JPS6191948A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS6191948A JPS6191948A JP59213859A JP21385984A JPS6191948A JP S6191948 A JPS6191948 A JP S6191948A JP 59213859 A JP59213859 A JP 59213859A JP 21385984 A JP21385984 A JP 21385984A JP S6191948 A JPS6191948 A JP S6191948A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- resist
- insulating layer
- semiconductor substrate
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 29
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 238000000034 method Methods 0.000 claims abstract description 23
- 238000005530 etching Methods 0.000 claims description 15
- 238000001020 plasma etching Methods 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 4
- 230000002411 adverse Effects 0.000 abstract description 2
- 238000001039 wet etching Methods 0.000 description 6
- 238000007796 conventional method Methods 0.000 description 4
- 238000009413 insulation Methods 0.000 description 3
- 206010007559 Cardiac failure congestive Diseases 0.000 description 2
- 238000009563 continuous hemofiltration Methods 0.000 description 2
- 206010011732 Cyst Diseases 0.000 description 1
- MMOXZBCLCQITDF-UHFFFAOYSA-N N,N-diethyl-m-toluamide Chemical compound CCN(CC)C(=O)C1=CC=CC(C)=C1 MMOXZBCLCQITDF-UHFFFAOYSA-N 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 208000031513 cyst Diseases 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Drying Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59213859A JPS6191948A (ja) | 1984-10-12 | 1984-10-12 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59213859A JPS6191948A (ja) | 1984-10-12 | 1984-10-12 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6191948A true JPS6191948A (ja) | 1986-05-10 |
| JPH0467333B2 JPH0467333B2 (enrdf_load_stackoverflow) | 1992-10-28 |
Family
ID=16646199
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59213859A Granted JPS6191948A (ja) | 1984-10-12 | 1984-10-12 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6191948A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05283358A (ja) * | 1992-02-07 | 1993-10-29 | Sumitomo Metal Ind Ltd | 半導体装置のコンタクトホール形成方法 |
| US5308415A (en) * | 1992-12-31 | 1994-05-03 | Chartered Semiconductor Manufacturing Pte Ltd. | Enhancing step coverage by creating a tapered profile through three dimensional resist pull back |
| JPH06151388A (ja) * | 1992-11-12 | 1994-05-31 | Sumitomo Metal Ind Ltd | 半導体装置のコンタクトホール形成方法 |
| CN104658906A (zh) * | 2013-11-22 | 2015-05-27 | 上海和辉光电有限公司 | 一种半导体平坦化层的制作方法 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7600359B2 (en) | 2002-05-09 | 2009-10-13 | Seagate Technology Llc | Method of merging two disks concentrically without gap between disks |
| US7083871B2 (en) | 2002-05-09 | 2006-08-01 | Maxtor Corporation | Single-sided sputtered magnetic recording disks |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS505105A (enrdf_load_stackoverflow) * | 1973-05-15 | 1975-01-20 | ||
| JPS5694353A (en) * | 1979-12-28 | 1981-07-30 | Fujitsu Ltd | Micropattern forming method |
-
1984
- 1984-10-12 JP JP59213859A patent/JPS6191948A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS505105A (enrdf_load_stackoverflow) * | 1973-05-15 | 1975-01-20 | ||
| JPS5694353A (en) * | 1979-12-28 | 1981-07-30 | Fujitsu Ltd | Micropattern forming method |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05283358A (ja) * | 1992-02-07 | 1993-10-29 | Sumitomo Metal Ind Ltd | 半導体装置のコンタクトホール形成方法 |
| JPH06151388A (ja) * | 1992-11-12 | 1994-05-31 | Sumitomo Metal Ind Ltd | 半導体装置のコンタクトホール形成方法 |
| US5308415A (en) * | 1992-12-31 | 1994-05-03 | Chartered Semiconductor Manufacturing Pte Ltd. | Enhancing step coverage by creating a tapered profile through three dimensional resist pull back |
| CN104658906A (zh) * | 2013-11-22 | 2015-05-27 | 上海和辉光电有限公司 | 一种半导体平坦化层的制作方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0467333B2 (enrdf_load_stackoverflow) | 1992-10-28 |
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