JPH01125744A - Production of optical disk substrate - Google Patents
Production of optical disk substrateInfo
- Publication number
- JPH01125744A JPH01125744A JP28366687A JP28366687A JPH01125744A JP H01125744 A JPH01125744 A JP H01125744A JP 28366687 A JP28366687 A JP 28366687A JP 28366687 A JP28366687 A JP 28366687A JP H01125744 A JPH01125744 A JP H01125744A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- mold
- optical disk
- stamper
- disk substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 28
- 230000003287 optical effect Effects 0.000 title claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000006089 photosensitive glass Substances 0.000 claims abstract description 13
- 239000010410 layer Substances 0.000 claims abstract description 12
- 238000000465 moulding Methods 0.000 claims abstract description 8
- 239000002344 surface layer Substances 0.000 claims abstract description 5
- 238000010438 heat treatment Methods 0.000 abstract description 7
- 238000005530 etching Methods 0.000 abstract description 6
- 238000000034 method Methods 0.000 description 14
- 239000011521 glass Substances 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 238000005323 electroforming Methods 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 238000000748 compression moulding Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000003362 replicative effect Effects 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 1
- 229910052912 lithium silicate Inorganic materials 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- YTZVWGRNMGHDJE-UHFFFAOYSA-N tetralithium;silicate Chemical compound [Li+].[Li+].[Li+].[Li+].[O-][Si]([O-])([O-])[O-] YTZVWGRNMGHDJE-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】 （産業上の利用分野） 本発明は、光ディスク基板の製造法に関する。[Detailed description of the invention] (Industrial application field) The present invention relates to a method for manufacturing an optical disc substrate.
（従来の技術）
従来、光ディスク用基板は、ニッケル電鋳によって得ら
れたスタンパ−を用い、これを複製することにより得ら
れている。(Prior Art) Conventionally, substrates for optical discs have been obtained by using a stamper obtained by nickel electroforming and replicating the stamper.
すなわち、第２図に示すように、平滑に研磨されたガラ
ス板２１等にレジスト層２２を形成し、所定位置にレー
ザビーム２３を照射し、現像、洗浄を行いレジストパタ
ーン２４を形成したのちに、表面導体層２５を設け、つ
いでニッケルの電鋳２６にひきつづき、剥離、洗浄を行
うことによりマスク２７を作成し、このマスタ２７を用
い、剥離剤処理、電鋳、剥離及び洗浄工程を経て母型２
８を作製後、母型２８をもとに、さらに剥離剤処理、電
鋳、剥離、及び洗浄工程をくり返し実施することにより
スタンパ２９を作製し、これを複製することにより光デ
ィスク基板を得ている。That is, as shown in FIG. 2, a resist layer 22 is formed on a smoothly polished glass plate 21 or the like, a laser beam 23 is irradiated at a predetermined position, and a resist pattern 24 is formed by developing and cleaning. , a surface conductor layer 25 is provided, followed by electroforming 26 of nickel, followed by peeling and cleaning to create a mask 27. Using this master 27, a mask 27 is formed through a release agent treatment, electroforming, peeling and cleaning steps. Type 2
After producing the stamper 8, a stamper 29 is produced by repeating the release agent treatment, electroforming, peeling, and cleaning steps based on the matrix 28, and by replicating this, an optical disk substrate is obtained. .
（発明が解決しようとする問題点）
従来法による光ディスク用スタンパは、電鋳用マスク２
７を作成後、母型２８を作りこれをもとにスタンパ２９
を加工するものであり、同一性能のスタンパを複数個得
ることを目的としているが、現実には必ずしも同一性能
のスタンパが得られていない。(Problems to be Solved by the Invention) The optical disc stamper according to the conventional method has two electroforming masks.
7, create a matrix 28 and use it as a stamper 29.
The purpose is to obtain a plurality of stampers with the same performance, but in reality, stampers with the same performance are not necessarily obtained.
また、スタンパ裏面のポリッシング、内外径加工等の煩
雑な工程が必要であるほか、スタンパが薄いため金型へ
の装着がむずかしいなどの欠点がある。In addition, it requires complicated processes such as polishing the back side of the stamper and machining the inner and outer diameters, and has drawbacks such as the fact that the stamper is thin and difficult to attach to a mold.
本発明は、高精度かつ生産性に優る光ディスク用スタン
パを用いる光ディスク基板の製造法を提供するものであ
る。The present invention provides a method for manufacturing an optical disc substrate using an optical disc stamper with high precision and excellent productivity.
（問題点を解決するための手段）
本発明は、少なくとも表面層に感光性ガラス層を有する
基板の所定位置を光照射し、熱処理後エツチングするこ
とにより凹凸構造をもつ光ディスク基板成型用型を作製
し、これを複製することを特徴とするものである。(Means for Solving the Problems) The present invention produces a mold for molding an optical disk substrate having an uneven structure by irradiating a predetermined position of a substrate having a photosensitive glass layer on at least the surface layer, etching it after heat treatment. It is characterized by copying this.
本発明の一実施例を示す第１図により説明する。An embodiment of the present invention will be explained with reference to FIG. 1.
感光性ガラスとしては、Ｓｉ、ＬＬ、Ｎａ、’Ａ１、Ｂ
、に、Ｃｅ等の酸化物を主体とする複合系が用いられる
が９代表例としては、メタケイ酸リチウム（ＬＬ！０−
８１０重）系、オルソケイ酸リチウム（２ＬｉｔＱ・Ｓ
ｉＯり系等の金属コロイド系が挙げられる。また、５ｓ
−Ｇｅ系ガラスのような非金属コロイドを用いることも
できる。As photosensitive glass, Si, LL, Na, 'A1, B
, a composite system mainly composed of oxides such as Ce is used.9 As a typical example, lithium metasilicate (LL!0-
810 heavy) system, lithium orthosilicate (2LitQ・S
Examples include metal colloid systems such as iO-based. Also, 5s
- Non-metallic colloids such as Ge-based glasses can also be used.
少なくとも表面層に感光性ガラス層を有する基板１１は
、単独層であっても良くまた。ガラス、セラミック、ま
たは金属との複層構造であっても良い。The substrate 11 having a photosensitive glass layer on at least the surface layer may be a single layer. It may have a multilayer structure with glass, ceramic, or metal.
本発明における光照射１２は、一般的には、紫外線が用
いられ、マスク法又は、ビーム照射法を採用することが
できる。The light irradiation 12 in the present invention generally uses ultraviolet rays, and can employ a mask method or a beam irradiation method.
熱処理は、用いる感光性ガラスの材質により異なるが、
一般的には４００℃〜６００℃で行われる。Heat treatment varies depending on the material of the photosensitive glass used, but
Generally, it is carried out at 400°C to 600°C.
エツチングは、弗酸等の酸エツチングのほかに。Etching includes acid etching such as hydrofluoric acid.
アルカリエツチングを用いることができる。Alkaline etching can be used.
こうして得られた凹凸構造をもつ光ディスク基板成型用
型１３を用い、光ディスク基板成型用型１３と押え板と
の間で樹脂を硬化させて光ディスク基板を製造する。光
ディスク基板成型用型１３と押え板との間に一方の面に
凹凸複製用の薄層を形成した樹脂基板、ガラス基板を挟
んで複製を行う、いわいる２Ｐ法で光ディスク基板を製
造することも出来る。Using the optical disc substrate mold 13 having the uneven structure thus obtained, the resin is cured between the optical disc substrate mold 13 and the presser plate to manufacture an optical disc substrate. It is also possible to manufacture optical disk substrates using the so-called 2P method, in which duplication is performed by sandwiching a resin substrate or a glass substrate with a thin layer for uneven duplication on one side between the optical disk substrate molding mold 13 and a holding plate. I can do it.
感光性ガラス単層ならびにガラス材をベースに感光性ガ
ラス層を設けた複層系においては透明光ディスク基板成
型用型１３としうるので、ｉ３明な押え板と併用して、
光硬化性樹脂を両面から光照射して光ディスク基板を製
造することも出来る。In the case of a single layer of photosensitive glass or a multilayer system in which a photosensitive glass layer is provided on a glass material as a base, it can be used as the mold 13 for molding a transparent optical disk substrate, so it can be used in combination with the i3 bright presser plate.
It is also possible to manufacture an optical disk substrate by irradiating the photocurable resin with light from both sides.
成型法としては、射出成型法、圧縮成型法、射出圧縮成
型法、注型法等が使用できる。As the molding method, an injection molding method, a compression molding method, an injection compression molding method, a casting method, etc. can be used.
樹脂としては、熱可塑性樹脂、熱硬化性樹脂、光硬化性
°樹脂等が使用出来る。As the resin, thermoplastic resin, thermosetting resin, photocurable resin, etc. can be used.
実施例
ＳｉＯ□−Ｌ ｉｔ Ｏ−Ａ Ｉｔ Ｏｓを主成分とし
。Example SiO□-L it O-A It Os was used as the main component.
外径１３５０．厚み２龍および平面あらさ０．０１μｍ
の感光性ガラス層の所定位置を、超高圧水銀ランプを用
いマスク法により光ビーム照斜を行った。ついで、５５
０〜６００℃で熱処理を２０分行った゛のち希弗酸溶液
でエツチングし、直径約２μｍ、ピッチ２μｍの穴を形
成し、スタンパ（光ディスク基板成型用型）を得た。Outer diameter 1350. Thickness 2mm and flat surface roughness 0.01μm
A predetermined position of the photosensitive glass layer was irradiated with a light beam by a mask method using an ultra-high pressure mercury lamp. Then, 55
After heat treatment at 0 to 600° C. for 20 minutes, etching was performed with a dilute hydrofluoric acid solution to form holes with a diameter of about 2 μm and a pitch of 2 μm to obtain a stamper (a mold for molding an optical disk substrate).
ひきつづき、このスタンパおよび透明押え板を用い両面
からＴ線照斜を行い、エポキシアクリレート系の光硬化
性樹脂を厚み１．２ｆｌの光ディスクに成形した。Subsequently, T-ray irradiation was performed on both sides using this stamper and a transparent holding plate, and the epoxy acrylate photocurable resin was molded into an optical disk with a thickness of 1.2 fl.
（発明の効果）
本発明は、従来法のように、ガラス基盤上のレジスト部
に異なり、光ディスク型用基盤上の感光性ガラス層の所
定位置を光照射し、熱処理後エツチングすることにより
、凹凸構造を形成し、スタンパを作製するものである。(Effects of the Invention) Unlike the conventional method, the resist part on the glass substrate is irradiated with light at a predetermined position of the photosensitive glass layer on the substrate for an optical disc mold, and etched after heat treatment, thereby forming unevenness. A structure is formed and a stamper is produced.
このため、レジストが不要となり、膜厚管理等の煩雑な
工程が不必要となるほか電鋳工程も必要としないために
、従来法に比べより簡便、経済的で高精度のスタンパを
作製できる。This eliminates the need for a resist, eliminates the need for complicated processes such as film thickness control, and eliminates the need for an electroforming process, making it possible to produce a stamper more easily, economically, and with high precision than conventional methods.
併せて、感光性ガラス単層ならびにガラス材をベースに
感光性ガラス層を設けた複層系においては透明スタンパ
を提供することができる。In addition, a transparent stamper can be provided in the case of a single layer of photosensitive glass or a multilayer system in which a photosensitive glass layer is provided based on a glass material.
【図面の簡単な説明】
第１図（ａ）〜（ｂ）は本発明の方法を示す断り
面図、第２図（ａ）〜（す）は従来の方法を示す断面図
である。
符号の説明
１１ 基板
１２ 光照射
（ａ）
（ｂ）
第１図！
（ｎ） ニフＺｚ上〜２１
（ｂ） ＝＝コて２１
（５） 口票１２７
（ｈ） ２８
α） 曙；コ］〜２９
第２図BRIEF DESCRIPTION OF THE DRAWINGS FIGS. 1(a)-(b) are sectional views showing the method of the present invention, and FIGS. 2(a)-(s) are sectional views showing the conventional method. Explanation of symbols 11 Substrate 12 Light irradiation (a) (b) Figure 1! (n) Nif Zz top~21 (b) ==Kote21 (5) Account slip 127 (h) 28 α) Akebono;K]~29 Figure 2
Claims (1)
所定位置を光照射し、熱処理後エッチングすることによ
り凹凸構造をもつ光ディスク基板成型用型を作製し、こ
れを複製することを特徴とする光ディスク基板の製造法
。1. An optical disc characterized in that a predetermined position of a substrate having a photosensitive glass layer on at least the surface layer is irradiated with light, heat treated and etched to produce an optical disc substrate molding mold having an uneven structure, and the mold is replicated. Substrate manufacturing method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28366687A JPH01125744A (en) | 1987-11-10 | 1987-11-10 | Production of optical disk substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28366687A JPH01125744A (en) | 1987-11-10 | 1987-11-10 | Production of optical disk substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01125744A true JPH01125744A (en) | 1989-05-18 |
Family
ID=17668485
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28366687A Pending JPH01125744A (en) | 1987-11-10 | 1987-11-10 | Production of optical disk substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01125744A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01188332A (en) * | 1988-01-25 | 1989-07-27 | Victor Co Of Japan Ltd | Molding stamper for information record carrier and its manufacture |
-
1987
- 1987-11-10 JP JP28366687A patent/JPH01125744A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01188332A (en) * | 1988-01-25 | 1989-07-27 | Victor Co Of Japan Ltd | Molding stamper for information record carrier and its manufacture |
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