JPS6182497A - Manufacture of printed circuit board - Google Patents

Manufacture of printed circuit board

Info

Publication number
JPS6182497A
JPS6182497A JP20520984A JP20520984A JPS6182497A JP S6182497 A JPS6182497 A JP S6182497A JP 20520984 A JP20520984 A JP 20520984A JP 20520984 A JP20520984 A JP 20520984A JP S6182497 A JPS6182497 A JP S6182497A
Authority
JP
Japan
Prior art keywords
copper
plating
copper foil
thermoplastic film
steel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20520984A
Other languages
Japanese (ja)
Inventor
順雄 岩崎
直樹 福富
木田 明成
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP20520984A priority Critical patent/JPS6182497A/en
Publication of JPS6182497A publication Critical patent/JPS6182497A/en
Pending legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、微細パターンを容易に得ることが出来る印刷
配線板の製造法に関する。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a method for manufacturing a printed wiring board that can easily obtain a fine pattern.

(従来の技術) 印刷配線板の線巾、線間隔はLSIの高集積化にともな
いますます細くなっている。しかし、従来の製造方法で
は、例えば、銅張り積層板をエツチングしてパターンを
形成する場合、100μmが加工限界となり、これ以下
の線巾では、断線やシ璽−トが発生し易くなる。
(Prior Art) The line width and line spacing of printed wiring boards are becoming increasingly narrower as LSIs become more highly integrated. However, in conventional manufacturing methods, for example, when forming a pattern by etching a copper-clad laminate, the processing limit is 100 .mu.m, and wire widths less than this are likely to cause wire breakage and spotting.

こ”nは鋼張積層板製造1糧において発生する鋼箔面の
へこみ、キズなとが原因である。また、線巾、線間隔が
50μm位になると銅張積層板表面の微小な凹凸やうね
りに工り線巾精度が問題となってくる。
This is caused by dents and scratches on the steel foil surface that occur during the production of steel-clad laminates.Furthermore, when the line width and line spacing are about 50 μm, minute irregularities and scratches on the surface of the copper-clad laminate occur. Due to the undulations, the accuracy of the line width becomes a problem.

また、通常鋼箔が18〜35μmと厚いため100μm
以下のエツチングが非常に困難になる。5〜9μmの銅
箔を用いnば内層回路用のエツチングは容易になるが、
表層部は、スルホール内のめっきが附加さnるので、全
体の銅の厚さは30〜40μmとなり100μm以下の
エツチングは非常に困難である。このようなことから、
エツチング法ではなく、必要な部分より回路を形成する
アディティブ法が微細パターンの形成に適するが、現状
では基板表面の粗度が大きく、また、不必要な場所にも
めりきが析出する鋼つり現象があり、サブトラクト法以
上の微細パターン形成ができない。
In addition, since steel foil is usually thick at 18 to 35 μm, 100 μm
The following etching becomes extremely difficult. Etching for inner layer circuits becomes easier if a copper foil of 5 to 9 μm is used, but
In the surface layer part, since the plating inside the through holes is added, the total copper thickness is 30 to 40 .mu.m, and etching of 100 .mu.m or less is extremely difficult. From such a thing,
Instead of the etching method, the additive method, which forms circuits from the necessary parts, is suitable for forming fine patterns, but at present the substrate surface has a large degree of roughness, and the steel sagging phenomenon, in which chips are deposited in unnecessary places, is a problem. However, it is not possible to form finer patterns than the subtract method.

そこて、5〜9μmの銅箔を用いた銅張積層板をベース
にめっきにより必要な部分にめっきをした後、ベースの
薄い銅箔をクイックエッチするセミアディティブ法が微
細のパターンに適している。しかし、この方法において
も、前記した銅張積層板自体の欠陥や特性に支配さn、
80μm以下の微細パターンの形成は困難である。
Therefore, a semi-additive method is suitable for creating fine patterns, in which the necessary areas are plated using a copper-clad laminate using 5-9 μm copper foil as a base, and then the thin copper foil on the base is quickly etched. . However, even in this method, the defects and characteristics of the copper-clad laminate itself, as described above,
It is difficult to form fine patterns of 80 μm or less.

(発明の目的) 本発明の目的は、微細パターンを容易に得ることの出来
る印刷配線板の製造法を提供するにある。
(Object of the Invention) An object of the present invention is to provide a method for manufacturing a printed wiring board that allows a fine pattern to be easily obtained.

(発明の構成) 本発明は銅箔の片面にめっきレジストを設け、銅のエツ
チング液に耐蝕性のある金属めっき、銅のめっきを行い
、回路パターンを形成し、めっきレジストな除去し、回
路パターン面にプリプレグな重ね合せ加熱加圧し念後、
粘着剤塗布熱可塑性フィルムを両面に加熱加圧して設け
、穴あけしたのち、加熱しな後、銅めっきを行い、更に
銅エツチング液に耐蝕性のある金属めっきを形成し、上
記熱可塑性フィルムを剥離後、銅をエツチングすること
を特徴とするものである。
(Structure of the Invention) The present invention provides a plating resist on one side of a copper foil, performs corrosion-resistant metal plating and copper plating in a copper etching solution, forms a circuit pattern, removes the plating resist, and processes the circuit pattern. After superimposing prepreg on the surface and applying heat and pressure,
A thermoplastic film coated with an adhesive is applied by heating and pressurizing both sides, and after drilling holes, copper plating is performed without heating, and a corrosion-resistant metal plating is formed in a copper etching solution, and the thermoplastic film is peeled off. After that, the copper is etched.

従来技術に用いらnる銅張積ffi板自体の特性や欠陥
に基く限界を打破するために本発明では、回路パターン
を形成するペース材料に銅箔を用いえ。用いる銅箔はス
テンレス板等に剥離可能なようにめっきし念銅箔でも良
いし、すでに引きけがさnた銅箔めるいは圧延さnた銅
箔でもよい。!1図に示すようにこの銅箔1の片面に、
フォトレジストをラミネート、焼付、現像する等により
レジストパターン2t−形成する。次に、無電解めっき
、または、電気めっきにより金、ニッケル、半田などの
銅エツチング液に耐蝕性のめる金属3をめりきした後、
鋼めりき4を行なう。レジスト2を剥離した後、銅4表
面の接着処坤を行なう。
In order to overcome the limitations based on the characteristics and defects of the copper-clad FFI board used in the prior art, the present invention uses copper foil as the paste material for forming the circuit pattern. The copper foil used may be a copper foil plated on a stainless steel plate or the like so that it can be peeled off, or it may be a copper foil that has already been scratched or a rolled copper foil. ! As shown in Figure 1, on one side of this copper foil 1,
A resist pattern 2t- is formed by laminating, baking, developing, etc. a photoresist. Next, after plating a corrosion-resistant metal 3 such as gold, nickel, or solder in a copper etching solution by electroless plating or electroplating,
Perform steel milling 4. After removing the resist 2, the surface of the copper 4 is bonded.

次に第2図に示すようにこのようにして形成した回路パ
ターン5を有する@箔1を表層としてパターンを内側に
内1@回路板6と共に、層間位置決めをし、グリプレグ
7を介して積層接着熱可塑性フィルム9を加圧加熱して
基板表面に設ける。そして、穴ろけによりスルホール8
を形成し、乾燥機で加熱すると、上記フィルム9が穴壁
より収縮後退する。こnにより穴内壁に倒nこんだフィ
ルムのパリなどが収縮することにより銅端部から取り除
かn、かつ適当な大きさのバット部となる銅層12を露
出させることがてきる。熱可塑性フィルムとしては、ポ
リエチレン、塩化ビニル、ポリプロピレン、ナイロンな
どの比較的融点の低(・ものに、アクリル系、クロロプ
レン系などの粘着剤を欽布したものが使用可能である。
Next, as shown in FIG. 2, the foil 1 having the circuit pattern 5 formed in this way is used as the surface layer, and the pattern is placed inside together with the circuit board 6 for interlayer positioning, and laminated and bonded via the Gripreg 7. A thermoplastic film 9 is applied to the substrate surface by heating and applying pressure. And, due to hole leakage, through hole 8
When the film 9 is formed and heated in a dryer, the film 9 shrinks and retreats from the hole wall. As a result, the parts of the film that have collapsed on the inner wall of the hole shrink and can be removed from the copper end, and the copper layer 12, which will become a butt part of an appropriate size, can be exposed. As thermoplastic films, those with relatively low melting points such as polyethylene, vinyl chloride, polypropylene, and nylon coated with adhesives such as acrylic and chloroprene can be used.

次に、第4に示すように無電解銅めっき10を行ったの
ち、必要に応じて電気銅めっきを更に設けてもよい。そ
して、鋼のエツチング液に耐蝕性のある金めりき、ニッ
ケルめっき、半田めっき等を行ったのち、熱可塑性フィ
ルムを剥離し、穴の周囲にパッド等必要とさnる表面パ
ターンが残るよ5Kして銅箔を工゛ツチングする。
Next, after electroless copper plating 10 is performed as shown in FIG. 4, electrolytic copper plating may be further provided as required. Then, after applying corrosion-resistant gold plating, nickel plating, solder plating, etc. to the steel etching solution, the thermoplastic film is peeled off, leaving a surface pattern that requires padding, etc. around the hole. Then process the copper foil.

ペースとなった銅箔がエツチング除去さnるとあらかじ
め形成された回路が基板内に埋め込まnた形で露出する
。このようなプロセスを取る堝曾、プリプレグ7と内層
回路板60基板には、無電解鋼めっきに対して触媒性を
有する化合物を含有したものを使用する。触媒性を有し
ない積層板およびプリプレグを使用する場合は、粘着剤
塗布熱可塑性フィルムを二重に設け、無電解めっきに対
して触媒となる化合物を溶解させた溶液に浸漬し、そし
て、乾燥後上記フィルムを1枚剥離したのち、無電解鋼
めっきを行う。
When the copper foil serving as the paste is removed by etching, the pre-formed circuit is exposed in the form of being embedded in the board. In order to use such a process, the prepreg 7 and the inner layer circuit board 60 substrate contain a compound that has catalytic properties for electroless steel plating. When using non-catalytic laminates and prepregs, double layers of adhesive-coated thermoplastic film are immersed in a solution containing a compound that acts as a catalyst for electroless plating, and then dried. After one sheet of the above film is peeled off, electroless steel plating is performed.

実施例1 次の工程により印刷配線板な製造した。Example 1 A printed wiring board was manufactured by the following steps.

1)ステンレス(SUS430−BA)表面をスコッチ
プライ)7448で研磨後、全面に308℃厚の硫酸鋼
めっきを行なった0次に、フォトレジストをロールラミ
ネータでラミネートシた。ポジマスクを当て紫外線を照
射した後、現像液をスプレーし現像した。次に、金めつ
きを1 #mの厚さて行ない、さらに硫酸鋼めっきを3
0μm行なった。レジスト剥離液に浸漬し、レジストを
剥離した後、黒色酸化銅処理を行なった後、パターンの
形成さnた銅箔をステンレス板よりはがし取った。
1) After polishing the stainless steel (SUS430-BA) surface with Scotch Ply 7448, the entire surface was plated with sulfuric acid steel to a thickness of 308° C. Next, a photoresist was laminated with a roll laminator. After applying a positive mask and irradiating it with ultraviolet rays, a developer was sprayed and developed. Next, gold plating is applied to a thickness of 1 #m, and sulfuric acid steel plating is applied to a thickness of 3 m.
0μm was performed. After immersing in a resist stripping solution and stripping off the resist, a black copper oxide treatment was performed, and then the patterned copper foil was peeled off from the stainless steel plate.

2)この銅箔をあらかじめエツチング法で作成した内層
Ii(触媒含有鋼張り積層板を使用した。製品名:日立
化成工業製MCL−E−168)と触媒含有プリプレグ
(日立化成工業製商品名GEA−168N)とを位置決
めピンにより位置決めてきる多層化金型にセットし、1
70℃、2時間、40kg/cdの条件で加圧加熱し念
2) Inner layer Ii (catalyst-containing steel laminate was used; product name: MCL-E-168 manufactured by Hitachi Chemical Co., Ltd.) prepared by etching this copper foil in advance and catalyst-containing prepreg (product name GEA manufactured by Hitachi Chemical Co., Ltd.) -168N) in a multilayer mold that can be positioned using positioning pins, and
Heat under pressure at 70°C and 40kg/cd for 2 hours.

3)このようにして積層し九基板に、粘着剤塗布ポリエ
チレンフィルム(ヒタレックス5500X−9、日立化
成工業製)を160℃、5分、20kg/aIPの条件
で加圧加熱した。そして、穴あけしたのち125℃、2
5分間熱処理し、無電解銅めりきな厚さ25μm、ノー
ンダめりきを4μm施し良。
3) A polyethylene film coated with an adhesive (Hitalex 5500X-9, manufactured by Hitachi Chemical) was heated under pressure at 160° C. for 5 minutes at 20 kg/aIP on the thus laminated nine substrates. After drilling the holes, heat at 125℃, 2
Heat treated for 5 minutes, electroless copper plated to a thickness of 25 μm and non-under plated to a thickness of 4 μm.

4)上記ポリエチレンフィルムを剥離後、アルカリエッ
チャントで銅をエツチングして所望の多層印刷配線板を
製作した。
4) After peeling off the polyethylene film, copper was etched with an alkaline etchant to produce a desired multilayer printed wiring board.

実施例2 次の工程により印刷配線板な製造した。Example 2 A printed wiring board was manufactured by the following steps.

1) 実施例1の(1)項と同様のプロセスを行う。1) Perform the same process as in section (1) of Example 1.

2)との銅箔を、触媒を含有しない銅張り積層板(MC
L−E−67、日立化成工業、11)と、触媒を含有し
ないプリプレグ(GEA−67N1日立化成工業#りと
を多層化金型にセットし、170℃、2時間、40kg
/―の条件で加圧加熱した。
2) Copper foil with catalyst-free copper clad laminate (MC)
L-E-67, Hitachi Chemical Co., Ltd., 11) and a prepreg containing no catalyst (GEA-67N1 Hitachi Chemical Co., Ltd. #Rito) were set in a multilayer mold, and heated at 170°C for 2 hours to produce 40 kg.
Pressure and heating were carried out under the conditions of /-.

3)このようにして積層した基板に粘着剤塗布ポリエチ
レンフィルム(しタレックスS−500X−9、日立化
成工業製)を2枚貼り付け、160℃、5分、20kg
/alFの条件で加圧加熱した。そして、穴あけし、1
25℃、30分間処理したのち、無電解鋼めっきに対し
て触媒性を有する溶液(H3−101B。
3) Two adhesive-coated polyethylene films (Shitalex S-500X-9, manufactured by Hitachi Chemical) were attached to the thus laminated substrates, and heated at 160°C for 5 minutes at 20kg.
The mixture was heated under pressure under the conditions of /alF. Then, drill a hole, 1
After processing at 25°C for 30 minutes, a solution having catalytic properties for electroless steel plating (H3-101B) was added.

日立化成工業製商品名)に常温で10分間浸漬し、3分
間水洗し、80℃、20分間乾燥する。
Hitachi Chemical Co., Ltd. (trade name) for 10 minutes at room temperature, washed with water for 3 minutes, and dried at 80° C. for 20 minutes.

4)上記ポリエチレンフィルムを1枚剥離したのち無電
解銅めっきを厚さ1μm1電気鋼めっきを厚さ25μm
、金めつきを厚さ1μm施す。
4) After peeling off one sheet of the above polyethylene film, apply electroless copper plating to a thickness of 1 μm, and apply electrical steel plating to a thickness of 25 μm.
, gold plating is applied to a thickness of 1 μm.

5)実施例1の4)項と同様のエツチングを行って、所
望の多層印刷配線板を製作し次。
5) Perform the same etching as in 4) of Example 1 to produce a desired multilayer printed wiring board.

(発明の効果) 以上説明したように、本発明の印刷配線板の製造法に於
ては次の利点が達成さnる。
(Effects of the Invention) As explained above, the method for manufacturing a printed wiring board of the present invention achieves the following advantages.

1)表面にキズの無い銅箔向上にパターンを形成するの
で線巾、線間隔がそnぞn100μm以下の微細パター
ンを容易に得ることができる。
1) Since the pattern is formed on a copper foil with no scratches on the surface, it is possible to easily obtain a fine pattern with a line width and line spacing of 100 μm or less.

2)あらかじめ微細パターンを形成した後、積層するの
て、積層前に検査でき歩留りが向上する。
2) By forming fine patterns in advance and then laminating them, inspection can be performed before lamination, improving yield.

3) 正確に形成さnたレジスト偉の間にめっきにより
導体を形成し、さらにこの導体が樹脂に埋め込まn完全
に保賎するので、サイドエッチがなく、線巾精度が極め
て高い。
3) A conductor is formed by plating between precisely formed resist grooves, and this conductor is embedded in resin and completely preserved, so there is no side etch and the line width accuracy is extremely high.

4)スルーホールめりき用レジストとして安価な粘着剤
塗布熱可塑性フィルムを使用し、かつ感光性レジストを
用いた工程より短縮さnるため、低コストの印刷配Il
j板を製造することが出来る。
4) Since an inexpensive thermoplastic film coated with an adhesive is used as the through-hole plated resist, and the process is shorter than that using a photosensitive resist, a low-cost printing arrangement is possible.
J board can be manufactured.

【図面の簡単な説明】[Brief explanation of the drawing]

第1〜4図は本発明の詳細な説明するための断面図であ
る。 符号の説明 1 銅箔        2 レジスト・パターン3 
耐蝕性金属    4 銅 5 回路パターン   6 内1−回路、板7 プリプ
レグ    8 スルホール9 熱可塑性フィルム  
10  スルホール鋼めっき層11  耐熱性金属めっ
き層 12  パット部となる銅層第1図 第2図
1 to 4 are sectional views for explaining the present invention in detail. Explanation of symbols 1 Copper foil 2 Resist pattern 3
Corrosion-resistant metal 4 Copper 5 Circuit pattern 6 Inner 1 circuit, board 7 Prepreg 8 Through hole 9 Thermoplastic film
10 Through-hole steel plating layer 11 Heat-resistant metal plating layer 12 Copper layer serving as pad portion Fig. 1 Fig. 2

Claims (1)

【特許請求の範囲】 1、銅箔の片面にめっきレジストを設け、銅のエッチン
グ液に耐蝕性のある金属めっき、更に銅のめっきを行い
回路パターンを形成し、めっきレジストを除去し、回路
パターン面にプリプレグを重ね合せ加熱加圧した後、 熱可塑性フィルムを両面に加熱加圧し て設け、穴あけした後、加熱することにより上記熱可塑
性フィルムを穴壁より収縮後退させたのち、銅めっきを
行い、更に銅のエッチング液に耐蝕性のある金属めっき
を形成し、上記熱可塑性フィルムを剥離後、銅をエッチ
ングすることを特徴とする印刷配線板の製造法。
[Claims] 1. A plating resist is provided on one side of the copper foil, a corrosion-resistant metal plating is applied to a copper etching solution, and further copper plating is applied to form a circuit pattern.The plating resist is removed, and the circuit pattern is formed. After superposing the prepreg on the surface and applying heat and pressure, a thermoplastic film is placed on both sides by heat and pressure, a hole is made, the thermoplastic film is heated to shrink and recede from the hole wall, and then copper plating is performed. A method for producing a printed wiring board, further comprising forming a corrosion-resistant metal plating in a copper etching solution, peeling off the thermoplastic film, and then etching the copper.
JP20520984A 1984-09-28 1984-09-28 Manufacture of printed circuit board Pending JPS6182497A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20520984A JPS6182497A (en) 1984-09-28 1984-09-28 Manufacture of printed circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20520984A JPS6182497A (en) 1984-09-28 1984-09-28 Manufacture of printed circuit board

Publications (1)

Publication Number Publication Date
JPS6182497A true JPS6182497A (en) 1986-04-26

Family

ID=16503204

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20520984A Pending JPS6182497A (en) 1984-09-28 1984-09-28 Manufacture of printed circuit board

Country Status (1)

Country Link
JP (1) JPS6182497A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05191050A (en) * 1992-01-13 1993-07-30 Hitachi Chem Co Ltd Manufacture of rigid flex wiring board
JP2002324975A (en) * 2001-04-25 2002-11-08 Toppan Printing Co Ltd Multilayer printed wiring board and its manufacturing method
WO2004039136A1 (en) * 2002-10-25 2004-05-06 Murata Manufacturing Co., Ltd. Method for manufacturing resin substrate and method for manufacturing multilayer resin substrate
JP2008109140A (en) * 2006-10-25 2008-05-08 Samsung Electro-Mechanics Co Ltd Circuit board and manufacturing method thereof
JPWO2009101723A1 (en) * 2008-02-11 2011-06-02 イビデン株式会社 Manufacturing method of electronic component built-in substrate

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05191050A (en) * 1992-01-13 1993-07-30 Hitachi Chem Co Ltd Manufacture of rigid flex wiring board
JP2002324975A (en) * 2001-04-25 2002-11-08 Toppan Printing Co Ltd Multilayer printed wiring board and its manufacturing method
WO2004039136A1 (en) * 2002-10-25 2004-05-06 Murata Manufacturing Co., Ltd. Method for manufacturing resin substrate and method for manufacturing multilayer resin substrate
JP2008109140A (en) * 2006-10-25 2008-05-08 Samsung Electro-Mechanics Co Ltd Circuit board and manufacturing method thereof
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