JPS62174378A - 硬質炭素薄膜の形成方法 - Google Patents
硬質炭素薄膜の形成方法Info
- Publication number
- JPS62174378A JPS62174378A JP61015096A JP1509686A JPS62174378A JP S62174378 A JPS62174378 A JP S62174378A JP 61015096 A JP61015096 A JP 61015096A JP 1509686 A JP1509686 A JP 1509686A JP S62174378 A JPS62174378 A JP S62174378A
- Authority
- JP
- Japan
- Prior art keywords
- film
- thin film
- hard carbon
- carbon
- monomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910021385 hard carbon Inorganic materials 0.000 title claims abstract description 24
- 230000015572 biosynthetic process Effects 0.000 title abstract description 6
- 239000010409 thin film Substances 0.000 claims abstract description 45
- 238000000034 method Methods 0.000 claims abstract description 28
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 13
- 238000006243 chemical reaction Methods 0.000 claims abstract description 13
- 239000000178 monomer Substances 0.000 claims abstract description 11
- 239000001301 oxygen Substances 0.000 claims abstract description 11
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 11
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims abstract description 10
- 239000001257 hydrogen Substances 0.000 claims abstract description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 9
- 229910003481 amorphous carbon Inorganic materials 0.000 claims abstract description 6
- 229930195733 hydrocarbon Natural products 0.000 claims abstract description 3
- 239000004215 Carbon black (E152) Substances 0.000 claims abstract 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 23
- 239000010408 film Substances 0.000 abstract description 22
- 229910052799 carbon Inorganic materials 0.000 abstract description 20
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 abstract description 20
- 239000007789 gas Substances 0.000 abstract description 12
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000654 additive Substances 0.000 abstract description 2
- 230000000996 additive effect Effects 0.000 abstract description 2
- 150000002430 hydrocarbons Chemical group 0.000 abstract description 2
- 239000001294 propane Substances 0.000 abstract description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 10
- 229910001882 dioxygen Inorganic materials 0.000 description 10
- 239000000758 substrate Substances 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 7
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229920006125 amorphous polymer Polymers 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Carbon And Carbon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61015096A JPS62174378A (ja) | 1986-01-27 | 1986-01-27 | 硬質炭素薄膜の形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61015096A JPS62174378A (ja) | 1986-01-27 | 1986-01-27 | 硬質炭素薄膜の形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62174378A true JPS62174378A (ja) | 1987-07-31 |
| JPS635468B2 JPS635468B2 (enrdf_load_stackoverflow) | 1988-02-03 |
Family
ID=11879307
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61015096A Granted JPS62174378A (ja) | 1986-01-27 | 1986-01-27 | 硬質炭素薄膜の形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62174378A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01246115A (ja) * | 1988-03-26 | 1989-10-02 | Semiconductor Energy Lab Co Ltd | 炭素または炭素を主成分とする被膜を形成する方法 |
| WO2001032513A1 (fr) * | 1999-11-04 | 2001-05-10 | Mitsubishi Shoji Plastics Corporation | Recipient en plastique revetu d'une couche de cda exempte d'azote, procede et appareil utilises pour sa fabrication |
| JP2006161075A (ja) * | 2004-12-03 | 2006-06-22 | Shinko Seiki Co Ltd | 硬質炭素膜およびその形成方法 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0259462U (enrdf_load_stackoverflow) * | 1988-10-21 | 1990-05-01 | ||
| ES2079968T3 (es) * | 1992-02-28 | 1996-01-16 | Dow Chemical Co | Aparato para la separacion de fluidos basado en una membrana. |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60145994A (ja) * | 1984-01-06 | 1985-08-01 | テクニオン・リサ−チ・アンド・デベロツプメント・フアウンデ−シヨン・リミテツド | 基体にダイヤモンド状炭素被膜を形成するための方法 |
| JPS61183198A (ja) * | 1984-12-29 | 1986-08-15 | Kyocera Corp | ダイヤモンド膜の製法 |
| JPS61222915A (ja) * | 1985-03-29 | 1986-10-03 | Asahi Chem Ind Co Ltd | ダイヤモンドの気相合成方法 |
-
1986
- 1986-01-27 JP JP61015096A patent/JPS62174378A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60145994A (ja) * | 1984-01-06 | 1985-08-01 | テクニオン・リサ−チ・アンド・デベロツプメント・フアウンデ−シヨン・リミテツド | 基体にダイヤモンド状炭素被膜を形成するための方法 |
| JPS61183198A (ja) * | 1984-12-29 | 1986-08-15 | Kyocera Corp | ダイヤモンド膜の製法 |
| JPS61222915A (ja) * | 1985-03-29 | 1986-10-03 | Asahi Chem Ind Co Ltd | ダイヤモンドの気相合成方法 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01246115A (ja) * | 1988-03-26 | 1989-10-02 | Semiconductor Energy Lab Co Ltd | 炭素または炭素を主成分とする被膜を形成する方法 |
| WO2001032513A1 (fr) * | 1999-11-04 | 2001-05-10 | Mitsubishi Shoji Plastics Corporation | Recipient en plastique revetu d'une couche de cda exempte d'azote, procede et appareil utilises pour sa fabrication |
| JP2006161075A (ja) * | 2004-12-03 | 2006-06-22 | Shinko Seiki Co Ltd | 硬質炭素膜およびその形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS635468B2 (enrdf_load_stackoverflow) | 1988-02-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA1191477A (en) | X-ray mask substrate and method of fabrication thereof | |
| EP0743375B1 (en) | Method of producing diamond-like-carbon coatings | |
| CN1130924A (zh) | 沉积第iiia族金属薄膜的方法 | |
| JPS6171626A (ja) | グロー放電による硬質の炭素質膜の堆積方法及び該方法により堆積された膜を有する半導体デバイス | |
| EP0918100B1 (en) | Method for producing homoepitaxial diamond thin film | |
| David et al. | Plasma deposition and etching of diamond‐like carbon films | |
| Poll et al. | Optical properties of plasma polymer films | |
| JPS62174378A (ja) | 硬質炭素薄膜の形成方法 | |
| Zhang et al. | Investigation of working pressure on the surface roughness controlling technology of glow discharge polymer films based on the diagnosed plasma | |
| JP3587622B2 (ja) | エッチングガス | |
| CN1065926C (zh) | 金刚石红外增透滤光窗口及其制备方法 | |
| US5035917A (en) | Method of preparing layers of vinylidene fluoride polymers and vinylidene fluoride/trifluoroethylene copolymers on a substrate | |
| JPS62174379A (ja) | 硬質炭素薄膜の形成方法 | |
| Gazicki | Plasma Deposition of Thin Carbon⧸ Germanium Alloy Films from Organogermanium Compounds | |
| Jiang et al. | Structure evolution of fluorinated diamond-like carbon films prepared at varying source gas flow ratios | |
| Therasse et al. | Effects of deposition temperature on the structure of amorphous carbon nitride films | |
| JPH06507672A (ja) | 薄い、ミクロ細孔の無い導電性重合膜の製造方法 | |
| JPS61159426A (ja) | プラズマ重合体膜の形成方法 | |
| JP3057072B2 (ja) | ダイヤモンド状炭素膜作製方法 | |
| JPH01261214A (ja) | ダイヤモンド含有膜または硬質カーボン膜の製造方法 | |
| JPS59182521A (ja) | 水素化シリコン薄膜の形成方法 | |
| Chu et al. | Effects of different nitrogen/methane ratios on the residual stress of aC: N thin films prepared by plasma enhanced chemical vapor deposition | |
| JPH01238024A (ja) | 半導体装置の酸化膜の製造法 | |
| JPS62177071A (ja) | 被覆物品の製造方法 | |
| Kashem et al. | Formation of carbon-gold-sulfide conductive granular molecules by a cooperation process of plasma CVD and sputtering |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |