JPS62190229A - シラン系レジスト材料 - Google Patents

シラン系レジスト材料

Info

Publication number
JPS62190229A
JPS62190229A JP3329186A JP3329186A JPS62190229A JP S62190229 A JPS62190229 A JP S62190229A JP 3329186 A JP3329186 A JP 3329186A JP 3329186 A JP3329186 A JP 3329186A JP S62190229 A JPS62190229 A JP S62190229A
Authority
JP
Japan
Prior art keywords
resist
polymer
molecular weight
layer
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3329186A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0547099B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Kazuhide Saigo
斉郷　和秀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP3329186A priority Critical patent/JPS62190229A/ja
Publication of JPS62190229A publication Critical patent/JPS62190229A/ja
Publication of JPH0547099B2 publication Critical patent/JPH0547099B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0754—Non-macromolecular compounds containing silicon-to-silicon bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Silicon Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP3329186A 1986-02-17 1986-02-17 シラン系レジスト材料 Granted JPS62190229A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3329186A JPS62190229A (ja) 1986-02-17 1986-02-17 シラン系レジスト材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3329186A JPS62190229A (ja) 1986-02-17 1986-02-17 シラン系レジスト材料

Publications (2)

Publication Number Publication Date
JPS62190229A true JPS62190229A (ja) 1987-08-20
JPH0547099B2 JPH0547099B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-07-15

Family

ID=12382432

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3329186A Granted JPS62190229A (ja) 1986-02-17 1986-02-17 シラン系レジスト材料

Country Status (1)

Country Link
JP (1) JPS62190229A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1990007540A1 (en) * 1988-12-29 1990-07-12 Canon Kabushiki Kaisha New polysilane compound and electrophotographic photoreceptor produced therefrom

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59210940A (ja) * 1983-03-31 1984-11-29 ユニオン・カ−バイド・コ−ポレ−シヨン 炭化珪素用のオレフイン基含有ポリシラン先駆体類
JPS6259632A (ja) * 1985-09-09 1987-03-16 Toyota Central Res & Dev Lab Inc 導電性ポリシランの製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59210940A (ja) * 1983-03-31 1984-11-29 ユニオン・カ−バイド・コ−ポレ−シヨン 炭化珪素用のオレフイン基含有ポリシラン先駆体類
JPS6259632A (ja) * 1985-09-09 1987-03-16 Toyota Central Res & Dev Lab Inc 導電性ポリシランの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1990007540A1 (en) * 1988-12-29 1990-07-12 Canon Kabushiki Kaisha New polysilane compound and electrophotographic photoreceptor produced therefrom

Also Published As

Publication number Publication date
JPH0547099B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-07-15

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