JPS62298951A - Production of optical disk substrate - Google Patents
Production of optical disk substrateInfo
- Publication number
- JPS62298951A JPS62298951A JP14255286A JP14255286A JPS62298951A JP S62298951 A JPS62298951 A JP S62298951A JP 14255286 A JP14255286 A JP 14255286A JP 14255286 A JP14255286 A JP 14255286A JP S62298951 A JPS62298951 A JP S62298951A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- substrate
- transfer
- transferred
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 29
- 230000003287 optical effect Effects 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000011347 resin Substances 0.000 claims abstract description 37
- 229920005989 resin Polymers 0.000 claims abstract description 37
- 238000006243 chemical reaction Methods 0.000 claims abstract description 14
- 238000004140 cleaning Methods 0.000 claims abstract description 5
- 238000000016 photochemical curing Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000003960 organic solvent Substances 0.000 claims description 2
- 238000003892 spreading Methods 0.000 claims description 2
- 239000002904 solvent Substances 0.000 abstract description 8
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 abstract description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 abstract description 4
- 150000002576 ketones Chemical class 0.000 abstract description 4
- 239000012153 distilled water Substances 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 15
- 239000010408 film Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910001004 magnetic alloy Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910001313 Cobalt-iron alloy Inorganic materials 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- FOPBMNGISYSNED-UHFFFAOYSA-N [Fe].[Co].[Tb] Chemical compound [Fe].[Co].[Tb] FOPBMNGISYSNED-UHFFFAOYSA-N 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000002294 plasma sputter deposition Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
3、発明の詳細な説明
〔概要〕
光情報の記録・再生に使用される光ディスク基板の製造
において、スタンバ原盤をなす金型パターン情報を光硬
化反応樹脂層にスタンプするトラック案や溝の転写面に
おける残存する未反応の光硬化樹脂を除去することによ
って光磁気記録媒体の品質(キャリア対ノイズ比)を同
上する。[Detailed Description of the Invention] 3. Detailed Description of the Invention [Summary] In the production of an optical disk substrate used for recording and reproducing optical information, mold pattern information forming a standby master is stamped on a photocuring reaction resin layer. The quality (carrier-to-noise ratio) of the magneto-optical recording medium is improved by removing the remaining unreacted photocuring resin on the transfer surface of the track plan or groove.
本発明は光記録または光磁気記録媒体を具備する光ディ
スク基板の製造方法に関する。The present invention relates to a method of manufacturing an optical disk substrate provided with an optical recording or magneto-optical recording medium.
レーザ光を用いて高密度の情報記録を行なう基板は、記
憶容量が大きく、また光または光磁気ヘッドと非接触で
情報の記録もしくは記録情報の再生を行ない得る光ディ
スクメモリとして実用化されている。Substrates that record high-density information using laser light have a large storage capacity, and have been put into practical use as optical disk memories that can record information or reproduce recorded information without contacting an optical or magneto-optical head.
このような光情報の記録に用いる基板は、袈造初朋にお
いて、光ディスクの光磁気へノドに対しトランク位置を
検出しかつ制?IIIするに不可欠とされる微細凹凸の
トラック案内溝やアドレス悄)侵が。The substrate used to record such optical information was developed by Hatsutomo Kezo to detect and control the trunk position relative to the opto-magnetic nozzle of the optical disk. Track guide grooves with minute irregularities and address vibrations are considered essential for the purpose of 3D.
光硬化樹脂層を介して金型パターンからスタンプ転写し
て形成される。It is formed by stamp transfer from a mold pattern via a photocurable resin layer.
前記スタンプ転写された樹脂転写面は、続いてその全面
に光磁気記録媒体膜をスバ・7タ法によって成膜するが
1本発明は前記光磁気記録媒体の成膜前における下地樹
脂層を有機溶媒で清浄化することである。Subsequently, a magneto-optical recording medium film is formed on the entire surface of the stamp-transferred resin transfer surface by the Svata method. cleaning with a solvent.
第1図は光ディスク基板の完成体断面図、また第2図は
金型パターン情報を転写する基本的構成図(断面図)で
ある。FIG. 1 is a cross-sectional view of a completed optical disc substrate, and FIG. 2 is a basic configuration diagram (cross-sectional view) for transferring mold pattern information.
図中、10は金型または転写金型、該転写金型10は軸
心部を突出させた担体円盤16及び該円盤16の面に接
着された金型パターン情報部17からなる。In the figure, reference numeral 10 denotes a mold or a transfer mold, and the transfer mold 10 consists of a carrier disk 16 with a protruding axial center portion and a mold pattern information part 17 adhered to the surface of the disk 16.
11は光硬化反応樹脂の展着層を介して載置された前記
パターン情報部17を転写する基板、また13は予めパ
ターン情報部17上に展着された光硬化反応樹脂例えば
アクリル系樹脂である。Reference numeral 11 denotes a substrate on which the pattern information section 17 is transferred, which is placed through a spreading layer of photocuring reaction resin, and 13 is a photocuring reaction resin, such as an acrylic resin, which is spread on the pattern information section 17 in advance. be.
金型パターン情報部17は、ニッケル(Ni)電鋳膜か
らなりその表面は写真蝕刻技法を用いて同心円状あるい
はスパイラル状のトラック案内溝12が刻入されている
。The mold pattern information section 17 is made of a nickel (Ni) electroformed film, and a concentric or spiral track guide groove 12 is engraved on its surface using photolithography.
但し、ニッケル電鋳膜の案内溝12の表面は、転写後に
おける光硬化反応熟成になる転写樹脂層13の金型10
との型離れ(離型性)をよくするためのプラズマスパッ
タ法による酸化処理、もしくは厚さ約0.01μm程度
のポリエチレンフィルムによるコーティング処理がしで
ある。However, the surface of the guide groove 12 of the nickel electroformed film is the mold 10 of the transfer resin layer 13 that undergoes photocuring reaction aging after transfer.
In order to improve release from the mold (mold releasability), oxidation treatment by plasma sputtering or coating treatment with a polyethylene film having a thickness of about 0.01 μm is performed.
パターン転写に当たり、金型10に対して心出しがされ
た基板11は、スタンバ装置の図示されない加圧機構に
よって金型側へ圧接した状態とされ。During pattern transfer, the substrate 11 centered with respect to the mold 10 is brought into pressure contact with the mold by a pressure mechanism (not shown) of a standby device.
また基板11背面に配置する紫外線照射j!A14によ
って光硬化反応樹脂層13を硬化させる。樹脂層13の
硬化熟成をまって基板11を金型10から剥離すれば。Also, ultraviolet rays are placed on the back of the board 11! The photocuring reaction resin layer 13 is cured by A14. After the resin layer 13 is cured and matured, the substrate 11 is peeled off from the mold 10.
第1図に示す如き樹脂転写層15を有する光ディスク基
板21が出来る。An optical disk substrate 21 having a resin transfer layer 15 as shown in FIG. 1 is produced.
これに続いて、前記剥離された樹脂転写層15を有する
基板21の全面にわたりテルビウム・コバルト・鉄合金
からなる磁性合金膜を被着することで光情報の記録媒体
膜が形成される。Subsequently, a magnetic alloy film made of a terbium-cobalt-iron alloy is deposited over the entire surface of the substrate 21 having the peeled resin transfer layer 15, thereby forming an optical information recording medium film.
光硬化反応樹脂2例えばエポキシ系樹脂を展着した金型
パターン情(Uの樹脂転写N15は、紫外線照射によっ
て樹脂の硬化反応が完了していれば問題はない。There is no problem with the mold pattern information (resin transfer N15 of U) on which the photocuring reaction resin 2, for example, an epoxy resin is spread, as long as the curing reaction of the resin is completed by ultraviolet irradiation.
然し本発明者らの検討結果によれば、記録媒体下地層の
樹脂転写層15を例えば赤外吸収スペク[・ル分析法で
検査したところ、未硬化樹脂成分が残存すること、これ
による転写面の汚染が明らかにされ係る状態で爾後の磁
性合金膜を被着することは問題がある。However, according to the study results of the present inventors, when the resin transfer layer 15 of the recording medium base layer was inspected by, for example, infrared absorption spectrometry, it was found that uncured resin components remained, and the transfer surface due to this remained. Deposition of a subsequent magnetic alloy film under such conditions is problematic.
C問題点を解決するための手段〕
光硬化反応樹脂の圧接展着層に光照射して、金型パター
ン情報を光ディスク基板(以下、基板とも云う)にスタ
ンプするトランク案内溝の転写後。Means for Solving Problem C] After the trunk guide groove is transferred, the mold pattern information is stamped onto the optical disk substrate (hereinafter also referred to as the substrate) by irradiating the pressure-adhesive layer of the photo-curing reaction resin with light.
該転写された光硬化反応樹脂の表面を加熱した有機溶媒
によって洗浄処理する本発明の光ディスク基板の製造方
法として前記問題点を解決したものである。The above-mentioned problems have been solved by the method of manufacturing an optical disc substrate of the present invention, in which the surface of the transferred photocuring reaction resin is cleaned with a heated organic solvent.
トランク案内溝等が転写されたパターン情ケuを溶かす
ことなく、転写面上に残存する未硬化樹脂成分を例えば
ケトン系有W溶媒(温度約60°C)で除去することに
よって、爾後の工程で成膜される光情報の記録媒体磁性
薄膜の品質が向上する。By removing the uncured resin component remaining on the transfer surface with, for example, a ketone-based W solvent (temperature of about 60°C) without dissolving the pattern information on which the trunk guide groove etc. have been transferred, subsequent steps can be carried out. The quality of the optical information recording medium magnetic thin film deposited in this manner is improved.
前記品質向上の尺度として2例えば磁性薄膜底H’JJ
tにおける録音品質のキャリア対ノイズ比によって見た
ところ、FM(Frequecy Moduratio
n)信号のCN比で6dBもよくなることから明白であ
る。As a measure of quality improvement, for example, magnetic thin film bottom H'JJ
As seen from the carrier-to-noise ratio of the recording quality at
n) It is obvious that the signal CN ratio is improved by 6 dB.
以下、案内溝等金型パターン情報をスタンプした樹脂転
写面の洗浄方法を説明する。Hereinafter, a method of cleaning the resin transfer surface stamped with mold pattern information such as guide grooves will be explained.
光硬化樹脂の硬化反応を応用した案内溝転写が完了した
基板は、スピンコータの回転テーブルに装着する。そし
て約30ORPMの回転状態として。The substrate, on which the guide groove has been transferred using the curing reaction of the photocurable resin, is mounted on the rotary table of the spin coater. And as a rotation state of about 30 ORPM.
これに約60°Cに加熱したケトン系溶媒5例えばメチ
ルエチルケトン、あるいはアセトン等の溶剤約Loom
lを3〜4回に分けて基板上に滴下して、前記案内溝
転写になる光硬化樹脂層表面に残存する未反応樹脂成分
を除去する。Add to this a ketone solvent 5 heated to about 60°C, such as methyl ethyl ketone, or acetone.
The unreacted resin component remaining on the surface of the photocured resin layer, which will become the guide groove transfer, is removed by dropping 3 to 4 times on the substrate.
前記未反応樹脂成分の除去後、蒸溜水による濯ぎを行い
1その後約10分間1回転テーブル上で乾燥を行なう。After removing the unreacted resin components, the product is rinsed with distilled water and then dried on a rotating table for about 10 minutes.
前記実施例の説明において使用するケトン系溶媒に替わ
って塩素系溶媒3例えばクロロホルム。A chlorinated solvent 3, such as chloroform, is used in place of the ketone solvent used in the description of the examples.
テトラヒドロフラン、塩化メチレン及び四塩化炭素を使
用するも構わない。Tetrahydrofuran, methylene chloride and carbon tetrachloride may also be used.
前記洗浄方法を採用した基板と、洗浄しない従来の同一
構成基板について、光情報の記録媒体磁性薄膜を形成し
これに0.5MHzの信号記録をした基板のそれぞれれ
のキャリア対ノイズ比(CN比)及びノイズレベル(N
L)を比較したところ本発明の基板: CN = 43
dB NL = −40dB従来の基板: CN
= 37dB NL = −36dBの如き光記録
媒体層の品質改善が確認された。The carrier-to-noise ratio (CN ratio) of a substrate using the above cleaning method and a conventional substrate with the same structure that is not cleaned, on which a magnetic thin film is formed as an optical information recording medium and a 0.5 MHz signal is recorded thereon. ) and noise level (N
When comparing L), the substrate of the present invention: CN = 43
dB NL = -40dB Conventional board: CN
= 37 dB NL = -36 dB quality improvement of the optical recording medium layer was confirmed.
以上の説明から明らかなように本発明の光ディスク基板
の製造方法によれば、金型パターン情報の転写樹脂層中
の未反応樹脂が除去されることによって光情報の記録媒
体層のCN比、及びノイズレベルが顕著に改善される。As is clear from the above description, according to the method for manufacturing an optical disk substrate of the present invention, by removing unreacted resin in the transfer resin layer of mold pattern information, the CN ratio of the optical information recording medium layer and Noise level is noticeably improved.
第1図は転写後の光ディスク基板断面図。
第2図は金型パターン情報を転写する基本的構成断面図
である。
図中、10は転写金型(金型)。
11はディスク基板。
及び15は樹脂転写層である。FIG. 1 is a sectional view of the optical disc substrate after transfer. FIG. 2 is a sectional view of the basic configuration for transferring mold pattern information. In the figure, 10 is a transfer mold (mold). 11 is a disk board. and 15 is a resin transfer layer.
Claims (1)
ーン情報を光ディスク基板にスタンプするトラック案内
溝の転写後、該転写された光ディスク基板の光硬化反応
樹脂の表面を加熱した有機溶媒によって洗浄処理するこ
とを特徴とする光ディスク基板の製造方法。After the track guide grooves for stamping the mold pattern information on the optical disc substrate are transferred by irradiating the pressure spreading layer of the photocuring reaction resin with light, an organic solvent is heated on the surface of the photocuring reaction resin of the transferred optical disk substrate. 1. A method of manufacturing an optical disk substrate, the method comprising cleaning the optical disk substrate by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14255286A JPS62298951A (en) | 1986-06-18 | 1986-06-18 | Production of optical disk substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14255286A JPS62298951A (en) | 1986-06-18 | 1986-06-18 | Production of optical disk substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62298951A true JPS62298951A (en) | 1987-12-26 |
Family
ID=15317999
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14255286A Pending JPS62298951A (en) | 1986-06-18 | 1986-06-18 | Production of optical disk substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62298951A (en) |
-
1986
- 1986-06-18 JP JP14255286A patent/JPS62298951A/en active Pending
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