JPS62188043A - Method for reforming substrate surface - Google Patents
Method for reforming substrate surfaceInfo
- Publication number
- JPS62188043A JPS62188043A JP61030182A JP3018286A JPS62188043A JP S62188043 A JPS62188043 A JP S62188043A JP 61030182 A JP61030182 A JP 61030182A JP 3018286 A JP3018286 A JP 3018286A JP S62188043 A JPS62188043 A JP S62188043A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- drying
- adhesive
- photoresist film
- alcohol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 33
- 238000000034 method Methods 0.000 title abstract description 16
- 238000002407 reforming Methods 0.000 title abstract description 4
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 16
- 239000000853 adhesive Substances 0.000 claims abstract description 9
- 230000001070 adhesive effect Effects 0.000 claims abstract description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000000203 mixture Substances 0.000 claims abstract description 3
- 238000002715 modification method Methods 0.000 claims description 4
- 239000003607 modifier Substances 0.000 claims description 3
- 239000002904 solvent Substances 0.000 claims description 2
- 238000001035 drying Methods 0.000 abstract description 11
- 238000004519 manufacturing process Methods 0.000 abstract description 10
- 239000000428 dust Substances 0.000 abstract description 5
- 239000011521 glass Substances 0.000 abstract description 5
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 abstract description 4
- 230000008021 deposition Effects 0.000 abstract 2
- 239000008246 gaseous mixture Substances 0.000 abstract 1
- 230000004048 modification Effects 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000012790 adhesive layer Substances 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000009835 boiling Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、例えば情報記録再生用原盤を製造する際の、
信号記録用の基板の表面改質方法に関する。（従来の技
術とその問題点）
従来、情報信号を高密度に記録した、例えばビデオディ
スクなどの情報記録円盤を製造するための情報記録再生
用原盤の製造方法としては、基体となるガラス基板上に
フォト・レジストなどの疎水性感光剤をスピンナー法な
どによって塗布してフォト・レジスト膜（単にレジスト
膜と称することもある）を形成し、このフォト・レジス
ト膜に情報信号を周波数変調したレーザービームを照射
して凹凸（ビット）のあるフォト・レジスト盤を作成し
、これに無電解メッキあるいは真空蒸着により銀あるい
はニッケル層を形成し、□その後ニッケル電鋳すること
によって行なわれている。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention is applicable to, for example, when manufacturing a master disc for information recording and reproduction.
The present invention relates to a method for modifying the surface of a substrate for signal recording. (Prior art and its problems) Conventionally, as a method for manufacturing an information recording and reproducing master disc for manufacturing information recording discs such as video discs on which information signals are recorded at high density, A photoresist film (sometimes simply referred to as a resist film) is formed by applying a hydrophobic photosensitizer such as a photoresist to the surface using a spinner method, and a laser beam frequency-modulated information signal is applied to this photoresist film. This is done by irradiating a photoresist disk with unevenness (bits), forming a silver or nickel layer on this by electroless plating or vacuum evaporation, and then electroforming the nickel.
その具体的な製造工程は、先に本出願人会社より特願昭
５９−１４５２７１号にて出願した如く、ガラス基板な
どの基板を光学的に研磨した後洗浄し、この基板上の水
分を除去するために乾燥工程を経た後、後工程のフォト
・レジスト膜の付着を容易にするために、後に後述する
如く、液状接着剤を加熱しこれを気化して基板上に定着
することにより接着層を形成して基板の表面改質を行な
い、しかる侵、この基板上にフォト・レジスト膜を付着
し、このレジスト膜に所定の情報信号を周波数変調した
ビームを照射した後、これを現像して選択的にレジスト
膜を除去して所定のパターンを形成し、この所定のレジ
スト膜を有するパターンをマスクとして基板をエツチン
グした後、このレジスｌ−膜を除去することにより所定
の信号が記録された情報記録再生用原盤の！！Ｉ造を行
なっていた。The specific manufacturing process is as previously filed by the applicant company in Japanese Patent Application No. 145271/1986, by optically polishing a substrate such as a glass substrate, and then cleaning it to remove moisture on the substrate. After passing through a drying process to facilitate the adhesion of the photoresist film in the subsequent process, the adhesive layer is formed by heating the liquid adhesive, vaporizing it, and fixing it on the substrate, as described later. The surface of the substrate is modified by forming a photoresist film, and then a photoresist film is deposited on this substrate, and this resist film is irradiated with a beam frequency-modulated with a predetermined information signal, and then developed. The resist film was selectively removed to form a predetermined pattern, the substrate was etched using the pattern with the predetermined resist film as a mask, and then the resist l-film was removed to record a predetermined signal. Master disc for information recording and playback! ! He was doing I-building.
（発明が解決しようとする問題点）
ところで、上記原盤の製造工程の内、光学的に研磨され
た基板に信号を記録するためにフォト・レジスト膜を形
成する際には、基板にフォト・レジス］−膜の付着を容
易にするために、先ずこの洗浄された基板をフレオン液
を加熱気化させた乾燥装置内に挿入してさせるものであ
るが、その場合、ガラス表面に付着した水分および蒸気
中に含まれる水分がガラス表面に付着し加水分解を起す
。このため基板を接着剤を蒸発させた接着剤槽に挿入し
て、この表面に接着層を形成する表面改質のための改質
処理を行なう２つの工程を経た後、フォト・レジスト膜
形成工程に移行されるため、この２つの工程の間に基板
表面にゴミなどが付着したり、ディフェクトが発生する
などして生産性が低下しコスト高となる問題点があった
。(Problems to be Solved by the Invention) By the way, when forming a photoresist film in order to record signals on an optically polished substrate in the manufacturing process of the above-mentioned master, a photoresist film is formed on the substrate. ] - To facilitate the adhesion of the film, the cleaned substrate is first inserted into a drying device that heats and vaporizes Freon liquid, but in that case, moisture and vapor adhering to the glass surface are removed. The moisture contained therein adheres to the glass surface and causes hydrolysis. For this purpose, the substrate is inserted into an adhesive tank in which the adhesive has been evaporated, and after passing through two steps of surface modification treatment to form an adhesive layer on this surface, a photoresist film forming step is performed. During these two steps, dust or the like may adhere to the substrate surface or defects may occur, resulting in lower productivity and higher costs.
（問題点を解決するための手段）
本発明は上記従来の欠点に鑑みてなされたものであり、
研磨された基板上にフォト・レジスト膜を形成するに際
し、この基板を、アルコールと表面改質剤として機能す
る接着剤とを混合した溶剤層に挿入することにより、上
記基板の乾燥と表面改質とを同時に行なうようにしたこ
とを特徴とする表面改質方法を提供するものである。(Means for solving the problems) The present invention has been made in view of the above-mentioned conventional drawbacks,
When forming a photoresist film on a polished substrate, the substrate is dried and surface modified by inserting the substrate into a solvent layer containing a mixture of alcohol and an adhesive that functions as a surface modifier. The present invention provides a surface modification method characterized in that the following steps are carried out simultaneously.
（実 施 例）
例えばビデオディスクなどの情報記録円盤を製造するた
めの情報記録再生用原盤の製造工程において、先ず光学
的に研磨され、洗浄されたガラス基板などの基板を用意
する。そして、この基板を、約４５°Ｃで蒸発気化する
乾燥用のアルコール（商品名：ダイフＯンソルベルトＳ
−３、ダイキン工業（株））の接着剤としてヘキサメチ
ルジシラザン （（Ｃｌ−１＊） ３５ｉＮＨ８ｉ
（ＣＩ」 ＊） ３ ：８度９９％、沸点１２０
°Ｃ）約６０ｃｃとを混合したものをヒータにて４０〜
４５°Ｃにて加熱蒸発させた乾燥・改質処理槽内に挿入
して表面の改質処理を行なう。(Embodiment) In the process of manufacturing an information recording/reproducing master disc for manufacturing an information recording disc such as a video disc, for example, an optically polished and cleaned substrate such as a glass substrate is first prepared. Then, drying alcohol (product name: Daif-O Solbert S) is applied to this substrate by evaporating it at about 45°C.
-3, Hexamethyldisilazane ((Cl-1*) 35iNH8i) as an adhesive manufactured by Daikin Industries, Ltd.
(CI” *) 3: 8 degrees 99%, boiling point 120
°C) approx. 60cc and heated to 40~
The surface is modified by inserting it into a drying/modifying treatment tank heated and evaporated at 45°C.
この際、槽上部の出口は、アルコールおよび改質剤が飛
散しないように冷却する。At this time, the outlet at the top of the tank is cooled to prevent the alcohol and modifier from scattering.
これにより、基板は乾燥と同時に接着剤層が形成された
改質処理がなされるため、この基板上に信号を記録する
ためのフォト・レジストなどの疎水性感光剤をスピンナ
ー法などによって塗布することにより、基板表面で加水
分解を起したＯＨＭと接着剤が反応して、フォト・レジ
スト膜の付着力を強固にする。As a result, the substrate undergoes a modification process in which an adhesive layer is formed at the same time as it dries, and a hydrophobic photosensitive agent such as photoresist for recording signals is applied onto this substrate using a spinner method. As a result, the OHM hydrolyzed on the substrate surface reacts with the adhesive, thereby strengthening the adhesion of the photoresist film.
ここで、従来の如く基板を乾燥し、さらに改質処理を行
なう２工程を経た改質方法と、本発明の如く乾燥と同時
に改質を行なう改質方法を液滴法によって接着層の接触
角を比較してみると、従来の方法による乾燥工程終了後
の接触角はθ−１０〜１３°となり、
これに対して、
本発明方法の如く乾燥と改質処理とを同時に行なった場
合の接触角はθ−２０〜２５°となって、表面改質の効
果が見られた。Here, the contact angle of the adhesive layer is determined by a droplet method using a two-step modification method in which the substrate is dried and then further modified as in the past, and a modification method in which modification is performed simultaneously with drying as in the present invention. When compared, the contact angle after the completion of the drying process according to the conventional method is θ-10 to 13°, whereas the contact angle when drying and modification treatment are performed simultaneously as in the method of the present invention is The angle was θ-20 to 25°, and the effect of surface modification was observed.
このようにしてその表面が改質処理された後、フォト・
レジスト膜が形成された基板に従来の如く、所定の情報
信号を周波数変調したビームを照射し、しかる後これを
現像して選択的にレジスト膜を除去して所定のレジスト
膜を有するパターンを形成し、この所定のレジスト膜を
有するパターンをマスクとして基板をエツチングしたあ
とレジスト膜を除去することにより所定の信号が記録さ
れた情報記録再生用原盤をゴミなどが付着することなく
生産性良く、かつ廉価に製造することができる。After the surface has been modified in this way, the photo-
A substrate on which a resist film is formed is irradiated with a frequency-modulated beam of a predetermined information signal as in the past, and then developed to selectively remove the resist film to form a pattern having a predetermined resist film. Then, by etching the substrate using the pattern with this predetermined resist film as a mask and then removing the resist film, the master disc for information recording and reproducing on which the predetermined signal has been recorded can be produced with high productivity without dust or the like adhering to it. It can be manufactured at low cost.
（発明の効果）
以上の如く、本発明になる基板の表面改質方法によれば
、例えばビデオディスクなどの情報記録再生用原盤を製
造する際、基板にレジスト膜を形成する前工程として従
来性なわれていた乾燥および改質処理の２工程を一つの
工程で行なうことができるので、その工程内でゴミなど
が付着することなく生産性良くしかも廉価に情報記録再
生用原盤を製造し得るなどの特長がある。(Effects of the Invention) As described above, according to the method for surface modification of a substrate according to the present invention, when manufacturing a master disc for information recording and reproduction such as a video disc, the conventional method can be used as a pre-process for forming a resist film on a substrate. Since the conventional two steps of drying and reforming can be performed in one process, it is possible to manufacture master discs for information recording and playback with high productivity and at a low cost, without the adhesion of dust during the process. It has the following characteristics.
Claims (1)
し、この基板を、アルコールと表面改質剤として機能す
る接着剤とを混合した溶剤層に挿入することにより、上
記基板の乾燥と表面改質とを同時に行なうようにしたこ
とを特徴とする表面改質方法。When forming a photoresist film on a polished substrate, the substrate is dried and surface modified by inserting the substrate into a solvent layer containing a mixture of alcohol and an adhesive that functions as a surface modifier. A surface modification method characterized in that the above steps are carried out at the same time.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61030182A JPS62188043A (en) | 1986-02-14 | 1986-02-14 | Method for reforming substrate surface |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61030182A JPS62188043A (en) | 1986-02-14 | 1986-02-14 | Method for reforming substrate surface |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62188043A true JPS62188043A (en) | 1987-08-17 |
Family
ID=12296617
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61030182A Pending JPS62188043A (en) | 1986-02-14 | 1986-02-14 | Method for reforming substrate surface |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62188043A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5002813A (en) * | 1988-08-01 | 1991-03-26 | Sharp Kabushiki Kaisha | Substrate with protective film and method of manufacturing optical memory device using the same |
-
1986
- 1986-02-14 JP JP61030182A patent/JPS62188043A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5002813A (en) * | 1988-08-01 | 1991-03-26 | Sharp Kabushiki Kaisha | Substrate with protective film and method of manufacturing optical memory device using the same |
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