JPS62153957A - フォトマスクブランクとフォトマスク - Google Patents

フォトマスクブランクとフォトマスク

Info

Publication number
JPS62153957A
JPS62153957A JP60294610A JP29461085A JPS62153957A JP S62153957 A JPS62153957 A JP S62153957A JP 60294610 A JP60294610 A JP 60294610A JP 29461085 A JP29461085 A JP 29461085A JP S62153957 A JPS62153957 A JP S62153957A
Authority
JP
Japan
Prior art keywords
glass substrate
light
photomask
shielding film
nitrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60294610A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0473940B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Hisao Kawai
河合　久雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP60294610A priority Critical patent/JPS62153957A/ja
Publication of JPS62153957A publication Critical patent/JPS62153957A/ja
Publication of JPH0473940B2 publication Critical patent/JPH0473940B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60294610A 1985-12-27 1985-12-27 フォトマスクブランクとフォトマスク Granted JPS62153957A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60294610A JPS62153957A (ja) 1985-12-27 1985-12-27 フォトマスクブランクとフォトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60294610A JPS62153957A (ja) 1985-12-27 1985-12-27 フォトマスクブランクとフォトマスク

Publications (2)

Publication Number Publication Date
JPS62153957A true JPS62153957A (ja) 1987-07-08
JPH0473940B2 JPH0473940B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-11-25

Family

ID=17809986

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60294610A Granted JPS62153957A (ja) 1985-12-27 1985-12-27 フォトマスクブランクとフォトマスク

Country Status (1)

Country Link
JP (1) JPS62153957A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009294681A (ja) * 2009-09-24 2009-12-17 Shin-Etsu Chemical Co Ltd フォトマスクブランク及びフォトマスク

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5831336A (ja) * 1981-08-19 1983-02-24 Konishiroku Photo Ind Co Ltd ホトマスク素材
JPS60176235A (ja) * 1984-02-22 1985-09-10 Nippon Kogaku Kk <Nikon> Ｘ線露光用マスク原板
JPS60202441A (ja) * 1984-03-27 1985-10-12 Mitsubishi Electric Corp 半導体装置用パタ−ン形成マスク

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5831336A (ja) * 1981-08-19 1983-02-24 Konishiroku Photo Ind Co Ltd ホトマスク素材
JPS60176235A (ja) * 1984-02-22 1985-09-10 Nippon Kogaku Kk <Nikon> Ｘ線露光用マスク原板
JPS60202441A (ja) * 1984-03-27 1985-10-12 Mitsubishi Electric Corp 半導体装置用パタ−ン形成マスク

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009294681A (ja) * 2009-09-24 2009-12-17 Shin-Etsu Chemical Co Ltd フォトマスクブランク及びフォトマスク

Also Published As

Publication number Publication date
JPH0473940B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-11-25

Similar Documents

Publication Publication Date Title
JP3397933B2 (ja) 位相シフトフォトマスクブランクス、位相シフトフォトマスク、及びそれらの製造方法。
US4363846A (en) Photomask and photomask blank
JPS6363896B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
US4321104A (en) Photoetching method
CN103376642B (zh) 光掩模坯料及其制造方法
TWI453532B (zh) 空白罩幕、光罩及其製造方法
US4374912A (en) Photomask and photomask blank
JPS5851412B2 (ja) 半導体装置の微細加工方法
US4556608A (en) Photomask blank and photomask
JPH0137728B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPS62282445A (ja) 検査用基板とその製造方法
JPH0469933B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP0054736A2 (en) Photomask and photomask blank
JPS62153957A (ja) フォトマスクブランクとフォトマスク
EP0103844B1 (en) X-ray mask
JP2556534B2 (ja) フォトマスクブランク
JPS6322575B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPS61240243A (ja) フオトマスクブランクおよびフオトマスク
JPH0434436A (ja) フォトマスクブランク、フォトマスク及びその製造方法
JPS6111749A (ja) フオトマスクブランク
JPS6251460B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPS6227386B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPS646449B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPS6227387B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPS6235361A (ja) フオトマスク材料

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term