JPS6159279B2 - - Google Patents

Info

Publication number
JPS6159279B2
JPS6159279B2 JP54113980A JP11398079A JPS6159279B2 JP S6159279 B2 JPS6159279 B2 JP S6159279B2 JP 54113980 A JP54113980 A JP 54113980A JP 11398079 A JP11398079 A JP 11398079A JP S6159279 B2 JPS6159279 B2 JP S6159279B2
Authority
JP
Japan
Prior art keywords
susceptor
gas
guide
silicon
flow adjustment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54113980A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5637296A (en
Inventor
Hiroshi Yamazaki
Katsumi Hoshina
Nobuyuki Ueshima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coorstek KK
Original Assignee
Toshiba Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Ceramics Co Ltd filed Critical Toshiba Ceramics Co Ltd
Priority to JP11398079A priority Critical patent/JPS5637296A/ja
Publication of JPS5637296A publication Critical patent/JPS5637296A/ja
Publication of JPS6159279B2 publication Critical patent/JPS6159279B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP11398079A 1979-09-05 1979-09-05 Epitaxially growing apparatus Granted JPS5637296A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11398079A JPS5637296A (en) 1979-09-05 1979-09-05 Epitaxially growing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11398079A JPS5637296A (en) 1979-09-05 1979-09-05 Epitaxially growing apparatus

Publications (2)

Publication Number Publication Date
JPS5637296A JPS5637296A (en) 1981-04-10
JPS6159279B2 true JPS6159279B2 (enExample) 1986-12-15

Family

ID=14626030

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11398079A Granted JPS5637296A (en) 1979-09-05 1979-09-05 Epitaxially growing apparatus

Country Status (1)

Country Link
JP (1) JPS5637296A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0445237Y2 (enExample) * 1985-03-14 1992-10-23
JPS6394633A (ja) * 1986-10-09 1988-04-25 Hitachi Electronics Eng Co Ltd 気相反応装置
JPH01294596A (ja) * 1988-05-20 1989-11-28 Toshiba Ceramics Co Ltd 組立式バレル型サセプタ
JP4606642B2 (ja) * 2001-05-17 2011-01-05 住友化学株式会社 半導体製造装置及び化合物半導体の製造方法

Also Published As

Publication number Publication date
JPS5637296A (en) 1981-04-10

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