JPS6184537A - 容量式センサの製造方法 - Google Patents
容量式センサの製造方法Info
- Publication number
- JPS6184537A JPS6184537A JP20663984A JP20663984A JPS6184537A JP S6184537 A JPS6184537 A JP S6184537A JP 20663984 A JP20663984 A JP 20663984A JP 20663984 A JP20663984 A JP 20663984A JP S6184537 A JPS6184537 A JP S6184537A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- epitaxial layer
- type
- capacitive sensor
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0072—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance
- G01L9/0073—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance using a semiconductive diaphragm
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measuring Fluid Pressure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20663984A JPS6184537A (ja) | 1984-10-02 | 1984-10-02 | 容量式センサの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20663984A JPS6184537A (ja) | 1984-10-02 | 1984-10-02 | 容量式センサの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6184537A true JPS6184537A (ja) | 1986-04-30 |
JPH0443226B2 JPH0443226B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-07-15 |
Family
ID=16526684
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20663984A Granted JPS6184537A (ja) | 1984-10-02 | 1984-10-02 | 容量式センサの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6184537A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02290524A (ja) * | 1989-01-30 | 1990-11-30 | Dresser Ind Inc | 半導体ウエーハ及びその形成法とトランスジューサ及びその製法 |
JPH04143628A (ja) * | 1990-10-05 | 1992-05-18 | Yamatake Honeywell Co Ltd | 静電容量式圧力センサ |
EP0501359A3 (en) * | 1991-02-25 | 1994-05-18 | Canon Kk | Semiconductor sensor of electrostatic capacitance type |
US5520051A (en) * | 1989-09-27 | 1996-05-28 | Nippondenso Co., Ltd. | Strain sensing device |
US6250165B1 (en) | 1998-02-02 | 2001-06-26 | Denso Corporation | Semiconductor physical quantity sensor |
US6388300B1 (en) | 1999-01-25 | 2002-05-14 | Denso Corporation | Semiconductor physical quantity sensor and method of manufacturing the same |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20230052771A1 (en) * | 2020-01-31 | 2023-02-16 | Sumitomo Metal Mining Co., Ltd. | Electromagnetic wave absorbing particles, electromagnetic wave absorbing particle dispersion liquid, and method for manufacturing electromagnetic wave absorbing particles |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5764978A (en) * | 1980-10-03 | 1982-04-20 | Ibm | Capacitive pressure transducer |
JPS5873166A (ja) * | 1981-10-13 | 1983-05-02 | ユナイテツド・テクノロジ−ズ・コ−ポレイシヨン | 容量性圧力トランスジューサの製造方法 |
-
1984
- 1984-10-02 JP JP20663984A patent/JPS6184537A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5764978A (en) * | 1980-10-03 | 1982-04-20 | Ibm | Capacitive pressure transducer |
JPS5873166A (ja) * | 1981-10-13 | 1983-05-02 | ユナイテツド・テクノロジ−ズ・コ−ポレイシヨン | 容量性圧力トランスジューサの製造方法 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02290524A (ja) * | 1989-01-30 | 1990-11-30 | Dresser Ind Inc | 半導体ウエーハ及びその形成法とトランスジューサ及びその製法 |
US5520051A (en) * | 1989-09-27 | 1996-05-28 | Nippondenso Co., Ltd. | Strain sensing device |
JPH04143628A (ja) * | 1990-10-05 | 1992-05-18 | Yamatake Honeywell Co Ltd | 静電容量式圧力センサ |
EP0501359A3 (en) * | 1991-02-25 | 1994-05-18 | Canon Kk | Semiconductor sensor of electrostatic capacitance type |
US6250165B1 (en) | 1998-02-02 | 2001-06-26 | Denso Corporation | Semiconductor physical quantity sensor |
US6388300B1 (en) | 1999-01-25 | 2002-05-14 | Denso Corporation | Semiconductor physical quantity sensor and method of manufacturing the same |
Also Published As
Publication number | Publication date |
---|---|
JPH0443226B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-07-15 |
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