JPS6194342U - - Google Patents

Info

Publication number
JPS6194342U
JPS6194342U JP17983484U JP17983484U JPS6194342U JP S6194342 U JPS6194342 U JP S6194342U JP 17983484 U JP17983484 U JP 17983484U JP 17983484 U JP17983484 U JP 17983484U JP S6194342 U JPS6194342 U JP S6194342U
Authority
JP
Japan
Prior art keywords
temperature
liquid
semiconductor wafer
optical system
imaging optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17983484U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP17983484U priority Critical patent/JPS6194342U/ja
Publication of JPS6194342U publication Critical patent/JPS6194342U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】
第１図は本考案の一実施例の要部を断面で示し
た構成説明図、第２図は従来の半導体ウエハー露
光装置の要部を断面で示した構成説明図である。 １…マスク、２…ステージ、３…半導体ウエハ
ー、１０，２０…結像光学系、１１，２１…レン
ズホルダー、１２〜１６…レンズ、２１〜２４…
空室、３０…温調液循環装置、３１，３２…パイ
プ。

Claims (1)

  1. 【実用新案登録請求の範囲】 １ 半導体ウエハーに塗着された感光膜面を露光
    する半導体ウエハー露光装置において、レンズホ
    ルダーが、光軸を揃えて複数のレンズを保持する
    と共に、該レンズ間の少なくとも１箇所に液体の
    流通が可能な空室を形成する結像光学系と、該結
    像光学系の空室に温度調節された透光性の液体を
    流通させる温調液送給手段とを具備し、前記空室
    に流通させた液体によつて前記結像光学系を温度
    調節することを特徴とする半導体ウエハーの露光
    装置。 ２ 前記透光性の液体は所定の温度に保持され、
    前記結像光学系の温度上昇を抑える冷却液である
    ことを特徴とする実用新案登録請求の範囲第１項
    に記載の半導体ウエハーの露光装置。
JP17983484U 1984-11-27 1984-11-27 Pending JPS6194342U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17983484U JPS6194342U (ja) 1984-11-27 1984-11-27

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17983484U JPS6194342U (ja) 1984-11-27 1984-11-27

Publications (1)

Publication Number Publication Date
JPS6194342U true JPS6194342U (ja) 1986-06-18

Family

ID=30737399

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17983484U Pending JPS6194342U (ja) 1984-11-27 1984-11-27

Country Status (1)

Country Link
JP (1) JPS6194342U (ja)

Cited By (12)

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WO2005006418A1 (ja) * 2003-07-09 2005-01-20 Nikon Corporation 露光装置及びデバイス製造方法
WO2006051745A1 (ja) * 2004-11-15 2006-05-18 Smc Corporation 小流量液体の温調方法及びそのシステム
JP2007027632A (ja) * 2005-07-21 2007-02-01 Nikon Corp 光学装置及び露光装置、並びにデバイス製造方法
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9310696B2 (en) 2005-05-12 2016-04-12 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9766555B2 (en) 2003-02-26 2017-09-19 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

Cited By (24)

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US10180632B2 (en) 2003-02-26 2019-01-15 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US9766555B2 (en) 2003-02-26 2017-09-19 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
KR101296501B1 (ko) * 2003-07-09 2013-08-13 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
WO2005006418A1 (ja) * 2003-07-09 2005-01-20 Nikon Corporation 露光装置及びデバイス製造方法
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
WO2006051745A1 (ja) * 2004-11-15 2006-05-18 Smc Corporation 小流量液体の温調方法及びそのシステム
US9429851B2 (en) 2005-05-12 2016-08-30 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9360763B2 (en) 2005-05-12 2016-06-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9310696B2 (en) 2005-05-12 2016-04-12 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2007027632A (ja) * 2005-07-21 2007-02-01 Nikon Corp 光学装置及び露光装置、並びにデバイス製造方法
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

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