JPS62293535A - Surface processing method for copied master - Google Patents

Surface processing method for copied master

Info

Publication number
JPS62293535A
JPS62293535A JP13749286A JP13749286A JPS62293535A JP S62293535 A JPS62293535 A JP S62293535A JP 13749286 A JP13749286 A JP 13749286A JP 13749286 A JP13749286 A JP 13749286A JP S62293535 A JPS62293535 A JP S62293535A
Authority
JP
Japan
Prior art keywords
matrix
master mold
pattern information
pattern
polyethylene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13749286A
Other languages
Japanese (ja)
Inventor
Mitsuru Hamada
浜田 満
Shuichi Hashimoto
修一 橋本
Mineo Moribe
峰生 守部
Fuminori Imamura
今村 文則
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13749286A priority Critical patent/JPS62293535A/en
Publication of JPS62293535A publication Critical patent/JPS62293535A/en
Pending legal-status Critical Current

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  • Manufacturing Optical Record Carriers (AREA)

Abstract

PURPOSE:To improve the mass productivity and pattern transfer performance by coating a high polymer resin film to an electronic plating face of a master mold transferring pattern information so as to improve the removal of the transferred light curing resin pattern from the master. CONSTITUTION:A transfer master mold 10 comprising a medium disc 16 whose axial center is projected and a pattern information section 17 engraved by concentric track guide grooves 12 is heated to 45-50 deg.C, a solvent of 0.1% concentration made by solving a chip polyethylene resin into a xylene solution whose temperature is 45 deg.C or over is dropped onto the electric plating film of the guide groove 12, the master mold 10 is driven at 3,000rpm to apply spin coating. A disk base 11 aligned to the master mold 10 is pressed, the expanded acrylic group resin layer 13 of the information section 17 is cured by the ultraviolet ray radiationlight source 14 at the rear side, the result is subject to heat treatment and drying for 15min under a nitrogen atmosphere at 200 deg.C to form a polyethylene film whose thickness is 0.01mum or the like, then the base 11 is removed, and since the polyethylene has the adhesive force to the acryl, the excellent removal performance is obtained.

Description

【発明の詳細な説明】 3、発明の詳細な説明 [概要] 光情報の記録・再生に使用される光ディスク基板の製造
に係り、スタンプ方式による母型パターン情報を光硬化
反応樹脂層に転写する工程において、転写母型の表面に
高分子樹脂の被膜をコートすることで該母型の剥離性を
よくして、量産性ならびにパターン転写性を向上する。
[Detailed Description of the Invention] 3. Detailed Description of the Invention [Summary] In the production of an optical disc substrate used for recording and reproducing optical information, matrix pattern information is transferred to a photocuring reaction resin layer using a stamping method. In the process, the surface of the transfer matrix is coated with a polymer resin film to improve the releasability of the matrix, thereby improving mass productivity and pattern transferability.

〔産業上の利用分野〕[Industrial application field]

本発明は光ディスク基板の製造に用いる複製母型の表面
処理方法に関する。
The present invention relates to a method for surface treatment of a replication master mold used in manufacturing optical disk substrates.

レーザ光を用いて高密度の情報記録を行なう光ディスク
は、記憶容量が大きく、また光または光磁気ヘッドと非
接触で情報の記録もしくは記録情報の再生を行ない得る
光ディスクメモリとして実用化されている。
Optical disks that record high-density information using laser light have a large storage capacity, and have been put into practical use as optical disk memories that can record information or reproduce recorded information without contact with an optical or magneto-optical head.

このような光情報の記録に用いる基板は、製造初期にお
いて、光ディスクの光磁気ヘッドに対しトラック位置を
検出しかつ制御するに不可欠とされる微細凹凸の母型パ
ターン情報(トランク案内溝やアドレス情報)が光硬化
樹脂層へスタンプ転写して形成される。
In the early stages of manufacturing, the substrate used to record such optical information contains matrix pattern information (trunk guide grooves and address information) of fine irregularities that are essential for detecting and controlling the track position for the magneto-optical head of the optical disk. ) is formed by stamp transfer onto the photocurable resin layer.

スタンプ転写のパターン情報転写面は、続いてその全面
に光磁気記録媒体が成膜される。本発明は母型パターン
情報を光硬化反応樹脂層へ転写する工程において、転写
された光硬化樹脂パターンの母型剥離をよくすることに
よって量産性ならびにパターン転写性を向上するもので
ある。
Subsequently, a magneto-optical recording medium is deposited on the entire surface of the pattern information transfer surface of the stamp transfer. The present invention improves mass productivity and pattern transferability by improving the separation of the transferred photocurable resin pattern from the matrix in the step of transferring the matrix pattern information to the photocurable reactive resin layer.

〔従来の技術〕[Conventional technology]

第1図は転写後の光ディスク基板の断面図、また第2図
は母型パターン情報を転写する基本的構成図(断面図)
である。
Figure 1 is a cross-sectional view of the optical disc substrate after transfer, and Figure 2 is a basic configuration diagram (cross-sectional view) for transferring matrix pattern information.
It is.

図において母型または転写母型10は、その軸心部を突
出させた担体円盤16.及び、同心円状あるいはスパイ
ラル状のトラック案内溝12が刻入された母型パターン
情報部17からなる。転写母型1oのが載置される。
In the figure, the mother mold or transfer mother mold 10 has a carrier disk 16 with its axial center protruding. It also includes a matrix pattern information section 17 in which concentric or spiral track guide grooves 12 are engraved. A transfer matrix 1o is placed.

母型パターン情報部エフのトラック案内溝12は。The track guide groove 12 of the matrix pattern information section F is as follows.

写真蝕刻技法によって形成されたニッケル(Ni)電鋳
膜である。
This is a nickel (Ni) electroformed film formed by photolithography.

て砕前樹脂層13を硬化させ、その硬化熟成をま9て基
板11を金型10から剥離すれば、第1図に示す如きパ
ターン転写樹脂層15を有する光ディスク基有スる基板
21の全面にわたりテルビウム・コバルト・鉄合金から
なる磁性合金膜を被着することで光情報の記録媒体膜が
形成される。
By curing the pre-crushed resin layer 13 and peeling the substrate 11 from the mold 10 after curing and aging, the entire surface of the substrate 21 containing the optical disc base having the pattern transfer resin layer 15 as shown in FIG. An optical information recording medium film is formed by depositing a magnetic alloy film made of a terbium-cobalt-iron alloy.

15の母型10との型離れ(離型性)をよくするため。In order to improve the mold separation (mold releasability) of 15 from the matrix 10.

プラズマスパッタ法による酸化処理がされていた。Oxidation treatment was performed using plasma sputtering.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

との剥離性をよくするための前記プラズマ酸化処理は、
離型性が優れず、このため意図するトラック案内溝12
が転写されず問題がある。
The plasma oxidation treatment for improving releasability with
The mold releasability is not excellent, and therefore the intended track guide groove 12
There is a problem that the image is not transcribed.

〔問題点を解決するための手段〕[Means for solving problems]

母型に圧接された展着樹脂層に光照射して、展着樹脂層
の硬化反応によって母型パターン情報を転写する光ディ
スク基板の製造において。
In the production of an optical disk substrate, in which a spreading resin layer pressed against a matrix is irradiated with light and matrix pattern information is transferred by a curing reaction of the spreading resin layer.

パターン情報を転写する前記母型の電鋳膜面に例えばポ
リエチレン樹脂の被膜をコートする本発明の複製母型の
表面処理方法として前記問題点を解決したものである。
The above-mentioned problems have been solved by the surface treatment method for a replicating matrix of the present invention, in which the electroformed film surface of the matrix onto which pattern information is transferred is coated with a film of, for example, polyethylene resin.

〔作用〕[Effect]

本発明の表面処理は、高分子樹脂の例えばポリエチレン
樹脂は他の樹脂に対して接着力を示さない性質があるこ
とを利用し、これを母型パターン情報の転写面に応用す
ることにより光硬化反応の展着樹脂層に対する剥離性を
よくするものである。
The surface treatment of the present invention takes advantage of the fact that polymer resins, such as polyethylene resin, do not exhibit adhesive strength to other resins, and by applying this to the transfer surface of the matrix pattern information, photocuring is possible. This improves the releasability of the reaction spreading resin layer.

前記ポリエチレン樹脂のコート処理は従来のプラズマス
パッタ法による母型表面の酸化処理に比べて極めて簡易
な手段でされる特長がある。
The coating treatment with the polyethylene resin has the advantage that it can be performed by an extremely simple means compared to the conventional oxidation treatment of the surface of the matrix by plasma sputtering.

〔実施例〕〔Example〕

ポリエチレン樹脂は、室温では一般の溶剤には溶解し難
いため、溶解可能な温度に加熱される。
Since polyethylene resin is difficult to dissolve in common solvents at room temperature, it is heated to a temperature at which it can be dissolved.

また樹脂を溶解する溶剤として例えばキシレン溶液を、
少なくとも45℃以上に加熱して用いる。
In addition, as a solvent for dissolving the resin, for example, xylene solution,
Use by heating to at least 45°C or higher.

即ち、転写母型の電鋳膜面にコートするポリエチレン溶
液の作製は、45°C以上に加熱したキシレン溶液にチ
ップ状のポリエチレン樹脂を入れて4度0.1%の溶液
を先ず作製する。
That is, to prepare a polyethylene solution to be coated on the electroformed film surface of the transfer matrix, first, a chip-shaped polyethylene resin is added to a xylene solution heated to 45° C. or higher to prepare a 0.1% solution at 4°C.

次いで、転写母型を45〜50“Cの温度に加熱した状
態として母型パターン情報形成の電鋳膜面に対し前記濃
度の溶液を滴下してスピンコードする。
Next, the transfer matrix is heated to a temperature of 45 to 50"C, and a solution having the above concentration is dropped onto the surface of the electroformed film on which the pattern information of the matrix is formed to perform spin coding.

スピンコード時の母型回転数は、 300PPM程度と
する。
The rotational speed of the matrix during spin code is approximately 300 PPM.

前記コートの母型の乾燥を例えば、200°Cの窒素雰
囲気で15分間、熱処理すれば、厚さ0.01μm程度
のポリエチレンフィルムが成膜される。
If the mother mold of the coat is dried by heat treatment in a nitrogen atmosphere at 200° C. for 15 minutes, a polyethylene film having a thickness of about 0.01 μm is formed.

前記高分子樹脂フィルムが成膜された転写母型を用い、
試行的に母型トラック案内溝パターンをスタンプ転写し
たところ、極めて離型性のよいかつまた転写パターンの
転写性能が優れていることが確認された。
Using a transfer matrix on which the polymer resin film is formed,
When the master track guide groove pattern was transferred by stamp on a trial basis, it was confirmed that the mold releasability was extremely good and the transfer performance of the transfer pattern was excellent.

〔発明の効果〕〔Effect of the invention〕

以上5本発明の複製母型の表面処理方法によれば、従来
のプラズマスパッタ法による母型表面の酸化処理に比べ
て極めて簡易な手段で離型性のよい、且つ量産性に適す
る複製母型の表面処理が可能となる。
According to the surface treatment method for a replica matrix of the present invention, the replication matrix can be produced by an extremely simple means, with good mold releasability, and which is suitable for mass production. surface treatment is possible.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は転写後の光ディスク基板断面図。 第2図は母型パターン情報を転写する基本的構成図であ
る。 図中、10は転写母型(母型)。 11はディスク基板。 12は案内溝(母型パターン情報)。 13は展着樹脂層、14は光源。
FIG. 1 is a sectional view of the optical disc substrate after transfer. FIG. 2 is a basic configuration diagram for transferring matrix pattern information. In the figure, 10 is a transfer matrix (matrix). 11 is a disk board. 12 is a guide groove (matrix pattern information). 13 is a spreading resin layer, and 14 is a light source.

Claims (1)

【特許請求の範囲】  母型に圧接された展着樹脂層に光照射して、展着樹脂
層の硬化反応によって母型パターン情報を転写する光デ
ィスク基板の製造において、 パターン情報を転写する前記母型の電鋳面に高分子樹脂
の被膜をコートすることを特徴とする複製母型の表面処
理方法。
[Scope of Claims] In the production of an optical disk substrate, in which a spreading resin layer pressed against a matrix is irradiated with light and matrix pattern information is transferred by a curing reaction of the spreading resin layer, the matrix onto which pattern information is transferred; A method for surface treatment of a replication master mold, characterized by coating the electroformed surface of the mold with a polymer resin film.
JP13749286A 1986-06-13 1986-06-13 Surface processing method for copied master Pending JPS62293535A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13749286A JPS62293535A (en) 1986-06-13 1986-06-13 Surface processing method for copied master

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13749286A JPS62293535A (en) 1986-06-13 1986-06-13 Surface processing method for copied master

Publications (1)

Publication Number Publication Date
JPS62293535A true JPS62293535A (en) 1987-12-21

Family

ID=15199916

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13749286A Pending JPS62293535A (en) 1986-06-13 1986-06-13 Surface processing method for copied master

Country Status (1)

Country Link
JP (1) JPS62293535A (en)

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