JPS62163933U - - Google Patents

Info

Publication number
JPS62163933U
JPS62163933U JP5250586U JP5250586U JPS62163933U JP S62163933 U JPS62163933 U JP S62163933U JP 5250586 U JP5250586 U JP 5250586U JP 5250586 U JP5250586 U JP 5250586U JP S62163933 U JPS62163933 U JP S62163933U
Authority
JP
Japan
Prior art keywords
lamp
semiconductor wafer
heating device
light source
source lamp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5250586U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5250586U priority Critical patent/JPS62163933U/ja
Publication of JPS62163933U publication Critical patent/JPS62163933U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例の概略断面図、第2
図は従来装置の概略断面図である。 1…装置本体、2…反応管、3…ガス導入管、
5…ランプ、6…反射板、7…水冷装置、8…ウ
エハ載置台、8a…蓋部、9…蓋体、10,11
,17,18…Oリング、12…ボルト、13…
枝管、14…放射温度計。
Fig. 1 is a schematic sectional view of one embodiment of the present invention;
The figure is a schematic cross-sectional view of a conventional device. 1... Apparatus main body, 2... Reaction tube, 3... Gas introduction tube,
5... Lamp, 6... Reflector, 7... Water cooling device, 8... Wafer mounting table, 8a... Lid, 9... Lid, 10, 11
, 17, 18...O ring, 12...bolt, 13...
Branch pipe, 14... Radiation thermometer.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体ウエハを光源ランプからの光の照射で昇
温し、加熱処理を行うランプ加熱装置において、
半導体ウエハを設置する反応管内は、光源ランプ
の設けられている空間及び外気とは遮断されるこ
とを特徴とするランプ加熱装置。
In a lamp heating device that heats a semiconductor wafer by irradiating it with light from a light source lamp,
A lamp heating device characterized in that the interior of a reaction tube in which a semiconductor wafer is placed is isolated from a space in which a light source lamp is provided and from the outside air.
JP5250586U 1986-04-08 1986-04-08 Pending JPS62163933U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5250586U JPS62163933U (en) 1986-04-08 1986-04-08

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5250586U JPS62163933U (en) 1986-04-08 1986-04-08

Publications (1)

Publication Number Publication Date
JPS62163933U true JPS62163933U (en) 1987-10-17

Family

ID=30877730

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5250586U Pending JPS62163933U (en) 1986-04-08 1986-04-08

Country Status (1)

Country Link
JP (1) JPS62163933U (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60133719A (en) * 1983-12-21 1985-07-16 Seiko Epson Corp Manufacture of compound semiconductor device
JPS60253939A (en) * 1984-05-31 1985-12-14 Fujitsu Ltd Measuring method of substrate temperature

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60133719A (en) * 1983-12-21 1985-07-16 Seiko Epson Corp Manufacture of compound semiconductor device
JPS60253939A (en) * 1984-05-31 1985-12-14 Fujitsu Ltd Measuring method of substrate temperature

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