JPS62125827A - 三塩化ホウ素含有ガスの除害法 - Google Patents
三塩化ホウ素含有ガスの除害法Info
- Publication number
- JPS62125827A JPS62125827A JP60265567A JP26556785A JPS62125827A JP S62125827 A JPS62125827 A JP S62125827A JP 60265567 A JP60265567 A JP 60265567A JP 26556785 A JP26556785 A JP 26556785A JP S62125827 A JPS62125827 A JP S62125827A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- harm
- liquid
- boron trichloride
- liquid contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 title claims abstract description 15
- 238000000034 method Methods 0.000 title claims description 25
- 239000007788 liquid Substances 0.000 claims abstract description 30
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000007864 aqueous solution Substances 0.000 claims description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims 3
- 239000007787 solid Substances 0.000 abstract description 6
- 238000006460 hydrolysis reaction Methods 0.000 abstract description 5
- 229910015844 BCl3 Inorganic materials 0.000 abstract description 4
- 230000007062 hydrolysis Effects 0.000 abstract description 4
- 239000003513 alkali Substances 0.000 abstract description 2
- 239000006260 foam Substances 0.000 abstract description 2
- 238000007796 conventional method Methods 0.000 description 4
- 239000006096 absorbing agent Substances 0.000 description 2
- 239000003463 adsorbent Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000779 smoke Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000004868 gas analysis Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60265567A JPS62125827A (ja) | 1985-11-25 | 1985-11-25 | 三塩化ホウ素含有ガスの除害法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60265567A JPS62125827A (ja) | 1985-11-25 | 1985-11-25 | 三塩化ホウ素含有ガスの除害法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62125827A true JPS62125827A (ja) | 1987-06-08 |
| JPH0580243B2 JPH0580243B2 (enrdf_load_stackoverflow) | 1993-11-08 |
Family
ID=17418908
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60265567A Granted JPS62125827A (ja) | 1985-11-25 | 1985-11-25 | 三塩化ホウ素含有ガスの除害法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62125827A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0792681A1 (en) | 1996-02-29 | 1997-09-03 | Japan Pionics Co., Ltd. | Process for cleaning a halogen containing gas |
| WO1999020374A1 (fr) * | 1997-10-17 | 1999-04-29 | Ebara Corporation | Procede et appareil de traitement de gaz d'echappement issus de la fabrication de semiconducteurs |
| JP2001259358A (ja) * | 2000-03-16 | 2001-09-25 | Sumitomo Seika Chem Co Ltd | 排ガス処理装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5322568U (enrdf_load_stackoverflow) * | 1976-08-04 | 1978-02-25 |
-
1985
- 1985-11-25 JP JP60265567A patent/JPS62125827A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5322568U (enrdf_load_stackoverflow) * | 1976-08-04 | 1978-02-25 |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0792681A1 (en) | 1996-02-29 | 1997-09-03 | Japan Pionics Co., Ltd. | Process for cleaning a halogen containing gas |
| US5756060A (en) * | 1996-02-29 | 1998-05-26 | Japan Pionics Co., Ltd. | Process for cleaning harmful gas |
| WO1999020374A1 (fr) * | 1997-10-17 | 1999-04-29 | Ebara Corporation | Procede et appareil de traitement de gaz d'echappement issus de la fabrication de semiconducteurs |
| US6953557B1 (en) * | 1997-10-17 | 2005-10-11 | Ebara Corporation | Process and apparatus for treating semiconductor production exhaust gases |
| JP2001259358A (ja) * | 2000-03-16 | 2001-09-25 | Sumitomo Seika Chem Co Ltd | 排ガス処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0580243B2 (enrdf_load_stackoverflow) | 1993-11-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |