JPS6155923A - レジスト処理方法 - Google Patents

レジスト処理方法

Info

Publication number
JPS6155923A
JPS6155923A JP17743884A JP17743884A JPS6155923A JP S6155923 A JPS6155923 A JP S6155923A JP 17743884 A JP17743884 A JP 17743884A JP 17743884 A JP17743884 A JP 17743884A JP S6155923 A JPS6155923 A JP S6155923A
Authority
JP
Japan
Prior art keywords
resist
processing method
resist pattern
ultraviolet rays
resist processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17743884A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0550850B2 (enrdf_load_stackoverflow
Inventor
Takashi Suzuki
隆 鈴木
Kei Kirita
桐田　慶
Toshiaki Shinozaki
篠崎　俊昭
Yoshihide Kato
加藤　芳秀
Kunihiro Isori
五十里　邦弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP17743884A priority Critical patent/JPS6155923A/ja
Publication of JPS6155923A publication Critical patent/JPS6155923A/ja
Publication of JPH0550850B2 publication Critical patent/JPH0550850B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP17743884A 1984-08-28 1984-08-28 レジスト処理方法 Granted JPS6155923A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17743884A JPS6155923A (ja) 1984-08-28 1984-08-28 レジスト処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17743884A JPS6155923A (ja) 1984-08-28 1984-08-28 レジスト処理方法

Publications (2)

Publication Number Publication Date
JPS6155923A true JPS6155923A (ja) 1986-03-20
JPH0550850B2 JPH0550850B2 (enrdf_load_stackoverflow) 1993-07-30

Family

ID=16030943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17743884A Granted JPS6155923A (ja) 1984-08-28 1984-08-28 レジスト処理方法

Country Status (1)

Country Link
JP (1) JPS6155923A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63232330A (ja) * 1987-03-20 1988-09-28 Ushio Inc レジスト処理方法
KR100687858B1 (ko) * 2000-12-29 2007-02-27 주식회사 하이닉스반도체 반도체소자의 패터닝 방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63232330A (ja) * 1987-03-20 1988-09-28 Ushio Inc レジスト処理方法
KR100687858B1 (ko) * 2000-12-29 2007-02-27 주식회사 하이닉스반도체 반도체소자의 패터닝 방법

Also Published As

Publication number Publication date
JPH0550850B2 (enrdf_load_stackoverflow) 1993-07-30

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