JPS6236756A - Grooved optical disk substrate and its production - Google Patents

Grooved optical disk substrate and its production

Info

Publication number
JPS6236756A
JPS6236756A JP60175156A JP17515685A JPS6236756A JP S6236756 A JPS6236756 A JP S6236756A JP 60175156 A JP60175156 A JP 60175156A JP 17515685 A JP17515685 A JP 17515685A JP S6236756 A JPS6236756 A JP S6236756A
Authority
JP
Japan
Prior art keywords
layer
substrate
photopolymer
stamper
optical disk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60175156A
Other languages
Japanese (ja)
Inventor
Akira Iwazawa
岩沢 晃
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP60175156A priority Critical patent/JPS6236756A/en
Publication of JPS6236756A publication Critical patent/JPS6236756A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a grooved optical disk substrate which satisfies groove transferability, substrate adhesiveness, stamper release property, thermal and physical characteristics of a film, etc. by providing the 1st layer having high adhesiveness on the substrate and providing the 2nd layer having a good stamper release property on said layer. CONSTITUTION:A layer of an epoxy photopolymer (1st layer) 23 is coated by a spinner on the polymethyl methacrylate (PMMA) substrate 21. A layer of a polyol acrylate photopolymer (2nd layer) 22 is formed on the PMMA substrate by using a 2P (photopolymer) automatic transfer device having a nickel stamper (groove stamper mold). The nickel stamper is superposed on the PMMA substrate having the laminated 2P film and is irradiated with an ultra-high pressure mercury lamp from the substrate 21 side. The substrate 21 is stripped from the stamper and the 2P transferred substrate (grooved optical disk substrate) is obtd. Not only epoxy, polyol acrylate and photopolymerizable siloxane but also many polymers including epoxy acrylate, polyester acrylate and urethane acrylate are used for the photopolymer.

Description

【発明の詳細な説明】 〔L業上の利用分野〕 本発明は、フォトポリマを用いた溝つき元ディスク基板
およびその製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of industrial application] The present invention relates to a grooved original disk substrate using a photopolymer and a method for manufacturing the same.

〔従来の技術〕[Conventional technology]

元ディスクでは、情報の書き込み、読み出し!正確にし
かも容易におこなうために、基板上にスパイラルもしく
は、同心円状の溝を形成し、これに沿って光ビームを制
御する。
Write and read information on the original disk! In order to do this accurately and easily, spiral or concentric grooves are formed on the substrate, and the light beam is controlled along these grooves.

従来、上記のような溝を基板上に形成する方法として1
例えば射出成形法や2F(フォトポリマ)形成法がある
Conventionally, as a method for forming the above-mentioned grooves on a substrate, 1
For example, there are injection molding method and 2F (photopolymer) forming method.

前者の方法は量産性に優れるため重要忰が高いが、ガラ
スや金属では1Mつぎ基板ができないこと、また、プラ
スチックでも基板材料や成形条件が限られる欠点があっ
た。
The former method is highly important because it is suitable for mass production, but it has the disadvantage that it is not possible to produce 1M substrates using glass or metal, and even when using plastics, the substrate material and molding conditions are limited.

一方、後者の方法は、液状のフォトポリマを基板と韓つ
ぎスタンパの間に流し込み、紫外線照射し、フォトポリ
マ?硬化させ、スタンパ1fltll!製し、スタンパ
を!#I離し、溝つぎ元ディスク基板を作製する方法で
ある。この方法は各種基板に適応でざるなど多くの長所
を持っている。
On the other hand, in the latter method, liquid photopolymer is poured between the substrate and the stamper, irradiated with ultraviolet rays, and then the photopolymer is removed. Let it harden and stamper 1fltll! Make a stamper! This is a method of separating #I and producing a groove patching source disk substrate. This method has many advantages such as being adaptable to various substrates.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかしながら、上記後者の方法において%第1図に示す
工うに基板1上にフォトポリマl112′ftI[接設
けただけでは基板lに対するフォトポリマ層2の密着力
が不十分なため転写作業中に7オトボリマIfa 2が
はがれてしまう欠点があった。一方、基板と密着性のよ
いフォトポリマを用いた場合には、基板上からはがれに
くくなるが、スタンパ剥離性も悪くなり、良好な転写基
板が得られない。
However, in the latter method, as shown in FIG. Otoborima Ifa 2 had the drawback of peeling off. On the other hand, if a photopolymer that has good adhesion to the substrate is used, it will be difficult to peel off from the substrate, but the stamper releasability will also be poor, making it impossible to obtain a good transfer substrate.

そこで、このような欠点を解消するために第2図に示す
工うに基板11上にプライマ層13’!’塗布し、この
上にフォトポリマ層12Y形成する方法が考えられてい
るうしD・し、プライマ層重3が一般にゴム状であるた
め熱膨張が大さく1元ディスク基板が熱衝撃的な環境に
おかれた時にフォトポリマN112のはがれ、クラック
生成などYfl’−なうという欠点があった。
Therefore, in order to eliminate such defects, a primer layer 13' is applied on the substrate 11 as shown in FIG. A method has been considered in which a photopolymer layer 12Y is formed on top of the photopolymer layer 12Y.However, since the primer layer 3 is generally rubber-like, thermal expansion is large and the single disk substrate is exposed to thermal shock environments. There were drawbacks such as peeling of the photopolymer N112 and generation of cracks when the photopolymer was exposed to Yfl'-.

本発明は上記の事情に鑑みてなされたもので。The present invention has been made in view of the above circumstances.

その目的は、基板密層性とスタンパ剥離性を同時に満足
し、しかも良好な溝転写性、記録再生特性7ft*する
溝つぎ光デイスク基板およびその製造方法を提供するこ
とにある。
The purpose is to provide a groove-stitched optical disk substrate that satisfies substrate density and stamper removability at the same time, and also has good groove transferability and recording/reproducing characteristics of 7ft*, and a method for manufacturing the same.

〔問題点を解決するための手段〕[Means for solving problems]

不発明の溝つき元ディスク基板は、従来、基板上に塗布
され、フォトポリマの下地rtityt形成していたプ
ライマ層に代えて、i&仮仮着層性優れ、11!化後は
優れた熱物理特性を示すフォトポリマを用い、このフォ
トポリマで第1層を形成した上にスタンバ剥離性のよい
フォトポリマで第2mY形ffしたものである。この場
合、第1層と@ 2 /1との間には1両層に対して親
和性の良好な中間層i「在させるのが望ましい。
The uninvented original grooved disk substrate replaces the primer layer that was conventionally coated on the substrate and formed the base layer of the photopolymer, and has excellent i&temporary adhesion properties.11! After conversion, a photopolymer exhibiting excellent thermophysical properties was used to form the first layer, and then a second mY type ff was formed using a photopolymer with good stand-bar releasability. In this case, it is desirable to provide an intermediate layer i' having good affinity for both layers between the first layer and @ 2 /1.

また、本発明の製造方法は、基板上にこれに対して密層
性の高いフォトポリマを塗布して第1層を形成した後、
第1層の上にスタンパM型性の良い7オトボリマを積層
して第2層を形成する工程と、この第2層の上に溝つき
スタンパを恵ねる工程とを行ない、さらに光学的に透明
7:e側から紫外梅を照射して両層を硬化させる方法で
ある。
Further, in the manufacturing method of the present invention, after forming a first layer by coating a photopolymer with high layer density on the substrate,
A second layer is formed by laminating 7 Otobolima with good stamper M-type properties on the first layer, and a step of forming a grooved stamper on this second layer is performed, and the process is further performed to make the stamper optically transparent. 7: This is a method of curing both layers by irradiating ultraviolet plum from the e side.

〔作用〕[Effect]

本発明の溝つぎ元ディスク基板および製造方法によれば
、フォトポリマ層の基板を層性およびスタンパ剥離性が
共に良好となり、さらに、溝転写性、熱物理特性等も向
上する。
According to the groove splicing source disk substrate and manufacturing method of the present invention, the photopolymer layer substrate has good layer properties and stamper removability, and furthermore, groove transferability, thermophysical properties, etc. are improved.

〔実施例〕〔Example〕

以下、実施例を示して、4:@明の作用効果を明確にす
る。
Examples are shown below to clarify the effects of 4:@Ming.

実施例1 厚さ1.2Hのポリメチルメタクリレート(以下PMM
Aと略丁)基板(日東樹脂製)2)上に第1図の如(エ
ポ千シ糸7オトポリマ(スリーボンド製3101)の層
(第1層)23を20μm厚さにスピンナ塗布した。こ
のPMMA基板上に、ニッケルスタンパ(溝つきスタン
パ金型つ付きの2PCフオトポリマン自動転写装置(松
下電器製)を用いて厚さ60μmのポリオールアクリレ
ート糸7オトボリマの層(第2層)22を形成した。こ
の積層2P@つ?tPMMAi[にニッケルスタンバを
重ねあわせ、基板2)mから超高圧水銀灯(オーク製作
新製、3kw)で30秒照射した。スタンパから基板2
)を剥離し、2P転写基板〔溝つぎ元ディスク基板〕を
得た。
Example 1 Polymethyl methacrylate (hereinafter referred to as PMM) with a thickness of 1.2H
As shown in Fig. 1, a layer (first layer) 23 of epoxy thread 7 otopolymer (3101 manufactured by Three Bond) was coated with a spinner to a thickness of 20 μm on a substrate (manufactured by Nitto Plastics Co., Ltd.) 2). On a PMMA substrate, a layer (second layer) 22 of polyol acrylate yarn 7 polymers having a thickness of 60 μm was formed using a nickel stamper (2PC photopolymer automatic transfer device (manufactured by Matsushita Electric) equipped with a grooved stamper mold). A nickel stamper was superimposed on this laminated 2P@tPMMAi[, and the substrate 2) was irradiated for 30 seconds with an ultra-high pressure mercury lamp (manufactured by Oak Manufacturing, 3kW).From the stamper to the substrate 2
) was peeled off to obtain a 2P transfer substrate (groove-joining source disk substrate).

この2P転写基板について、セロテープ試験より2P膜
の剥離を調べたが、剥離はみられなかった。
Regarding this 2P transfer substrate, peeling of the 2P film was examined by cellophane tape test, but no peeling was observed.

また、2P転寥基板の120”Cまでの梅り脹率を測定
したところ、7.5810−”C1でPMMA基板のそ
れと同等であった。さらに、溝転写性を走査型電子顕微
鏡により観察したところ、ニッケルスタンバの形状(溝
ピッチ1.6μm、溝mo、8μm、溝深さ700A)
を精度よく転ダしていた。
Further, when the plume expansion rate of the 2P transfer substrate up to 120''C was measured, it was 7.5810-''C1, which was equivalent to that of the PMMA substrate. Furthermore, when the groove transferability was observed using a scanning electron microscope, the shape of the nickel stubber (groove pitch 1.6 μm, groove mo 8 μm, groove depth 700A)
It was rolling with great precision.

この溝つぎ元ディスク基板上に記憶媒体として、テルル
を共蒸着した二硫化炭素プラズマ重合膜を厚さ300A
つけた。この元ディスク媒体をlsoorpmで回転し
ながら、半導体レーザーで記録したところ、5mwで記
録が口J能であった。また記録された元ディスク媒体を
3mwで再生したが媒体に何ら損湯な起こすことはなか
った。また、この元ディスク媒体について、室温と12
0°Cの温度サイクル試験をおこなったが200サイク
ル後も媒体のワレ、はがれなどはみられなかった。
As a storage medium, a carbon disulfide plasma polymerized film co-deposited with tellurium was deposited to a thickness of 300 Å on this groove-forming disk substrate.
Wearing. When this original disk medium was rotated at lsoorpm and recorded with a semiconductor laser, the recording was just as good at 5 mw. Furthermore, when the original disc medium on which the data was recorded was played back at 3 mW, no hot water loss occurred in the medium. Also, regarding this original disk medium, the room temperature and 12
A temperature cycle test at 0°C was conducted, but no cracking or peeling of the medium was observed even after 200 cycles.

比較例1 PMMA基板上に、実施例1と同様に、直りポリオール
アクリレート系フォトポリマ層を形成し、2P転写基板
を得た。セロテープ試験により2PPI4の剥離を調べ
たところ1傭格子パターンで丁べてはかれた、比較例2 PMMA基板上に、実施例1と同様に、lIkmエポ千
シ糸フォトポリマーを塗布し、ニッケルスタンパと該基
板を嵐ねあわせ、タンボブリント装置(日本文化精工製
〕によりプレスし、索外機硬化し、スタンパを剥離し、
転写基板を得た。転写基板を光学顕微属で観察したとこ
ろ、硬化したエボ千シアオドポリマの凝集破壊がみもれ
、剥離性が悪かった。
Comparative Example 1 A cured polyol acrylate photopolymer layer was formed on a PMMA substrate in the same manner as in Example 1 to obtain a 2P transfer substrate. Peeling of 2PPI4 was investigated by cellophane tape test and it was printed in a grid pattern. Comparative Example 2 On a PMMA substrate, lIkm epoxy thread photopolymer was applied in the same manner as in Example 1, and a nickel stamper was applied. The substrate was aligned, pressed using a tambo printing machine (manufactured by Nippon Bunka Seiko), hardened by an external machine, and the stamper was peeled off.
A transfer substrate was obtained. When the transfer substrate was observed under an optical microscope, cohesive failure of the cured EVO 1,000 cyanide polymer was observed and peelability was poor.

比較例3 PMMA基板上に、ポリエステル系プライマ(東洋紡製
、バイロン)を20μmDiさにf2!偵し、実IIa
例1と同様に2P(ポリオールアクリレート)転写基板
を得た。この基板の120 °C9での、線Im!脹率
を測定しにところ2×lO°Cであった。この溝つき基
板上に実施例1と同様にテルル・で共蒸着した二硫化炭
素プラズマ重合膜を記録媒体としてつけた。この元ディ
スク媒体について、室温と120°C0)@度すイクル
試験ysこなった。200サイクル後に媒体を観察した
ところ、プラズマ蔦合編の一部にワレがみられた。
Comparative Example 3 A polyester primer (manufactured by Toyobo Co., Ltd., Byron) was applied to a thickness of 20 μm at f2! on a PMMA substrate. Detective, Real IIa
A 2P (polyol acrylate) transfer substrate was obtained in the same manner as in Example 1. The line Im! of this substrate at 120 °C9! The swelling rate was measured at 2×10°C. On this grooved substrate, a carbon disulfide plasma polymerized film co-deposited with tellurium was applied as a recording medium in the same manner as in Example 1. This original disk medium was subjected to a cycle test at room temperature and 120° C0). When the medium was observed after 200 cycles, cracks were observed in a part of the plasma stitch.

実施例2 厚さ1.2朋のガラス基板上にエポキシ系フォトポリマ
の層(第1層]t20μn1厚さンこスピンナ塗布した
。一方、溝つきニッケルスタンパ上に接着剤ディスペン
サ(岩下エンジニアリング製ンでポリオールアクリレー
ト系フォトポリマのrfiI〔第2層〕を塗布し、エポ
キシ系フォトポリマの塗布されたガラス基板と中心を合
わせ、タンボブリント装置にエリ圧締、シ、ガラス基板
側から露光し。
Example 2 A layer of epoxy photopolymer (first layer) with a thickness of 20 μm was coated on a glass substrate with a thickness of 1.2 mm using a spinner.Meanwhile, an adhesive dispenser (manufactured by Iwashita Engineering Co., Ltd.) was applied onto a grooved nickel stamper. Apply RFII [second layer] of polyol acrylate photopolymer, align the center with the glass substrate coated with epoxy photopolymer, press the edges with a tanbo printing machine, and expose from the glass substrate side.

硬化させた。スタンパからはがした2P転写基板につい
てセロテープ試験により2pHgの剥IQを調べたが剥
離はみられなかった。
hardened. The 2P transfer substrate peeled off from the stamper was examined for peeling IQ at 2pHg by cellophane tape test, but no peeling was observed.

実施例3 実施例1と同様にエポキシ系7オトボリマの層(@ 1
71 )が塗布されたPMMA基板に2P自動転写装置
を用いて厚さ40μmの末瑞アクリロキシグロビル化ポ
リジメチルシロキサン(信越比学製ンからなる感光性シ
リコーン樹脂(光開始剤。
Example 3 Similar to Example 1, a layer of epoxy-based 7 otobolima (@ 1
A photosensitive silicone resin (photoinitiator) made of Suzui acryloxyglobylated polydimethylsiloxane (manufactured by Shin-Etsu Higaku Co., Ltd.) with a thickness of 40 μm was applied to a PMMA substrate coated with 71) using a 2P automatic transfer device.

ベンゾインイソプロピルエーテル3 IN (第271
 )を形成し、基板側から紫外線照射し、硬化し、スタ
ンパから基板?剥離し2P転写基板を得た。
Benzoin isopropyl ether 3 IN (No. 271
) is formed, irradiated with ultraviolet rays from the substrate side, cured, and removed from the stamper to the substrate? A 2P transfer substrate was obtained by peeling.

セロテープ試験によるはがれはみられなかった。No peeling was observed in the Sellotape test.

また溝転写性も良好であった。Furthermore, the groove transferability was also good.

この溝つき基板にテルルを共蒸漕した二硫化炭素プラズ
マ重合膜をつけた。1800rpmで回転しながら、半
導体レーザで記録したところ4mwで記録が可能であっ
た。実施例1のポリオールアクリレート系フォトポリマ
ーりも高感度であったのは、プラズマ重合膜の融解蒸発
にフォトポリマーの表面エネルギ(ぬれ性)の低いこと
が作用したと考えられる。
A carbon disulfide plasma polymerized film coated with tellurium was attached to this grooved substrate. When recording was performed using a semiconductor laser while rotating at 1800 rpm, recording was possible at 4 mw. The reason why the polyol acrylate photopolymer of Example 1 also had high sensitivity is thought to be due to the low surface energy (wettability) of the photopolymer acting on the melting and evaporation of the plasma polymerized film.

実施例4 実施ガニと同様に(第2図参照)PMMA基仮3基土3
1上キシ系フォトポリマのjfi CM 1層】33を
*歪し、さらにボリエテレングリーールジアクリレート
からなるjfti (中間m)34をlOμm皇伯し1
この基板に2P自動転写装置にエリメタクリル蹴ヘプタ
フルオロブチルモノマY2Ll含むポリオールアクリレ
ート膜(@2Ni332を30μn1ffj層し、ニッ
ケルスタンパに嵐ねて超高圧水銀灯で40秒照射し、積
層2p基板(溝つき光ディスク基板]?:得た。これに
実施ガニと同僚の記録膜tつばて、記録したところ、半
導体レーザを用いて五aoorpmで4mwでgcEf
iが0]能であった。また、温度60°C9湿1190
チ下で20日装いたが、媒体にはがれやワレはみられな
O為った。
Example 4 Similar to the practical example (see Figure 2), 3 temporary PMMA bases 3
1. The jfi CM 1 layer of xy-based photopolymer 33 was strained, and the jfti (middle m) 34 made of borietherene glycol diacrylate was further reduced to 10 μm.
This substrate was coated with a 30μn 1ffj layer of polyol acrylate film (@2Ni332) containing methacrylic heptafluorobutyl monomer Y2Ll in a 2P automatic transfer device, and irradiated with an ultra-high pressure mercury lamp for 40 seconds on a nickel stamper. [Substrate]?: Obtained. When recording was performed on this with the recording film of Gani and colleagues, gcEf was recorded at 4 mW at 5 aoorpm using a semiconductor laser.
i was 0]. In addition, the temperature is 60°C, the humidity is 1190°C,
I wore it under the sun for 20 days, but the media showed no peeling or cracking.

なお、上記芙IM例では中間層34を設ける場合罠、第
1膚、中間層、第2層の順で積層し、第2)−の上にス
タンバt1にねたが、これに限るものではなく1例えば
i板に第1鳩と中間+fiを積層しておI!:sこれに
、@2層?積層したスタンバを重ね合わせてもよい。あ
るいは、基板に第1層だけY:m層しておき、これに第
2層と中間層とを積層したスタンバラ東ね合わせてもよ
い。
In addition, in the above IM example, when providing the intermediate layer 34, the trap, the first layer, the intermediate layer, and the second layer are laminated in this order, and the standby layer t1 is placed on top of the second layer 34, but the present invention is not limited to this. Instead of 1, for example, stack the first pigeon and intermediate + fi on the i board! :s @2 layers for this? Laminated stand bars may be stacked on top of each other. Alternatively, only the first layer (Y:m) may be formed on the substrate, and the second layer and the intermediate layer may be laminated thereon and then stacked together.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明の溝つぎ光デイスク基板は
、基板上に、これに対して密着性の高い第1層を設け、
この@1層の上にスタンバ離型性4゜の良い第2f曽を
設けたので、この構造に依存する感度がみられ1元記録
媒体(特に穴あき]の高感度化が期待できる。すなわち
、高感度の記録再生特性?Mする。これらに使えるフォ
トポリマは、エポキシ系、ポリオールアクリレート系光
1合性シロキサン系にかぎらず、エポキシアクリレート
As explained above, the grooved optical disk substrate of the present invention includes a first layer having high adhesion on the substrate, and
Since the 2nd f layer with a good standby mold release property of 4° is provided on this @1 layer, the sensitivity depends on this structure, and it is expected that the sensitivity of the single-source recording medium (especially with holes) will be increased. , high-sensitivity recording and reproducing characteristics?M. Photopolymers that can be used for these are not limited to epoxy, polyol acrylate, photo-monotropic siloxane, and epoxy acrylate.

ポリエステルアクリレート、ウレタンアクリレートなど
多(のものがあげられ、これらを組合わせることに工り
檀々の基板、媒体に適合した溝つき元ディスクが得られ
る。
There are many types such as polyester acrylate and urethane acrylate, and by combining them, a grooved original disk suitable for various substrates and media can be obtained.

f7S:、本発明の製造方法によれば、基板に対して密
着性の高いフォトポリマで第1層を形成した後、この上
にスタンパ離型性の良いフォトポリマで第27#/z形
成する工程と、この第2層の上に溝つきスタンバtJj
Lねる工種とを行ない、さらに。
f7S: According to the manufacturing method of the present invention, after forming the first layer with a photopolymer having high adhesion to the substrate, a 27th #/z layer is formed on this with a photopolymer having good stamper releasability. process and grooved stand bar tJj on top of this second layer.
We carry out various types of work, and furthermore.

光学的に透明な側から紫外線を照射して第1層。The first layer is irradiated with ultraviolet light from the optically transparent side.

第2層乞硬化させるので1m転写注、基板密着性。Since the second layer is hardened, it is possible to transfer 1m and adhere to the substrate.

スタンパ趨型t!、%楓の熱物理符注等を同時に満足す
る14つぎ元ディスク基板?得ることができる。
Stamper trend type T! , 14-piece original disk board that simultaneously satisfies Kaede's thermophysical notes, etc.? Obtainable.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本比病の夾厖丙馨示す概略断面図、第2図は同
じく他の実施例?示す概略Wr南図、第3図にシび第4
図は、従来の元ディスク基板の概略断面図である。 2).31°・・基板、23.33・・・第1層(フォ
トボ+)−rr@)、22t32・・・第2層(フォト
ポリマ鳩ン、34・・・中間層。 22:第2層 31: 基j阪 32:  第2層
Figure 1 is a schematic cross-sectional view showing the symptoms of this disease, and Figure 2 is another example. Schematic Wr south map shown, Figure 3 and No. 4
The figure is a schematic cross-sectional view of a conventional original disk substrate. 2). 31°...Substrate, 23.33...First layer (photobo+)-rr@), 22t32...Second layer (photopolymer layer, 34...Intermediate layer. 22: Second layer 31 : Base 32: 2nd layer

Claims (3)

【特許請求の範囲】[Claims] (1)基板上にフォトポリマ層を積層し、このフォトポ
リマ層に溝つきスタンパ金型を用いて溝を形成してなる
光ディスク基板において、 前記フォトポリマ層は、基板に直接積層されるとともに
基板に対して密着性の高い第1層と、この第1層の上に
積層されるとともにスタンパ離型性の良い第2層とから
なることを特徴とする溝つき光ディスク基板。
(1) In an optical disk substrate in which a photopolymer layer is laminated on a substrate and grooves are formed in this photopolymer layer using a grooved stamper mold, the photopolymer layer is laminated directly on the substrate and 1. A grooved optical disk substrate comprising: a first layer having high adhesiveness to the substrate; and a second layer laminated on the first layer and having good stamper releasability.
(2)前記第2層は、前記第1層および第2層に対し親
和性の良好な中間層を介して第1層の上に積層されてい
ることを特徴とする特許請求の範囲第1項記載の溝つき
光ディスク基板。
(2) The second layer is laminated on the first layer via an intermediate layer having good affinity for the first layer and the second layer. Grooved optical disk substrate as described in Section 1.
(3)基板上のフォトポリマ層に溝が形成されてなる光
ディスク基板を製造する方法において、前記基板上にこ
の基板と密着性の高いフォトポリマを塗布して第1層を
形成し、次いで、第1層の上に、スタンパ離型性の良い
フォトポリマを積層して第2層を形成する工程と、第2
層の上に溝つきスタンパを重ねる工程とを行ない、しか
る後に、光学的に透明な基板側から紫外線を照射してフ
ォトポリマ層を硬化させることを特徴とする溝つき光デ
イスク基板の製造方法。
(3) In a method for manufacturing an optical disk substrate in which grooves are formed in a photopolymer layer on a substrate, a photopolymer having high adhesion to the substrate is coated on the substrate to form a first layer, and then, a step of laminating a photopolymer with good stamper releasability on the first layer to form a second layer;
A method for producing a grooved optical disk substrate, comprising the steps of stacking a grooved stamper on the layer, and then curing the photopolymer layer by irradiating ultraviolet rays from the optically transparent substrate side.
JP60175156A 1985-08-09 1985-08-09 Grooved optical disk substrate and its production Pending JPS6236756A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60175156A JPS6236756A (en) 1985-08-09 1985-08-09 Grooved optical disk substrate and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60175156A JPS6236756A (en) 1985-08-09 1985-08-09 Grooved optical disk substrate and its production

Publications (1)

Publication Number Publication Date
JPS6236756A true JPS6236756A (en) 1987-02-17

Family

ID=15991245

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60175156A Pending JPS6236756A (en) 1985-08-09 1985-08-09 Grooved optical disk substrate and its production

Country Status (1)

Country Link
JP (1) JPS6236756A (en)

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