JPS62125697A - Manufacture of electric circuit forming substrate - Google Patents

Manufacture of electric circuit forming substrate

Info

Publication number
JPS62125697A
JPS62125697A JP60265718A JP26571885A JPS62125697A JP S62125697 A JPS62125697 A JP S62125697A JP 60265718 A JP60265718 A JP 60265718A JP 26571885 A JP26571885 A JP 26571885A JP S62125697 A JPS62125697 A JP S62125697A
Authority
JP
Japan
Prior art keywords
heat
electric circuit
adhesive
resistant insulating
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60265718A
Other languages
Japanese (ja)
Inventor
浩 川合
伸一 真鍋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP60265718A priority Critical patent/JPS62125697A/en
Publication of JPS62125697A publication Critical patent/JPS62125697A/en
Pending legal-status Critical Current

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  • Laminated Bodies (AREA)
  • Insulated Metal Substrates For Printed Circuits (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 [産業上の利用分野1 本発明は電気回路形成用基盤の製造方法に関し、さらt
こ詳しくは、外観lこ膨れ等の異常のない高い接着強度
が得られる金属箔・耐熱絶縁層・金属基板よりなる三層
構造の電気回路形成用基盤を製造する方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field 1] The present invention relates to a method for manufacturing a board for forming an electric circuit, and further relates to a method for manufacturing a board for forming an electric circuit.
More specifically, the present invention relates to a method for manufacturing a three-layer structure base for forming an electric circuit consisting of a metal foil, a heat-resistant insulating layer, and a metal substrate, which exhibits high adhesive strength without abnormalities such as bulges in appearance.

[従来技術1 従来において、第2図(a)に示すような金属箔・耐熱
絶縁層(接着剤・耐熱絶縁フィルム・接着剤)・金属基
板よりなる三層構造の電気回路形成用基盤はプレス方式
により製造されていた。即ち、金属基板・ml熱絶縁層
(接着剤・絶縁フィルム・接着剤)・金属箔の三層構造
の素材を複数個積重ねで、熱プレスに常温においてセッ
トし、5回程度のエアー抜きを行ない、20〜40 K
g/cm2の圧力をかけ、加熱して温度を上昇させて約
100℃の温度において再びエアー抜きを行なってから
20−40 kg/cm2の圧力をかけ、1. 、i、
 O−160℃の温度においてまたエアー接ぎを行ない
、さらに、140〜160℃の温度において、20〜4
0 kg/cm2の圧力で40〜60分の処理を行ない
、その後冷却してから熱プレスから取出して電気回路形
成用基盤とする。
[Prior Art 1] Conventionally, a three-layer electric circuit forming board consisting of a metal foil, a heat-resistant insulating layer (adhesive, a heat-resistant insulating film, an adhesive), and a metal substrate as shown in Fig. 2(a) is pressed. It was manufactured by the method. In other words, a plurality of materials with a three-layer structure of metal substrate, ML heat insulating layer (adhesive, insulating film, adhesive), and metal foil are stacked together, set in a heat press at room temperature, and air removed about 5 times. , 20~40K
Apply a pressure of g/cm2, heat to raise the temperature, remove air again at a temperature of about 100°C, then apply a pressure of 20-40 kg/cm2, 1. ,i,
Air grafting is carried out again at a temperature of O-160°C, and then at a temperature of 140-160°C, 20-4
The product is treated at a pressure of 0 kg/cm2 for 40 to 60 minutes, and then cooled and taken out from the hot press to use as a base for forming an electric circuit.

この熱プレス方式よると、金属基盤・耐熱絶縁層(接着
剤・耐熱絶縁フィルム・接着剤)・金属箔の三層構造の
電気回路形成用基盤の製造に長時間を要し、さらに、接
着強度を1−げなければならないという問題がある。
According to this heat press method, it takes a long time to manufacture a board for forming an electric circuit, which has a three-layer structure of a metal base, a heat-resistant insulating layer (adhesive, a heat-resistant insulating film, and an adhesive), and a metal foil. The problem is that we have to give 1-.

1発明が解決しようとする問題点] 本発明は上記に説明したJ:うに、従来におけるバッフ
式のプレス方式による金属箔・耐熱絶縁層・金属基板の
三層構造よりなる電気回路形成用基盤の製造方法におけ
る種ノZの問題点に鑑み、本発明者の鋭意研究の結果、
電気回路形成用基盤の外観に膨れ等の異常かなく、か−
)、接着強度を向l二させる、:とを見出し、性能の優
れた金属箔・耐熱絶縁層・金属基板よりなる三層構造の
電気回路形成用基盤の製造方法を開発したのである。
1. Problems to be Solved by the Invention] The present invention is directed to the above-mentioned J: sea urchin, and to the production of an electric circuit forming substrate having a three-layer structure of metal foil, a heat-resistant insulating layer, and a metal substrate by the conventional buff press method. In view of the problems with Taneno Z in the manufacturing method, as a result of the inventor's intensive research,
Is there any abnormality such as swelling on the appearance of the board for forming the electric circuit?
) and improved adhesive strength, and developed a method for manufacturing a three-layered electrical circuit board consisting of a metal foil, a heat-resistant insulating layer, and a metal substrate with excellent performance.

[問題点を解決するための手段1 本発明に係る電気回路形成用JI(盤の製造方法の特徴
とするところは、長尺の金属箔と長尺の金属基板との間
に耐熱絶縁層が設けられている金属箔・耐熱絶縁層・金
属基板よりなる一ニ一層構造の長尺累月を適宜の・j°
法に切断し、この切断した一F、)−構造の素材を加熱
炉内にJ)いて1.’r +、1−120 ’Cの温度
において2・・・24時間の加熱後、さらに、120〜
200 ’Cの温度において30分以上加熱すること1
こある。
[Means for Solving the Problems 1 The feature of the method for manufacturing an electric circuit forming JI (board) according to the present invention is that a heat-resistant insulating layer is provided between a long metal foil and a long metal substrate. The long and single-layer structure consisting of metal foil, heat-resistant insulating layer, and metal substrate is then
The cut material of the structure is placed in a heating furnace.1. 'r+, after heating for 2...24 hours at a temperature of 1-120'C, further 120~
Heating for at least 30 minutes at a temperature of 200'C1
There it is.

本発明に係る電気回路形成用基盤の製造方法について以
F詳細に説明する。
A method of manufacturing a substrate for forming an electric circuit according to the present invention will be described in detail below.

先ず、本発明に係る電気回路形成用基盤の製造方法にお
いて、使用する材料について説明する。
First, materials used in the method of manufacturing an electric circuit forming board according to the present invention will be explained.

金属箔は導体となるものであるから、111然に導電率
の優れた金属によ1)製造され、厚さは5・−70μと
するのがよい。さらに、この金属箔はアルミニウム、銅
合金、ニンケル、銀或いは導電性を有する金属またはそ
の合金等が使用される。
Since the metal foil is a conductor, it is preferable that it is made of a metal with excellent electrical conductivity and has a thickness of 5.-70 .mu.m. Further, this metal foil may be made of aluminum, copper alloy, nickel, silver, or a conductive metal or an alloy thereof.

耐熱絶縁層は、接着剤・耐熱絶縁フィルム・接着剤或い
は1回置ヒの接着剤の塗布層よりなっており、以下接着
剤と耐熱絶縁フィルムについて説明する。
The heat-resistant insulating layer is composed of an adhesive, a heat-resistant insulating film, an adhesive, or a coated layer of a one-time adhesive.The adhesive and the heat-resistant insulating film will be explained below.

接着剤は比較的電気絶縁性の良好なエボNシ系の接着剤
を使用するのかよく、その他金属との接着力か゛良く、
かつ、電気絶縁性の良好な接着剤、例えば、ポリアミド
・イミド系、シリコーン系、アクリル系、ポリエステル
系、ポリウレタン系のものでも使用することかできる。
It is best to use an Evo-N adhesive that has relatively good electrical insulation properties, and has good adhesion to other metals.
Additionally, adhesives with good electrical insulation properties, such as those based on polyamide/imide, silicone, acrylic, polyester, and polyurethane, may also be used.

また、接着剤の厚さは耐熱絶縁フィルムを合せて電気絶
縁層としては要求される絶縁性から決めるのがよく、約
2()〜200μとするのがよい。なす5、接着剤のみ
からなる耐熱絶縁層とする場合には、この厚さより厚く
するのがよい。
Further, the thickness of the adhesive is preferably determined based on the insulation properties required for the electrical insulation layer including the heat-resistant insulation film, and is preferably about 2(μ) to 200μ. 5. If the heat-resistant insulating layer is made of adhesive only, it is better to make it thicker than this thickness.

耐熱絶縁フィルムはピンホール等の欠陥がなく加熱によ
っても溶融することがない耐熱性を有し、接着剤にも影
響されず、さらに、電気絶縁性の優れたものが必要であ
り、例えば、ポリイミドフィルムが好ましい。この耐熱
絶縁フィルムの厚さは5〜50μとするのがよい。また
、この絶縁フィルムハ」1記の外にポリエステルフィル
ム、ポリエーテルイミド、ポリスルフォンフィルム等も
用途によって使用できる。そして、この絶縁層は金属箔
のパターンエツチングにより何等の影響を受けない。
The heat-resistant insulating film must have heat resistance that does not have defects such as pinholes, does not melt even when heated, is unaffected by adhesives, and has excellent electrical insulation properties.For example, polyimide Films are preferred. The thickness of this heat-resistant insulating film is preferably 5 to 50 microns. In addition to the insulating film described in 1 above, polyester film, polyetherimide, polysulfone film, etc. can also be used depending on the purpose. This insulating layer is not affected in any way by pattern etching of the metal foil.

金属基板は厚さ0.3〜3.Ommの粋通鋼板が或いは
厚さ0.1〜1.OmmのT1−素鋼板を使用する。ま
た、アルミニウム、アルミニウム合金、銅、銅合金も使
用することができる。
The metal substrate has a thickness of 0.3 to 3. Omm steel plate or thickness 0.1~1. Omm T1-base steel plate is used. Additionally, aluminum, aluminum alloys, copper, and copper alloys can also be used.

次に、本発明に係る電気回路形成用基盤の製造方法を第
1図に示す例により説明する。なお、金属箔は銅箔、ま
た、金属基板は鉄基板により説明する。
Next, a method of manufacturing a board for forming an electric circuit according to the present invention will be explained using an example shown in FIG. Note that the metal foil will be described as a copper foil, and the metal substrate will be described as an iron substrate.

即ち、図示していないが、長尺の′jJi1箔に接着剤
を塗布して加熱後耐熱絶縁フィルムを接着してコイル状
とし、この耐熱絶縁フィルムに接着剤を塗布して加熱乾
燥して耐熱絶縁層を形成し、この耐熱絶縁層の接着剤と
予熱された長尺の鉄基板とを接着することにより、鉄基
板・耐熱絶縁層・銅箔の三層構造の電気回路形成用基盤
の累月を製造した(第2図(a)参照)。
That is, although not shown, an adhesive is applied to a long piece of 'jJi1 foil, heated, and then a heat-resistant insulating film is adhered to form a coil. By forming an insulating layer and adhering the adhesive of this heat-resistant insulating layer to a preheated long iron substrate, a three-layer structure of the iron substrate, heat-resistant insulating layer, and copper foil can be assembled into a board for forming an electric circuit. The moon was manufactured (see Figure 2(a)).

また、耐熱絶縁層を接着剤層のみとする場合には、耐熱
絶縁フィルムを使用しないので絶縁性を確保するため銅
箔に接着剤を1回以上塗布して冷却乾燥後、予熱した鉄
基板と接着することにより、三層構造の電気回路形成用
基盤の素材を製造した(第2図(b)参照)。
In addition, when the heat-resistant insulating layer is only an adhesive layer, since a heat-resistant insulating film is not used, adhesive is applied to the copper foil one or more times to ensure insulation, and after cooling and drying, it is attached to a preheated iron substrate. By adhering, a material for a three-layer electric circuit formation substrate was manufactured (see FIG. 2(b)).

しかし、この状態では耐熱性、絶縁性に充分な性能を発
揮できるまて゛に接着剤は充分硬化していないことか多
く、そのため次の硬化処理を行なう。
However, in this state, the adhesive is often not sufficiently cured to exhibit sufficient heat resistance and insulation properties, and therefore the next curing treatment is performed.

この三層構造の素材を適宜の長さに切断し、第1図に示
すような適dr、な熱源により加熱される炉内に、切断
した戸層描込の素材を間隔板をおいて積重ねて台−1−
に載置して−Tfダ階の加熱を行なう。
This three-layer structure material is cut to an appropriate length, and the cut material with the door layer drawn is stacked with spacers in a furnace heated by an appropriate heat source as shown in Figure 1. Table-1-
Place it on the -Tf floor and heat it.

(lIS1図においては三層構造の素材が2個であるが
、可能な限i)数を多くすることかてトる。)先ず、第
1回[1の加熱は、50〜12 (1”Cの温度におい
て2〜24時間の加熱を行なう。この場合、加熱温度が
50’C未満ではたとえ2〜24時間加熱しても充分な
接着強度が得られず、120℃を越える温度では各々の
素材が各々の熱膨張率の差から、膨張に差が顕著に表わ
れ浮上り、剥離する恐れがあり、また、加熱時間が2時
nt1未満では加熱が充分でなく、24時間を越える加
熱は無駄である。
(In the IS1 diagram, there are two materials with a three-layer structure, but it is best to increase the number as much as possible.) ) First, for the first heating, heat for 2 to 24 hours at a temperature of 50 to 12 (1"C). However, at temperatures exceeding 120°C, the difference in thermal expansion coefficients of each material causes a noticeable difference in expansion, which may lead to floating and peeling. If it is less than 2 hours nt1, heating is insufficient, and heating for more than 24 hours is wasteful.

次に、上記第1回[1の加熱が終了すると、接着前の完
全硬化をうながすinめ、第2同の加熱は120〜20
0℃の温度において30分以−1−の加熱を行なう。こ
の時、120℃以Iこに温度を−にげても第1回目の加
熱処理により各々の素材が熱膨張できない程度まで接着
力がでているため、完全硬化反応処理が可能となる。こ
の場合、加熱温度が12 (] ’C未満ではたとえ3
0分以」−加熱しても最終的に硬化がf:充分であり所
望の接着強度が1υられす、また、200℃を越える温
度では高過ぎて素材が剥離し、加熱時間は30分未満で
は不充分で、充分な接着強度が得られない。
Next, when the first heating [1] is completed, the second heating is carried out at a temperature of 120 to 20
Heating is carried out at a temperature of 0° C. for 30 minutes or more. At this time, even if the temperature is lowered to below 120° C., the first heat treatment has produced adhesive strength to such an extent that each material cannot thermally expand, making it possible to perform a complete curing reaction treatment. In this case, if the heating temperature is less than 12 (]'C, even 3
0 minutes or more - Even if heated, the final curing is sufficient and the desired adhesive strength is reduced by 1υ; temperatures exceeding 200°C are too high and the material peels off, so the heating time is less than 30 minutes. is insufficient, and sufficient adhesive strength cannot be obtained.

[実 施例1 本発明に係る電気回路形成用基盤の製造方法について実
施例を説明する。
[Example 1] An example of the method for manufacturing an electric circuit forming board according to the present invention will be described.

実施例 硬化温度か第1反応温度80℃5第2反応温度150℃
の熱硬化型エポキシ系接着剤を銅箔接着面に15μ、耐
熱絶縁フィルムに15μ塗布し、銅箔・耐熱絶縁層(接
着剤・耐熱絶縁フィルム・接着剤)・鉄基板の三層構造
に加熱ロールに上り熱融着を行なった。その時の接着強
度は数百g/cm程度であり、接着剤は未硬化状態であ
った。その後、適宜の寸法に切断した。
Example curing temperature: 1st reaction temperature: 80°C 5: 2nd reaction temperature: 150°C
Apply 15μ of thermosetting epoxy adhesive to the copper foil adhesion surface and 15μ to the heat-resistant insulating film, and heat the three-layer structure of copper foil, heat-resistant insulating layer (adhesive, heat-resistant insulating film, adhesive), and iron substrate. It was put on a roll and heat fused. The adhesive strength at that time was approximately several hundred g/cm, and the adhesive was in an uncured state. Thereafter, it was cut into appropriate dimensions.

(1)この切断された三層構造の素材を、先ず、] (
’) ()’CI′>温度で1時間加熱し、続いて、1
50℃の温度にす)いて1時間の加熱を加圧せずに自由
の状態で行った、。
(1) First, cut this three-layered material into ] (
') ()'CI'>temperature for 1 hour, followed by heating at 1
Heating was carried out at a temperature of 50° C. for 1 hour in a free state without applying pressure.

(2)この切断した五層構造の素材を150℃の温度で
1時間、加圧せずに自由の状態で加熱した。
(2) This cut five-layer structure material was heated in a free state without applying pressure at a temperature of 150° C. for 1 hour.

その結果、(1)の本発明に係る電気回路形成用基盤の
製造方法による加熱では、得られた製品は外観に異常は
なく、26(1℃の温度1こ第5いて5分間のはんだ耐
熱性を有し、接着強度は2kg/cmと優れており、熱
プレス(150℃の温度において1時間の加熱)の場合
と同等の性能が得られた。
As a result, when heated by the method for manufacturing an electric circuit forming board according to the present invention in (1), the obtained product had no abnormal appearance and was resistant to soldering heat for 5 minutes at a temperature of 26 (1°C). The adhesive strength was excellent at 2 kg/cm, and performance equivalent to that obtained by heat pressing (heating at 150° C. for 1 hour) was obtained.

なお、耐熱絶縁層が接着剤のみの場合も−[1記と同様
の結果が得られた。
Note that even when the heat-resistant insulating layer was made of only an adhesive, the same results as in Section 1 were obtained.

(2)の比較例は、外観観察で、鉄基板界面、銅箔界面
至るところに膨れが発生しており、この膨れ部分は接着
しておらず、また、はんだ浴に接触させるとさらに膨れ
が大きくなり、電気回路形成用基盤としては使用不可能
である。
Comparative example (2) was observed to have blisters everywhere on the iron substrate interface and the copper foil interface, and these blisters were not bonded, and further blisters appeared when they came into contact with the solder bath. It becomes large and cannot be used as a base for forming an electric circuit.

従って、本発明に係る電気回路形成用基盤の製造方法の
実施例によれば、銅箔・耐熱絶縁層・鉄基板の三層構造
の製品は、鉄基板、銅箔に膨れの発生がなく、電気回路
形成用基盤としての性能も充分であり、さらに、接着強
度も高いものである。
Therefore, according to the embodiment of the method for manufacturing a board for forming an electric circuit according to the present invention, the product with the three-layer structure of copper foil, heat-resistant insulating layer, and iron substrate has no bulges in the iron substrate and copper foil. It has sufficient performance as a base for forming an electric circuit, and also has high adhesive strength.

[発明の効果1 以り説明したように、本発明に係る電気回路形成用基盤
の製造方法は上記の構成であるから、電気回路形成用基
盤として性能も充分であり、接着強度も高く、かつ、大
量生産に適しているという優れた効果を有するものであ
る。
[Effects of the Invention 1] As explained above, since the method for manufacturing a board for forming an electric circuit according to the present invention has the above configuration, it has sufficient performance as a board for forming an electric circuit, has high adhesive strength, and , which has an excellent effect of being suitable for mass production.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る電気回路形成用基盤の製造方法を
説明するための説明図、第2図は銅箔・耐熱絶縁層・鉄
基板の三層構造の断面図である。
FIG. 1 is an explanatory view for explaining the method of manufacturing a board for forming an electric circuit according to the present invention, and FIG. 2 is a cross-sectional view of a three-layer structure of copper foil, a heat-resistant insulating layer, and an iron substrate.

Claims (1)

【特許請求の範囲】[Claims] 長尺の金属箔と長尺の金属基板との間に耐熱絶縁層が設
けられている金属箔・耐熱絶縁層・金属基板よりなる三
層構造の長尺素材を適宜の寸法に切断し、この切断した
三層構造の素材を加熱炉内において、50〜120℃の
温度において2〜24時間の加熱後、さらに、120〜
200℃の温度において30分以上加熱することを特徴
とする電気回路形成用基盤の製造方法。
A long material with a three-layer structure consisting of a metal foil, a heat-resistant insulating layer, and a metal substrate, in which a heat-resistant insulating layer is provided between the long metal foil and the long metal substrate, is cut into appropriate dimensions. After heating the cut three-layer material in a heating furnace at a temperature of 50 to 120°C for 2 to 24 hours,
A method for manufacturing a board for forming an electric circuit, comprising heating at a temperature of 200° C. for 30 minutes or more.
JP60265718A 1985-11-26 1985-11-26 Manufacture of electric circuit forming substrate Pending JPS62125697A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60265718A JPS62125697A (en) 1985-11-26 1985-11-26 Manufacture of electric circuit forming substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60265718A JPS62125697A (en) 1985-11-26 1985-11-26 Manufacture of electric circuit forming substrate

Publications (1)

Publication Number Publication Date
JPS62125697A true JPS62125697A (en) 1987-06-06

Family

ID=17421043

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60265718A Pending JPS62125697A (en) 1985-11-26 1985-11-26 Manufacture of electric circuit forming substrate

Country Status (1)

Country Link
JP (1) JPS62125697A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62214693A (en) * 1986-03-14 1987-09-21 三菱電線工業株式会社 Manufacture of circuit board

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62214693A (en) * 1986-03-14 1987-09-21 三菱電線工業株式会社 Manufacture of circuit board

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