JPS62109317A - プラズマエツチング装置 - Google Patents

プラズマエツチング装置

Info

Publication number
JPS62109317A
JPS62109317A JP24874285A JP24874285A JPS62109317A JP S62109317 A JPS62109317 A JP S62109317A JP 24874285 A JP24874285 A JP 24874285A JP 24874285 A JP24874285 A JP 24874285A JP S62109317 A JPS62109317 A JP S62109317A
Authority
JP
Japan
Prior art keywords
gas
plasma
electrodes
sintered body
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24874285A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0560650B2 (enrdf_load_stackoverflow
Inventor
Hideki Fujimoto
秀樹 藤本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP24874285A priority Critical patent/JPS62109317A/ja
Publication of JPS62109317A publication Critical patent/JPS62109317A/ja
Publication of JPH0560650B2 publication Critical patent/JPH0560650B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP24874285A 1985-11-08 1985-11-08 プラズマエツチング装置 Granted JPS62109317A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24874285A JPS62109317A (ja) 1985-11-08 1985-11-08 プラズマエツチング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24874285A JPS62109317A (ja) 1985-11-08 1985-11-08 プラズマエツチング装置

Publications (2)

Publication Number Publication Date
JPS62109317A true JPS62109317A (ja) 1987-05-20
JPH0560650B2 JPH0560650B2 (enrdf_load_stackoverflow) 1993-09-02

Family

ID=17182685

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24874285A Granted JPS62109317A (ja) 1985-11-08 1985-11-08 プラズマエツチング装置

Country Status (1)

Country Link
JP (1) JPS62109317A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62252942A (ja) * 1986-04-17 1987-11-04 Tokai Carbon Co Ltd プラズマエツチング用電極板
JPS62281426A (ja) * 1986-05-30 1987-12-07 Teru Ramu Kk 半導体処理装置
JPS6415930A (en) * 1987-07-10 1989-01-19 Hitachi Ltd Plasma processing device
JPH02186656A (ja) * 1989-01-13 1990-07-20 Hitachi Ltd 低発塵装置
US5006220A (en) * 1987-10-26 1991-04-09 Tokyo Ohka Kogyo Co., Ltd. Electrode for use in the treatment of an object in a plasma
JPH07169749A (ja) * 1994-09-19 1995-07-04 Tokai Carbon Co Ltd プラズマエッチング用電極板
US6376977B1 (en) 1999-06-08 2002-04-23 Shin-Etsu Chemical Co., Ltd. Silicon electrode plate
USRE41266E1 (en) 1990-09-18 2010-04-27 Lam Research Corporation Composite electrode for plasma processes

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58209111A (ja) * 1982-05-31 1983-12-06 Toshiba Corp プラズマ発生装置
JPS594028A (ja) * 1982-06-30 1984-01-10 Fujitsu Ltd 半導体製造装置
JPS6226820A (ja) * 1985-07-26 1987-02-04 Ibiden Co Ltd 炭化珪素質プラズマ分散板
JPS62100477A (ja) * 1985-10-25 1987-05-09 イビデン株式会社 ドライ・エツチング装置用の炭化珪素質部品

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58209111A (ja) * 1982-05-31 1983-12-06 Toshiba Corp プラズマ発生装置
JPS594028A (ja) * 1982-06-30 1984-01-10 Fujitsu Ltd 半導体製造装置
JPS6226820A (ja) * 1985-07-26 1987-02-04 Ibiden Co Ltd 炭化珪素質プラズマ分散板
JPS62100477A (ja) * 1985-10-25 1987-05-09 イビデン株式会社 ドライ・エツチング装置用の炭化珪素質部品

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62252942A (ja) * 1986-04-17 1987-11-04 Tokai Carbon Co Ltd プラズマエツチング用電極板
JPS62281426A (ja) * 1986-05-30 1987-12-07 Teru Ramu Kk 半導体処理装置
JPS6415930A (en) * 1987-07-10 1989-01-19 Hitachi Ltd Plasma processing device
US5006220A (en) * 1987-10-26 1991-04-09 Tokyo Ohka Kogyo Co., Ltd. Electrode for use in the treatment of an object in a plasma
US5022979A (en) * 1987-10-26 1991-06-11 Tokyo Ohka Kogyo Co., Ltd. Electrode for use in the treatment of an object in a plasma
JPH02186656A (ja) * 1989-01-13 1990-07-20 Hitachi Ltd 低発塵装置
USRE41266E1 (en) 1990-09-18 2010-04-27 Lam Research Corporation Composite electrode for plasma processes
JPH07169749A (ja) * 1994-09-19 1995-07-04 Tokai Carbon Co Ltd プラズマエッチング用電極板
US6376977B1 (en) 1999-06-08 2002-04-23 Shin-Etsu Chemical Co., Ltd. Silicon electrode plate

Also Published As

Publication number Publication date
JPH0560650B2 (enrdf_load_stackoverflow) 1993-09-02

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term