JPS6217743B2 - - Google Patents
Info
- Publication number
- JPS6217743B2 JPS6217743B2 JP56008626A JP862681A JPS6217743B2 JP S6217743 B2 JPS6217743 B2 JP S6217743B2 JP 56008626 A JP56008626 A JP 56008626A JP 862681 A JP862681 A JP 862681A JP S6217743 B2 JPS6217743 B2 JP S6217743B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- resist
- mask
- glass mask
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP862681A JPS57122437A (en) | 1981-01-23 | 1981-01-23 | Glass mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP862681A JPS57122437A (en) | 1981-01-23 | 1981-01-23 | Glass mask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57122437A JPS57122437A (en) | 1982-07-30 |
JPS6217743B2 true JPS6217743B2 (enrdf_load_stackoverflow) | 1987-04-20 |
Family
ID=11698154
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP862681A Granted JPS57122437A (en) | 1981-01-23 | 1981-01-23 | Glass mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57122437A (enrdf_load_stackoverflow) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5628600Y2 (enrdf_load_stackoverflow) * | 1976-11-30 | 1981-07-07 |
-
1981
- 1981-01-23 JP JP862681A patent/JPS57122437A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS57122437A (en) | 1982-07-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0126621B1 (en) | Alignment marks on semiconductor wafers and method of manufacturing the marks | |
JP3402750B2 (ja) | 位置合わせ方法及びそれを用いた素子の製造方法 | |
JP2581902B2 (ja) | パターン重ね合せ精度測定マークの製造法 | |
US6737205B2 (en) | Arrangement and method for transferring a pattern from a mask to a wafer | |
JPH0450730B2 (enrdf_load_stackoverflow) | ||
JPS6217743B2 (enrdf_load_stackoverflow) | ||
EP0230648A2 (en) | Method of forming an alignment mark | |
JPH06324475A (ja) | レチクル | |
JP2002222762A (ja) | 半導体露光装置のレチクルのレベル測定方法 | |
KR100261164B1 (ko) | 오버레이 측정 타겟 및 이의 제조방법 | |
JP3529967B2 (ja) | アライメントマーク付きフォトマスク用ブランクスの製造方法 | |
JPS62177922A (ja) | 半導体装置の製造方法 | |
JPS5931852B2 (ja) | フォトレジスト露光用マスク | |
JPH04136855A (ja) | 露光用マスクの製造方法 | |
JPS6215854B2 (enrdf_load_stackoverflow) | ||
JPS60111245A (ja) | マスクの製造方法 | |
JPH10185541A (ja) | 配置精度測定方法、フォトマスク及び半導体装置 | |
KR20040059251A (ko) | 하나의 레이어에 다수의 박스형 마크를 갖는 중첩측정용정렬마크 | |
JPS6341020A (ja) | 半導体装置の製造方法 | |
JPH0382051A (ja) | 半導体装置の製造方法 | |
JPS6245111A (ja) | ウエハおよびそれを用いた半導体装置 | |
JPS5986221A (ja) | 特殊基準マ−クを用いたマスクのアライメント方法 | |
JPH0644550B2 (ja) | 半導体装置の製造方法 | |
JPH0738371B2 (ja) | 位置検出用マークの形成方法 | |
JPS623944B2 (enrdf_load_stackoverflow) |