JPS62172000A - 2−6族化合物の単結晶成長法 - Google Patents

2−6族化合物の単結晶成長法

Info

Publication number
JPS62172000A
JPS62172000A JP1423286A JP1423286A JPS62172000A JP S62172000 A JPS62172000 A JP S62172000A JP 1423286 A JP1423286 A JP 1423286A JP 1423286 A JP1423286 A JP 1423286A JP S62172000 A JPS62172000 A JP S62172000A
Authority
JP
Japan
Prior art keywords
crystal growth
ampoule
temperature
growth
single crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1423286A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0369880B2 (cs
Inventor
Tomoji Yamagami
山上 智司
Yoshitaka Tomomura
好隆 友村
Masahiko Kitagawa
雅彦 北川
Shigeo Nakajima
中島 重夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP1423286A priority Critical patent/JPS62172000A/ja
Publication of JPS62172000A publication Critical patent/JPS62172000A/ja
Publication of JPH0369880B2 publication Critical patent/JPH0369880B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP1423286A 1986-01-24 1986-01-24 2−6族化合物の単結晶成長法 Granted JPS62172000A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1423286A JPS62172000A (ja) 1986-01-24 1986-01-24 2−6族化合物の単結晶成長法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1423286A JPS62172000A (ja) 1986-01-24 1986-01-24 2−6族化合物の単結晶成長法

Publications (2)

Publication Number Publication Date
JPS62172000A true JPS62172000A (ja) 1987-07-28
JPH0369880B2 JPH0369880B2 (cs) 1991-11-05

Family

ID=11855325

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1423286A Granted JPS62172000A (ja) 1986-01-24 1986-01-24 2−6族化合物の単結晶成長法

Country Status (1)

Country Link
JP (1) JPS62172000A (cs)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101922041A (zh) * 2009-06-10 2010-12-22 硅电子股份公司 硅单晶的拉制方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49129694A (cs) * 1973-04-04 1974-12-12
JPS59164695A (ja) * 1983-03-10 1984-09-17 Matsushita Electric Ind Co Ltd 単結晶の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49129694A (cs) * 1973-04-04 1974-12-12
JPS59164695A (ja) * 1983-03-10 1984-09-17 Matsushita Electric Ind Co Ltd 単結晶の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101922041A (zh) * 2009-06-10 2010-12-22 硅电子股份公司 硅单晶的拉制方法

Also Published As

Publication number Publication date
JPH0369880B2 (cs) 1991-11-05

Similar Documents

Publication Publication Date Title
US4999082A (en) Process for producing monocrystalline group II-IV or group III-V compounds and products thereof
Epelbaum et al. Approaches to seeded PVT growth of AIN crystals
US4866007A (en) Method for preparing single-crystal ZnSe
CN109576777A (zh) 晶体生长用双层坩埚及晶体生长工艺
JPS62172000A (ja) 2−6族化合物の単結晶成長法
KR101530349B1 (ko) 사파이어 초고온 단결정 성장로 단열 구조
JP3231050B2 (ja) 化合物半導体の結晶成長法
CN209537670U (zh) 晶体生长用双层坩埚
JPH06298600A (ja) SiC単結晶の成長方法
JP2680617B2 (ja) 炭化ケイ素単結晶の成長方法
Fornari Electronic materials and crystal growth
JPH0614479Y2 (ja) 炭化ケイ素単結晶の液相エピタキシヤル成長装置
JP2579336B2 (ja) 青色発光ダイオードの製造方法
JPS62153192A (ja) 化合物半導体の結晶成長方法
JPH08290991A (ja) 化合物半導体単結晶の成長方法
JPH0450188A (ja) 単結晶の製造方法および製造装置
Rudolph et al. The state of the art of ZnSe melt growth and new steps towards twin-free bulk crystals
JP3132034B2 (ja) 化合物半導体結晶の育成方法
JP2004323271A (ja) Si添加砒化ガリウム単結晶基板
JPH01133998A (ja) SiC単結晶の液相エピタキシヤル成長方法
JPS627693A (ja) 化合物半導体単結晶の成長装置
JPH05270994A (ja) Ii−vi族単結晶の製造方法
JPH0631192B2 (ja) 半導体単結晶の製造方法及び装置
JPH04348086A (ja) 液相エピタキシャル成長方法
JPS62197388A (ja) 半導体単結晶の製造法およびそのための装置