JPS6184375A - 化学蒸着法 - Google Patents
化学蒸着法Info
- Publication number
- JPS6184375A JPS6184375A JP20456384A JP20456384A JPS6184375A JP S6184375 A JPS6184375 A JP S6184375A JP 20456384 A JP20456384 A JP 20456384A JP 20456384 A JP20456384 A JP 20456384A JP S6184375 A JPS6184375 A JP S6184375A
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- gas
- chemical vapor
- gaseous
- reaction chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20456384A JPS6184375A (ja) | 1984-09-29 | 1984-09-29 | 化学蒸着法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20456384A JPS6184375A (ja) | 1984-09-29 | 1984-09-29 | 化学蒸着法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6184375A true JPS6184375A (ja) | 1986-04-28 |
JPS6149390B2 JPS6149390B2 (enrdf_load_stackoverflow) | 1986-10-29 |
Family
ID=16492540
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20456384A Granted JPS6184375A (ja) | 1984-09-29 | 1984-09-29 | 化学蒸着法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6184375A (enrdf_load_stackoverflow) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61157681A (ja) * | 1984-12-28 | 1986-07-17 | Toho Kinzoku Kk | 化学蒸着法 |
US5262202A (en) * | 1988-02-17 | 1993-11-16 | Air Products And Chemicals, Inc. | Heat treated chemically vapor deposited products and treatment method |
WO2000047796A1 (fr) * | 1999-02-11 | 2000-08-17 | Hardide Limited | Revetements de carbure de tungstene et procede de production |
JP2005248231A (ja) * | 2004-03-03 | 2005-09-15 | Tokyo Electron Ltd | 成膜方法 |
JP2021510934A (ja) * | 2018-01-15 | 2021-04-30 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 炭化タングステン膜の接着性及び欠陥を改善する技法 |
-
1984
- 1984-09-29 JP JP20456384A patent/JPS6184375A/ja active Granted
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61157681A (ja) * | 1984-12-28 | 1986-07-17 | Toho Kinzoku Kk | 化学蒸着法 |
US5262202A (en) * | 1988-02-17 | 1993-11-16 | Air Products And Chemicals, Inc. | Heat treated chemically vapor deposited products and treatment method |
WO2000047796A1 (fr) * | 1999-02-11 | 2000-08-17 | Hardide Limited | Revetements de carbure de tungstene et procede de production |
US6800383B1 (en) | 1999-02-11 | 2004-10-05 | Hardide Limited | Tungsten carbide coating and method for producing the same |
JP2005248231A (ja) * | 2004-03-03 | 2005-09-15 | Tokyo Electron Ltd | 成膜方法 |
JP2021510934A (ja) * | 2018-01-15 | 2021-04-30 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 炭化タングステン膜の接着性及び欠陥を改善する技法 |
US11859275B2 (en) | 2018-01-15 | 2024-01-02 | Applied Materials, Inc. | Techniques to improve adhesion and defects for tungsten carbide film |
Also Published As
Publication number | Publication date |
---|---|
JPS6149390B2 (enrdf_load_stackoverflow) | 1986-10-29 |
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