JPS6214108B2 - - Google Patents
Info
- Publication number
- JPS6214108B2 JPS6214108B2 JP55039460A JP3946080A JPS6214108B2 JP S6214108 B2 JPS6214108 B2 JP S6214108B2 JP 55039460 A JP55039460 A JP 55039460A JP 3946080 A JP3946080 A JP 3946080A JP S6214108 B2 JPS6214108 B2 JP S6214108B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- insulating film
- gate
- polycrystalline layer
- impurity density
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
- H01L23/53204—Conductive materials
- H01L23/53271—Conductive materials containing semiconductor material, e.g. polysilicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3946080A JPS56135974A (en) | 1980-03-27 | 1980-03-27 | Field effect semiconductor device of junction type and manufacture thereof |
| GB8109383A GB2072947B (en) | 1980-03-27 | 1981-03-25 | Junction type field effect semiconductor device and a method of fabricating the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3946080A JPS56135974A (en) | 1980-03-27 | 1980-03-27 | Field effect semiconductor device of junction type and manufacture thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56135974A JPS56135974A (en) | 1981-10-23 |
| JPS6214108B2 true JPS6214108B2 (enExample) | 1987-03-31 |
Family
ID=12553650
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3946080A Granted JPS56135974A (en) | 1980-03-27 | 1980-03-27 | Field effect semiconductor device of junction type and manufacture thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56135974A (enExample) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5852352B2 (ja) * | 1977-12-14 | 1983-11-22 | 日本電信電話株式会社 | 電界効果型トランジスタの製法 |
-
1980
- 1980-03-27 JP JP3946080A patent/JPS56135974A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56135974A (en) | 1981-10-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4757028A (en) | Process for preparing a silicon carbide device | |
| US4845046A (en) | Process for producing semiconductor devices by self-alignment technology | |
| US4587712A (en) | Method for making vertical channel field controlled device employing a recessed gate structure | |
| JPS63140571A (ja) | バイポ−ラトランジスタおよびその製造方法 | |
| JPH06177154A (ja) | Mos fetの製造方法と構造 | |
| JPH0526352B2 (enExample) | ||
| JPS61231761A (ja) | 半導体装置 | |
| US4352238A (en) | Process for fabricating a vertical static induction device | |
| US4449284A (en) | Method of manufacturing an integrated circuit device having vertical field effect transistors | |
| JPH01209766A (ja) | 縦型電界効果トランジスタ及びその製造方法 | |
| JPH07183528A (ja) | 薄膜トランジスタ | |
| JPS6214108B2 (enExample) | ||
| JPH05114734A (ja) | 半導体装置 | |
| JPH0728043B2 (ja) | 半導体装置 | |
| JP2672596B2 (ja) | 半導体装置の製造方法 | |
| JPH0548108A (ja) | 半導体装置およびその製造方法 | |
| JPS6313352B2 (enExample) | ||
| JPS6214103B2 (enExample) | ||
| JPH01147864A (ja) | 半導体装置 | |
| JPH0621461A (ja) | 薄膜トランジスタ | |
| JPS6237541B2 (enExample) | ||
| JPH0810704B2 (ja) | 半導体装置の製造方法 | |
| JPH0770716B2 (ja) | 半導体装置の製造方法 | |
| GB2072947A (en) | Junction type field effect semiconductor device and a method of fabricating the same | |
| JPS61147575A (ja) | 半導体装置の製造方法 |