JPS6156199B2 - - Google Patents

Info

Publication number
JPS6156199B2
JPS6156199B2 JP2927683A JP2927683A JPS6156199B2 JP S6156199 B2 JPS6156199 B2 JP S6156199B2 JP 2927683 A JP2927683 A JP 2927683A JP 2927683 A JP2927683 A JP 2927683A JP S6156199 B2 JPS6156199 B2 JP S6156199B2
Authority
JP
Japan
Prior art keywords
chromium
semi
insulating
introducing
bisbenzene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2927683A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59156997A (ja
Inventor
Masahiro Akyama
Yoshihiro Kawarada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP2927683A priority Critical patent/JPS59156997A/ja
Publication of JPS59156997A publication Critical patent/JPS59156997A/ja
Publication of JPS6156199B2 publication Critical patent/JPS6156199B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/40AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C30B29/42Gallium arsenide
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/40AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP2927683A 1983-02-25 1983-02-25 化合物半導体のエピタキシヤル成長法 Granted JPS59156997A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2927683A JPS59156997A (ja) 1983-02-25 1983-02-25 化合物半導体のエピタキシヤル成長法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2927683A JPS59156997A (ja) 1983-02-25 1983-02-25 化合物半導体のエピタキシヤル成長法

Publications (2)

Publication Number Publication Date
JPS59156997A JPS59156997A (ja) 1984-09-06
JPS6156199B2 true JPS6156199B2 (enrdf_load_stackoverflow) 1986-12-01

Family

ID=12271748

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2927683A Granted JPS59156997A (ja) 1983-02-25 1983-02-25 化合物半導体のエピタキシヤル成長法

Country Status (1)

Country Link
JP (1) JPS59156997A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01170821A (ja) * 1987-12-25 1989-07-05 Yonden Eng Kk 熱画像表示装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01170821A (ja) * 1987-12-25 1989-07-05 Yonden Eng Kk 熱画像表示装置

Also Published As

Publication number Publication date
JPS59156997A (ja) 1984-09-06

Similar Documents

Publication Publication Date Title
CN105209671B (zh) 钒掺杂SiC单晶及其方法
US8361227B2 (en) Silicon carbide single crystals with low boron content
CN104364428B (zh) 钒补偿的NU型和PI型SI SiC单晶及其晶体生长方法
US4404265A (en) Epitaxial composite and method of making
JPH05208900A (ja) 炭化ケイ素単結晶の成長装置
EP0200766B1 (en) Method of growing crystalline layers by vapour phase epitaxy
JPH01313927A (ja) 化合物半導体結晶成長方法
Fujiwara et al. Drastic effects of hydrogen flow rate on growth characteristics and electrical/optical properties of InP grown by organometallic vapour phase epitaxy with TMIn and TBP
US4239584A (en) Molecular-beam epitaxy system and method including hydrogen treatment
US3406048A (en) Epitaxial deposition of gallium arsenide from an atmosphere of hydrogen and ga2h6+ascl3+ash3 vapors
JPS6156199B2 (enrdf_load_stackoverflow)
US4238252A (en) Process for growing indium phosphide of controlled purity
JPH0225018A (ja) 半導体装置の製造方法
JPH0416597A (ja) 炭化珪素単結晶の製造方法
JP3141628B2 (ja) 化合物半導体素子及びその製造方法
JPS6115150B2 (enrdf_load_stackoverflow)
JPH07118457B2 (ja) Ii−vi族半導体物質の金属有機物蒸気相エピタキシ−成長法
JPS64809B2 (enrdf_load_stackoverflow)
JPH02289484A (ja) 単結晶成長装置
JPS647487B2 (enrdf_load_stackoverflow)
Koukitu et al. Vapor-phase epitaxial growth of GaAs by the single flat temperature zone method
JPH0322519A (ja) 化合物半導体混晶の製造方法
JPS6242517A (ja) 半導体気相処理方法
JPS62235300A (ja) 3−5族化合物半導体の気相成長方法
Görög et al. Epitaxial growth of AIIIBV semiconductors from vapour phase