JPS6210011B2 - - Google Patents
Info
- Publication number
- JPS6210011B2 JPS6210011B2 JP54064259A JP6425979A JPS6210011B2 JP S6210011 B2 JPS6210011 B2 JP S6210011B2 JP 54064259 A JP54064259 A JP 54064259A JP 6425979 A JP6425979 A JP 6425979A JP S6210011 B2 JPS6210011 B2 JP S6210011B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- substrate
- pattern
- exposure
- mark
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6425979A JPS55156329A (en) | 1979-05-24 | 1979-05-24 | Manufacture for integrated element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6425979A JPS55156329A (en) | 1979-05-24 | 1979-05-24 | Manufacture for integrated element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55156329A JPS55156329A (en) | 1980-12-05 |
| JPS6210011B2 true JPS6210011B2 (enExample) | 1987-03-04 |
Family
ID=13253004
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6425979A Granted JPS55156329A (en) | 1979-05-24 | 1979-05-24 | Manufacture for integrated element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55156329A (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6010624A (ja) * | 1983-06-29 | 1985-01-19 | Mitsubishi Electric Corp | パタ−ン形成方法 |
-
1979
- 1979-05-24 JP JP6425979A patent/JPS55156329A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55156329A (en) | 1980-12-05 |
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