JPH01188332A - Molding stamper for information record carrier and its manufacture - Google Patents

Molding stamper for information record carrier and its manufacture

Info

Publication number
JPH01188332A
JPH01188332A JP1408588A JP1408588A JPH01188332A JP H01188332 A JPH01188332 A JP H01188332A JP 1408588 A JP1408588 A JP 1408588A JP 1408588 A JP1408588 A JP 1408588A JP H01188332 A JPH01188332 A JP H01188332A
Authority
JP
Japan
Prior art keywords
stamper
resist film
glass
information recording
recording carrier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1408588A
Other languages
Japanese (ja)
Other versions
JPH0827998B2 (en
Inventor
Tetsuya Kondo
哲也 近藤
Noboru Kawai
登 川合
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Victor Company of Japan Ltd
Original Assignee
Victor Company of Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Victor Company of Japan Ltd filed Critical Victor Company of Japan Ltd
Priority to JP63014085A priority Critical patent/JPH0827998B2/en
Publication of JPH01188332A publication Critical patent/JPH01188332A/en
Publication of JPH0827998B2 publication Critical patent/JPH0827998B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Laminated Bodies (AREA)

Abstract

PURPOSE:To enable manufacture of an information record carrier which is free from facial deflection and distortion and has favorable S/N, by forming a material of a stamper as glass. CONSTITUTION:A negative type photoresist 8 is applied uniformly onto the surface of a II type quartz glass board 7 polished highly accurately. Then a guide groove is recorded on the photoresist 8 by making use of laser rays 9 and continuously a desired pattern is obtained by development treatment. Dry etching is performed on the board within CF4 gas plasma 10 and it is suspended at a desired depth. The remaining photoresist 8 is removed by performing ashing with oxygen (O2) and a stamper made of glass is obtained further. A disk board is made of the stamper through a 2P method, to which a recording film and protective film are applied and an information record carrier is obtained. As an adhesive process at the time of making of the stamper becomes unnecessary, in an optical disk made by a method like this, the title carrier becomes a matter where a distortion or facial deflection is little.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は情報記録担体の成形スタンパ及びその製造方法
に係り、特に光学的に情報信号を記録する光ディスク、
光磁気ディスク等の情報記録担体の成形スタンパ及びそ
の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a molded stamper for an information recording carrier and a method for manufacturing the same, and more particularly to an optical disc on which an information signal is optically recorded;
The present invention relates to a molding stamper for information recording carriers such as magneto-optical disks and a method for manufacturing the same.

従来の技術 一般に光ディスク、光磁気ディスク等の情報記録担体は
スタンパから紫外線硬化樹脂、熱硬化性樹脂等のレプリ
カ盤を作成し、記録膜コート、保護膜塗布等を行なうこ
とにより形成されている。
BACKGROUND OF THE INVENTION Generally, information recording carriers such as optical disks and magneto-optical disks are formed by making a replica disk of ultraviolet curing resin, thermosetting resin, etc. from a stamper, and coating the disk with a recording film, a protective film, etc.

従来より、この種の情報記録担体の成形スタンパは第4
図に示すような方法で製造されていた。
Conventionally, the molding stamper for this type of information recording carrier has been
It was manufactured by the method shown in the figure.

まず、高精度に研磨したガラス基盤上に例えばポジタイ
プのフォトレジスト2を均一に塗布する(第4図(a)
→(b))。
First, for example, a positive type photoresist 2 is uniformly applied onto a highly precisely polished glass substrate (Fig. 4(a)).
→(b)).

次にレーザ光3により、フォトレジスト2上にパターン
を記録した後、現像処理により所望のパターンを得る(
第4図(C)→(d))。続いて、パターン化されたレ
ジスト・2上にニッケル、銀などの金属4を蒸着、スパ
ッタ、無電解メツキ等により被着させ導電化を行なう(
第4図(e))。
Next, a pattern is recorded on the photoresist 2 using a laser beam 3, and then a desired pattern is obtained by a development process (
Figure 4 (C) → (d)). Next, a metal 4 such as nickel or silver is deposited on the patterned resist 2 by vapor deposition, sputtering, electroless plating, etc. to make it conductive (
Figure 4(e)).

この上にさらにニッケルなどの金属5を100〜300
μm程度電鋳する(第4図(f))。これを剥離し、フ
ォト・レジスト2を除去した後に高精度に研磨したガラ
ス、金属、樹脂などの裏打ち基盤6を接着剤により接着
する(第4図(Q)→(h))。または、電η後直ちに
裏打ら処理し、その後に剥離し、フォト・レジスト2を
除去しく第4図(1)→(j))作成する。方法もある
On top of this, add 100 to 300 metals such as nickel.
Electroforming is performed to the extent of μm (Fig. 4(f)). After this is peeled off and the photoresist 2 is removed, a backing substrate 6 made of highly precisely polished glass, metal, resin, etc. is bonded with an adhesive (FIG. 4 (Q)→(h)). Alternatively, the photoresist 2 is removed immediately after the lining process is performed, and then peeled off to remove the photoresist 2 (FIG. 4(1)→(j)). There is a way.

発明が解決しようとする問題点 しかるに、従来の方法で作成されたスタンパは実行ら処
理(第4図(h)又は(i)の工程)にエポキシ等の接
着剤を用いていたため、裏打ち基盤6と電鋳スタンパ5
の間に気泡が入りやすく、2 P (Photo po
lymarization)法等による成形時にディス
ク側に気泡の跡が転写され、歪を発生させるという問題
点があった。
Problems to be Solved by the Invention However, since the stamper produced by the conventional method uses an adhesive such as epoxy in the processing (step (h) or (i) in FIG. 4), the backing base 6 and electroforming stamper 5
Air bubbles can easily enter between the 2P (Photo
There was a problem in that during molding by the lymarization method or the like, traces of air bubbles were transferred to the disk side, causing distortion.

また、第4図(Q)→(h)の工程により裏打ち基盤を
接着する場合には裏打ち基!6と電鋳スタンパ5とを平
行度良く接着することが困難で、面振れの小さいディス
クが成形できず、第4図(i)→(j)の工程により裏
打ち基盤を接着する場合には平行度良く接着することは
容易だが、ガラス基盤1からの剥離が困難となるという
問題点があった。
Also, when bonding the lining base using the process shown in Figure 4 (Q) → (h), the lining base! 6 and the electroforming stamper 5 with good parallelism, making it impossible to form a disk with small surface runout. Although it is easy to adhere well, there is a problem in that peeling from the glass substrate 1 is difficult.

本発明は上記の点から鑑みてなされたもので、而振れや
歪がなく、S/Nが良好な情報記録担体が作成できる情
報記録担体のスタンパとその製造方法を提供することを
目的とする。
The present invention has been made in view of the above points, and an object of the present invention is to provide a stamper for an information recording carrier that can produce an information recording carrier with no vibration or distortion and a good S/N ratio, and a method for manufacturing the same. .

問題点を解決するための手段 スタンパ表面に樹脂材料を対向させ、硬化させることに
より、情報信号パターンを有する情報記録担体を作成す
る情報記録担体の成形スタンパにおいて、スタンパの素
材をガラスとして形成してなる。
Means for Solving the Problems In a molding stamper for an information recording carrier that creates an information recording carrier having an information signal pattern by placing a resin material opposite to the surface of the stamper and curing it, the material of the stamper is formed as glass. Become.

また、本発明の情報記録担体の成形スタンパはガラス基
盤を研磨する工程と、ガラス基盤上にビームの照射に感
応するレジスト膜を形成する工程と、レジスト膜に情報
信号パターンに応じて変調されたビームを照射する工程
と、レジスト膜を現像することにより、ビームが照射さ
れた部分又はビームが照射されていない部分のレジスト
膜を除去し、情報信号パターンに応じたパターンのレジ
スト膜を形成する工程と、レジスト膜をマスクとしてガ
ラス基盤をエツチングする工程とレジスト膜を除去する
工程を含む製造方法により作成される。
Further, the molding stamper of the information recording carrier of the present invention includes a step of polishing a glass substrate, a step of forming a resist film sensitive to beam irradiation on the glass substrate, and a step of forming a resist film that is modulated according to an information signal pattern on the resist film. A process of irradiating the beam and developing the resist film to remove the resist film in the areas irradiated with the beam or the areas not irradiated with the beam to form a resist film with a pattern corresponding to the information signal pattern. It is produced by a manufacturing method including a step of etching a glass substrate using a resist film as a mask and a step of removing the resist film.

作用 本発明による情報記録担体の成形スタンパはガラスを素
材となり、そのガラスの素材にエツチングにより直接情
報信号に応じたパターンを形成しているため、接着等に
よる裏打ち工程を省くことができる。
Function The molded stamper for the information recording carrier according to the present invention is made of glass, and a pattern corresponding to the information signal is directly formed on the glass material by etching, so that a backing process such as adhesion can be omitted.

実施例 第1図は本発明の情報記録担体の成形スタンパの製造工
程の説明図を示す。
Embodiment FIG. 1 shows an explanatory diagram of the manufacturing process of a molded stamper for an information recording carrier of the present invention.

まず、高精度に研磨した■型石英ガラス基盤7の表面上
にネガタイプの7オトレジスト8を均一に塗布する(第
1図(a))。次にこのフォトレジスト8上にレーザ光
9を用いて案内溝を記録しく第1図(b))、続いて現
像処理により、所望のパターンを得る(第1図(C))
First, a negative type 7 photoresist 8 is uniformly applied onto the surface of a highly precisely polished quartz glass substrate 7 (FIG. 1(a)). Next, a guide groove is recorded on this photoresist 8 using a laser beam 9 (FIG. 1(b)), and then a desired pattern is obtained by a development process (FIG. 1(C)).
.

次に、この基盤にCF4ガスプラズマ10中でドライエ
ツチングを行ない所望の深さで停止させる(第1図(d
))。さらに、残存するフォトレジスト8を酸素(02
)によりアッシングして除去し、ガラス製のスタンパを
得る(第1図(e))。
Next, dry etching is performed on this substrate in a CF4 gas plasma 10, and the etching is stopped at a desired depth (Fig. 1(d)
)). Furthermore, the remaining photoresist 8 is removed with oxygen (02
) to obtain a glass stamper (FIG. 1(e)).

このスタンパから2P法等によりディスク基盤を作成し
、記録膜及び保護膜をコーティングして光ディスク等の
情報記録担体を得た。上記のような方法で作成された光
ディスクはスタンパが作成される際に接着工程等が不要
となるため、歪や面振れの少ないものとなる。
A disk base was prepared from this stamper by the 2P method or the like, and a recording film and a protective film were coated to obtain an information recording carrier such as an optical disk. The optical disc produced by the method described above does not require an adhesion process or the like when the stamper is produced, and therefore has less distortion and surface wobbling.

なお、本実施例ではスタンパに案内溝のパターンを得る
方法としてネガタイプのレジスト上にレーザ光を用いて
パターンを作成したが、これは従来の工程、すなわちポ
ジタイプのレジストを利用した工程と記録上Ti換性を
保っためであり、これに限るものではない。また、予め
案内溝がパターン化されたクロムマスクなどを介して紫
外線を照射して、フォトレジスト上にパターンとして露
光する方法も考えられる。
In this example, a pattern was created using a laser beam on a negative type resist as a method of obtaining a pattern of guide grooves on a stamper, but this is different from the conventional process, that is, a process using a positive type resist, and a process using a Ti on recording. This is to maintain compatibility, but is not limited to this. Another possible method is to irradiate ultraviolet rays through a chrome mask or the like in which guide grooves are patterned in advance and expose the photoresist as a pattern.

また、高品質のディスク、特にS/Nの良好なディスク
を得るために、ガラス基盤の材質に着目し、種々の組成
比を持つガラスをCF4ガスでドライエツチングして被
エツチング面の面荒れ等の状態を調べた結果を第2図に
示す。
In addition, in order to obtain high-quality disks, especially disks with good S/N, we focused on the material of the glass substrate and dry-etched glasses with various composition ratios with CF4 gas to reduce the surface roughness of the etched surface. Figure 2 shows the results of examining the condition.

第2図に示すように■型石英、■型石英、ホウケイ酸ガ
ラスはエツチングレートが大で面荒れも大きい。また、
ソーダ石灰ガラス、ソーダアルミノケイ酸ガラス、バリ
ウムホウケイ酸ガラスはエツチングレートが小で面荒れ
も小さい。すなわち、エツチングレートと面荒れにはエ
ツチングレートの大なるガラスはど面荒れが大となると
いう相関関係がある。
As shown in FIG. 2, ■-type quartz, ■-type quartz, and borosilicate glass have high etching rates and rough surfaces. Also,
Soda lime glass, soda aluminosilicate glass, and barium borosilicate glass have low etching rates and less surface roughness. That is, there is a correlation between the etching rate and surface roughness, such that the higher the etching rate of the glass, the greater the surface roughness.

これをガラスの組成比に注目して考察すると、ガラス中
に含まれる5fOzやB2O3の凹が多い程エツチング
レートは太き(、Naz O。
Considering this by paying attention to the composition ratio of the glass, the more concavities there are in 5fOz and B2O3 contained in the glass, the thicker the etching rate (NazO, NazO, etc.).

K20.MQO,cao、Ae20x 、BaOの量が
多いほどエツチングレートは小さいことが分かる。第3
図は主なガラス構成物質のフッ化物の蒸気圧が10 t
orrとなるときの温度を示す図で、化学便覧・基礎編
555ページ(1975年日本化学会編)より引用して
示しているが、SiO2やB2O3のようにそのフッ化
物の温度の低いものが大きなエツチングレートを生み、
Nap、  @に20.Ae、203のようにそのフッ
化物の温度の高いものが小さなエツチングレートを生む
ことが理解できる。
K20. It can be seen that the higher the amount of MQO, cao, Ae20x, and BaO, the lower the etching rate. Third
The figure shows that the vapor pressure of fluoride, the main glass component, is 10 t.
This figure shows the temperature at which fluoride becomes orr, and is quoted from page 555 of the Chemical Handbook, Basic Edition (edited by the Chemical Society of Japan, 1975). Produces a large etching rate,
Nap, @20. It can be seen that the higher the temperature of the fluoride, such as Ae, 203, produces a smaller etching rate.

以上の考察より、ガラスのエツチングレートは構成物質
の組成比により決定され、S/Nの良好なディスクを得
るためには石英の60%以下のエツチングレートを有す
るガラスが適するものと考えられる。
From the above considerations, the etching rate of glass is determined by the composition ratio of the constituent materials, and it is considered that glass having an etching rate of 60% or less of quartz is suitable for obtaining a disk with good S/N.

上記実施例において基盤をソーダ石灰ガラスをスタンパ
として作成された光ディスクは歪がなく、面振れも非常
に小さく、S/Nについても非常に良好なものが得られ
る。
In the above embodiment, the optical disk produced using soda lime glass as the stamper has no distortion, has very small surface runout, and has a very good S/N ratio.

また、基盤をソーダアルミノケイ酸ガラス、ガスプラズ
マをCHF 3として作成されたスタンパにより作成さ
れた光ディスクにおいても歪が少なく、面振れも非常に
小さく、S/Nについても非常に良好なものが得られる
Furthermore, optical discs made with a stamper using a soda aluminosilicate glass substrate and CHF 3 gas plasma have little distortion, very little surface runout, and very good S/N ratios. .

なお、以上の実施例では反応ガスとしてCF4 。Note that in the above examples, CF4 was used as the reaction gas.

CHF3を用いたが、ガラスとの反応性のあるフッ素系
ガスならば、これら以外のガスでもよく、例えば、C2
F6 、C3F8 、NF3及びこれらの混合ガスなど
でもよい。
Although CHF3 was used, other gases may be used as long as they are fluorine-based gases that are reactive with glass; for example, C2
F6, C3F8, NF3, and mixed gases thereof may also be used.

また、ディスクのトラッキング特性を良好にするだめに
案内溝にテーバを付与しても良く、テーパ化に特開昭6
1−26952号公報に示すようなガラスのドライエツ
チング時にレジストを同時にエツチングすることにより
テーパ化する方法も導入可能である。
Further, in order to improve the tracking characteristics of the disk, the guide groove may be tapered.
It is also possible to introduce a method of tapering the resist by simultaneously etching the resist during the dry etching of the glass, as shown in Japanese Patent No. 1-26952.

また、このスタンパを透明にすることができるためスタ
ンパを通して、紫外線を照射することにより2P成形を
行なう方法(特開昭57−15235号公報)も可能で
あり、この方法はCD−V (コンパクト・ディスク・
ビデオ)等のような成形するディスクの基盤に色素を含
む場合にも有効となる。
In addition, since this stamper can be made transparent, it is also possible to perform 2P molding by irradiating ultraviolet rays through the stamper (Japanese Patent Application Laid-Open No. 15235/1982). disk·
It is also effective when the base of the disc to be molded, such as a video disc, contains a pigment.

発明の効果 上述の如く、本発明によれば、裏打ち処理が不必要なの
で接着工程が不要となり、気泡などの侵入がなくなり歪
や而振れの少ないスタンパを作成できるため、歪や面振
れの少ない情報記録担体が作成でき、また、工程を短縮
できるため、スタンパの作成時間を短縮できると共に自
動化を容易にし、さらに、スタンパを通して紫外線等を
照射する2P法による情報記録担体の成形に用いること
ができる等の特長を右する。
Effects of the Invention As described above, according to the present invention, there is no need for backing treatment, so there is no need for an adhesion process, and there is no need for air bubbles to enter, making it possible to create a stamper with less distortion or wobbling. Since the recording carrier can be created and the process can be shortened, the stamper creation time can be shortened and automation can be facilitated.Furthermore, it can be used to mold information recording carriers by the 2P method of irradiating ultraviolet rays etc. through the stamper. Right features.

【図面の簡単な説明】 第1図は本発明のスタンパの製造り法の一実施例を説明
するための図、第2図はCF4ガスでドライエツチング
したときの種々の組成比を持つガラスの被エツチング面
の面荒れの状態を示す図、第3図はフッ化物の蒸気圧が
10torrとなる温度を示す図、第4図は従来のスタ
ンパの製造方法の一例を説明するための図である。 7・・・ガラス5513.8・・・フォトレジスト、9
・・・レーザ光、10・・・ガスプラズマ。 特許出願人 日本ビクター株式会社 代 理 人 弁理士 伊 東 忠 彦、、′<、、 ′
’:、i’i’j′。 同   弁理士 松 浦 兼 行・ 第1図 (e)ヒ]クゴトニョー7 第4図 (a)   口======下−1 ↓
[Brief Description of the Drawings] Fig. 1 is a diagram for explaining one embodiment of the stamper manufacturing method of the present invention, and Fig. 2 shows the results of glass with various composition ratios when dry etched with CF4 gas. FIG. 3 is a diagram showing the state of roughness of the surface to be etched, FIG. 3 is a diagram showing the temperature at which the vapor pressure of fluoride becomes 10 torr, and FIG. 4 is a diagram for explaining an example of a conventional stamper manufacturing method. . 7...Glass 5513.8...Photoresist, 9
...Laser light, 10...Gas plasma. Patent applicant: Japan Victor Co., Ltd. Representative: Patent attorney: Tadahiko Ito
':, i'i'j'. Same patent attorney Kaneyuki Matsuura Figure 1 (e) Hi] Kugotonyyo 7 Figure 4 (a) 口======Bottom-1 ↓

Claims (7)

【特許請求の範囲】[Claims] (1)情報信号パターンの反転パターンを有するスタン
パ表面に樹脂材料を対向させ、硬化させることにより該
情報信号パターンを有する情報記録担体を作成する情報
記録担体の成形スタンパにおいて、 該スタンパの素材をガラスとして形成してなることを特
徴とする情報記録担体の成形スタンパ。
(1) In a molding stamper for an information recording carrier in which an information recording carrier having an information signal pattern is produced by placing a resin material opposite the surface of a stamper having an inverted pattern of an information signal pattern and curing the material, the material of the stamper is glass. A molded stamper for an information recording carrier, characterized in that the stamper is formed by forming the stamper as a molded stamper.
(2)該スタンパの素材は石英の60%以下のエッチン
グ・レートを有するガラスであることを特徴とする請求
項1記載の情報記録担体の成形スタンパ。
(2) The molded stamper for an information recording carrier according to claim 1, wherein the material of the stamper is glass having an etching rate of 60% or less of quartz.
(3)該反転パターンはテーパ形状であることを特徴と
する請求項1ないし請求項2記載の情報記録担体の成形
スタンパ。
(3) The information recording carrier molding stamper according to any one of claims 1 to 2, wherein the inversion pattern has a tapered shape.
(4)ガラス基盤を研磨する工程と、 該ガラス基盤上にビームの照射に感応するレジスト膜を
形成する工程と、 該レジスト膜に該情報信号パターンに応じて変調された
該ビームを照射する工程と、 該レジスト膜を現像することにより、該ビームが照射さ
れた部分又は該ビームが照射されていない部分の該レジ
スト膜を除去し、該情報信号パターンに応じたパターン
の該レジスト膜を形成する工程と、 該レジスト膜をマスクとして該ガラス基盤をエッチング
する工程と、 該レジスト膜を除去する工程と を含むことを特徴とする請求項1記載の情報記録担体の
成形スタンパの製造方法。
(4) A step of polishing a glass substrate, a step of forming a resist film sensitive to beam irradiation on the glass substrate, and a step of irradiating the resist film with the beam modulated according to the information signal pattern. and developing the resist film to remove the resist film in the portions irradiated with the beam or the portions not irradiated with the beam, and form the resist film in a pattern corresponding to the information signal pattern. 2. The method of manufacturing a molded stamper for an information recording carrier according to claim 1, comprising the steps of: etching the glass substrate using the resist film as a mask; and removing the resist film.
(5)該ガラス基盤の素材は石英の60%以下のエッチ
ング・レートを有するガラスであることを特徴とする請
求項1記載の情報記録担体の成形スンタパの製造方法。
(5) The method for manufacturing a molded suntapa of an information recording carrier according to claim 1, wherein the material of the glass base is glass having an etching rate of 60% or less of quartz.
(6)該レジスト膜上にビームを照射する工程は、あら
かじめ該情報信号パターンがパターニングされたマスク
を透過して該レジスト膜上に露光する工程であることを
特徴とする請求項4ないし請求項5記載の情報記録担体
の成形スンタパの製造方法。
(6) The step of irradiating the beam onto the resist film is a step of exposing the resist film through a mask in which the information signal pattern has been patterned in advance. 5. The method for producing a molded suntapa of an information recording carrier according to 5.
(7)該レジスト膜をマスクとして該ガラス基盤をエッ
チングする工程は、該レジスト膜を後退させながらエッ
チングして該情報信号パターンをテーパ形状に形成する
ことを特徴とする請求項4ないし請求項5ないし請求項
6記載の情報記録担体の成形スタンパの製造方法。
(7) The step of etching the glass substrate using the resist film as a mask is characterized in that the information signal pattern is formed into a tapered shape by etching while retracting the resist film. 7. A method for producing a molded stamper for an information recording carrier according to claim 6.
JP63014085A 1988-01-25 1988-01-25 Molding stamper for information recording carrier and manufacturing method thereof Expired - Lifetime JPH0827998B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63014085A JPH0827998B2 (en) 1988-01-25 1988-01-25 Molding stamper for information recording carrier and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63014085A JPH0827998B2 (en) 1988-01-25 1988-01-25 Molding stamper for information recording carrier and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPH01188332A true JPH01188332A (en) 1989-07-27
JPH0827998B2 JPH0827998B2 (en) 1996-03-21

Family

ID=11851266

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63014085A Expired - Lifetime JPH0827998B2 (en) 1988-01-25 1988-01-25 Molding stamper for information recording carrier and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JPH0827998B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5480763A (en) * 1991-01-11 1996-01-02 Victor Company Of Japan, Ltd. Method for manufacturing a stamper for high-density recording discs
US7171676B2 (en) * 2001-06-28 2007-01-30 Sony Corporation Stamper for producing optical recording medium, optical recording medium, and methods of producing the same
US7955786B2 (en) 2007-04-23 2011-06-07 Canon Kabushiki Kaisha Production of a multilayer optical recording medium using a stamper

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62145553A (en) * 1985-12-19 1987-06-29 Sumitomo Bakelite Co Ltd Production of substrate for pregrooved optical disk
JPH01125744A (en) * 1987-11-10 1989-05-18 Hitachi Chem Co Ltd Production of optical disk substrate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62145553A (en) * 1985-12-19 1987-06-29 Sumitomo Bakelite Co Ltd Production of substrate for pregrooved optical disk
JPH01125744A (en) * 1987-11-10 1989-05-18 Hitachi Chem Co Ltd Production of optical disk substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5480763A (en) * 1991-01-11 1996-01-02 Victor Company Of Japan, Ltd. Method for manufacturing a stamper for high-density recording discs
US7171676B2 (en) * 2001-06-28 2007-01-30 Sony Corporation Stamper for producing optical recording medium, optical recording medium, and methods of producing the same
US7955786B2 (en) 2007-04-23 2011-06-07 Canon Kabushiki Kaisha Production of a multilayer optical recording medium using a stamper

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