JPS6218715A - 反射型投影露光機 - Google Patents

反射型投影露光機

Info

Publication number
JPS6218715A
JPS6218715A JP60159011A JP15901185A JPS6218715A JP S6218715 A JPS6218715 A JP S6218715A JP 60159011 A JP60159011 A JP 60159011A JP 15901185 A JP15901185 A JP 15901185A JP S6218715 A JPS6218715 A JP S6218715A
Authority
JP
Japan
Prior art keywords
alignment
optical system
mirror
mask
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60159011A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0528487B2 (cg-RX-API-DMAC7.html
Inventor
Masaki Suzuki
正樹 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP60159011A priority Critical patent/JPS6218715A/ja
Publication of JPS6218715A publication Critical patent/JPS6218715A/ja
Publication of JPH0528487B2 publication Critical patent/JPH0528487B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60159011A 1985-07-18 1985-07-18 反射型投影露光機 Granted JPS6218715A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60159011A JPS6218715A (ja) 1985-07-18 1985-07-18 反射型投影露光機

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60159011A JPS6218715A (ja) 1985-07-18 1985-07-18 反射型投影露光機

Publications (2)

Publication Number Publication Date
JPS6218715A true JPS6218715A (ja) 1987-01-27
JPH0528487B2 JPH0528487B2 (cg-RX-API-DMAC7.html) 1993-04-26

Family

ID=15684292

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60159011A Granted JPS6218715A (ja) 1985-07-18 1985-07-18 反射型投影露光機

Country Status (1)

Country Link
JP (1) JPS6218715A (cg-RX-API-DMAC7.html)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5356975A (en) * 1976-11-01 1978-05-23 Hitachi Ltd Exposure apparatus
JPS58108745A (ja) * 1981-12-23 1983-06-28 Canon Inc 転写装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5356975A (en) * 1976-11-01 1978-05-23 Hitachi Ltd Exposure apparatus
JPS58108745A (ja) * 1981-12-23 1983-06-28 Canon Inc 転写装置

Also Published As

Publication number Publication date
JPH0528487B2 (cg-RX-API-DMAC7.html) 1993-04-26

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees