JPS6210996Y2 - - Google Patents
Info
- Publication number
- JPS6210996Y2 JPS6210996Y2 JP18038681U JP18038681U JPS6210996Y2 JP S6210996 Y2 JPS6210996 Y2 JP S6210996Y2 JP 18038681 U JP18038681 U JP 18038681U JP 18038681 U JP18038681 U JP 18038681U JP S6210996 Y2 JPS6210996 Y2 JP S6210996Y2
- Authority
- JP
- Japan
- Prior art keywords
- tank
- organic solvent
- liquid storage
- volatile organic
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 17
- 239000007788 liquid Substances 0.000 claims description 15
- 239000003960 organic solvent Substances 0.000 claims description 14
- 238000000034 method Methods 0.000 description 6
- 101100327917 Caenorhabditis elegans chup-1 gene Proteins 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 230000005802 health problem Effects 0.000 description 2
- 238000004080 punching Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18038681U JPS5885337U (ja) | 1981-12-03 | 1981-12-03 | 半導体基板の有機処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18038681U JPS5885337U (ja) | 1981-12-03 | 1981-12-03 | 半導体基板の有機処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5885337U JPS5885337U (ja) | 1983-06-09 |
| JPS6210996Y2 true JPS6210996Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-03-16 |
Family
ID=29976932
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18038681U Granted JPS5885337U (ja) | 1981-12-03 | 1981-12-03 | 半導体基板の有機処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5885337U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0793254B2 (ja) * | 1987-07-22 | 1995-10-09 | 松下電子工業株式会社 | レジスト膜形成用基板の処理方法 |
-
1981
- 1981-12-03 JP JP18038681U patent/JPS5885337U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5885337U (ja) | 1983-06-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4695327A (en) | Surface treatment to remove impurities in microrecesses | |
| KR940006209A (ko) | 표면 처리방법 및 장치 | |
| DE3650127D1 (de) | Verfahren und vorrichtung zum entfernen von schichten von substraten. | |
| CA2009518A1 (en) | Spin-on glass processing technique for the fabrication of semiconductor device | |
| JPH03151228A (ja) | 容器の製造方法 | |
| EP0047308A1 (en) | CENTRIFUGAL MICROPHONE PROCESSOR. | |
| JPS6210996Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| EP0952610A3 (en) | Microelectronic device package containing a liquid and method | |
| JPS63182818A (ja) | 乾燥装置 | |
| JPS63199423A (ja) | 半導体基板表面処理方法 | |
| JPH01226157A (ja) | 半導体基板の乾燥方法 | |
| JPS5753933A (ja) | Handotaisoshinoseizohoho | |
| JPS6127970Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| ATE162772T1 (de) | Durch siegeln verschliessbarer, nach dem ersten öffnen wiederverschliessbarer behälter, sowie verfahren und folie zu seiner herstellung | |
| JPS58190027A (ja) | 半導体基板有機処理装置 | |
| JPS6097351A (ja) | レジスト塗布装置 | |
| JPH089765B2 (ja) | セラミツク溶射材の封孔処理方法 | |
| JPH058676Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| JPH0362521A (ja) | 半導体ウエハの洗浄方法およびその装置 | |
| JPH0222057Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| KR19990066233A (ko) | 반도체 웨이퍼 기상분해시스템 및 이를 사용한 기상분해방법 | |
| JPS6019665B2 (ja) | 半導体装置用フレ−ムの製造方法 | |
| SU1426659A1 (ru) | Устройство дл нанесени покрыти | |
| JPH0427566Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
| JP2879812B2 (ja) | 小物ワーク用洗浄装置 |