JPS62160691U - - Google Patents
Info
- Publication number
- JPS62160691U JPS62160691U JP4910986U JP4910986U JPS62160691U JP S62160691 U JPS62160691 U JP S62160691U JP 4910986 U JP4910986 U JP 4910986U JP 4910986 U JP4910986 U JP 4910986U JP S62160691 U JPS62160691 U JP S62160691U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- dry air
- pressure
- injection device
- pressure water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 11
- 238000002347 injection Methods 0.000 claims description 5
- 239000007924 injection Substances 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 4
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Manufacturing Optical Record Carriers (AREA)
Description
第１図は本考案に係る基板洗浄装置の実施例を
示す斜視図である。第２図は第１図の基板洗浄装
置を作動したとき、回転テーブル上に形成される
エアスクリーン、および高圧水と高圧乾気の基板
面上の流れを示す説明図である。
１……回転テーブル、２……エアスクリーン形
成装置、３……高圧水噴射装置、４……高圧乾気
噴射装置。
FIG. 1 is a perspective view showing an embodiment of a substrate cleaning apparatus according to the present invention. FIG. 2 is an explanatory diagram showing the air screen formed on the rotary table and the flow of high-pressure water and high-pressure dry air over the substrate surface when the substrate cleaning apparatus of FIG. 1 is operated. 1...Rotary table, 2...Air screen forming device, 3...High pressure water injection device, 4...High pressure dry air injection device.
Claims (1)
ル上に載置された基板に向けて高圧水を噴射して
、基板の表面に付着した異物を除去する基板洗浄
装置において、 前記回転テーブルの上方の定位置に設けられて
いて、回転テーブル上に載置された基板に対し高
圧乾気を環状に噴射するエアスクリーン形成装置
と、 実質的に基板の半径方向外側に向けて高圧水を
基板に噴射する高圧水噴射装置と、 実質的に基板の半径方向外側に向けて高圧乾気
を基板に噴射する高圧乾気噴射装置とを有し、 前記高圧水噴射装置および高圧乾気噴射装置か
ら噴射される高圧水および高圧乾気の噴射方向は
基板の半径方向に沿つて移動できることを特徴と
する基板洗浄装置。[Claims for Utility Model Registration] In a substrate cleaning device that removes foreign matter attached to the surface of a substrate by jetting high-pressure water toward the substrate placed on a rotating table that rotates around a fixed rotation center. , an air screen forming device that is provided at a fixed position above the rotary table and injects high-pressure dry air in an annular manner onto the substrate placed on the rotary table; and a high-pressure dry air injection device that injects high-pressure dry air onto the substrate substantially radially outward of the substrate, the high-pressure water injection device and the high-pressure A substrate cleaning device characterized in that the directions of high pressure water and high pressure dry air injected from a dry air injection device can be moved along the radial direction of the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4910986U JPS62160691U (en) | 1986-04-02 | 1986-04-02 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4910986U JPS62160691U (en) | 1986-04-02 | 1986-04-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62160691U true JPS62160691U (en) | 1987-10-13 |
Family
ID=30871252
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4910986U Pending JPS62160691U (en) | 1986-04-02 | 1986-04-02 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62160691U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013056310A (en) * | 2011-09-09 | 2013-03-28 | Olympus Corp | Cleaning apparatus |
-
1986
- 1986-04-02 JP JP4910986U patent/JPS62160691U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013056310A (en) * | 2011-09-09 | 2013-03-28 | Olympus Corp | Cleaning apparatus |
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