JPS62126362U - - Google Patents
Info
- Publication number
- JPS62126362U JPS62126362U JP16943986U JP16943986U JPS62126362U JP S62126362 U JPS62126362 U JP S62126362U JP 16943986 U JP16943986 U JP 16943986U JP 16943986 U JP16943986 U JP 16943986U JP S62126362 U JPS62126362 U JP S62126362U
- Authority
- JP
- Japan
- Prior art keywords
- support stand
- workpiece
- gas
- chamber
- flow rate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007789 gas Substances 0.000 claims 4
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000006698 induction Effects 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986169439U JPH0111721Y2 (nl) | 1986-11-04 | 1986-11-04 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986169439U JPH0111721Y2 (nl) | 1986-11-04 | 1986-11-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62126362U true JPS62126362U (nl) | 1987-08-11 |
JPH0111721Y2 JPH0111721Y2 (nl) | 1989-04-06 |
Family
ID=31103250
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1986169439U Expired JPH0111721Y2 (nl) | 1986-11-04 | 1986-11-04 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0111721Y2 (nl) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006274390A (ja) * | 2005-03-30 | 2006-10-12 | Yamaguchi Prefecture | SiNxOyCz膜及び薄膜の成膜方法 |
JP2012152732A (ja) * | 2011-01-26 | 2012-08-16 | 秉豊 ▲頼▼ | プラズマ反応方法及びプラズマ反応装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53144891A (en) * | 1977-05-25 | 1978-12-16 | Nippon Telegr & Teleph Corp <Ntt> | Method and apparatus for production of inorganic compound |
JPS5488016U (nl) * | 1977-11-30 | 1979-06-21 |
-
1986
- 1986-11-04 JP JP1986169439U patent/JPH0111721Y2/ja not_active Expired
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53144891A (en) * | 1977-05-25 | 1978-12-16 | Nippon Telegr & Teleph Corp <Ntt> | Method and apparatus for production of inorganic compound |
JPS5488016U (nl) * | 1977-11-30 | 1979-06-21 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006274390A (ja) * | 2005-03-30 | 2006-10-12 | Yamaguchi Prefecture | SiNxOyCz膜及び薄膜の成膜方法 |
JP2012152732A (ja) * | 2011-01-26 | 2012-08-16 | 秉豊 ▲頼▼ | プラズマ反応方法及びプラズマ反応装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH0111721Y2 (nl) | 1989-04-06 |
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