CN105372943B - A kind of alignment device for lithographic equipment - Google Patents
A kind of alignment device for lithographic equipment Download PDFInfo
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- CN105372943B CN105372943B CN201410429838.2A CN201410429838A CN105372943B CN 105372943 B CN105372943 B CN 105372943B CN 201410429838 A CN201410429838 A CN 201410429838A CN 105372943 B CN105372943 B CN 105372943B
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Abstract
The present invention discloses a kind of alignment device for lithographic equipment characterized by comprising a light source, for provide one for alignment illuminating bundle；Optical system, for making the illuminating bundle oblique incidence to alignment mark；Detector, for detecting the interference signal for the diffracted beam that the alignment mark generates；Processing unit, for calculating alignment position with the relationship of sports platform change in location according to the intensity of the interference signal.
Description
Technical field
The present invention relates to a kind of integrated circuit equipment manufacturing fields, more particularly to a kind of alignment for lithographic equipment to fill
It sets.
Background technique
Currently, lithographic equipment mostly uses greatly based on optical grating diffraction interference to Barebone.Such is to Barebone essential characteristic
Are as follows: the illuminating bundle comprising Single wavelength or multi-wavelength, which is radiated on grating type alignment mark, occurs diffraction, the diffraction at different levels of generation
Light carries the location information about alignment mark；The light beam of different levels is dissipated from phase alignment grating with the different angles of diffraction
Open, by collecting the diffracted beam of each level to Barebone, make two symmetrical positive and negative diffraction times (as ± 1 grade, ± 2 grades, ±
3 grades etc.) to Barebone image planes or the overlapping of pupil face it is relevant, form interference signals at different levels.When being scanned to alignment mark,
Centring position is determined by signal processing using the Strength Changes of photodetectors register interference signal.
Representative in the prior art is a kind of off-axis alignment system that Dutch ASML company uses, this is to Barebone
Feux rouges, green light two-source illumination are used in light source part；And realize that alignment mark multistage is spread out using voussoir array or wedge group
Overlapping and the coherent imaging of light are penetrated, and separates imaging space in image planes；The registration signal of feux rouges and green light is inclined by one
Beam splitter prism shake to separate；The transmitted light intensity that reference grating is penetrated by detection alignment mark picture obtains the alignment of sinusoidal output
Signal.This is to defect existing for Barebone: firstly, since the system can only separate two using the beam splitting system of polarization beam splitter prism
The coloured light of a wavelength is then unable to complete registration signals more than two wavelength；Secondly, the program be only capable of it is normal using fixed grating
Several labels are aligned, and the label of different cycles can not be compatible with；Finally, when this uses voussoir array to Barebone, birefringence
The face type and angle of wedge coherence request of two voussoirs of positive and negative identical level are very high, and processing and manufacturing, assembly and the adjustment of wedge group
Requirement it is also very high, specific implementation engineering difficulty it is larger, it is at high cost.
Therefore, different grating constant labels and multi-wavelength's alignment, and light channel structure can either be compatible with by how providing one kind
Simply, avoid be using complicated optics, off-axis alignment system easy to accomplish and alignment methods those skilled in the art urgently
A technical problem to be solved.
Summary of the invention
In order to overcome the defects of the prior art, the present invention, which provides one kind, can either be compatible with different grating constants label and more
Kind wavelength alignment, and light channel structure is simple, avoids using complicated optics, off-axis alignment device easy to accomplish.
A kind of alignment device for lithographic equipment of the present invention a characterized by comprising light source is used for providing one
In the illuminating bundle of alignment；Optical system, for making the illuminating bundle oblique incidence to alignment mark；Detector, for visiting
Survey the interference signal for the diffracted beam that the alignment mark generates；Processing unit, for according to the intensity of the interference signal with
The relationship of sports platform change in location calculates alignment position.
Further, the optical system is also used to collect the diffracted beam that the alignment mark generates.
Further, the illuminating bundle is broadband light, the combination of multi-wavelength light, monochromatic light or narrow band light, described
Optical system includes: the first optical element, for the illuminating bundle to be formed kohler's illumination in the pupil face of the alignment device；
Second optical element, the illuminating bundle for that will pass through first optical element are oriented to the alignment mark；Third optics member
Part, for the diffracted beam will to be formed after the illuminating bundle of second optical element converges to the alignment mark,
The diffracted beam is received by the third optical element, is returned to second optical element and is detected through its guide probe.
Further, the illuminating bundle is laser, and the optical system includes: the second optical element, for that will shine
Alignment mark described in bright beam direction；Third optical element, the illuminating bundle for that will pass through second optical element are assembled
The diffracted beam is formed after to the alignment mark, the diffracted beam is received by the third optical element, described in return
Second optical element is simultaneously detected through its guide probe.
Further, second optical element includes reflecting region and transmission region, the reflecting region and light transmission
The illuminating bundle that region is used to only will be distributed over the non-central region in the pupil face is oriented to the alignment mark, returns to described second
Only 1 grade of light or 1 grade and advanced light are detected by the second optical element guide probe in the diffracted beam of optical element.
Further, second optical element is a reflecting mirror or a beam splitter.
Further, it is reflected by the illuminating bundle of the first optical element by the reflecting region of second optical element
After reach the third optical element；Only 1 is returned in the diffracted beam of second optical element through the third optical element
Grade light or 1 grade and advanced light are transmitted through the detector by the transmission region of second optical element, remaining diffraction light quilt
Stop.
Further, it is transmitted by the illuminating bundle of the first optical element by the transmission region of second optical element
After reach the third optical element；Only 1 is returned in the diffracted beam of second optical element through the third optical element
Grade light or 1 grade and advanced light reflex to the detector by the reflecting region of second optical element, remaining diffraction light quilt
Stop.
Further, the reflecting region and transmission region are located on a straight line, and the reflecting region is located at described
The two sides in light region or the transmission region are located at center, and the reflecting region is distributed in the outer of the transmission region
It encloses.
Further, the reflecting region and transmission region are located on a straight line, and the transmission region is located at described anti-
The two sides or the reflecting region for penetrating region are located at center, and the transmission region is distributed in the outer of the reflecting region
It encloses.
Further, second optical element further includes one not reflecting light tight region.
Further, the light source includes light source strobe unit.
Further, the size of the transmission region by the alignment mark maximum grating constant pmaxWith the photograph
The minimal wave length λ of Mingguang City's beamminAnd the minimum diffraction time N for needing to detect in diffracted beamminIt determines, the transmission region can
By the angle of light beam be less than
Further, the illuminating bundle is laser, and the optical system includes Amici prism, the first reflecting mirror and
Two-mirror composition, the illuminating bundle is divided into transmitted light and reflected light through the Amici prism, respectively by the first reflecting mirror and
The reflection of second reflecting mirror is simultaneously finally oblique to be incident upon alignment mark.
Further, the adjustable angle of first reflecting mirror and the second reflecting mirror, to change the illuminating bundle
The incidence angle of opposite alignment mark.
Compared with prior art, technical solution provided by the invention uses tilting incident alignment light beam, with completely new
Structure and form are aligned, and are not needed the positive and negative level interference of light and are simply easily achieved without complex components, structures such as wedges,
Avoided tight processing and adjustment required precision；Traditional mark is good, can measure all directions (such as 0 °, 90 °, ± 45 ° and other
Direction) grating marker, the also label of compatible different cycles；Meanwhile being made by broadband light source etc. and kohler's illumination combination
With Technological adaptability can be improved；Using the optical element for having reflecting region and transmission region, can be mingled with to avoid 0 grade of light
In the detection light of recycling, alignment precision is improved.
Detailed description of the invention
It can be obtained further by detailed description of the invention below and institute's accompanying drawings about the advantages and spirit of the present invention
Solution.
Fig. 1 is lithographic equipment structural schematic diagram；
Fig. 2 is the structural schematic diagram of the first embodiment of alignment device of the present invention；
Fig. 3 is the structural schematic diagram of the second embodiment of alignment device of the present invention；
Fig. 4 is the structural schematic diagram of the optical element of alignment device of the present invention；
Fig. 5 is the schematic diagram of the diffraction light under incidence angle different situations；
Fig. 6 is the structural schematic diagram of the third embodiment of alignment device of the present invention；
Fig. 7 is the alignment mark schematic diagram of alignment device of the present invention；
Fig. 8 is the structural schematic diagram suitable for the optical element of multi-direction label measurement；
Fig. 9 is the structural schematic diagram suitable for the optical element of multi-wavelength multilevel measurement；
Figure 10 is more diffraction time instrumentation plans；
Figure 11 is multi-wavelength instrumentation plan；
Figure 12 is different grating constant alignment mark instrumentation plans；
Figure 13 is schematic diagram of the present invention in pupil face formation kohler's illumination；
Figure 14 is schematic diagram of the present invention in pupil face formation kohler's illumination；
Structural schematic diagram under the conditions of the laser light source of Figure 15 alignment device of the present invention.
Specific embodiment
The specific embodiment that the invention will now be described in detail with reference to the accompanying drawings.
In projection lithography field, silicon wafer is directed at the mode of off-axis alignment of mostly using, and the positional relationship of silicon wafer and mask is logical
The alignment mark on work stage datum plate is crossed as transition with reference to indirect gain, i.e., first establishes silicon wafer and mask respectively in work stage
Then position under coordinate system obtains relative positional relationship between silicon wafer, mask indirectly.Wherein, silicon wafer is in worktable coordinate system
Under position establish, i.e., silicon wafer be aligned, it is increasingly complex, need to establish by reference to marking.Therefore, by silicon wafer alignment mark
(and work stage alignment mark) carries out being directed at the key as problem with reference marker.
Projection lithography equipment is as shown in Figure 1, comprising: for providing the lighting system of exposing light beam；For supporting mask
The mask platform of version has mask pattern and the label RM for alignment on mask；For the mask pattern on mask to be projected
Projection optical system on to silicon wafer；For supporting the work stage of silicon wafer, there is the datum plate for being carved with reference mark FM in work stage,
There are the periodic markings for alignment on silicon wafer；The off-axis alignment system being aligned for mask and silicon wafer.Mask platform and work stage
All driven by high accuracy servo system.
The present invention relates to a kind of alignment device, including a light source, for provide one for alignment illuminating bundle；Optical system
System collects the diffracted beam that the alignment mark generates for making the illuminating bundle oblique incidence to alignment mark；Detection
Device, for detecting the interference signal of the diffracted beam；Processing unit, for according to the intensity of the interference signal with sports platform
The relationship of change in location calculates alignment position.
Fig. 2 is the structural schematic diagram of the first embodiment of alignment device of the present invention.Light source 1, provides illumination light,
Illumination light is monochromatic light or narrow band light, broadband light.Optical system 10 is projected in illumination light oblique incidence on label, wherein tiltedly
Incident illumination light includes at least two incidence angles degrees.Detector 5 receives the diffraction light of label.Processor 6, from detector
The interference signal of diffraction light is obtained, and is handled.Alignment mark 9, using grating marker.The light that light source 1 issues passes through optics
Generated after system 10 can oblique incident ray 21 and 22 (21 and 22 represent the oblique incidence illumination light of two different angles), and 21 and 22
Relevant, light oblique incidence illuminates alignment mark 9, and the equidirectional diffraction light after aligned 9 diffraction of label interferes.Detector 5
It is responsible for receiving the diffraction light of label, and diffraction light interference light intensity signal is transferred to processor 6.When alignment mark 9 is with carrier edge
When screen periods direction is mobile, the variation of cosine form is presented in the interference light intensity signal that detector 5 receives, according to light intensity signal
Alignment position can be calculated in variation.
Fig. 3 is the structural schematic diagram of the second embodiment of alignment device of the present invention.As shown in figure 3, the alignment
Device includes: lighting unit 1, provides illumination light, and illumination light is broadband, white light, monochromatic light or narrow band light；Optical unit 2 is used
In forming kohler's illumination at pupil face (back focal plane of optical unit 4), i.e. light source is imaged on sample surface, and on pupil face, light source
The entire pupil face of optical illumination a little issued, as shown in figure 13,01 is a point light source, and 41 represent the pupil face of system, light source hair
The light of the same direction out is all focused at the same point on pupil face, and as shown in figure 14,02,03,04,05 respectively represents 4 differences
The point light source of position, i.e., the light a little issued on light source correspond to entire pupil face, and some corresponding light source each points issue same on pupil face
The light in one direction.Kohler's illumination can guarantee that the diffraction light for the aligned label that same point light source issues has coherence, energy
Obtain interference signal.Optical element 3, for can be the reflecting mirror of center transmission (as schemed for illumination light orientation measurement sample surface
Shown in 4) or beam splitter.For illumination light to be converged to measurement sample object lens can be used, that is to say, that shine in optical unit 4
Mingguang City's beam oblique incidence is to alignment mark.Detector 5 can be placed in the back focal plane of optical unit 4 for measuring optical signal, can
Use photodiode.Signal processing system 6 obtains strength signal from detector, and carries out signal processing.Work stage 7, is used for
Silicon wafer is carried, and can 6DOF accurate positioning.Labeled vector 8 can be silicon wafer or benchmark version, there is alignment mark thereon.It is right
Fiducial mark note 9 can be one-dimensional linear grating, or have fine structure striated pattern.
The light that 1 exit end of lighting unit issues forms kohler's illumination in pupil face by optical unit 2.Illumination light corresponds to optics
The light of 3 reflecting region of element (a-quadrant in Fig. 4) is reflected by optical element 3, is converged to by 4 oblique incidence of optical unit to fiducial mark
In note 9, other light penetrate optical element 3 (a-quadrant in Fig. 4), thus can not be irradiated on alignment mark, other light are not
The bias light needed is excluded the detection that diffraction light is interfered to avoid it.Optionally, the light of labeled 9 diffraction is by optics list
Member 4 receives, and wherein 0 grade of diffraction light (reflected light) of label and high level diffraction light will be hindered by optical element 3 (region B and C in Fig. 4)
Gear, the region C are not reflect opaque area, and ± 1 grade of diffraction light or more advanced secondary diffraction light pass through the (area Tu4Zhong A of optical element 3
Domain) detector 5 is reached, processing unit 6 is transferred to by the interference light intensity signal that the detection of detector 5 obtains and is handled.
After the labeled diffraction of illuminating bundle, light wave expression formula is as follows
Wherein, Rθ.mWhen indicating that incidence angle is θ, the ratio of the amplitude of m grades of diffraction lights and incident light amplitude；λ is incident light
Wavelength；P is alignment mark grating constant；Δ s is the offset for marking relative alignment position.
Diffraction light 104a and 114a are respectively+1 grade and -1 grade of diffraction light of respective incident light 103 and 113, then work as incidence angle
Sine valueWhen, ξ=0,104a and 114a are overlapped, and perpendicular to silicon wafer face, are received by optical unit 4
Collection, the interference strength that detector 5 detects this two-beam are
Sports platform is moved along label grating orientation, and the offset Δ s of label changes, the light intensity that detector 5 detects
Signal is with Δ s cyclically-varying.The every movement of sports platformDistance, measuring signal change a cycle.
When incident ray 103 and 113 and optical axis included angle are unequal, as shown in figure 5, when meeting equationWhen, 104a is parallel with 114a, then may detect the interference signal of two light beams on test surface, such as
Shown in lower:
The light intensity signal that detector 5 detects is ± 1 grade of diffraction light of the incidence angles degree light that search coverage receives
The sum of interference signal is represented by
Wherein, DC is background, IAThe amplitude changed for light intensity with marking bias amount Δ s.
The light intensity that detector detects changes with mark position period of change, the measurement letter of 6 pick-up probe 5 of processor
Number, in conjunction with the work stage location information that work stage position measuring system is fed back, alignment position can be calculated.
Fig. 6 is the third embodiment of alignment device according to the present invention.Unlike second embodiment, illumination
Light beam corresponds to the opaque area of optical element 31 (region E and G, E are reflecting region in Fig. 4, and G is not reflect opaque area) domain
Light beam is blocked by optical element 31 (as shown in Figure 4), thus can not be irradiated on alignment mark, which is unwanted background
Light is excluded the detection that diffraction light is interfered to avoid it；Optionally, the light of transmission region is through optical element 31 (in Fig. 4
The region F) it is converged on alignment mark through optical unit 4, the diffraction light of label is collected by optical unit 4, wherein ± 1 grade of diffraction light
Or more advanced secondary diffraction light is reflected by optical element 31 (region E in Fig. 4) and reaches detector 5, the measurement interference letter of detector 5
Number.Shown in its same formula of interference light intensity (7) detected.Optionally, optical element 31 can also only include opaque area, so that not
Light beam other than transmission region unimpededly converges on alignment mark through optical unit 4.Optionally, optical element 31 is anti-
Penetrating area may be central circular, and transparent area is the annular section around echo area.
Fig. 7 is the alignment mark schematic diagram of alignment device of the present invention, as shown in fig. 7,5A is 0 scale designation, 5B is
90 scale designations, 5C are 45 scale designations, and 5D is -45 scale designations.Alignment mark in Fig. 7 is the alignment mark of any direction, in order to
The alignment mark is adapted to, the present invention provides a kind of optical element suitable for multi-direction label measurement.As shown in figure 8, illumination is single
The light that first 1 exit end issues forms kohler's illumination in pupil face by optical unit 2, wherein the region 6B (echo area) in corresponding diagram 8
Light reflected by optical element 3, converged on alignment mark 9 by optical unit 4, other light can not be irradiated to alignment mark
On.The light of labeled 9 diffraction is received by optical unit 4, and wherein 0 grade of diffraction light (reflected light) of label and high level diffraction light will be by
Optical element 3 (region 6B and 6C) stops, and ± 1 grade of diffraction light reaches detector 5 by the region 6A in 3 Fig. 8 of optical element, by 5
The light intensity signal that detection obtains is transferred to processing unit 6 and is handled.
The light intensity signal that detector 5 measures is
Wherein, γ is label orientation angle (angle of label grating orientation and sports platform scanning direction).
The present invention also provides the 4th embodiment, expansion light source wavelength on the basis of second embodiment optimizes optics
Element 3 increases reflecting region annulus width, increases illumination light incident angle range, compatible multi-wavelength or broadband measurement,
Technological adaptability, the label of also compatible different grating constants are improved, while can measure the interference signal of high level light.
Lighting unit 1, provides illumination light, can be broadband light (such as 450~750nm), is also possible to multiple wavelength
Light, if wavelength is respectively λ 1, the laser of λ 2, λ 3.It can also include light source strobe unit in 1, different light source illuminations may be selected.Silicon
Piece different process layer is different to the reflectivity of different wavelengths of light, is illuminated by choosing the higher light source of reflectivity, to improve
The contrast of signal achievees the purpose that enhance Technological adaptability.
The light that 1 exit end of lighting unit issues forms kohler's illumination in pupil face by optical unit 2 and 3, wherein pupil face position
The light for setting the region 7B (echo area) in corresponding diagram 9 is reflected by optical element 3, converges to alignment mark 9 by optical unit 4
On, the corresponding region center 7A (transparent area, the size in the region by alignment mark maximum grating constant pmaxWith illuminating bundle
Minimal wave length λminAnd the minimum diffraction time N for needing to detectminIt determines, the angle of the passable light beam of transmission region is less than) light will transmit through optical element 3, can not be irradiated on alignment mark.The light quilt of labeled 9 diffraction
Optical unit 4 receives, and wherein 0 grade of diffraction light (reflected light) of label will be stopped by optical element 3 (B area in Figure 10), other can
Detector 5 is reached by the diffraction time light in the region 7A, processing unit 6 is transferred to by the light intensity signal that 5 detections obtain and is carried out
Reason.
The luminous energy of Same Wavelength difference level reaches detector level m and incidence angle θ is needed to meet optical grating diffraction equationWherein angle of diffraction α is within the scope of detector collection angle.
As shown in Figure 10, for -2 grades of -1 grade of diffraction light 183a and 193 of the incident light 183 of Same Wavelength different angle
In 5 range of receiving of detector, 193-1 grade of diffraction light 193a can not be received by a detector diffraction light 193c.Equally, normal is another
+ 1 grade of diffraction light 283a and+2 grades of diffraction light 293c of the corresponding incident light 283 and 293 in side are interfered with 183a and 183c, are produced
Raw interference signal.
When the light of more diffraction times meets its angle of diffraction in 5 capture range of detector, light that detector 5 detects
Strong signal is the interference signal of diffraction lights at different levels.The measuring signal that high level diffraction light is formed corresponds to higher to locating tab assembly point
Resolution.Due to the periodic nature of alignment mark, the measuring signal that rudimentary secondary diffraction light is formed can get bigger measurement range.
High level and rudimentary secondary diffracted light signals is applied in combination, preferable alignment precision can be obtained in biggish alignment range.
The angle of diffraction of light determines by diffraction time, wavelength and grating constant,For different waves
Long illumination light is needed using different incidence angle θ illuminated signs, and when incidence angle θ meets condition, guarantee sin α connects in detector
When receiving in range, it can be detected, for the diffraction light of identical diffraction time, the incidence angle of short wavelength's incident light is small, long wavelength
Incidence angle it is big, as shown in figure 11, wherein incident light 153 be blue light, 163 be green light, and 173 be feux rouges, their incidence angle is big
Small is a1 < a2 < a3, and 153a, 163a and 173a are corresponding diffraction light, and 153b, 163b and 173b are corresponding reflected light.Diffraction
Light 153a, 163a and 173a can the diffraction light respectively with the incident light of the co-wavelength of the other side interfere, thus by detector
Detection.
The interference signal of each wavelength light is as follows:
The measuring signal of multi-wavelength or broadband light is the sum of the intensity of each wavelength-interferometric signal.
Diffraction light direction meets diffraction equationGrating constant is marked to change, detector 5 can receive
To the incidence angle of diffraction light change, co-wavelength is with the diffraction light of level, and when marking grating constant to increase, incidence angle subtracts
It is small；Conversely, incidence angle increases.As shown in figure 12, left side is the alignment instrumentation plan of large period label, and right side is minor cycle mark
The alignment instrumentation plan of note.The program increases ring illumination region, contains different incidence angles, compatible difference grating constant
Label.
The invention further relates to a kind of alignment devices, as shown in Fig. 2, include a laser source, for provides one be used for alignment
Illuminating bundle；Optical system collects what the alignment mark generated for making the illuminating bundle oblique incidence to alignment mark
Diffracted beam；Detector, for detecting the interference signal of the diffracted beam；Processing unit, for according to the interference signal
Intensity with sports platform change in location relationship calculate alignment position.That is, not needing when light source is laser to pupil
Face uses kohler's illumination, and the optical element 3 that the light that the process that laser issues in Fig. 3 expands enters reaches optical unit 4；
Laser beam reaches optical unit 4 by expanding through 31 two sides of optical element in Fig. 6.
It optionally, can also be incident using other modes under the conditions of laser light source.As shown in figure 15, when light source 1 is using sharp
When radiant, Amici prism 11 is can be used in optical system, reflecting mirror 12 and 13 forms.The laser beam that light source 1 issues is through beam splitter
11 are divided into two bundles light, then respectively by reflecting mirror 12 and 13 reflect and it is oblique be incident upon label 9, diffraction light is received by detector 5, and will
Light intensity signal feeds back to processor 6.It can be by adjusting the incidence angle of the angulation change light of reflecting mirror 12 and 13, to adapt to difference
The alignment mark of grating constant uses different alignment wavelengths.
It is preferred embodiment of the invention described in this specification, above embodiments are only to illustrate the present invention
Technical solution rather than limitation of the present invention.All those skilled in the art pass through logic analysis, reasoning under this invention's idea
Or the limited available technical solution of experiment, it all should be within the scope of the present invention.
Claims (14)
1. a kind of alignment device for lithographic equipment characterized by comprising
One light source, for provide one for alignment illuminating bundle；
Optical system, for making the incident light of the illuminating bundle oblique incidence be incident upon alignment mark, including the second optical element,
For illuminating bundle to be oriented to the alignment mark；Third optical element, for the illumination of second optical element will to be passed through
Light beam forms diffracted beam after converging to the alignment mark, and the diffracted beam is received by the third optical element, returns
Second optical element is simultaneously detected through its guide probe；
Second optical element includes reflecting region and transmission region, and the reflecting region and transmission region will be for will only be distributed
Illuminating bundle in the non-central region in pupil face is oriented to the alignment mark, in the diffracted beam for returning to second optical element
Only 1 grade of light or 1 grade and advanced light are detected by the second optical element guide probe；
Detector, for detecting the interference signal for the diffracted beam that the alignment mark generates；
Processing unit, for calculating alignment position with the relationship of sports platform change in location according to the intensity of the interference signal；
The incident light includes the first incident light and the second incident light, the incidence of first incident light and second incident light
Inclination angle is different, and first incident light and second incident light are relevant.
2. alignment device as described in claim 1, which is characterized in that the optical system is also used to collect the alignment mark
The diffracted beam of generation.
3. alignment device as described in claim 1, which is characterized in that the illuminating bundle is broadband light, multi-wavelength light
Combination, monochromatic light or narrow band light, the optical system include:
First optical element, for the illuminating bundle to be formed kohler's illumination in the pupil face of the alignment device；
Second optical element, the illuminating bundle for that will pass through first optical element are oriented to the alignment mark；
The third optical element, for will be after the illuminating bundle of second optical element converges to the alignment mark
The diffracted beam is formed, the diffracted beam is received by the third optical element, is returned to second optical element and is passed through
The detection of its guide probe.
4. alignment device as described in claim 1, which is characterized in that the illuminating bundle is laser, the optical system packet
It includes:
Second optical element, for illuminating bundle to be oriented to the alignment mark；
The third optical element, for will be after the illuminating bundle of second optical element converges to the alignment mark
The diffracted beam is formed, the diffracted beam is received by the third optical element, is returned to second optical element and is passed through
The detection of its guide probe.
5. alignment device as described in claim 3 or 4, which is characterized in that second optical element is a reflecting mirror or one
Beam splitter.
6. alignment device as described in claim 3 or 4, which is characterized in that by the illuminating bundle of the first optical element by institute
The third optical element is reached after stating the reflecting region reflection of the second optical element；Through described in third optical element return
Only 1 grade of light or 1 grade and advanced light are saturating by the transmission region of second optical element in the diffracted beam of second optical element
It is incident upon the detector, remaining diffraction light is blocked.
7. alignment device as described in claim 3 or 4, which is characterized in that by the illuminating bundle of the first optical element by institute
The third optical element is reached after stating the transmission region transmission of the second optical element；Through described in third optical element return
Only 1 grade of light or 1 grade and advanced light are anti-by the reflecting region of second optical element in the diffracted beam of second optical element
It is incident upon the detector, remaining diffraction light is blocked.
8. alignment device as described in claim 3 or 4, which is characterized in that the reflecting region and transmission region are located at always
On line, the reflecting region is located at the two sides of the transmission region or the transmission region is located at center, the reflection
Area distribution is in the periphery of the transmission region.
9. alignment device as described in claim 3 or 4, which is characterized in that the reflecting region and transmission region are located at always
On line, the transmission region is located at the two sides of the reflecting region or the reflecting region is located at center, the light transmission
Area distribution is in the periphery of the reflecting region.
10. alignment device as described in claim 3 or 4, which is characterized in that second optical element further includes one not reflecting
Light tight region.
11. alignment device as claimed in claim 3, which is characterized in that the light source includes light source strobe unit.
12. alignment device as claimed in claim 8, which is characterized in that the size of the transmission region is by the alignment mark
Maximum grating constant pmaxWith the minimal wave length λ of the illuminating bundleminAnd the minimum diffraction for needing to detect in diffracted beam
Level NminIt determines, the angle of the passable light beam of transmission region is less than
13. alignment device as described in claim 1, which is characterized in that the illuminating bundle is laser, the optical system packet
Include Amici prism, the first reflecting mirror and the second reflecting mirror composition, the illuminating bundle through the Amici prism be divided into transmitted light and
Reflected light is incident upon alignment mark by the first reflecting mirror and the reflection of the second reflecting mirror are simultaneously finally oblique respectively.
14. alignment device as claimed in claim 13, which is characterized in that the angle of first reflecting mirror and the second reflecting mirror
It is adjustable, to change incidence angle of the illuminating bundle with respect to alignment mark.
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| US10117603B2 (en) * | 2015-06-27 | 2018-11-06 | Intel Corporation | Field-of-view ocular and facial alignment guides |
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