JPS62165920A - エツチング終点判定装置 - Google Patents

エツチング終点判定装置

Info

Publication number
JPS62165920A
JPS62165920A JP643686A JP643686A JPS62165920A JP S62165920 A JPS62165920 A JP S62165920A JP 643686 A JP643686 A JP 643686A JP 643686 A JP643686 A JP 643686A JP S62165920 A JPS62165920 A JP S62165920A
Authority
JP
Japan
Prior art keywords
end point
etching
photoelectric conversion
value
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP643686A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0457092B2 (enrdf_load_html_response
Inventor
Tatsuo Moroi
師井　達夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP643686A priority Critical patent/JPS62165920A/ja
Publication of JPS62165920A publication Critical patent/JPS62165920A/ja
Publication of JPH0457092B2 publication Critical patent/JPH0457092B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP643686A 1986-01-17 1986-01-17 エツチング終点判定装置 Granted JPS62165920A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP643686A JPS62165920A (ja) 1986-01-17 1986-01-17 エツチング終点判定装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP643686A JPS62165920A (ja) 1986-01-17 1986-01-17 エツチング終点判定装置

Publications (2)

Publication Number Publication Date
JPS62165920A true JPS62165920A (ja) 1987-07-22
JPH0457092B2 JPH0457092B2 (enrdf_load_html_response) 1992-09-10

Family

ID=11638346

Family Applications (1)

Application Number Title Priority Date Filing Date
JP643686A Granted JPS62165920A (ja) 1986-01-17 1986-01-17 エツチング終点判定装置

Country Status (1)

Country Link
JP (1) JPS62165920A (enrdf_load_html_response)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0348423A (ja) * 1989-07-17 1991-03-01 Hitachi Ltd 終点判定方法および装置
US5118378A (en) * 1989-10-10 1992-06-02 Hitachi, Ltd. Apparatus for detecting an end point of etching
JPH0587943U (ja) * 1992-04-28 1993-11-26 国際電気株式会社 ドライエッチング装置の終点検出器
US5626714A (en) * 1994-12-08 1997-05-06 Sumitomo Metal Industries Limited Method for detecting etching endpoint and etching apparatus and etching system using the method thereof
US6149761A (en) * 1994-12-08 2000-11-21 Sumitomo Metal Industries Limited Etching apparatus and etching system using the method thereof

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6239294B2 (ja) 2013-07-18 2017-11-29 株式会社日立ハイテクノロジーズ プラズマ処理装置及びプラズマ処理装置の運転方法
CN113302722B (zh) 2019-12-23 2023-12-08 株式会社日立高新技术 等离子处理方法以及等离子处理中使用的波长选择方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60148120A (ja) * 1984-01-13 1985-08-05 Hitachi Ltd ドライエツチング装置
JPS60220848A (ja) * 1984-04-18 1985-11-05 Hitachi Ltd プラズマ利用装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60148120A (ja) * 1984-01-13 1985-08-05 Hitachi Ltd ドライエツチング装置
JPS60220848A (ja) * 1984-04-18 1985-11-05 Hitachi Ltd プラズマ利用装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0348423A (ja) * 1989-07-17 1991-03-01 Hitachi Ltd 終点判定方法および装置
US5118378A (en) * 1989-10-10 1992-06-02 Hitachi, Ltd. Apparatus for detecting an end point of etching
JPH0587943U (ja) * 1992-04-28 1993-11-26 国際電気株式会社 ドライエッチング装置の終点検出器
US5626714A (en) * 1994-12-08 1997-05-06 Sumitomo Metal Industries Limited Method for detecting etching endpoint and etching apparatus and etching system using the method thereof
US5885472A (en) * 1994-12-08 1999-03-23 Sumitomo Metal Industries Limited Method for detecting etching endpoint, and etching apparatus and etching system using the method thereof
US6149761A (en) * 1994-12-08 2000-11-21 Sumitomo Metal Industries Limited Etching apparatus and etching system using the method thereof

Also Published As

Publication number Publication date
JPH0457092B2 (enrdf_load_html_response) 1992-09-10

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