JPS62121445A - 感光性組成物 - Google Patents

感光性組成物

Info

Publication number
JPS62121445A
JPS62121445A JP26313685A JP26313685A JPS62121445A JP S62121445 A JPS62121445 A JP S62121445A JP 26313685 A JP26313685 A JP 26313685A JP 26313685 A JP26313685 A JP 26313685A JP S62121445 A JPS62121445 A JP S62121445A
Authority
JP
Japan
Prior art keywords
polyether
polyvinyl alcohol
polymer
parts
photosensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP26313685A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0511614B2 (enrdf_load_stackoverflow
Inventor
Toshiaki Sato
寿昭 佐藤
Junnosuke Yamauchi
山内　淳之助
Takuji Okaya
岡谷　卓司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kuraray Co Ltd
Original Assignee
Kuraray Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kuraray Co Ltd filed Critical Kuraray Co Ltd
Priority to JP26313685A priority Critical patent/JPS62121445A/ja
Publication of JPS62121445A publication Critical patent/JPS62121445A/ja
Publication of JPH0511614B2 publication Critical patent/JPH0511614B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP26313685A 1985-11-21 1985-11-21 感光性組成物 Granted JPS62121445A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26313685A JPS62121445A (ja) 1985-11-21 1985-11-21 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26313685A JPS62121445A (ja) 1985-11-21 1985-11-21 感光性組成物

Publications (2)

Publication Number Publication Date
JPS62121445A true JPS62121445A (ja) 1987-06-02
JPH0511614B2 JPH0511614B2 (enrdf_load_stackoverflow) 1993-02-16

Family

ID=17385311

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26313685A Granted JPS62121445A (ja) 1985-11-21 1985-11-21 感光性組成物

Country Status (1)

Country Link
JP (1) JPS62121445A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993006529A1 (en) * 1991-09-14 1993-04-01 San Nopco Limited Photosensitive resin composition
WO2003087939A3 (en) * 2002-04-10 2004-03-04 Kodak Polychrome Graphics Llc On-press developable ir sensitive printing plates using binder resins having polyethylene oxide segments
JP2010032029A (ja) * 2008-07-31 2010-02-12 Hitachi Automotive Systems Ltd シリンダ装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4272611A (en) * 1978-10-26 1981-06-09 Basf Aktiengesellschaft Photopolymerizable composition for the production of printing plates and relief plates, and the elements produced therewith
EP0081964A2 (en) * 1981-12-10 1983-06-22 Toray Industries, Inc. Photosensitive polymer composition
EP0130828A2 (en) * 1983-07-01 1985-01-09 Toray Industries, Inc. Photosensitive resin composition
US4548894A (en) * 1981-07-22 1985-10-22 Basf Aktiengesellschaft Photosensitive recording materials for the production of abrasion-resistant and scratch-resistant gravure printing plates comprising particles

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4272611A (en) * 1978-10-26 1981-06-09 Basf Aktiengesellschaft Photopolymerizable composition for the production of printing plates and relief plates, and the elements produced therewith
US4548894A (en) * 1981-07-22 1985-10-22 Basf Aktiengesellschaft Photosensitive recording materials for the production of abrasion-resistant and scratch-resistant gravure printing plates comprising particles
EP0081964A2 (en) * 1981-12-10 1983-06-22 Toray Industries, Inc. Photosensitive polymer composition
EP0130828A2 (en) * 1983-07-01 1985-01-09 Toray Industries, Inc. Photosensitive resin composition

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993006529A1 (en) * 1991-09-14 1993-04-01 San Nopco Limited Photosensitive resin composition
US6899994B2 (en) 2001-04-04 2005-05-31 Kodak Polychrome Graphics Llc On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments
WO2003087939A3 (en) * 2002-04-10 2004-03-04 Kodak Polychrome Graphics Llc On-press developable ir sensitive printing plates using binder resins having polyethylene oxide segments
JP2010032029A (ja) * 2008-07-31 2010-02-12 Hitachi Automotive Systems Ltd シリンダ装置

Also Published As

Publication number Publication date
JPH0511614B2 (enrdf_load_stackoverflow) 1993-02-16

Similar Documents

Publication Publication Date Title
US4849307A (en) Photosensitive recording materials having a novel graft copolymer binder
US5317080A (en) Polyether acrylamide and active energy ray curable resin composition
EP0277418B1 (en) Photosensitive resin composition
JPS6057057B2 (ja) 印刷版及びレリ−フ版を製造するための光重合可能な混合物
US4167415A (en) Photocurable composition comprising copolymer of maleic acid monoester and α-olefin compound
JPS62121445A (ja) 感光性組成物
JPS62246047A (ja) 感光性組成物
JPH0523428B2 (enrdf_load_stackoverflow)
JP2002023349A (ja) 感光性樹脂凸版材
EP0020782B1 (en) Light-sensitive polyamide resin composition
US4168173A (en) Polymers for increasing the viscosity of photosensitive resins
EP0670521A1 (en) Photosensitive resin composition and process for producing the same
JPH03250013A (ja) ポリエーテルアクリルアミド誘導体及びそれを含んでなる活性エネルギー線硬化性樹脂組成物
JPH0687171B2 (ja) 感光性組成物
JPH0321615A (ja) 凸版印刷版の製版のための光硬化性エラストマー混合物およびそれから得られた記録材料
CA1085537A (en) Polymers for increasing the viscosity of photosensitive resins
JPH0466947A (ja) 感光性組成物
JP3627394B2 (ja) 感光性樹脂凸版材
JPH04218050A (ja) 感光性樹脂組成物
JP3399146B2 (ja) 印刷版用感光性樹脂組成物および感光性樹脂版材
JPH04298506A (ja) ポリビニルアルコール、ポリビニルエステルおよび感光性組成物
JP2938213B2 (ja) 感光性組成物
JPH05232698A (ja) リン含有親水性共重合体の製造方法及び該共重合体を用いた水現像用感光性組成物
JPS62121449A (ja) 感光性の組成物
JPS5836766B2 (ja) ジユシバンヨウソセイブツ

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term