JPS6211515B2 - - Google Patents

Info

Publication number

JPS6211515B2

JPS6211515B2 JP11404476A JP11404476A JPS6211515B2 JP S6211515 B2 JPS6211515 B2 JP S6211515B2 JP 11404476 A JP11404476 A JP 11404476A JP 11404476 A JP11404476 A JP 11404476A JP S6211515 B2 JPS6211515 B2 JP S6211515B2

Authority

JP

Japan

Prior art keywords

forming

region

insulating film

sio

film

Prior art date

1976-09-22

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired

Links

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• 239000000758 substrate Substances 0.000 claims description 18
• 239000004065 semiconductor Substances 0.000 claims description 16
• 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 12
• 238000009792 diffusion process Methods 0.000 claims description 10
• 238000004519 manufacturing process Methods 0.000 claims description 8
• XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
• 239000012535 impurity Substances 0.000 claims description 4
• 229910052710 silicon Inorganic materials 0.000 claims description 4
• 239000010703 silicon Substances 0.000 claims description 4
• 238000005192 partition Methods 0.000 claims 1
• 229910004298 SiO 2 Inorganic materials 0.000 description 27
• 238000000034 method Methods 0.000 description 11
• 230000003647 oxidation Effects 0.000 description 8
• 238000007254 oxidation reaction Methods 0.000 description 8
• 239000013078 crystal Substances 0.000 description 7
• 229910052581 Si3N4 Inorganic materials 0.000 description 6
• HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 6
• 238000005516 engineering process Methods 0.000 description 4
• OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
• KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
• 230000005669 field effect Effects 0.000 description 3
• 238000010438 heat treatment Methods 0.000 description 3
• 229910052698 phosphorus Inorganic materials 0.000 description 3
• 239000011574 phosphorus Substances 0.000 description 3
• KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
• NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
• XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
• 229910052782 aluminium Inorganic materials 0.000 description 2
• 230000015572 biosynthetic process Effects 0.000 description 2
• 230000000694 effects Effects 0.000 description 2
• 238000005530 etching Methods 0.000 description 2
• 229920002120 photoresistant polymer Polymers 0.000 description 2
• UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
• BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
• 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
• 239000011248 coating agent Substances 0.000 description 1
• 238000000576 coating method Methods 0.000 description 1
• 230000008878 coupling Effects 0.000 description 1
• 238000010168 coupling process Methods 0.000 description 1
• 238000005859 coupling reaction Methods 0.000 description 1
• 230000002542 deteriorative effect Effects 0.000 description 1
• 229910052739 hydrogen Inorganic materials 0.000 description 1
• 239000001257 hydrogen Substances 0.000 description 1
• 230000010354 integration Effects 0.000 description 1
• 239000000463 material Substances 0.000 description 1
• 238000002844 melting Methods 0.000 description 1
• 230000008018 melting Effects 0.000 description 1
• 230000003071 parasitic effect Effects 0.000 description 1
• 238000000206 photolithography Methods 0.000 description 1
• 235000011118 potassium hydroxide Nutrition 0.000 description 1
• 229910000077 silane Inorganic materials 0.000 description 1
• 238000005979 thermal decomposition reaction Methods 0.000 description 1
• 238000001947 vapour-phase growth Methods 0.000 description 1