JPS6155923A - レジスト処理方法 - Google Patents
レジスト処理方法Info
- Publication number
- JPS6155923A JPS6155923A JP17743884A JP17743884A JPS6155923A JP S6155923 A JPS6155923 A JP S6155923A JP 17743884 A JP17743884 A JP 17743884A JP 17743884 A JP17743884 A JP 17743884A JP S6155923 A JPS6155923 A JP S6155923A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- resist pattern
- ultraviolet rays
- oxygen plasma
- curing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title description 4
- 238000012545 processing Methods 0.000 title description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 8
- 239000001301 oxygen Substances 0.000 claims abstract description 8
- 238000003672 processing method Methods 0.000 claims description 5
- 239000000758 substrate Substances 0.000 abstract description 9
- 239000002344 surface layer Substances 0.000 abstract description 5
- 230000000694 effects Effects 0.000 abstract description 3
- 238000010894 electron beam technology Methods 0.000 abstract description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052753 mercury Inorganic materials 0.000 abstract description 2
- 235000014121 butter Nutrition 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 210000003141 lower extremity Anatomy 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17743884A JPS6155923A (ja) | 1984-08-28 | 1984-08-28 | レジスト処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17743884A JPS6155923A (ja) | 1984-08-28 | 1984-08-28 | レジスト処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6155923A true JPS6155923A (ja) | 1986-03-20 |
| JPH0550850B2 JPH0550850B2 (enrdf_load_stackoverflow) | 1993-07-30 |
Family
ID=16030943
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17743884A Granted JPS6155923A (ja) | 1984-08-28 | 1984-08-28 | レジスト処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6155923A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63232330A (ja) * | 1987-03-20 | 1988-09-28 | Ushio Inc | レジスト処理方法 |
| KR100687858B1 (ko) * | 2000-12-29 | 2007-02-27 | 주식회사 하이닉스반도체 | 반도체소자의 패터닝 방법 |
-
1984
- 1984-08-28 JP JP17743884A patent/JPS6155923A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63232330A (ja) * | 1987-03-20 | 1988-09-28 | Ushio Inc | レジスト処理方法 |
| KR100687858B1 (ko) * | 2000-12-29 | 2007-02-27 | 주식회사 하이닉스반도체 | 반도체소자의 패터닝 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0550850B2 (enrdf_load_stackoverflow) | 1993-07-30 |
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