JPS62144341A - 導体を電気的に断絶する方法及び装置 - Google Patents
導体を電気的に断絶する方法及び装置Info
- Publication number
- JPS62144341A JPS62144341A JP61295699A JP29569986A JPS62144341A JP S62144341 A JPS62144341 A JP S62144341A JP 61295699 A JP61295699 A JP 61295699A JP 29569986 A JP29569986 A JP 29569986A JP S62144341 A JPS62144341 A JP S62144341A
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- composite
- silver
- lead
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76886—Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances
- H01L21/76892—Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances modifying the pattern
- H01L21/76894—Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances modifying the pattern using a laser, e.g. laser cutting, laser direct writing, laser repair
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/525—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections
- H01L23/5256—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections comprising fuses, i.e. connections having their state changed from conductive to non-conductive
- H01L23/5258—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections comprising fuses, i.e. connections having their state changed from conductive to non-conductive the change of state resulting from the use of an external beam, e.g. laser beam or ion beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electroplating Methods And Accessories (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/807,676 US4661214A (en) | 1985-12-11 | 1985-12-11 | Method and apparatus for electrically disconnecting conductors |
| US807676 | 1997-02-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62144341A true JPS62144341A (ja) | 1987-06-27 |
Family
ID=25196929
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61295699A Pending JPS62144341A (ja) | 1985-12-11 | 1986-12-11 | 導体を電気的に断絶する方法及び装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US4661214A (enExample) |
| JP (1) | JPS62144341A (enExample) |
| DE (1) | DE3641375A1 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5122440A (en) * | 1988-09-06 | 1992-06-16 | Chien Chung Ping | Ultraviolet curing of photosensitive polyimides |
| US5124238A (en) * | 1988-09-06 | 1992-06-23 | The Boeing Company | Fabrication of microelectronics using photosensitive polyimides |
| US4974048A (en) * | 1989-03-10 | 1990-11-27 | The Boeing Company | Integrated circuit having reroutable conductive paths |
| JPH0383398A (ja) * | 1989-08-26 | 1991-04-09 | Shinko Electric Ind Co Ltd | 配線基板及びその製造方法 |
| US5112448A (en) * | 1989-11-28 | 1992-05-12 | The Boeing Company | Self-aligned process for fabrication of interconnect structures in semiconductor applications |
| US5102506A (en) * | 1991-04-10 | 1992-04-07 | The Boeing Company | Zinc-based microfuse |
| GB2260219B (en) * | 1991-10-01 | 1995-08-30 | Northern Telecom Ltd | Improvements in integrated circuits |
| US5963825A (en) * | 1992-08-26 | 1999-10-05 | Hyundai Electronics America | Method of fabrication of semiconductor fuse with polysilicon plate |
| JPH07211715A (ja) * | 1994-01-20 | 1995-08-11 | Toshiba Corp | 半導体装置の製造方法 |
| US6734455B2 (en) * | 2001-03-15 | 2004-05-11 | Micron Technology, Inc. | Agglomeration elimination for metal sputter deposition of chalcogenides |
| TWM362572U (en) * | 2009-04-13 | 2009-08-01 | Phytrex Technology Corp | Signal convertor |
| US20140097003A1 (en) * | 2012-10-05 | 2014-04-10 | Tyco Electronics Amp Gmbh | Electrical components and methods and systems of manufacturing electrical components |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3801366A (en) * | 1971-02-16 | 1974-04-02 | J Lemelson | Method of making an electrical circuit |
| US4318978A (en) * | 1976-11-05 | 1982-03-09 | Corning Glass Works | Photosensitive film and methods |
-
1985
- 1985-12-11 US US06/807,676 patent/US4661214A/en not_active Expired - Fee Related
-
1986
- 1986-12-04 DE DE19863641375 patent/DE3641375A1/de active Granted
- 1986-12-11 JP JP61295699A patent/JPS62144341A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE3641375A1 (de) | 1987-06-19 |
| US4661214A (en) | 1987-04-28 |
| DE3641375C2 (enExample) | 1990-10-04 |
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