JPS6211492B2 - - Google Patents

Info

Publication number
JPS6211492B2
JPS6211492B2 JP2348977A JP2348977A JPS6211492B2 JP S6211492 B2 JPS6211492 B2 JP S6211492B2 JP 2348977 A JP2348977 A JP 2348977A JP 2348977 A JP2348977 A JP 2348977A JP S6211492 B2 JPS6211492 B2 JP S6211492B2
Authority
JP
Japan
Prior art keywords
etching
discharge
etched
change
high frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2348977A
Other languages
English (en)
Japanese (ja)
Other versions
JPS53108286A (en
Inventor
Katsuzo Ukai
Kunio Hanazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Canon Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Anelva Corp filed Critical Canon Anelva Corp
Priority to JP2348977A priority Critical patent/JPS53108286A/ja
Publication of JPS53108286A publication Critical patent/JPS53108286A/ja
Publication of JPS6211492B2 publication Critical patent/JPS6211492B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP2348977A 1977-03-03 1977-03-03 Etching control device Granted JPS53108286A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2348977A JPS53108286A (en) 1977-03-03 1977-03-03 Etching control device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2348977A JPS53108286A (en) 1977-03-03 1977-03-03 Etching control device

Publications (2)

Publication Number Publication Date
JPS53108286A JPS53108286A (en) 1978-09-20
JPS6211492B2 true JPS6211492B2 (enExample) 1987-03-12

Family

ID=12111915

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2348977A Granted JPS53108286A (en) 1977-03-03 1977-03-03 Etching control device

Country Status (1)

Country Link
JP (1) JPS53108286A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5723226A (en) * 1980-07-17 1982-02-06 Nippon Telegr & Teleph Corp <Ntt> Plasma etching device
JPS5759332A (en) * 1980-09-27 1982-04-09 Fujitsu Ltd Method for detecting finishing time of dry etching reaction
JPS57154147U (enExample) * 1981-03-20 1982-09-28
JPS5879722A (ja) * 1981-11-06 1983-05-13 Fujitsu Ltd プラズマエツチングの制御方法
JPS58215030A (ja) * 1982-06-08 1983-12-14 Kokusai Electric Co Ltd 半導体基板のドライエツチング終了時点検出装置
JP6799134B2 (ja) * 2017-02-21 2020-12-09 株式会社アルバック 素子構造体の製造方法

Also Published As

Publication number Publication date
JPS53108286A (en) 1978-09-20

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