JPS6161251B2 - - Google Patents
Info
- Publication number
- JPS6161251B2 JPS6161251B2 JP54084983A JP8498379A JPS6161251B2 JP S6161251 B2 JPS6161251 B2 JP S6161251B2 JP 54084983 A JP54084983 A JP 54084983A JP 8498379 A JP8498379 A JP 8498379A JP S6161251 B2 JPS6161251 B2 JP S6161251B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- aperture
- linear
- shaping
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8498379A JPS5610926A (en) | 1979-07-06 | 1979-07-06 | Electron beam drawing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8498379A JPS5610926A (en) | 1979-07-06 | 1979-07-06 | Electron beam drawing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5610926A JPS5610926A (en) | 1981-02-03 |
| JPS6161251B2 true JPS6161251B2 (cs) | 1986-12-24 |
Family
ID=13845843
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8498379A Granted JPS5610926A (en) | 1979-07-06 | 1979-07-06 | Electron beam drawing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5610926A (cs) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6414435U (cs) * | 1987-07-14 | 1989-01-25 | ||
| JPH0344043U (cs) * | 1989-09-08 | 1991-04-24 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58189204A (ja) * | 1982-04-30 | 1983-11-04 | Konishiroku Photo Ind Co Ltd | 高分子重合体の製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1557924A (en) * | 1976-02-05 | 1979-12-19 | Western Electric Co | Irradiation apparatus and methods |
| JPS5316578A (en) * | 1976-07-30 | 1978-02-15 | Toshiba Corp | Electron beam exposure apparatus |
| JPS545663A (en) * | 1977-06-15 | 1979-01-17 | Cho Lsi Gijutsu Kenkyu Kumiai | Device for exposing electron beam |
| US4097817A (en) * | 1977-06-30 | 1978-06-27 | Raytheon Company | Cylindrical cavity power combiner for plurality of coaxial oscillators |
| JPS5454581A (en) * | 1977-10-11 | 1979-04-28 | Fujitsu Ltd | Electron beam exposure apparatus |
-
1979
- 1979-07-06 JP JP8498379A patent/JPS5610926A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6414435U (cs) * | 1987-07-14 | 1989-01-25 | ||
| JPH0344043U (cs) * | 1989-09-08 | 1991-04-24 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5610926A (en) | 1981-02-03 |
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