers of Sn alloy containing at least one of Ni and Co as the main alloy component to improve solder wettability and molten solder erosion resistance. Excellent high strength and high thermal conductivity soldering iron chip. 2 Made of a Cu alloy containing Cr: more than 2% to 17.0%, Zr: 0.03 to 1.2%, further containing P: 0.005 to 0.25%, and the remainder consisting of Cu and unavoidable impurities (weight %) At least the surface of the tip of the soldering tip is made of Sn containing at least one of Ni and Co as the main alloy component.
A high-strength, high-thermal conductive soldering iron chip that is coated with one or more Sn alloy plating layers and has excellent solder wettability and molten solder erosion resistance. 3. At least the surface of the tip of a soldering iron tip made of a Cu alloy having a composition (weight %) containing Cr: more than 2% to 17.0%, Zr: 0.03 to 1.2%, and the remainder consisting of Cu and unavoidable impurities, Fe, Ni, Co,
Through one or more intermediate plating layers consisting of one or more of Cr and alloys containing these components as main components, at least Ni is added as the main alloy component.
A high-strength, high-thermal-conductivity soldering iron chip with excellent solder wettability and molten solder erosion resistance, which is coated with one or more Sn alloy plating layers made of a Sn alloy containing one or more of Co and Co. 4 Made of a Cu alloy containing Cr: more than 2% to 17.0%, Zr: 0.03 to 1.2%, further containing P: 0.005 to 0.25%, and the remainder consisting of Cu and unavoidable impurities (weight %) At least the tip of the soldering iron chip is coated with the main alloy through one or more intermediate plating layers made of one or more of Fe, Ni, Co, Cr, and alloys containing these components as main components. High strength and high thermal conductivity with excellent solderability and molten solder erosion resistance, made by coating with one or more Sn alloy plating layers of Sn alloy containing at least one of Ni and Co as a component. Soldering iron chip.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11310981A JPS5816770A (en) | 1981-07-20 | 1981-07-20 | High strength and high heat conductivity soldering iron tip having excellent wettability with solder and resistance to erosion by molten solder |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11310981A JPS5816770A (en) | 1981-07-20 | 1981-07-20 | High strength and high heat conductivity soldering iron tip having excellent wettability with solder and resistance to erosion by molten solder |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5816770A JPS5816770A (en) | 1983-01-31 |
JPS6219264B2 true JPS6219264B2 (en) | 1987-04-27 |
Family
ID=14603723
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11310981A Granted JPS5816770A (en) | 1981-07-20 | 1981-07-20 | High strength and high heat conductivity soldering iron tip having excellent wettability with solder and resistance to erosion by molten solder |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5816770A (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0830230B2 (en) * | 1987-07-16 | 1996-03-27 | 古河電気工業株式会社 | Flexible cable conductor |
JPH0830231B2 (en) * | 1987-07-16 | 1996-03-27 | 古河電気工業株式会社 | Flexible cable conductor |
JPS6421024A (en) * | 1987-07-16 | 1989-01-24 | Furukawa Electric Co Ltd | Bending-resisting cable conductor |
JPH0830232B2 (en) * | 1987-07-16 | 1996-03-27 | 古河電気工業株式会社 | Flexible cable conductor |
JP3775172B2 (en) * | 2000-05-22 | 2006-05-17 | 株式会社村田製作所 | Solder composition and soldered article |
US6660226B1 (en) | 2000-08-07 | 2003-12-09 | Murata Manufacturing Co., Ltd. | Lead free solder and soldered article |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5164441A (en) * | 1974-11-30 | 1976-06-03 | Tokyo Shibaura Electric Co | TEIKOYOSETSUYODENKYOKUTO SONOSEIZOHOHO |
JPS5319136A (en) * | 1976-08-06 | 1978-02-22 | Kabel Metallwerke Ghh | Method of using copper alloy as mold material for continuous casting |
JPS547230B2 (en) * | 1972-12-28 | 1979-04-05 | ||
JPS5479121A (en) * | 1977-12-07 | 1979-06-23 | Sumitomo Electric Ind Ltd | Copper alloy for trolley wire |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5079722U (en) * | 1973-11-28 | 1975-07-10 | ||
JPS5123528U (en) * | 1974-08-12 | 1976-02-20 | ||
JPS51162831U (en) * | 1975-06-19 | 1976-12-25 | ||
JPS547230U (en) * | 1977-06-20 | 1979-01-18 |
-
1981
- 1981-07-20 JP JP11310981A patent/JPS5816770A/en active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS547230B2 (en) * | 1972-12-28 | 1979-04-05 | ||
JPS5164441A (en) * | 1974-11-30 | 1976-06-03 | Tokyo Shibaura Electric Co | TEIKOYOSETSUYODENKYOKUTO SONOSEIZOHOHO |
JPS5319136A (en) * | 1976-08-06 | 1978-02-22 | Kabel Metallwerke Ghh | Method of using copper alloy as mold material for continuous casting |
JPS5479121A (en) * | 1977-12-07 | 1979-06-23 | Sumitomo Electric Ind Ltd | Copper alloy for trolley wire |
Also Published As
Publication number | Publication date |
---|---|
JPS5816770A (en) | 1983-01-31 |
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