JPS6172219A - 露光装置 - Google Patents
露光装置Info
- Publication number
- JPS6172219A JPS6172219A JP59193032A JP19303284A JPS6172219A JP S6172219 A JPS6172219 A JP S6172219A JP 59193032 A JP59193032 A JP 59193032A JP 19303284 A JP19303284 A JP 19303284A JP S6172219 A JPS6172219 A JP S6172219A
- Authority
- JP
- Japan
- Prior art keywords
- collimator lens
- light
- transfer surface
- receiving means
- light receiving
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59193032A JPS6172219A (ja) | 1984-09-15 | 1984-09-15 | 露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59193032A JPS6172219A (ja) | 1984-09-15 | 1984-09-15 | 露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6172219A true JPS6172219A (ja) | 1986-04-14 |
| JPH0347569B2 JPH0347569B2 (enEXAMPLES) | 1991-07-19 |
Family
ID=16301031
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59193032A Granted JPS6172219A (ja) | 1984-09-15 | 1984-09-15 | 露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6172219A (enEXAMPLES) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105242500A (zh) * | 2015-11-10 | 2016-01-13 | 中国科学院光电技术研究所 | 一种基于紫外宽光谱泰伯自成像的光刻系统 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51126073A (en) * | 1975-04-25 | 1976-11-02 | Hitachi Ltd | Pattern printing equpment made available by photo-etching method |
| JPS5859595A (ja) * | 1981-10-02 | 1983-04-08 | 株式会社和廣武 | 人工光源装置 |
| JPS58196023A (ja) * | 1982-03-29 | 1983-11-15 | フユ−ジヨン・システムズ・コ−ポレ−シヨン | 深紫外線フオトリトグラフイ−を達成する方法及び装置 |
-
1984
- 1984-09-15 JP JP59193032A patent/JPS6172219A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51126073A (en) * | 1975-04-25 | 1976-11-02 | Hitachi Ltd | Pattern printing equpment made available by photo-etching method |
| JPS5859595A (ja) * | 1981-10-02 | 1983-04-08 | 株式会社和廣武 | 人工光源装置 |
| JPS58196023A (ja) * | 1982-03-29 | 1983-11-15 | フユ−ジヨン・システムズ・コ−ポレ−シヨン | 深紫外線フオトリトグラフイ−を達成する方法及び装置 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105242500A (zh) * | 2015-11-10 | 2016-01-13 | 中国科学院光电技术研究所 | 一种基于紫外宽光谱泰伯自成像的光刻系统 |
| CN105242500B (zh) * | 2015-11-10 | 2017-07-11 | 中国科学院光电技术研究所 | 一种基于紫外宽光谱泰伯自成像的光刻系统 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0347569B2 (enEXAMPLES) | 1991-07-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |