JPS62112034A - Particle analyzing instrument - Google Patents
Particle analyzing instrumentInfo
- Publication number
- JPS62112034A JPS62112034A JP60252334A JP25233485A JPS62112034A JP S62112034 A JPS62112034 A JP S62112034A JP 60252334 A JP60252334 A JP 60252334A JP 25233485 A JP25233485 A JP 25233485A JP S62112034 A JPS62112034 A JP S62112034A
- Authority
- JP
- Japan
- Prior art keywords
- light
- flow cell
- optical axis
- flow
- optical system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 title claims abstract description 38
- 230000003287 optical effect Effects 0.000 claims abstract description 57
- 238000004458 analytical method Methods 0.000 claims description 12
- 238000001514 detection method Methods 0.000 claims 1
- 239000007788 liquid Substances 0.000 abstract description 8
- 238000005375 photometry Methods 0.000 abstract description 5
- 239000000758 substrate Substances 0.000 description 9
- 230000004888 barrier function Effects 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 206010041662 Splinter Diseases 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 241001446276 Helia <angisperm> Species 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、フローサイトメータ等において、測光光学系
及びフローセルの光軸との調整を可能とした粒子解析装
置に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a particle analysis device that allows adjustment with the optical axis of a photometric optical system and a flow cell in a flow cytometer or the like.
［従来の技術］
フローサイトメータ等に用いられる従来の粒子解析装置
では、第５図に示すように、フローセル１の中央部の例
えば２００ｇｍＸ２００μｍの微小な断面を有する流通
部２内を、シース液に包まれて高速で流れる検体粒子Ｓ
に、図示しないレーザー光源からの平行なレーザービー
ムＬを、第６図に示すように集光レンズ３を介してフロ
ーセル１内の流通部２に照射する。検体粒子Ｓにより散
乱された前方散乱光は、対物レンズ４を介して光電検出
器５上に集光され、主に検体粒子Ｓの大きさに関する情
報が得られる。また、検体粒子Ｓからの側方散乱光及び
蛍光散乱光は、対物レンズ６を介して光電検出器７上に
集光され、主に検体粒子Ｓの内部の複雑性に関する重要
な情報を得ることができる。[Prior Art] In a conventional particle analysis device used in a flow cytometer or the like, as shown in FIG. Specimen particles S wrapped and flowing at high speed
Next, a parallel laser beam L from a laser light source (not shown) is irradiated onto the flow section 2 in the flow cell 1 through the condenser lens 3, as shown in FIG. The forward scattered light scattered by the sample particles S is focused on the photoelectric detector 5 via the objective lens 4, and information mainly regarding the size of the sample particles S is obtained. Further, the side scattered light and fluorescent scattered light from the sample particles S are focused on the photoelectric detector 7 via the objective lens 6, and important information mainly regarding the internal complexity of the sample particles S can be obtained. I can do it.
フローサイトメータにおいて正確な測定を行うには、レ
ーザービームＬの光軸とフローセル１の中心が一致して
いると共に、検体粒子Ｓからの散乱光が測光用対物レン
ズ４，６により正確に集光されなければならない、その
ために、レーザービームＬの光軸に対して検体粒子Ｓの
流れの軸及び集光レンズ４．６を正確に調整しなければ
ならないが、従来装置においてはフローセル１と測光光
学系とが分離されており、フローセル１が微動した状態
で、レーザービームＬの光軸に対して検体粒子Ｓの流れ
の袖を調整すると、側方散乱光ｍ光学系の焦点位置がず
れるため、側方散乱光用光学系の調整も行う必要があり
、操作が繁雑になる上に十分に正確な調整を行うことが
困難である。In order to perform accurate measurements with a flow cytometer, the optical axis of the laser beam L must be aligned with the center of the flow cell 1, and the scattered light from the sample particles S must be accurately focused by the photometric objective lenses 4 and 6. For this purpose, the flow axis of the sample particles S and the condensing lens 4.6 must be accurately adjusted with respect to the optical axis of the laser beam L. However, in conventional devices, the flow cell 1 and the photometric optical If the flow cell 1 is adjusted slightly with respect to the optical axis of the laser beam L, the focal position of the side scattered light m optical system will shift. It is also necessary to adjust the optical system for side scattered light, which complicates the operation and makes it difficult to perform sufficiently accurate adjustment.
［発明の目的］
本発明の目的は、測光用光学系とフローセルを固定する
ことにより、レーザービームの光軸に対して検体粒子の
流れの軸の合軸調整を行うだけで容易に位置合わせが実
施でき、高精度の測定を可能とする粒子解析装置を提供
することにある。[Objective of the Invention] An object of the present invention is to fix the photometric optical system and the flow cell so that positioning can be easily achieved by simply aligning the axis of the flow of sample particles with the optical axis of the laser beam. The object of the present invention is to provide a particle analysis device that can perform measurements with high accuracy.
［発明の概要］
上述の目的を達成するための本発明の要旨は、フローセ
ル内の流通部を流れる検体粒子に光ビームを照射する照
射光学系と、光ビームにより散乱された検体粒子からの
散乱光を測定する測光用光学系と、前記７０−セルを該
測光用光学系と共に基台上に載置して、該基台を光ビー
ムの照射光軸に対して相対的に移動可能としたことを特
徴とする粒子解析装置である。[Summary of the Invention] The gist of the present invention for achieving the above-mentioned object is to provide an irradiation optical system that irradiates a light beam to sample particles flowing through a flow section in a flow cell, and an irradiation optical system that irradiates a light beam to sample particles that are scattered by the light beam. A photometric optical system for measuring light and the 70-cell were placed on a base together with the photometric optical system, and the base was movable relative to the irradiation optical axis of the light beam. This particle analysis device is characterized by the following.
［発明の実施例］
本発明を第１図〜第４図に図示の実施例に基づいて詳細
に説明する。[Embodiments of the Invention] The present invention will be described in detail based on embodiments illustrated in FIGS. 1 to 4.
第１図は光学系及びアライメント装置の平面図である。FIG. 1 is a plan view of the optical system and alignment device.
フローセル１の中央部には、紙面に垂直な上下方向にサ
ンプル液を通過する流通部２が設けられており、このサ
ンプル液の流れと直交する方向にレーザー光源１０が配
置され、レーザー光源１ｏからの照射光を流通部２に導
光するために、光軸０１上にレーザービームＬの結像形
状を調整する結像レンズ１１が配されている。また。At the center of the flow cell 1, there is provided a flow section 2 through which the sample liquid passes in the vertical direction perpendicular to the plane of the paper. In order to guide the irradiated light to the flow section 2, an imaging lens 11 for adjusting the imaging shape of the laser beam L is disposed on the optical axis 01. Also.
レーザービームＬによる検体粒子Ｓからの前方散乱光側
には、フローセル１側からビームスプリッタ１２、対物
レンズ１３及び光電検出器１４が配置されている。また
、ビームスプリッタ１２により分割された光束の分布状
態を検出するために、ビームスプリッタ１２の反射側の
光軸０２上に対物レンズ１５及びアレイ状光電検出器１
６が配されている。そして、光電変換器１６の出力は光
強度分布を観察するモニタ１７に接続されている。また
、検体粒子Ｓの流れの軸及び光軸０１にそれぞれ直交す
る光軸０３上に フローセル１側から測光用対物レンズ
１８、ハーフミラ−１９、集光レンズ２０、絞り２１、
集光レンズ２２、グイクロイックミラー２３．２４及び
ミラー２５が順次に配置首されている。グイクロイック
ミラー２３の反射方向にバリアフィルタ２６と光電検出
器２７が、グイクロインクミラー２３の反射方向に／へ
リアフィルタ２８と光電検出器２９が、ミラー２５の反
射方向にバリアフィルタ３０と光電検出器３１か配置さ
れている。これらの光電検出器２７．２９．３１には、
微弱光を増強して検出可能にするフォトマルが用いられ
ている。そして、ハーフミラ−１９の反射側には、フロ
ーセル１と側方散乱光及び蛍光測光用光学系との焦点調
整に用いるオートフォーカスユニント３２が設けられて
いる。On the side of the forward scattered light from the sample particles S caused by the laser beam L, a beam splitter 12, an objective lens 13, and a photoelectric detector 14 are arranged from the flow cell 1 side. In addition, in order to detect the distribution state of the luminous flux split by the beam splitter 12, an objective lens 15 and an array photoelectric detector 1 are placed on the optical axis 02 on the reflection side of the beam splitter 12.
6 is placed. The output of the photoelectric converter 16 is connected to a monitor 17 for observing the light intensity distribution. Also, on the optical axis 03 perpendicular to the flow axis of the sample particles S and the optical axis 01, from the flow cell 1 side, a photometric objective lens 18, a half mirror 19, a condensing lens 20, an aperture 21,
A condensing lens 22, microchroic mirrors 23, 24, and a mirror 25 are arranged in sequence. A barrier filter 26 and a photoelectric detector 27 are arranged in the reflection direction of the microink mirror 23, a helia filter 28 and a photoelectric detector 29 are mounted in the reflection direction of the microink mirror 23, and a barrier filter 30 is mounted in the reflection direction of the mirror 25. A photoelectric detector 31 is also arranged. These photoelectric detectors 27.29.31 include
Photomuls are used to enhance weak light and make it detectable. An autofocus unit 32 is provided on the reflection side of the half mirror 19 to adjust the focus between the flow cell 1 and the optical system for side scattered light and fluorescence photometry.
ここで、光軸Ｏ１上のレーザー光源１０〜光電検出器１
４及び光軸０２上の対物レンズ１５、光電検出器１６は
軸：Ａ撃抜に基板４０上に固定されている・また、フロ
ーセル１及び光軸０３上の対物しンズ１８〜ミラー２５
、バリアフィルタ２６．２８．３０、光電検出器２７．
２９．３１．オートフォーカスユニット３２は、焦点調
整後に光軸０３と平行なＹ方向に移動自在のステージ４
１上に配首され、基板４０とステージ４１の間には、更
に光軸０１と平行なＸ方向に移動自在のステージ４２が
介在されている。そして、ステージ４１のＹ方向の移動
量はダイアルゲージ４３により、ステージ４２のＸ方向
の移動量はダイアルゲージ４４により測定されるように
なっている。Here, the laser light source 10 to the photoelectric detector 1 on the optical axis O1
4, an objective lens 15 on the optical axis 02, and a photoelectric detector 16 are fixed on the substrate 40 on the axis A. Also, an objective lens 18 to a mirror 25 on the flow cell 1 and the optical axis 03
, barrier filter 26.28.30, photoelectric detector 27.
29.31. The autofocus unit 32 includes a stage 4 that is movable in the Y direction parallel to the optical axis 03 after focus adjustment.
A stage 42 is arranged between the substrate 40 and the stage 41 and is movable in the X direction parallel to the optical axis 01. The amount of movement of the stage 41 in the Y direction is measured by a dial gauge 43, and the amount of movement of the stage 42 in the X direction is measured by a dial gauge 44.
第２図は第１図のＡ−Ａ線に治った断面図であり、ステ
ージ４２の上面にＹ方向に２木のレール５ｏが敷設され
、ステージ４１の下面のレール５１との嵌合により、ス
テージ４１はステージ４２に対してＹ方向に平行移動で
きるようになっている。ステージ４２の右端部には軸受
５３が設けられ、この軸受５３にはカム軸５４が回転自
在に軸着され、更にカム軸５４の外側にカム軸５５が嵌
合されており、このカム軸５５はカム軸５４に対して回
転自在な状態となっている。カム軸５４及び力１、輛５
５には、それぞれ偏心カム５４ａ、５５ａが周設ｙれて
おり、これらのカム５４ａ、５５ａは基板４０ 、、ｌ
−に固定されているガイド５６及びステージ４１に固定
されている第３図に図示のガイド５７とそれぞれ常時接
触するように、ステージ４１．４２は図示しないばねに
より付勢された状態となっている。更に、カム軸５４の
上部には抜は止め５８とカム軸５４を回転させる回転つ
まみ５９が取り付けられ、カム軸５５の上部に回転つま
み６０が増り付けられている。FIG. 2 is a cross-sectional view taken along the line A-A in FIG. 1, in which two rails 5o are laid in the Y direction on the upper surface of the stage 42, and by fitting with the rail 51 on the lower surface of the stage 41, The stage 41 can be moved parallel to the stage 42 in the Y direction. A bearing 53 is provided at the right end of the stage 42, a camshaft 54 is rotatably attached to the bearing 53, and a camshaft 55 is fitted on the outside of the camshaft 54. is in a state where it can freely rotate with respect to the camshaft 54. Camshaft 54 and force 1, vehicle 5
Eccentric cams 54a and 55a are provided around the substrates 40, 5, respectively, and these cams 54a and 55a
- The stages 41 and 42 are biased by springs (not shown) so that they are in constant contact with a guide 56 fixed to the stage 41 and a guide 57 shown in FIG. 3 fixed to the stage 41. . Furthermore, a pull-out stop 58 and a rotation knob 59 for rotating the camshaft 54 are attached to the top of the camshaft 54, and a rotation knob 60 is additionally attached to the top of the camshaft 55.
第３図は第１図のＢ方向から見た側面図であり、基板４
０上にＸ方向に２本のレール６１が敷設され、ステージ
４２の下面の２木のレール６２と嵌合しており、ステー
ジ４２は基板４０に対してＸ方向に平行移動できるよう
になっている。FIG. 3 is a side view seen from direction B in FIG.
Two rails 61 are laid on the board 40 in the X direction, and are fitted with two rails 62 on the lower surface of the stage 42, so that the stage 42 can move parallel to the board 40 in the X direction. There is.
レーザー光源１０から照射されたレーザービームＬは、
結像レンズ１１を介してフローセル１の流通部２に入射
し、検体粒子Ｓによる前方散乱光の一部はビームスプリ
ッタ１２を直進して、対物レンズ１３を介して光電検出
器１４に集光されその光強度が測光される。また、残り
の一部はビームスプリンタ１２によって反射され、対物
レンズ１５を介してアレイ状光電検出器１６に集光され
、光軸０１に対する検体粒子Ｓの流れの位置関係を検出
することになる。The laser beam L emitted from the laser light source 10 is
A part of the forward scattered light by the sample particles S enters the flow section 2 of the flow cell 1 via the imaging lens 11, passes straight through the beam splitter 12, and is focused on the photoelectric detector 14 via the objective lens 13. The light intensity is photometered. Further, the remaining part is reflected by the beam splinter 12 and focused on the arrayed photoelectric detector 16 via the objective lens 15, thereby detecting the positional relationship of the flow of the sample particles S with respect to the optical axis 01.
また、検体粒子Ｓによる側方散乱光は、測光用対物レン
ズ１８．ハーフミラ−１９，集光レンズ２０、絞り２１
．更に集光レンズ２２を介してグイクロインクミラー２
３．２４及びミラー２５に入射し、これらのミラー２３
．２４．２５による波長領域ごとの各反射光は、バリア
フィルタ２６．２８．３０を介して、光電検出器２７．
２９．３１上にそれぞれ集光され光強度が４ＩＩＩ光さ
れる。Further, side scattered light by the sample particles S is transmitted through the photometric objective lens 18. Half mirror 19, condenser lens 20, aperture 21
．． Further, through the condensing lens 22, the micro ink mirror 2
3.24 and mirror 25, and these mirrors 23
．． Each reflected light for each wavelength range by 24.25 passes through barrier filters 26, 28, and 30 to photoelectric detectors 27.
The light is focused on 29 and 31, respectively, and has a light intensity of 4III.
フローセル１と測光光学系をＸ方向、Ｙ方向についての
調整を行うには、先ずカム軸５４の回転つまみ５９を廻
すと、カム５４ａがカイト５６と回転摺動するため、カ
ム５４ａのこのリフト都゛だけステージ４２が基板４０
に対してＸ方向に平行移動できる。同様に、カム軸５５
に固定されている回転つまみ６０を廻すと、カム５５
ａかカイ！パ５７に回転摺動するため、カム５５ａのリ
フト吊だけステージ４１をステージ４２に対してＹｊｊ
向に平行移動することができる。To adjust the flow cell 1 and the photometric optical system in the X and Y directions, first turn the rotation knob 59 of the camshaft 54. Since the cam 54a rotates and slides on the kite 56, this lift position of the cam 54a Only the stage 42 is the substrate 40
Can be translated in parallel to the X direction. Similarly, the camshaft 55
When the rotary knob 60 fixed to the cam 55 is turned, the cam 55
A or Kai! In order to rotate and slide the cam 57, the stage 41 is Yjj relative to the stage 42 only by lifting the cam 55a.
Can be translated in parallel.
これらのＸ、Ｙ方向への平行移動値は、回転角度に対す
るリフト省をカム５４ａ、５５ａによって任意に設定す
ることができるため、相当に蛍！−の範囲での移動が可
能であり、これらの移動１′達は基板４０上に固定され
たダイアルケージ４３４４ｉこよって読み取りが可能で
ある。These parallel movement values in the X and Y directions can be set arbitrarily by the cams 54a and 55a to reduce lift with respect to the rotation angle, so they are quite fast! Movements within a range of - are possible, and these movements 1' can be read by a dial cage 4344i fixed on the substrate 40.
次に、この粒子解析装置の調整手順を説明すると、側方
測光用光学系を光軸０３に対して軸調整した後にステー
ジ４１に固定して、Ａ１１ｌ光用光学系に対するフロー
セル１のアライメントを行う。このために、オートフォ
ーカスユニ７］・３２を用いて、フローセル１をＸ、Ｙ
方向へそれぞれ独ケに平行移動させながら、フローセル
１の中心にｊ、＋３点が合った位置で、フローセルｌを
ステージ４１に固定する。従って、フローセルｌと側方
Ｗｉｌｌ光川尤学系はステージ４１七で一体となって、
基板４０に対してＸ、Ｙ方向に平行移動できることにな
る。Next, to explain the adjustment procedure of this particle analyzer, after adjusting the axis of the lateral photometry optical system with respect to the optical axis 03, it is fixed to the stage 41, and the flow cell 1 is aligned with the A11l optical system. . For this purpose, use the autofocus unit 7].32 to move the flow cell 1 in
The flow cell 1 is fixed to the stage 41 at a position where point j, +3 is aligned with the center of the flow cell 1 while independently moving parallel in each direction. Therefore, the flow cell l and the lateral Will Mitsukawa theory unite at stage 417,
This means that it can move parallel to the substrate 40 in the X and Y directions.
ステージ４１．４２を動かすことによって、前述の調整
されたフローセル１を光軸０１上を移動しながら、検体
粒子Ｓの流れと光軸０１とのアライメントを行うには、
例えば検体粒子Ｓの代りにレーザーど−ムＬの波長債域
の光を吸収する疑似サンプル液を使用する。レーザー光
源１０から照射されたレーザービームＬの一部は、この
疑似サンプル液で吸収され、吸収時の光強度分布はアレ
イ状光電検出器１６で測定され、その出力信号はモニタ
１７により観察される。光軸０１と疑似サンプル液流の
中心か合致している場合には、第４図に示すように光強
度分布状態はガウス分布状の波形の中心部が凹状になっ
た左右対称の波形が観察される。しかし合致していない
場合には、中央の凹状部分が左右何れかにずれて対称の
波形を示さなくなる。この場合には、回転つまみ６０を
廻してフローセル１をＹ方向に平行移動しながら、モニ
タ上の波形が左右対称を示すまで調整を行う。To align the flow of sample particles S with the optical axis 01 while moving the above-mentioned adjusted flow cell 1 on the optical axis 01 by moving the stages 41 and 42,
For example, instead of the sample particles S, a pseudo sample liquid that absorbs light in the wavelength range of the laser beam L is used. A part of the laser beam L emitted from the laser light source 10 is absorbed by this pseudo sample liquid, and the light intensity distribution at the time of absorption is measured by the array photoelectric detector 16, and its output signal is observed by the monitor 17. . When the optical axis 01 and the center of the pseudo sample liquid flow coincide, the light intensity distribution state is a Gaussian distribution with a concave center and a symmetrical waveform as shown in Figure 4. be done. However, if they do not match, the central concave portion shifts to either the left or right and no longer exhibits a symmetrical waveform. In this case, while rotating the rotary knob 60 to move the flow cell 1 in parallel in the Y direction, adjustments are made until the waveform on the monitor shows left-right symmetry.
また、レーザー光源１０からのレーザービームＬの焦点
位置と疑似サンプル液流の流れの中心の合致を確認する
には、回転つまみ５９を廻してフローセル１をＸ方向に
平行移動させながら、モニタ上のガウス分布の凹状の谷
の部分が、最も低レベルにかつ幅が最も狭くなるように
調整すればよい、このような調整方法を用いて、光軸Ｏ
１に対して疑似サンプル液流の流れの軸との合軸調整を
行うことができる。To check whether the focal position of the laser beam L from the laser light source 10 matches the center of the flow of the pseudo sample liquid flow, turn the rotary knob 59 to move the flow cell 1 in parallel in the It is only necessary to adjust the concave valley part of the Gaussian distribution to the lowest level and the narrowest width.Using this adjustment method, the optical axis O
1, alignment adjustment with the flow axis of the pseudo sample liquid flow can be performed.
本実施例では、照射光の検体粒子Ｓによる光軸０３」二
の側方散乱光及び蛍光測光用光学系を、ブローセル１を
固定したステージ４１．４２ 上ｉ、： 載置し、これ
らのステージ４１．４２をＹ方向又はＸ方向に平行移動
させることによって、レーザービームＬの光軸０１との
合軸調整を行ったが、逆にレーザー光源１０と前方散乱
光測光用光学系とを載置する基板４０にフローセル１を
固定して、この基板４０を側方散乱光及び蛍光測光用光
学系に対して移動することにより、合軸調整を行っても
同様の効果か得られる。更には、前方散乱光用光学系の
みをステージ４１．４２上に載置することもある。なお
実施例では、ステージ４１．４２の微動調整にカム軸５
４．５５を用いる方法を使用したが、他の駆動機構を用
いて光軸調整を行うことも勿論可能である。In this example, the optical system for side scattered light and fluorescence photometry on the optical axis 03'2 by the specimen particles S of the irradiated light is placed on the stage 41 and 42 on which the blow cell 1 is fixed, and these stages By moving 41 and 42 in parallel in the Y direction or the X direction, the alignment of the laser beam L with the optical axis 01 was adjusted. The same effect can be obtained even if the axis adjustment is performed by fixing the flow cell 1 to a substrate 40 and moving the substrate 40 relative to the optical system for side scattered light and fluorescence photometry. Furthermore, only the optical system for forward scattered light may be placed on the stage 41, 42. In the embodiment, the camshaft 5 is used for fine adjustment of the stages 41 and 42.
Although the method using 4.55 was used, it is of course possible to adjust the optical axis using other drive mechanisms.
［発明の効果コ
以−Ｆ説明したように本発明に係る粒子解析装置は、一
方の測光用光学系と共にフローセルを共通の）１（台に
固定し、他方の直交する方向のａｔ（Ｉ先光学系の光軸
に対して平行及び垂直に相対的に移動させることによっ
て、レーザービームの光軸と検体粒子の流れの軸との合
＠調整及び焦点調整を正確にしかも容易に行うことがで
き、精度の高い測定結果を得ることが可能である。[Effects of the Invention] As explained above, in the particle analysis device according to the present invention, the flow cell is fixed to a common stand together with one photometric optical system, and the at (I tip) is fixed to the other orthogonal direction. By relatively moving parallel and perpendicular to the optical axis of the optical system, alignment and focus adjustment between the optical axis of the laser beam and the axis of the sample particle flow can be performed accurately and easily. , it is possible to obtain highly accurate measurement results.
図面第１図〜第４図は本発明に係る粒子解析袋ａの一実
施例を示し、第１図は光学系と７ライメント装首の構成
図、第２図は第１図のＡ−Ａ線に沿った断面図、第３図
は第１図のＢ方向から見た側面図、第４図は合軸状態に
おける光強度分布図であり、第５図はフローセルの斜視
図、第６図は従来の光学系の配置図である。
符号１はフローセル、２は流通部、１０はレーザー光源
、１１は結像レンズ、１２はビームスプリンタ、１３．
１５．１８は対物レンズ、１４．１６は光電検出器、１
７はモニタ、２３．２４はグイクロイックミラー、２５
はミラー、２６．２８．３０はバリアフィルタ、２７．
２９．３１は光’７７１検出器、３２はオートフォーカ
スユニント、４０は基板、４１．４２はステージ、４３
．４４はダイアルゲージ、５０．５１．６１．６２はレ
ール、５４．５５はカム軸、５４ａ、５５ａはカム、５
９．６０は回転つまみである。
＃許出願人 キャノン株式会社
図面 第１図
第２図
第３図
第４図Figures 1 to 4 show an embodiment of the particle analysis bag a according to the present invention, Figure 1 is a configuration diagram of an optical system and a 7-line neck attachment, and Figure 2 is A-A in Figure 1. 3 is a side view taken from direction B in FIG. 1, FIG. 4 is a light intensity distribution diagram in the aligned state, FIG. 5 is a perspective view of the flow cell, and FIG. 6 is a cross-sectional view taken along the line. is a layout diagram of a conventional optical system. 1 is a flow cell, 2 is a flow section, 10 is a laser light source, 11 is an imaging lens, 12 is a beam splinter, 13.
15.18 is an objective lens, 14.16 is a photoelectric detector, 1
7 is a monitor, 23.24 is a groic mirror, 25
is a mirror, 26.28.30 is a barrier filter, 27.
29.31 is a light '771 detector, 32 is an autofocus unit, 40 is a substrate, 41.42 is a stage, 43
．． 44 is a dial gauge, 50.51.61.62 is a rail, 54.55 is a camshaft, 54a, 55a are cams, 5
9.60 is a rotary knob. #Applicant: Canon Co., Ltd. Drawings Figure 1 Figure 2 Figure 3 Figure 4
Claims (1)
を照射する照射光学系と、光ビームにより散乱された検
体粒子からの散乱光を測定する測光用光学系と、前記フ
ローセルを該測光用光学系と共に基台上に載置して、該
基台を光ビームの照射光軸に対して相対的に移動可能と
したことを特徴とする粒子解析装置。 ２、前記測光用光学系は側方散乱光を測光するものとし
た特許請求の範囲第１項に記載の粒子解析装置。 ３、前記基台は光ビーム照射光軸を含む同一平面内にお
いて、照射光軸に平行及び垂直方向に移動可能とした特
許請求の範囲第１項に記載の粒子解析装置。 ４、前記基台の移動手段にはカム軸を用い、該カム軸の
回転角とそのリフト量を利用して移動を行う特許請求の
範囲第１項に記載の粒子解析装置。 ５、前記基台の移動量検出手段としてダイアルゲージを
用いた特許請求の範囲第１項に記載の粒子解析装置。 ６、前記検体粒子による散乱光の光強度分布をモニタで
観察するようにした特許請求の範囲第１項に記載の粒子
解析装置。[Scope of Claims] 1. An irradiation optical system that irradiates a light beam onto sample particles flowing through a flow section in a flow cell; a photometric optical system that measures scattered light from the sample particles scattered by the light beam; A particle analysis device characterized in that a flow cell is placed on a base together with the photometric optical system, and the base is movable relative to the irradiation optical axis of the light beam. 2. The particle analysis device according to claim 1, wherein the photometric optical system measures side scattered light. 3. The particle analysis apparatus according to claim 1, wherein the base is movable in parallel and perpendicular directions to the irradiation optical axis within the same plane containing the light beam irradiation optical axis. 4. The particle analysis apparatus according to claim 1, wherein a camshaft is used as the means for moving the base, and the movement is performed using the rotation angle of the camshaft and the amount of lift thereof. 5. The particle analysis device according to claim 1, wherein a dial gauge is used as the movement amount detection means of the base. 6. The particle analysis device according to claim 1, wherein the light intensity distribution of the light scattered by the sample particles is observed on a monitor.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60252334A JPH061241B2 (en) | 1985-11-11 | 1985-11-11 | Particle analyzer |
| US06/918,981 US4732479A (en) | 1985-10-18 | 1986-10-15 | Particle analyzing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60252334A JPH061241B2 (en) | 1985-11-11 | 1985-11-11 | Particle analyzer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62112034A true JPS62112034A (en) | 1987-05-23 |
| JPH061241B2 JPH061241B2 (en) | 1994-01-05 |
Family
ID=17235821
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60252334A Expired - Fee Related JPH061241B2 (en) | 1985-10-18 | 1985-11-11 | Particle analyzer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH061241B2 (en) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63292039A (en) * | 1987-05-26 | 1988-11-29 | Fuji Electric Co Ltd | Apparatus for detecting fine grain in liquid |
| JPS6418043A (en) * | 1987-07-14 | 1989-01-20 | Kowa Co | Method and apparatus for measuring fine particle in liquid |
| EP0486747A2 (en) * | 1990-11-22 | 1992-05-27 | Toa Medical Electronics Co., Ltd. | Flow cell mechanism in flow imaging cytometer |
| JPH05273114A (en) * | 1992-03-30 | 1993-10-22 | Nikkiso Co Ltd | Grain size distribution measuring device |
| GB2378526A (en) * | 2001-08-07 | 2003-02-12 | Lockheed Corp | Plate for mounting camera, illuminator and flow cell |
| US7019834B2 (en) | 2002-06-04 | 2006-03-28 | Lockheed Martin Corporation | Tribological debris analysis system |
| US7184141B2 (en) | 2004-03-23 | 2007-02-27 | Lockheed Martin Corporation | Optical flow cell for tribological systems |
| US7307717B2 (en) | 2005-09-16 | 2007-12-11 | Lockheed Martin Corporation | Optical flow cell capable of use in high temperature and high pressure environment |
| US7385694B2 (en) | 2002-06-04 | 2008-06-10 | Lockheed Martin Corporation | Tribological debris analysis system |
| JP2009145044A (en) * | 2007-12-11 | 2009-07-02 | Mitsui Eng & Shipbuild Co Ltd | Fluorescence detector |
| US8079250B2 (en) | 2008-07-09 | 2011-12-20 | Lockheed Martin Corporation | Viscometer system utilizing an optical flow cell |
| EP4043862A4 (en) * | 2019-11-06 | 2022-12-07 | Sony Group Corporation | Method for adjusting position, microparticle analysis device, and program |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5128038A (en) * | 1974-07-29 | 1976-03-09 | Yoshio Koyama | Pachinkokiheno tamakyokyuhohooyobisochi |
| JPS5299839A (en) * | 1976-02-17 | 1977-08-22 | Suntory Ltd | Device for observing infinitesimal article in liquid |
| JPS5942432A (en) * | 1982-09-01 | 1984-03-09 | Rion Co Ltd | Light scattering type floating particle counting apparatus |
| JPS59176649A (en) * | 1983-03-28 | 1984-10-06 | Shimadzu Corp | Particle analyzer |
-
1985
- 1985-11-11 JP JP60252334A patent/JPH061241B2/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5128038A (en) * | 1974-07-29 | 1976-03-09 | Yoshio Koyama | Pachinkokiheno tamakyokyuhohooyobisochi |
| JPS5299839A (en) * | 1976-02-17 | 1977-08-22 | Suntory Ltd | Device for observing infinitesimal article in liquid |
| JPS5942432A (en) * | 1982-09-01 | 1984-03-09 | Rion Co Ltd | Light scattering type floating particle counting apparatus |
| JPS59176649A (en) * | 1983-03-28 | 1984-10-06 | Shimadzu Corp | Particle analyzer |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63292039A (en) * | 1987-05-26 | 1988-11-29 | Fuji Electric Co Ltd | Apparatus for detecting fine grain in liquid |
| JPS6418043A (en) * | 1987-07-14 | 1989-01-20 | Kowa Co | Method and apparatus for measuring fine particle in liquid |
| EP0486747A2 (en) * | 1990-11-22 | 1992-05-27 | Toa Medical Electronics Co., Ltd. | Flow cell mechanism in flow imaging cytometer |
| JPH05273114A (en) * | 1992-03-30 | 1993-10-22 | Nikkiso Co Ltd | Grain size distribution measuring device |
| US6873411B2 (en) | 2001-08-07 | 2005-03-29 | Lockheed Martin Corporation | Optical debris analysis fixture |
| GB2378526B (en) * | 2001-08-07 | 2005-02-16 | Lockheed Corp | Optical debris analysis fixture |
| GB2378526A (en) * | 2001-08-07 | 2003-02-12 | Lockheed Corp | Plate for mounting camera, illuminator and flow cell |
| US7019834B2 (en) | 2002-06-04 | 2006-03-28 | Lockheed Martin Corporation | Tribological debris analysis system |
| US7385694B2 (en) | 2002-06-04 | 2008-06-10 | Lockheed Martin Corporation | Tribological debris analysis system |
| US7184141B2 (en) | 2004-03-23 | 2007-02-27 | Lockheed Martin Corporation | Optical flow cell for tribological systems |
| US7307717B2 (en) | 2005-09-16 | 2007-12-11 | Lockheed Martin Corporation | Optical flow cell capable of use in high temperature and high pressure environment |
| JP2009145044A (en) * | 2007-12-11 | 2009-07-02 | Mitsui Eng & Shipbuild Co Ltd | Fluorescence detector |
| US8079250B2 (en) | 2008-07-09 | 2011-12-20 | Lockheed Martin Corporation | Viscometer system utilizing an optical flow cell |
| EP4043862A4 (en) * | 2019-11-06 | 2022-12-07 | Sony Group Corporation | Method for adjusting position, microparticle analysis device, and program |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH061241B2 (en) | 1994-01-05 |
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